| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 08/15/2002 | US20020110751 Photosensitive flexographic printing element having an IR-ablative layer comprising polyether-polyurethanes |
| 08/15/2002 | US20020110750 Positive-working photoresist composition |
| 08/15/2002 | US20020110741 Phase shift mask blank, photo mask blank and manufacturing apparatus and method of blanks |
| 08/15/2002 | US20020110740 Photosensitive composition for volume hologram recording and photosensitive medium for volume hologram recording |
| 08/15/2002 | US20020110665 Aperture fill |
| 08/15/2002 | US20020110641 Nozzle which drops the coating liquid on the center of substrate includes spiral groove or fins for creating gyration to the dropped coating |
| 08/15/2002 | US20020110640 Coating method and apparatus for semiconductor process |
| 08/15/2002 | US20020110510 Adsorption apparatus and methods |
| 08/15/2002 | US20020110217 X-ray illumination optical system and X-ray reduction exposure apparatus |
| 08/15/2002 | US20020110174 Laser gas replenishment method |
| 08/15/2002 | US20020109954 Electrostatic chucks and process for producing the same |
| 08/15/2002 | US20020109850 Exposure apparatus including interferometer system |
| 08/15/2002 | US20020109828 Mask handling apparatus, lithographic projection apparatus, device manufacturing method and device manufactured thereby |
| 08/15/2002 | US20020109827 Exposure apparatus and method |
| 08/15/2002 | US20020109826 Optical device, method of cleaning the same, projection aligner, and method of producing the same |
| 08/15/2002 | US20020109825 Lithographic apparatus |
| 08/15/2002 | US20020109824 Exposure apparatus and exposure method |
| 08/15/2002 | US20020109823 Wafer stage assembly |
| 08/15/2002 | US20020109437 System for damping oscillations |
| 08/15/2002 | US20020109108 Illumination apparatus and projection exposure apparatus using the same |
| 08/15/2002 | US20020109103 Lithographic apparatus, method of manufacturing a device, and device manufactured thereby |
| 08/15/2002 | US20020109088 Inspection method, apparatus and system for circuit pattern |
| 08/15/2002 | US20020108926 Method for producing micromachined devices and devices obtained thereof |
| 08/15/2002 | US20020108561 Spin coating methods |
| 08/15/2002 | CA2433076A1 Fabrication of structures of metal/semiconductor compound by x-ray/euv projection lithography |
| 08/14/2002 | EP1231770A2 Drum for fixing sheet-type member |
| 08/14/2002 | EP1231769A2 Multiple beam scanning apparatus for scanning photosensitive material with a multi spot array and method of correcting the positions of picture elements produced thereby |
| 08/14/2002 | EP1231617A1 Out-of-plane micro-device structures |
| 08/14/2002 | EP1231616A1 Out-of-plane micro-device structures |
| 08/14/2002 | EP1231518A2 Image recording apparatus |
| 08/14/2002 | EP1231517A1 Lithographic projection apparatus and method of measuring wave front aberrations |
| 08/14/2002 | EP1231516A2 Method of forming and adjusting optical system and exposure apparatus, and for determining specification thereof and related computer system |
| 08/14/2002 | EP1231515A1 Lithographic apparatus and device manufacturing method |
| 08/14/2002 | EP1231514A1 Measurement of wavefront aberrations in a lithographic projection apparatus |
| 08/14/2002 | EP1231513A1 Lithographic projection apparatus with adjustable focal surface |
| 08/14/2002 | EP1231512A1 Composition for anti-reflective coating and method for manufacturing semiconductor device |
| 08/14/2002 | EP1231511A2 Photosensitive composition for volume hologram recording and photosensitive medium for volume hologram recording |
| 08/14/2002 | EP1231282A2 Methods and compositions for identification of polymers |
| 08/14/2002 | EP1231205A1 Vinylphenylpropionic acid derivatives, processes for production of the derivatives, polymers thereof and radiosensitive resin compositions |
| 08/14/2002 | EP1231182A2 Out-of-plane micro-device structures |
| 08/14/2002 | EP1231075A2 Presensitized printing plate |
| 08/14/2002 | EP1231074A2 Presensitized plate useful for making lithographic printing plate and method for making lithographic printing plate therefrom |
| 08/14/2002 | EP1230828A1 Method for obtaining an extreme ultraviolet radiation source and its use in lithography |
| 08/14/2002 | EP1230752A1 Virtual laser operator |
| 08/14/2002 | EP1230334A1 Non-corrosive cleaning composition for removing plasma etching residues |
| 08/14/2002 | EP1230276A1 Photoinitiator formulations |
| 08/14/2002 | EP1115751A4 Photopolymerization process and composition employing a charge transfer complex and cationic photoinitiator |
| 08/14/2002 | EP0974075B1 Black-pigmented structured high molecular weight material |
| 08/14/2002 | EP0937321A4 Picosecond laser |
| 08/14/2002 | EP0897557B1 Lithographical process for production of nanostructures on surfaces |
| 08/14/2002 | EP0823460B1 Water-base photosensitive resin composition |
| 08/14/2002 | DE10105978A1 Mehrstrahl-Abtastvorrichtung zur Abtastung eines fotoempfindlichen Materials mit einem Multi-Spot-Array sowie Verfahren zur Korrektur der Position von Bildpunkten des Multi-Spot-Arrays Multi-beam scanning device for scanning a photosensitive material with a multi-spot array and method for correcting the position of pixels of the multi-spot array |
| 08/14/2002 | DE10103707A1 Halterung zum Positionieren eines Objektträgers sowie Vorrichtung zum Laserschneiden von Präparaten und Mikroskop Holder for positioning a microscope slide and apparatus for laser cutting of preparations and microscope |
| 08/14/2002 | DE10065537A1 Verfahren zur Identifikation einer auf einen Wafer projizierten Maske nach der Belichtung des Wafers A method for identifying a projected onto a wafer mask of the exposure of the wafer |
| 08/14/2002 | CN1364247A 焊锡抗蚀剂油墨组合物 Solder resist ink composition |
| 08/14/2002 | CN1364246A Method for manufacturing semiconductor integrated circuit device, optical mask used therefor, method for manufacturing the same, and mask blanks used therefor |
| 08/14/2002 | CN1363948A Foundation treating system and method |
| 08/14/2002 | CN1363859A High-temp heat-stream photoetching method |
| 08/13/2002 | US6433917 Light modulation device and system |
| 08/13/2002 | US6433878 Method and apparatus for the determination of mask rules using scatterometry |
| 08/13/2002 | US6433872 Exposure method and apparatus |
| 08/13/2002 | US6433854 Method of illumination uniformity in photolithographic systems |
| 08/13/2002 | US6433479 Short-arc discharge lamp |
| 08/13/2002 | US6433437 Manufacturing process for semiconductor device, photomask, and manufacturing apparatus for semiconductor device |
| 08/13/2002 | US6433352 Method of positioning semiconductor wafer |
| 08/13/2002 | US6433351 Exposure apparatus and control method for correcting an exposure optical system on the basis of an estimated magnification variation |
| 08/13/2002 | US6433347 Charged-particle-beam projection-exposure methods and apparatus that selectively expose desired exposure units of a reticle pattern |
| 08/13/2002 | US6433346 Electrostatic reticle chucks, charged-particle-beam microlithography apparatus and methods, and semiconductor-device manufacturing methods comprising same |
| 08/13/2002 | US6433118 Photosensitivity; color filters |
| 08/13/2002 | US6432790 Method of manufacturing photomask, photomask, and method of manufacturing semiconductor integrated circuit device |
| 08/13/2002 | US6432727 Method for eliminating a static electricity on a semiconductor wafer |
| 08/13/2002 | US6432622 Mixture of acetone, butyrolactone and ester |
| 08/13/2002 | US6432621 Developer is reaction product of base and phenolic carboxylic compound |
| 08/13/2002 | US6432620 Exposure, development, discharging development solution |
| 08/13/2002 | US6432619 Forming photosensitive mask; simplification |
| 08/13/2002 | US6432616 Water soluble polymer and photoresist composition containing the same |
| 08/13/2002 | US6432615 Color forming |
| 08/13/2002 | US6432614 Photosensitive resin composition and color filter |
| 08/13/2002 | US6432613 For use in packaged circuit boards; heat resistance and solder resistance; adhesion to substrates |
| 08/13/2002 | US6432612 Ultraviolet-curable type photo solder resist ink |
| 08/13/2002 | US6432609 Photoacid generators, photoresists containing the same, and method of undergoing a photoacid-catalyzed reaction in a resin system using the same |
| 08/13/2002 | US6432608 Resist composition |
| 08/13/2002 | US6432594 Charged particle beam microlithography |
| 08/13/2002 | US6432591 Overlay target design method with pitch determination to minimize impact of lens aberrations |
| 08/13/2002 | US6432588 By optimizing the first of two electron beam dosages. |
| 08/13/2002 | US6432317 Method to produce masking |
| 08/13/2002 | US6432211 Cleaning compounds for mechanical printing with nonionic and anionic surfactants |
| 08/13/2002 | US6432209 Mixture of hydroxylamine partially neutralized with a weak carboxylic acid and an organic solvent such as an alkyl sulfoxide, pyrrolidinone or a sulfone removes photoresist with reduced metal corrosion |
| 08/13/2002 | US6431769 Substrate processing system and substrate processing method |
| 08/13/2002 | CA2055840C Stable liquid compositions useful as polymerization photo-promoters, their preparation and use |
| 08/08/2002 | WO2002061897A1 Purge monitoring system for gas discharge laser |
| 08/08/2002 | WO2002061813A1 Electron beam exposure device, electron beam forming member, and method of manufacturing the electron beam forming member |
| 08/08/2002 | WO2002061812A1 Electron beam exposure device and electron lens |
| 08/08/2002 | WO2002061809A2 Configurable patterning device and a method of making integrated circuits using such a device |
| 08/08/2002 | WO2002061508A1 Composition for hologram-recording material, hologram-recording medium, and process for producing the same |
| 08/08/2002 | WO2002061506A2 Developer fluid containing diprolene glycol dialkyl ethers |
| 08/08/2002 | WO2002061505A1 Mask, optical characteristic measuring method, exposure apparatus adjusting method and exposure method, and device manufacturing method |
| 08/08/2002 | WO2002061191A2 Fibrous structure having increased surface area and process for making same |
| 08/08/2002 | WO2002060973A1 Photocurable composition containing iodonium salt compound |
| 08/08/2002 | WO2002046179A8 (meth)acrylate esters, starting alcohols for the preparation thereof, processes for preparing both, polymers of the esters, chemically amplifiable resist compositions, and method for forming patterns |