| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 08/22/2002 | US20020112633 Mechanism for correcting unbalance of a rotor |
| 08/22/2002 | US20020112370 Method for two dimensional adaptive process control of critical dimensions during spin coating process |
| 08/22/2002 | DE10200703A1 Verfahren zum Bilden einer Resiststruktur, zum Bilden einer Elektrodenstruktur und zum Herstellen eines akustischen Oberflächenwellenbauelements A method of forming a resist pattern, forming an electrode structure and for producing a surface acoustic wave device |
| 08/22/2002 | DE10106605A1 System zur Beseitigung oder wenigstens Dämpfung von Schwingungen System to eliminate or at least dampen vibrations |
| 08/22/2002 | DE10104577A1 Verfahren zum Belacken eines Photomaskenrohlings für die Chipherstellung und Photomaske A method for lacquering a photomask blank for chip fabrication and photomask |
| 08/22/2002 | CA2437411A1 Process for roll-to-roll manufacture of a display by synchronized photolithographic exposure on a substrate web |
| 08/21/2002 | EP1233444A2 Membrane dielectric isolation ic fabrication |
| 08/21/2002 | EP1233305A2 Photolithographic device with multiple reticles |
| 08/21/2002 | EP1233304A1 Lithographic apparatus |
| 08/21/2002 | EP1233005A1 Method for producing synthetic quartz glass members for excimer lasers and synthetic quartz glass members for excimer laser optics produced by the same |
| 08/21/2002 | EP1232997A1 Method of treating an acid treatment solution, device for treating the solution, and method of fabricating a support for a planographic printing plate |
| 08/21/2002 | EP1232976A2 Method and device for separating printing plates |
| 08/21/2002 | EP1232877A1 Cleaning method for recycling a printing substrate by laser ablation |
| 08/21/2002 | EP1232526A1 Method and apparatus for personalization of semiconductor |
| 08/21/2002 | EP1232517A1 Plasma focus light source with improved pulse power system |
| 08/21/2002 | EP1232516A1 Method and radiation generating system using microtargets |
| 08/21/2002 | EP1232419A1 Fabrication of finely featured devices by liquid embossing |
| 08/21/2002 | EP1123212B1 Method for manufacture of electronic parts |
| 08/21/2002 | EP0971924B1 Photoactivatable nitrogen-containing bases based on alpha-amino ketones |
| 08/21/2002 | EP0758097B1 Polymerizable composition for color filter |
| 08/21/2002 | CN1365529A Narrow band gas discharge laser with gas additive |
| 08/21/2002 | CN1365512A Improved ladder boat for supporting wafers |
| 08/21/2002 | CN1365343A Systhetic quartz glass member, photolithography apparatus, and method for producing photolithography apparatus |
| 08/21/2002 | CN1365135A Optical mask, its producing method, image forming method and method for producing semicondcutor device |
| 08/21/2002 | CN1365028A Base board exposure device |
| 08/21/2002 | CN1365027A Separate exposure process by using common ultraviolet in deep layer photoetching |
| 08/21/2002 | CN1365026A Method for producing photosensitive lithoprint plate |
| 08/21/2002 | CN1365025A Positive imaging material |
| 08/21/2002 | CN1089472C Exposure apparatus |
| 08/21/2002 | CN1089453C 感光性树脂组合物 The photosensitive resin composition |
| 08/20/2002 | US6438461 Method and device for displacing a moving body on a base mounted elastically with respect to the ground |
| 08/20/2002 | US6438199 Illumination system particularly for microlithography |
| 08/20/2002 | US6437864 Stage positioning device |
| 08/20/2002 | US6437858 Aberration measuring method, aberration measuring system and aberration measuring mask |
| 08/20/2002 | US6437852 Exposure system |
| 08/20/2002 | US6437851 Exposure apparatus |
| 08/20/2002 | US6437850 Method and device for exposing both sides of a sheet |
| 08/20/2002 | US6437463 Wafer positioner with planar motor and mag-lev fine stage |
| 08/20/2002 | US6437354 Exposure method and scanning-type exposure apparatus |
| 08/20/2002 | US6437353 Particle-optical apparatus and process for the particle-optical production of microstructures |
| 08/20/2002 | US6437352 Charged particle beam projection lithography with variable beam shaping |
| 08/20/2002 | US6437349 Fluid nozzle system and method in an emitted energy system for photolithography |
| 08/20/2002 | US6437347 Target locking system for electron beam lithography |
| 08/20/2002 | US6437058 Novolak resin |
| 08/20/2002 | US6437052 Monomer having diol structure, polymer thereof, and negative photoresist composition and pattern forming method using the same |
| 08/20/2002 | US6436772 Method of manufacturing semiconductor device having memory cell transistors |
| 08/20/2002 | US6436726 Methods and circuits for mask-alignment detection |
| 08/20/2002 | US6436615 Methods and materials for selective modification of photopatterned polymer films |
| 08/20/2002 | US6436613 Substrate with a sol-gel glass multimode interference region coupled to and contiguous with the input region and configured to accept input light diffract the laser light outward from the grating outcoupler and to electrically vary an index of |
| 08/20/2002 | US6436610 Method for selectively exposing a light pattern to a photosensitive work surface |
| 08/20/2002 | US6436609 Photolithography and vapor deposition for semiconductors |
| 08/20/2002 | US6436608 Lithographic method utilizing a phase-shifting mask |
| 08/20/2002 | US6436607 Edges and scanning beam lithography with masking for semiconductors |
| 08/20/2002 | US6436606 Polymers and photoresists coating |
| 08/20/2002 | US6436605 Reactive ion etching resistance of radiation sensitive resist composition is enhanced by adding at least one organometallic compound to polymers with patterns |
| 08/20/2002 | US6436601 Thermally sensitive coating compositions containing mixed diazo novolaks useful for lithographic elements |
| 08/20/2002 | US6436596 Substrate a photosensitive layer formed by a resin soluble in an aqueous alkali solution and a compound that absorbs light to generate heat, the quality control method having the steps of: (a) exposing, to an ultraviolet ray, a gray scale and |
| 08/20/2002 | US6436595 Method for aligning a projected photolithography mask pattern image with respect to the underlying device layer. the method involves measuring the overlay error between product features in the projected layer and product features in the underlaying |
| 08/20/2002 | US6436594 Electron-beam exposure method utilizing specific alignment mask selection |
| 08/20/2002 | US6436593 A polyimide precursor or a polyoxazole precursor having a group represented by--or, acid generation with radiation |
| 08/20/2002 | US6436590 Phase shifting circuit manufacture method and apparatus |
| 08/20/2002 | US6436589 Reticle having an interleave kerf |
| 08/20/2002 | US6436586 Pellicle with a filter and method for production thereof |
| 08/20/2002 | US6436482 Upper and lower heaters for the top and bottom surfaces of the substrate, and a thermoconductive heater block on whidch the substrate is placed for independently setting the temperatures of the upper and lower heaters |
| 08/20/2002 | US6436472 Method of applying a coating solution to a substrate surface using a rotary coater |
| 08/20/2002 | US6436276 Using printed circuits having copper on its surface as cathodes during electrolysis in metal hydroxide electrolytes, so that removal with minimal sheeting and abrasion occurs on the metal layers |
| 08/20/2002 | US6436220 Process for the collective removal of resist material and side wall protective film |
| 08/20/2002 | US6436093 Controllable liquid crystal matrix mask particularly suited for performing ophthamological surgery, a laser system with said mask and a method of using the same |
| 08/20/2002 | CA2168106C High brightness directional viewing screen |
| 08/15/2002 | WO2002063664A1 Exposure system and exposure method, and device production method |
| 08/15/2002 | WO2002063663A1 Electron beam exposure apparatus and exposure method |
| 08/15/2002 | WO2002063662A1 Method for making slit, slit, and electron beam exposure system |
| 08/15/2002 | WO2002063613A2 A system and method for high resolution optical imaging, data storage, lithography, and inspection |
| 08/15/2002 | WO2002063396A1 In-situ lithography mask cleaning |
| 08/15/2002 | WO2002063395A1 Stepper exposure dose control base upon across wafer variations in photoresist thickness |
| 08/15/2002 | WO2002063394A1 Fabrication of structures of metal/semiconductor compound by x-ray/euv projection lithography |
| 08/15/2002 | WO2002063392A1 Self-aligned aperture masks having high definition apertures |
| 08/15/2002 | WO2002063382A1 Liquid crystal shutter for exposure system |
| 08/15/2002 | WO2002062593A1 Polymeric antireflective coatings deposited by plasma enhanced chemical vapor deposition |
| 08/15/2002 | WO2002049080A3 Method and apparatus for inspecting a substrate |
| 08/15/2002 | WO2002045215A3 Nanolithography methods and products therefor and produced thereby |
| 08/15/2002 | WO2002031599A3 Aqueous developer for negative working lithographic printing plates |
| 08/15/2002 | WO2002023845A3 Method for improving image quality and for increasing writing speed during exposure of light-sensitive layers |
| 08/15/2002 | WO2001079936A9 Mitigation of photoresist outgassing in vacuum lithography |
| 08/15/2002 | US20020111509 Containing C17-23 divalent hydrocarbon group containing a bridged cyclic hydrocarbon group, as well as an acid decompsable group |
| 08/15/2002 | US20020111459 Effecting deblocking reaction on an addition polymer in presence of acid catalyst |
| 08/15/2002 | US20020111391 Curable composition, cured coating film and coated substrate |
| 08/15/2002 | US20020111041 Post-etch photoresist strip with O2 and NH3 for organosilicate glass low-K dielectric etch applications |
| 08/15/2002 | US20020111038 Measurements are taken in-situ and monitor the erosion rate |
| 08/15/2002 | US20020111028 Method of manufacturing semiconductor device as well as reticle and wafer used therein |
| 08/15/2002 | US20020110766 Curve pattern; various etching depth |
| 08/15/2002 | US20020110765 Photolithography process for producing gates and conductive lines |
| 08/15/2002 | US20020110762 Narrow width pattern; variations in light intensity |
| 08/15/2002 | US20020110761 Photolithography patterns |
| 08/15/2002 | US20020110760 Heat treatment; transferring pattern |
| 08/15/2002 | US20020110758 Overcoating elastic material onto substrate; forming stress profiles; photolithographical patterning |
| 08/15/2002 | US20020110757 Low cost integrated out-of-plane micro-device structures and method of making |
| 08/15/2002 | US20020110755 Uisng photomask; curve pattern |
| 08/15/2002 | US20020110753 Reducing interference during optical imaging; transferring pattern from structural carrier |
| 08/15/2002 | US20020110752 Method for producing wiring configurations having coarse conductor structures and at least one region having fine conductor structures |