Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
09/2002
09/03/2002US6444373 Modification of mask layout data to improve mask fidelity
09/03/2002US6444320 Thermosetting anti-reflective coatings for full-fill dual damascene process
09/03/2002US6444029 Compact photolithography device for developing photoresist on semiconductor wafer; vertically stacked compartments; enhanced throughput
09/03/2002US6443641 Substrate process method and substrate process apparatus
09/03/2002US6442973 Synthetic silica glass and its manufacturing method
09/03/2002US6442858 Positioning apparatus, exposure apparatus, device manufacturing method, and positioning method
08/2002
08/29/2002WO2002067304A1 A method of forming resist patterns in a semiconductor device and a semiconductor washing liquid used in said method
08/29/2002WO2002067303A1 Exposure system, exposure device and device production method
08/29/2002WO2002067292A2 Semiconductor package and method of preparing same
08/29/2002WO2002067058A1 Assembly for the continuous production of a structured, coated substrate
08/29/2002WO2002067057A1 Image amplification for laser systems
08/29/2002WO2002067056A1 Resist composition and method of forming resist pattern
08/29/2002WO2002067055A2 Template for room temperature, low pressure micro- and nano-imprint lithography
08/29/2002WO2002067054A2 High-resolution photoresist structuring of multi-layer structures deposited onto substrates
08/29/2002WO2002067021A1 Polygon reflector, and illumination optical system and semiconductor exposure device using the polygon reflector
08/29/2002WO2002066561A1 Radiation-sensitive composition capable of having refractive index distribution
08/29/2002WO2002066526A1 Ethylenic fluoromonomer containing hydroxyl or fluoroalkylcarbonyl group and fluoropolymer obtained by polymerizing the same
08/29/2002WO2002066263A2 Mounting and preparing a gemstone or industrial diamond for the formation of a mark on the surface thereof
08/29/2002WO2002066262A2 Forming a mark on a gemstone or industrial diamond
08/29/2002WO2002066252A1 Thermally convertible lithographic printing precursor comprising an organic base
08/29/2002WO2002066176A1 Methods for cleaning microelectronic structures
08/29/2002WO2002044786A3 Catadioptric projection system for 157 nm lithography
08/29/2002WO2002043121A3 Bright field image reversal for contact hole patterning
08/29/2002WO2001081977A3 Optical reduction system with control of illumination polarization
08/29/2002WO2001039337A9 Deep ultraviolet catadioptric anamorphic telescope
08/29/2002WO2000069761A9 Cassette buffering within a minienvironment
08/29/2002WO2000041037A9 Method of removing photoresist material with dimethyl sulfoxide
08/29/2002WO2000038286A9 ArF LASER WITH LOW PULSE ENERGY AND HIGH REP RATE
08/29/2002US20020120417 Semi conductor production system
08/29/2002US20020120090 Cycloaliphatic polyimide, a method for producing the same, and its use
08/29/2002US20020120070 Diazonapthoquinonesulfonyl-substituted polymer suitable for use in anti-reflective coating of a semiconductor device
08/29/2002US20020120058 Silicon-containing polymer, process for its production, resist composition employing it, pattern-forming method and electronic device fabrication method
08/29/2002US20020120031 Photothermosetting component
08/29/2002US20020119586 Process for forming pattern and method for producing liquid crystal display apparatus
08/29/2002US20020119404 Aqueous developer for negative working lithographic printing plates
08/29/2002US20020119403 Using developer solution
08/29/2002US20020119402 Shift multi-exposure method
08/29/2002US20020119401 Method for light exposure
08/29/2002US20020119398 Photopolymerization
08/29/2002US20020119397 Methods of forming patterns across photoresist and methods of forming radiation-patterning tools
08/29/2002US20020119395 Photopolymerization
08/29/2002US20020119393 Semiconductor patterns
08/29/2002US20020119392 Planographic printing original plate
08/29/2002US20020119391 Using cyclic olefin polymer; forming relief images
08/29/2002US20020119390 Using photosensitizer; forming photoresist pattern
08/29/2002US20020119389 Positive photosensitive resin composition
08/29/2002US20020119378 Lithography; microelectronics
08/29/2002US20020119308 Puff heat transfer
08/29/2002US20020119263 Exhibits excellent developability when contains pigment in high concentration; residue/stain-free
08/29/2002US20020119246 Method for producing color filter
08/29/2002US20020118897 Stage device, exposure apparatus, device manufacturing method and movement guidance method
08/29/2002US20020118721 Method and apparatus for optimizing the output beam characteristics of a laser
08/29/2002US20020118350 Method and apparatus for registration control in production by imaging
08/29/2002US20020118349 Position detecting method and unit, optical characteristic measuring method and unit, exposure apparatus, and device manufacturing method
08/29/2002US20020118348 Semiconductor manufacturing device
08/29/2002US20020118347 Aligner
08/29/2002US20020118346 Lithographic tool with dual isolation system and method for configuring the same
08/29/2002US20020118345 Method and apparatus for printing patterns on substrates
08/29/2002US20020117903 Linear motor and stage apparatus, exposure apparatus, and device manufacturing method using the same
08/29/2002US20020117636 Electron beam irradiation system and electron beam irradiation method
08/29/2002US20020117618 Measurement technique for determining the width of a structure on a mask
08/29/2002US20020117611 Object inspection and/or modification system and method
08/29/2002US20020117111 Resist film forming method and resist coating apparatus
08/29/2002US20020117109 Multiple stage, stage assembly having independent reaction force transfer
08/29/2002US20020117105 Method of heat-treating fluoride crystal, method of producing optical part, and optical apparatus
08/29/2002US20020117067 Method and multibeam scanning device for the ablation of flexo printing plates by laser engraving
08/29/2002US20020116815 Manufacturing method of printed circuit board using dry film resist
08/29/2002DE10203354A1 Verfahren zum Bilden eines Verbindungsmusters in einer Halbleitervorrichtung A method for forming an interconnection pattern in a semiconductor device
08/29/2002DE10104415A1 Verfahren und Vorrichtung zur Handhabung einer zu belichtenden Belichtungsfläche, insbesondere einer Druckplatte Method and device for handling of a surface to be exposed, exposure, in particular a printing plate
08/29/2002CA2438126A1 Semiconductor package and method of preparing same
08/29/2002CA2406219A1 Radiation sensitive refractive index changing composition
08/28/2002EP1235314A2 Method and apparatus for optimizing the output beam characteristics of a laser
08/28/2002EP1235254A2 Short-arc discharge lamp
08/28/2002EP1235115A2 Stage device and movement guidance method
08/28/2002EP1235114A1 Lithographic apparatus and method of manufacturing a device
08/28/2002EP1235113A2 Illumination system with reduced energy load
08/28/2002EP1235112A2 Objective subsystem for illumination system
08/28/2002EP1235111A2 Imaging of a printing element with reduced banding
08/28/2002EP1235110A2 Optical beam guide system and method of preventing contamination of optical components thereof
08/28/2002EP1235109A1 Method for exposing at least one or at least two semiconductor wafers
08/28/2002EP1235108A1 Antireflective coating material and semiconductor product with an ARC layer
08/28/2002EP1235107A1 Photopolymerizable composition
08/28/2002EP1235106A2 Lithographic printing plate precursor
08/28/2002EP1235105A2 Planographic printing plate precursor
08/28/2002EP1235104A1 Composition having refractive index sensitively changeable by radiation and method for forming refractive index pattern
08/28/2002EP1235103A2 An optical proximity correction method utilizing gray bars as sub-resolution assist features
08/28/2002EP1235102A2 Process and multibeam scanning device for laser ablation for making flexographic plates
08/28/2002EP1235092A2 Projection optical system, projection apparatus and projection exposure method
08/28/2002EP1235091A2 Projection optical system and exposure apparatus with the same
08/28/2002EP1234662A2 Image-recording material
08/28/2002EP1234358A1 High power gas discharge laser with helium purged line narrowing unit
08/28/2002EP1234322A2 Method and apparatus for supercritical processing of multiple workpieces
08/28/2002EP1156886A4 Apparatus and method for applying flux to a substrate
08/28/2002EP1053508B1 A process for making a photoactive compound and photoresist therefrom
08/28/2002EP0993445B1 New oxime sulfonates and the use thereof as latent sulfonic acids
08/28/2002EP0929843B1 Light sensitive composition containing an arylhydrazo dye
08/28/2002EP0770922B1 Method of removing surface stickiness of relief printing plate made from photosensitive resin
08/28/2002CN1366534A Polyimides and polyamide acids
08/28/2002CN1366333A Substrate treatment equipment and substrate treatment method using said equipment
08/28/2002CN1366212A Chemical reinforcing type positive photoresist composition
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