| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 09/12/2002 | US20020126266 Optical correction plate, and its application in a lithographic projection apparatus |
| 09/12/2002 | US20020126194 Color filter and process for producing the same |
| 09/12/2002 | US20020125824 Shadow mask, a method of forming the shadow mask, and a method of manufacturing a semiconductor device with using the shadow mask |
| 09/12/2002 | US20020125612 Method for production of three-dimensionally arranged conducting and connecting structures for volumetric and energy flows |
| 09/12/2002 | US20020125447 Devices and methods for monitoring respective operating temperatures of components in a microlithography apparatus |
| 09/12/2002 | US20020125445 Method of lithography using vacuum ultraviolet radiation |
| 09/12/2002 | US20020125444 Illumination-beam scanning configurations and methods for charged-particle-beam microlithography |
| 09/12/2002 | US20020125443 Dual layer reticle blank and manufacturing process |
| 09/12/2002 | US20020125441 Methods and apparatus for determining blur of an optical system |
| 09/12/2002 | US20020125231 Method and system for precisely positioning a waist of a material-processing laser beam to process microstructures within a laser-processing site |
| 09/12/2002 | US20020124993 Apparatus with air-conditioning system, and device manufacturing method using the same |
| 09/12/2002 | US20020124798 Film forming unit |
| 09/12/2002 | US20020124797 Film forming unit |
| 09/12/2002 | DE10208150A1 Rapid prototyping by consolidating layers with laser beam includes oscillating beam impact zone to improve surface finish |
| 09/12/2002 | DE10157045A1 Microlithography projection device for use in semiconductor chip production has a four-mirror system to provide effective centering with a sufficiently high numerical aperture |
| 09/12/2002 | DE10111372A1 Wavelength measurement device for use with a bundled laser device, and associated fluorescing laser device, uses an unbundled spontaneously emitted beam |
| 09/12/2002 | DE10111299A1 Iris especially for exposure objective in semiconductor lithography equipment, has leaves which can be moved approximately linearly to the optical axis of the iris |
| 09/12/2002 | DE10110612A1 Use of radiation-curable polymer composition as data recording medium or composite, e.g. for recording digital data or hologram on label, adhesive tape, smart label or smart coatings on lacquered or metallic surface |
| 09/12/2002 | DE10109965A1 Teilchenoptische Linsenanordnung und Verfahren unter Einsatz einer solchen Linsenanordnung A particle-lens array and method using such a lens assembly |
| 09/12/2002 | DE10108827A1 Messverfahren zur Bestimmung der Breite einer Struktur auf einer Maske Techniques to determine the width of a structure on a mask |
| 09/12/2002 | DE10106424A1 Monitoring manufacture of integrated circuits by using correction values for three or more sub-regions of same wafer and two or more of different wafers |
| 09/11/2002 | EP1239510A1 Particle optical lensassembly and method using such a lens assembly |
| 09/11/2002 | EP1239509A1 Lens assembly for electron beam column |
| 09/11/2002 | EP1239332A1 Photosensitive polysilazane composition, method of forming pattern therefrom, and method of burning coating film thereof |
| 09/11/2002 | EP1239331A2 Illumination optimization for specific mask patterns |
| 09/11/2002 | EP1239330A1 Control of illumination distribution in the exit pupil of an EUV illumination system |
| 09/11/2002 | EP1239329A2 A process for making a flexographic printing plate and a photosensitive element for use in the process |
| 09/11/2002 | EP1239328A2 Radiation-sensitive recording material having an electrically conductive back coating |
| 09/11/2002 | EP1238972A1 Novel carbazole derivative and chemically amplified radiation-sensitive resin composition |
| 09/11/2002 | EP1238969A2 Sulfonium salt compounds |
| 09/11/2002 | EP1238819A2 Laser-induced thermal transfer ink sheet, production method of the same, and image recording sheet |
| 09/11/2002 | EP1238801A2 Lithographic printing plate precursor |
| 09/11/2002 | EP1238314A1 Modification of 193 nm sensitive photoresist materials by electron beam exposure |
| 09/11/2002 | EP1238313A1 Apparatus and methods for development of resist patterns |
| 09/11/2002 | EP1238312A1 Use of polyimide for adhesive layers, lithographic method for producing microcomponents and method for producing composite material |
| 09/11/2002 | EP1238311A1 Flat coil and lithographic method for producing microcomponents |
| 09/11/2002 | EP1238310A1 Ultraviolet and vacuum ultraviolet transparent polymer compositions and their uses |
| 09/11/2002 | EP1238309A1 Ultraviolet and vacuum ultraviolet transparent polymer compositions and their uses |
| 09/11/2002 | EP1237983A2 Polymerizable composition, cured material thereof and method for manufacturing the same |
| 09/11/2002 | EP1237824A1 A method and apparatus for treating a substrate with an ozone-solvent solution |
| 09/11/2002 | EP1025462B1 Thermosetting polyester anti-reflective coatings for multilayer photoresist processes |
| 09/11/2002 | CN1369066A Methods for enhancing images on relief image printing plates |
| 09/11/2002 | CN1369039A Microfabricated elastomeric valve and pump systems |
| 09/11/2002 | CN1368661A Optical nearby correcting method based on contact hole model |
| 09/11/2002 | CN1368655A Liquid crystal display device and its manufacturing method |
| 09/11/2002 | CN1090817C Method for forming fine patterns on semiconductor device |
| 09/11/2002 | CN1090815C Method for forming depression and contact window |
| 09/11/2002 | CN1090767C Photoenhanced diffusion patterning for organic polymer films |
| 09/11/2002 | CN1090757C Mask for checking lens distortion |
| 09/11/2002 | CN1090651C Polymer composition for making single or multilayer circuit patterns |
| 09/10/2002 | US6449387 Method for analyzing light intensity distribution |
| 09/10/2002 | US6449386 Patterned figure resolution verification method and semiconductor pattern forming method |
| 09/10/2002 | US6449332 Exposure apparatus, and device manufacturing method |
| 09/10/2002 | US6449106 Catadioptric lens barrel structure having a support structure to maintain alignment of a plurality of sub-barrels |
| 09/10/2002 | US6449086 Multilayer stacks; lithography projections |
| 09/10/2002 | US6449031 Method for use of a critical dimensional test structure |
| 09/10/2002 | US6449030 Balanced positioning system for use lithographic apparatus |
| 09/10/2002 | US6449029 Apparatus for providing levelling and focusing adjustments on a semiconductor wafer |
| 09/10/2002 | US6448999 Method for microlithographic writing with improved precision |
| 09/10/2002 | US6448723 Stage system and exposure apparatus |
| 09/10/2002 | US6448568 Electron beam column using high numerical aperture photocathode source illumination |
| 09/10/2002 | US6448505 Substrate for mounting an optical component, a method for producing the same, and an optical module using the same |
| 09/10/2002 | US6448420 Acid-decomposable ester compound suitable for use in resist material |
| 09/10/2002 | US6448383 Method for producing 1,2-naphthoquinonediazide photosensitive agent |
| 09/10/2002 | US6448352 Photoresist monomer, polymer thereof and photoresist composition containing it |
| 09/10/2002 | US6448269 Such as 6-(n-(4-(aminoiminomethyl)benzoyl)amino)-3,4-dihydro-4,4-dimethyl-2h-1 -benzopyran-2-yl)acetic acid; inhibiting platelet aggregation or fibrinogen binding or preventing thrombosis |
| 09/10/2002 | US6448183 Method of forming contact portion of semiconductor element |
| 09/10/2002 | US6447983 Maskless photolithography method where photosensitizer is selectively applied to portion of film in desired pattern prior to exposure |
| 09/10/2002 | US6447982 Litho strip and method for its manufacture |
| 09/10/2002 | US6447980 Photoresist composition for deep UV and process thereof |
| 09/10/2002 | US6447978 Imaging member containing heat switchable polymer and method of use |
| 09/10/2002 | US6447975 Produces a photoresist layer, photosensitive chemical, and solvents without unpleasant odor |
| 09/10/2002 | US6447961 Optical proximity correction methods, and methods forming radiation-patterning tools |
| 09/10/2002 | US6447960 Electron beam exposure mask and pattern designing method thereof |
| 09/10/2002 | US6447959 Amplitude mask for writing long-period gratings |
| 09/10/2002 | US6447884 Low volume ablatable processless imaging member and method of use |
| 09/10/2002 | US6447608 Spin coating apparatus |
| 09/10/2002 | US6447217 Substrate transfer device and operating method thereof |
| 09/10/2002 | CA2095222C Device for controlling beams of particles, x-ray and gamma quanta and uses thereof |
| 09/06/2002 | WO2002069677A1 Extreme ultraviolet generating device, exposure device using the generating device, and semiconductor manufacturing method |
| 09/06/2002 | WO2002069461A1 Laser wavelength control unit with piezoelectric driver |
| 09/06/2002 | WO2002069390A2 Grating test patterns and methods for overlay metrology |
| 09/06/2002 | WO2002069379A1 X-ray reflective mask, method of protecting the reflective mask, x-ray exposure device, and method of manufacturing semiconductor device |
| 09/06/2002 | WO2002069054A1 Vacuum ultraviolet transmitting silicon oxyfluoride lithography glass |
| 09/06/2002 | WO2002069053A2 Method and apparatus for registration control in production by imaging |
| 09/06/2002 | WO2002069052A1 Semiconductor developing agent |
| 09/06/2002 | WO2002069051A2 Interference lithography using holey fibers |
| 09/06/2002 | WO2002069050A2 Polarization vector alignment for interference lithography patterning |
| 09/06/2002 | WO2002069049A2 Simultaneous imaging of two reticles |
| 09/06/2002 | WO2002069048A2 Method and apparatus for printing patterns on substrates |
| 09/06/2002 | WO2002069047A1 Method for exposing at least one or at least two semiconductor wafers |
| 09/06/2002 | WO2002069046A1 Adhesion-promoting film and process of forming patterns by using the film |
| 09/06/2002 | WO2002069045A2 Anti-reflective coating material, semiconductor product with an arc layer and methods |
| 09/06/2002 | WO2002069044A2 Polymers and photoresist compositions |
| 09/06/2002 | WO2002069043A2 Low absorbing resists for 157 nm lithography |
| 09/06/2002 | WO2002069042A1 Wet etch compatible deep uv photoresist compositions |
| 09/06/2002 | WO2002069041A1 Precursor composition for positive photosensitive resin and display made with the same |
| 09/06/2002 | WO2002069040A1 Novel polymers, processes for polymer synthesis and photoresist compositions |
| 09/06/2002 | WO2002069039A2 Photoacid generator systems for short wavelength imaging |
| 09/06/2002 | WO2002069038A2 Novel polymers and photoresist compositions comprising same |