| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 09/17/2002 | US6452662 Lithography apparatus |
| 09/17/2002 | US6452661 Illumination system and exposure apparatus and method |
| 09/17/2002 | US6452623 Multiple-beam, diode-pumped imaging system |
| 09/17/2002 | US6452560 Slot array antenna with reduced edge diffraction |
| 09/17/2002 | US6452292 Planar motor with linear coil arrays |
| 09/17/2002 | US6452199 Plasma focus high energy photon source with blast shield |
| 09/17/2002 | US6452194 Radiation source for use in lithographic projection apparatus |
| 09/17/2002 | US6452154 Microlens for surface mount products |
| 09/17/2002 | US6452110 Patterning microelectronic features without using photoresists |
| 09/17/2002 | US6452092 Stacking electrode, photovoltaic, hole transport, conductive and counter electrode layers in this order; stability; high conversion efficiency |
| 09/17/2002 | US6451945 Containing pendant acid labile functional group and a functional group containing a methyl carbonyl or silyl protected hydroxyl moiety |
| 09/17/2002 | US6451719 Ultraviolet radiation with a wavelength of 155 to 195 nm; ultrahigh purity |
| 09/17/2002 | US6451706 Attenuation of reflecting lights by surface treatment |
| 09/17/2002 | US6451680 Method for reducing borderless contact leakage by OPC |
| 09/17/2002 | US6451635 Photolithography system and a method for fabricating a thin film transistor array substrate using the same |
| 09/17/2002 | US6451620 Method for etching organic film, method for fabricating semiconductor device and pattern formation method |
| 09/17/2002 | US6451536 Products for detecting nucleic acids |
| 09/17/2002 | US6451515 Substrate treating method |
| 09/17/2002 | US6451512 UV-enhanced silylation process to increase etch resistance of ultra thin resists |
| 09/17/2002 | US6451511 Method for forming-photoresist mask |
| 09/17/2002 | US6451510 Ammonium perfluoroalkyl sulfonic acid or ammonium, amine or quaternary ammonium salt is used as anionic surfactant |
| 09/17/2002 | US6451508 Plural interleaved exposure process for increased feature aspect ratio in dense arrays |
| 09/17/2002 | US6451507 Exposure apparatus and method |
| 09/17/2002 | US6451506 Material for producing a lithographic printing plate comprising a glass support |
| 09/17/2002 | US6451503 Antihalation compositions |
| 09/17/2002 | US6451501 Acid sensitive copolymer, resist composition and resist pattern forming method |
| 09/17/2002 | US6451500 Imaging member containing heat switchable carboxylate polymer and method of use |
| 09/17/2002 | US6451499 Polycyclic resist compositions with increased etch resistance |
| 09/17/2002 | US6451498 Photosensitive composition |
| 09/17/2002 | US6451497 Diazo compound |
| 09/17/2002 | US6451496 Cresol or xylenol resin that has been esterified with 1,2-naphthoquinonediazide-4 or 5-sulfonic acid |
| 09/17/2002 | US6451492 Optical system |
| 09/17/2002 | US6451491 Aqueous developable negative acting photosensitive composition having improved image contrast |
| 09/17/2002 | US6451490 Method to overcome image shortening by use of sub-resolution reticle features |
| 09/17/2002 | US6451381 Electrically insulating crosslinked thin-film-forming organic resin composition and method for forming thin film therefrom |
| 09/17/2002 | US6451223 Thinner composition and methods and systems for using the thinner composition |
| 09/17/2002 | US6450635 Color filter and process for producing the same |
| 09/17/2002 | US6450288 Air-conditioning apparatus, partition and exposure apparatus |
| 09/17/2002 | US6450015 Ambient condition sensor for a photosensitive media cartridge |
| 09/17/2002 | CA2278878C Very large scale immobilized peptide synthesis |
| 09/12/2002 | WO2002071457A1 Lens-barrel, exposure device, and method of manufacturing device |
| 09/12/2002 | WO2002071155A1 Thermosetting anti-reflective coatings comprising aryl urethanes of hydroxypropyl cellulose |
| 09/12/2002 | WO2002071154A2 Method of uniformly coating a substrate |
| 09/12/2002 | WO2002071153A2 Method for uniformly coating a substrate |
| 09/12/2002 | WO2002071152A2 Method of controlling the thickness of layers of photoresist |
| 09/12/2002 | WO2002071151A1 Dithiocarboxylic acid self-assembled monolayers and methods for using same in microconact printing |
| 09/12/2002 | WO2002071150A2 Lithographic template |
| 09/12/2002 | WO2002071127A1 A method and apparatus for spatial light modulation |
| 09/12/2002 | WO2002071105A2 Method of fabricating reflection-mode euv diffraction elements |
| 09/12/2002 | WO2002070985A1 Line profile asymmetry measurement using scatterometry |
| 09/12/2002 | WO2002070258A1 Lithographic imaging with printing members having multiphase laser-responsive layers |
| 09/12/2002 | WO2002045148A3 Cleaning solution for semiconductor wafers in the back-end-of-line |
| 09/12/2002 | WO2002015249A3 Integrated shallow trench isolation process |
| 09/12/2002 | WO2001055767A9 Microlithographic reduction projection catadioptric objective |
| 09/12/2002 | WO2001035440A9 Method and apparatus for electron beam column assembly with precise alignment using displaced semi-transparent membranes |
| 09/12/2002 | WO2001022163A3 Radiation sensitive copolymers, photoresist compositions thereof and deep uv bilayer systems thereof |
| 09/12/2002 | US20020129328 Method for designing optical system, optical system and projection exposure apparatus |
| 09/12/2002 | US20020129327 Phase shifting design and layout for static random access memory |
| 09/12/2002 | US20020128733 Moving/guiding apparatus and exposure apparatus using the same |
| 09/12/2002 | US20020128410 Organic anti-reflective coating polymers, anti-reflective coating composition comprising the same and preparation methods thereof |
| 09/12/2002 | US20020128408 Polymerizing at least two types of polycyclic (norbornene) monomers one of which containing a pendant acid labile group and another of which containing a pendnt polar functional group using a group 8 transition metal catalyst |
| 09/12/2002 | US20020128388 Siloxane polymer and an organic absorbing compound that strongly absorbs light at given wavelength, such as 9-anthracene carboxy-methyl triethoxysilane; for deep ultraviolet photolithography |
| 09/12/2002 | US20020128342 Photosensitive resin compositions for color filter applications |
| 09/12/2002 | US20020128164 Resist stripper |
| 09/12/2002 | US20020127889 Forming hardmask by applying electric field to fluoro-organosilane and oxidizing gas |
| 09/12/2002 | US20020127881 Step mask |
| 09/12/2002 | US20020127879 Impurities at a molecular level, such as oxygen, basic substances, ozone, and organic substances, can be prevented from adhering to a substrate; for use in photolithography |
| 09/12/2002 | US20020127865 Lithography method for forming semiconductor devices with sub-micron structures on a wafer and apparatus |
| 09/12/2002 | US20020127840 Method for photoresist strip, sidewall polymer removal and passivation for aluminum metallization |
| 09/12/2002 | US20020127789 For producing semiconductor device |
| 09/12/2002 | US20020127747 Lithography method and apparatus with simplified reticles |
| 09/12/2002 | US20020127501 Covering surface of wafer with patterned mask; and transferring mask pattern to wafer surface at particular magnification factor, wherein transferring mask pattern comprises exposing portions of wafer surface while moving |
| 09/12/2002 | US20020127500 Photoresist stripper composition and method for stripping photoresist using the same |
| 09/12/2002 | US20020127499 For forming resist pattern, fineness, semiconductors |
| 09/12/2002 | US20020127498 Photo-definable self-assembled materials |
| 09/12/2002 | US20020127495 Method of fabricating nanometer-scale flowchannels and trenches with self-aligned electrodes and the structures formed by the same |
| 09/12/2002 | US20020127492 Focusing a source of infrared radiation onto a first area on semiconductor to heat coating; simultaneously imaging a second area of heated coating within bounds of first area with image producing radiation; repeating procedure |
| 09/12/2002 | US20020127491 Chemical functionalization nanolithography |
| 09/12/2002 | US20020127490 Radiation sensitive bilayer resists which are used in manufacture of integrated circuits |
| 09/12/2002 | US20020127489 Radiation-sensitive recording material having a structured back |
| 09/12/2002 | US20020127486 Suitable for a pattern formation on a semiconductor wafer |
| 09/12/2002 | US20020127485 Exposing a photoresist film formed on a peripheral area of a wafer by radiating light; inspecting whether light is uniformly radiated onto a predetermined width of peripheral area of wafer; adjusting position of light to be radiated |
| 09/12/2002 | US20020127483 For use in semiconductor device |
| 09/12/2002 | US20020127482 Coating lithography resist onto wafer; exposing wafer to irradiation through a reticle in an exposure tool, stabilizing lithography resist; developing lithography resist in predetermined; stabilizing; metrology inspection |
| 09/12/2002 | US20020127481 Method of forming color filter array |
| 09/12/2002 | US20020127479 Phase shift masking for complex patterns with proximity adjustments |
| 09/12/2002 | US20020127478 For fabrication of passive matrix display; active matrix display; flat panel display; photodiode array |
| 09/12/2002 | US20020127352 Irradiating focused ion beam and depositing a film on a narrowly limited strip shape region from ends of sample; sequentially shifting irradiation region in a tip end direction to cause a thin deposition layer to extend |
| 09/12/2002 | US20020127340 Supplying a coating solution to the substrate to form a coating layer on substrate; developing treatment for substrate carrying substrate into chamber after forming coating layer and before exposure; reducing pressure to remove impurities |
| 09/12/2002 | US20020127334 Mounting substrate inside enclosed housing and passing a control gas; controlling a solvent vapor concentration of a control gas; extruding polymer solution onto surface of substrate in housing; spinning the substrate; exhausting gas |
| 09/12/2002 | US20020127050 Platform positioning system |
| 09/12/2002 | US20020126931 Optical integrator for an illumination device |
| 09/12/2002 | US20020126479 High power incoherent light source with laser array |
| 09/12/2002 | US20020126400 Optical arrangement |
| 09/12/2002 | US20020126380 Radial polarization-rotating optical arrangement and microlithographic projection exposure system incorporating said arrangement |
| 09/12/2002 | US20020126368 Post metal etch clean process using soft mask |
| 09/12/2002 | US20020126366 Particle-optical lens arrangement and method employing such a lens arrangement |
| 09/12/2002 | US20020126269 Gas replacement method and apparatus, and exposure method and apparatus |
| 09/12/2002 | US20020126268 Projection exposure method, projection exposure apparatus, and methods of manufacturing and optically cleaning the exposure apparatus |
| 09/12/2002 | US20020126267 Illumination device for projection system and method for fabricating |