G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor

Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
09/2002
09/19/2002	WO2002073699A2 Nanofabrication
09/19/2002	WO2002073688A2 Lithography method for forming semiconductor devices on a wafer and apparatus
09/19/2002	WO2002073677A1 Method and evaporating solution for rinsing a developed photoresist layer
09/19/2002	WO2002073670A1 Exposure method and exposure system, and device production method
09/19/2002	WO2002073319A1 Resist releasing composition
09/19/2002	WO2002073318A2 Method and device for vibration control
09/19/2002	WO2002073317A2 Lithography method and apparatus with simplified reticles
09/19/2002	WO2002073316A1 Fine pattern forming method
09/19/2002	WO2002073315A1 Fluorinated aromatic acetal polymers and photosensitive compositions containing such polymers
09/19/2002	WO2002073314A1 Method of fabricating nanometer-scale flowchannels and trenches with self-aligned electrodes and structures formed by the same
09/19/2002	WO2002073313A1 Structured organic materials and devices using low-energy particle beams
09/19/2002	WO2002073309A2 Packaged radiation sensitive coated workpiece process for making and method of storing same
09/19/2002	WO2002073308A1 High resolution resists for next generation lithographies
09/19/2002	WO2002073307A2 Thermally cured underlayer for lithographic application
09/19/2002	WO2002073288A1 Point array maskless lithography
09/19/2002	WO2002073258A2 Refractive index grating manufacturing process
09/19/2002	WO2002073245A2 High power incoherent light source with laser array
09/19/2002	WO2002073122A2 Cyclic error reduction in average interferometric position measurements
09/19/2002	WO2002072705A1 Radiation-sensitive composition changing in refractive index and utilization thereof
09/19/2002	WO2002072640A1 Polymerizable composition
09/19/2002	WO2002072363A1 Thermal transfer recording material
09/19/2002	WO2002072290A1 Method and apparatus for texturing a metal sheet or strip
09/19/2002	WO2002056113A3 Method for producing an etching mask
09/19/2002	WO2002054154A3 Method for the production of thermally cross-linked laser engravable flexographic elements
09/19/2002	WO2002031598A3 Resist methods and materials for uv and electron-beam lithography with reduced outgassing
09/19/2002	WO2002009884A3 Methods for the lithographic deposition of materials containing nanoparticles
09/19/2002	US20020133800 Reticle exposure matrix
09/19/2002	US20020132970 Exposure to high energy radiation
09/19/2002	US20020132872 Resin composition for photofabrication of three dimensional objects
09/19/2002	US20020132745 Non-corrosive cleaning composition for removing plasma etching residues
09/19/2002	US20020132744 Formulations including a 1,3-dicarbonyl compound chelating agent and copper corrosion inhibiting agents for stripping residues from semiconductor substrates containing copper structures
09/19/2002	US20020132719 Fluoride crystalline optical lithography lens element blank
09/19/2002	US20020132491 Method of removing photoresist material with dimethyl sulfoxide
09/19/2002	US20020132482 Fluid pressure imprint lithography
09/19/2002	US20020132409 Substrate processing apparatus
09/19/2002	US20020132194 Ashing a photo-sensitive material over the ruthenium or the ruthenium oxide using a gas mixture containing oxygen gas or ozone gas and nitrogen gas
09/19/2002	US20020132193 Developing solution for a photoresist and a method for developing the photoresist
09/19/2002	US20020132192 Forming resist pattern layer having a predetermined pattern from resist film of organic material formed on substrate; rinsing by exposing to rinse solution; supplying supercritical carbon dioxide to dry pattern layer; vaporization
09/19/2002	US20020132190 Organic anti-reflective coatings deposited by chemical vapor deposition (CVD)
09/19/2002	US20020132189 Multiple resist layer photolithographic process
09/19/2002	US20020132186 May be exposed to light using ArF lasers, may have strong resistances to dry etching processes, may possess excellent adhesion to film materials, and may be developed using conventional developers
09/19/2002	US20020132185 Copolymer photoresist with improved etch resistance
09/19/2002	US20020132184 System and method for developing a photoresist layer with reduced pattern collapse
09/19/2002	US20020132183 Organic anti-reflective coating material and its preparation
09/19/2002	US20020132182 Polymers, resist materials, and pattern formation method
09/19/2002	US20020132181 Radiation-sensitive resin composition
09/19/2002	US20020132180 Photoresist composition
09/19/2002	US20020132178 Positive photoresist composition
09/19/2002	US20020132172 Semiconductor mask alignment system
09/19/2002	US20020132123 Thermosetting anti-reflective coatings for full-fill dual damascene process
09/19/2002	US20020131875 Filter unit, chemical liquid supply system, and chemical liquid supply method
09/19/2002	US20020131181 Illumination system with raster elements of different sizes
09/19/2002	US20020131055 Method and apparatus for the determination of mask rules using scatterometry
09/19/2002	US20020131040 System and method for characterizing macro-grating test patterns in advanced lithography and etch processes
09/19/2002	US20020131032 Scanning exposure apparatus and device manufacturing method using the same
09/19/2002	US20020131030 Projection exposure apparatus and device manufacturing method using the same
09/19/2002	US20020130993 Method for producing cholesteric liquid crystal color filters
09/19/2002	US20020130630 Linear pulse motor, stage apparatus, and exposure apparatus
09/19/2002	US20020130425 Mask-making member and its production method, mask and its making method, exposure process, and fabrication method of semiconductor device
09/19/2002	US20020130349 Semiconductor structures formed using redeposition of an etchable layer
09/19/2002	US20020130298 For removing a photoresist; for removing a residue of a semiconductor element generated in semiconductor treatment
09/19/2002	US20020130279 Dual-beam materials-processing system
09/19/2002	US20020130276 Gas cooled electrostatic pin chuck for vacuum applications
09/19/2002	US20020130106 Method and apparatus for removing a liquid from a surface of a rotating substrate
09/19/2002	US20020129476 Device for manufacturing semiconductor device and method of manufacturing the same
09/19/2002	DE10209024A1 Photosensitive composition used in the production of printing press plates or photoetched products comprises a sensitizer, a water-soluble high molecular weight substance, a sensitivity-improving compound, and water
09/19/2002	DE10051466C2 Anordnung als Maske für Lithographie Arrangement as a mask for lithography
09/19/2002	CA2451882A1 Nanofabrication
09/19/2002	CA2408217A1 Radiation sensitive refractive index changing composition and use thereof
09/18/2002	EP1241706A2 A gas cooled electrostatic pin chuck for vacuum applications
09/18/2002	EP1241528A2 Radical polymerizable compounds for image forming materials
09/18/2002	EP1241527A1 Positive type photosensitive polyimide resin composition
09/18/2002	EP1241524A2 Photomask blank, Photomask and method of manufacture
09/18/2002	EP1241209A2 Solvent swell containing heterocyclic nitrogen compounds and glycols for texturing resinous material and desmearing and removing resinous material
09/18/2002	EP1241002A2 Planographic printing plate precursor
09/18/2002	EP1240932A2 Filter unit, chemical liquid supply system, and chemical liquid supply method
09/18/2002	EP1240694A1 Line narrowed laser with bidirection beam expansion
09/18/2002	EP1240557A1 Imaging method using phase boundary masking with modified illumination
09/18/2002	EP1240556A1 Photolithography method, photolithography mask blanks, and method of making
09/18/2002	EP1240555A1 Thinner for rinsing photoresist and method of treating photoresist layer
09/18/2002	EP1240554A2 Nitrile/fluoroalcohol polymer-containing photoresists and associated processes for microlithography
09/18/2002	EP1240553A2 Photoresist composition for deep uv radiation
09/18/2002	EP1240552A1 Water-processable photoresist compositions
09/18/2002	EP1240551A2 Lithography device which uses a source of radiation in the extreme ultraviolet range and multi-layered mirrors with a broad spectral band in this range
09/18/2002	EP1240550A2 High precision orientation alignment and gap control stages for imprint lithography processes
09/18/2002	EP1101258A4 High pulse rate pulse power system
09/18/2002	EP1040539A4 High pulse rate pulse power system
09/18/2002	EP0986474B1 Heat sensitive printing plate precursors
09/18/2002	EP0975577B1 Photocurable halofluorinated acrylates
09/18/2002	CN1370111A Filmable material with characteristics selectively modifiable by administration of particular types of energy
09/18/2002	CN1369859A Layot encode method for photoetching system of array-type integrated circit
09/18/2002	CN1369747A Exposure method and exposure device
09/18/2002	CN1369746A Pregaining sensitive flat printing plate
09/18/2002	CN1091264C Light-absorbing antireflective layers with improved performance due to refractive index optimization
09/17/2002	USRE37846 Projection optical system and exposure apparatus using the same
09/17/2002	US6453458 System and method for generating a flat mask design for projecting a circuit pattern to a spherical semiconductor device
09/17/2002	US6453274 Method of forming a pattern using proximity-effect-correction
09/17/2002	US6453001 X-ray exposure apparatus
09/17/2002	US6453000 Exposure method, exposure device and semiconductor device manufacturing method
09/17/2002	US6452723 Exposure apparatus and method

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