| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 09/26/2002 | US20020136838 Coating apparatus and coating method |
| 09/26/2002 | US20020136834 Organic anti-reflective polymer and method for manufacturing therof |
| 09/26/2002 | US20020136829 Film forming apparatus and film forming method |
| 09/26/2002 | US20020136354 Laser plasma x-ray generation apparatus |
| 09/26/2002 | US20020136351 Illumination system with variable adjustment of the illumination |
| 09/26/2002 | US20020136087 Purified developer producing equipment and method |
| 09/26/2002 | US20020136018 Multi-spectral uniform light source |
| 09/26/2002 | US20020135875 Grating test patterns and methods for overlay metrology |
| 09/26/2002 | US20020135847 Manufacturing method of microstructure, manufacturing method and manufacturing device of electronic device |
| 09/26/2002 | US20020135833 Method and apparatus for increasing the effective efficiency of holograms |
| 09/26/2002 | US20020135785 Device for manufacturing semiconductor device and method of manufacturing the same |
| 09/26/2002 | US20020135776 Exposure apparatus and method |
| 09/26/2002 | US20020135759 Detection of contaminants on low wavelength masks |
| 09/26/2002 | US20020135755 Scanning probe microscope assembly |
| 09/26/2002 | US20020135746 Optical system with improved durability for projection exposure apparatus and method for manufacturing optical system for projection exposure apparatus |
| 09/26/2002 | US20020135745 Multibeam scanning device for scanning a photosensitive material with a multi-spot array, and method of correcting the position of image points of the multi-spot array |
| 09/26/2002 | US20020135744 Exposure apparatus |
| 09/26/2002 | US20020135287 Shadow mask, a method of forming the shadow mask, and a method of manufacturing a semiconductor device with using the shadow mask |
| 09/26/2002 | US20020135073 Manufacturing process for semiconductor device, photomask, and manufacturing apparatus for semiconductor device |
| 09/26/2002 | US20020134963 For removal of residues from integrated circuits; comprises a choline compound, water and an organic solvent |
| 09/26/2002 | US20020134947 Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 09/26/2002 | US20020134512 Substrate processing apparatus and substrate processing method |
| 09/26/2002 | US20020134405 Reduction/oxidation material removal method |
| 09/26/2002 | US20020134111 Oxygen doping of silicon oxyfluoride glass |
| 09/26/2002 | US20020133935 Method for forming a thin film and method for fabricating a thin film magnetic head |
| 09/26/2002 | DE10206364A1 Photosensitive composition includes specific polymer, organic boron salt and hindered amine compound to be used in lithographic plate |
| 09/26/2002 | DE10201452A1 Positiv-Fotoresist-Zusammensetzung A positive photoresist composition |
| 09/26/2002 | DE10148308A1 Beleuchtungssystem mit reduzierter energetischer Belastung Lighting system with reduced energy load |
| 09/26/2002 | DE10113788A1 Beugungsoptische Komponente, Beleuchtungssystem und Belichtungssystem mit einer solchen beugungsoptischen Komponente und Belichtungsverfahren unter Verwendung eines solchen Belichtungssystems Diffraction optical component, illumination system and exposure system having such a diffraction optical component and exposure method using such an exposure system |
| 09/25/2002 | EP1243972A1 Positioning system and lithographic projection apparatus |
| 09/25/2002 | EP1243971A2 Exposure device |
| 09/25/2002 | EP1243970A1 Lithographic apparatus |
| 09/25/2002 | EP1243969A1 Lithographic projection apparatus and positioning system |
| 09/25/2002 | EP1243968A2 Positive resist composition |
| 09/25/2002 | EP1243947A2 Diffractive optical element, illumination system and exposure system and method |
| 09/25/2002 | EP1243629A1 Active energy beam curable composition and ink |
| 09/25/2002 | EP1243412A1 Method for forming image and apparatus for forming image |
| 09/25/2002 | EP1243411A1 Method of coating an image-recording layer by ink-jet |
| 09/25/2002 | EP1243410A1 Method of making a heat-sensitive lithographic printing plate precursor |
| 09/25/2002 | EP1243346A2 Coating apparatus and coating method |
| 09/25/2002 | EP1243021A2 Method and apparatus for supercritical processing of a workpiece |
| 09/25/2002 | EP1243002A1 X-ray zoom lens |
| 09/25/2002 | EP1242851A1 Use of a composition in stereolithography |
| 09/25/2002 | EP1242843A1 Projection lens comprising adjacent aspheric lens surfaces |
| 09/25/2002 | EP1242836A1 CALCIUM FLUORIDE (CaF2) STRESS PLATE AND METHOD OF MAKING THE SAME |
| 09/25/2002 | EP1242177A1 Method and device for the mask-free production of biopolymers by means of a light diode array |
| 09/25/2002 | EP0904599B1 METHOD FOR ETCHING THE GATE IN MOS TECHNOLOGY USING A SiON BASED HARD MASK |
| 09/25/2002 | EP0839341B1 Heterogeneous photo-initiators, photopolymerisable compositions and their use |
| 09/25/2002 | CN1371121A Figure forming method |
| 09/25/2002 | CN1371028A Exposure equipment with interferometer system |
| 09/25/2002 | CN1371027A Format determing method, manufacture and regulation of projecting optical system, exposure equipment and its manufacture and computer system |
| 09/25/2002 | CN1371026A Sandwich back-up paper, laminated body, cutting method and lamination method for planographic printing plate |
| 09/25/2002 | CN1371023A Synchronous photoetching and exposing process on chip supporting net for making roller-to-roller display |
| 09/24/2002 | US6457169 Geometric phase analysis for overlay measurement |
| 09/24/2002 | US6456953 Method for correcting misalignment between a reticle and a stage in a step-and-repeat exposure system |
| 09/24/2002 | US6456899 Context-based automated defect classification system using multiple morphological masks |
| 09/24/2002 | US6456894 Semiconductor processing techniques |
| 09/24/2002 | US6456736 Automatic field sampling for CD measurement |
| 09/24/2002 | US6456382 Interferometer that measures aspherical surfaces |
| 09/24/2002 | US6456378 Semiconductor wafer alignment methods and semiconductor wafer alignment tools |
| 09/24/2002 | US6456377 Method for measuring optical feature of exposure apparatus and exposure apparatus having means for measuring optical feature |
| 09/24/2002 | US6456374 Exposure apparatus and a device manufacturing method using the same |
| 09/24/2002 | US6456364 Semiconductor manufacturing apparatus, and device manufacturing method |
| 09/24/2002 | US6456363 Exposure control apparatus and method |
| 09/24/2002 | US6456362 Integrating waveguide for use in lithographic projection apparatus |
| 09/24/2002 | US6456361 Method and instrument for measuring vacuum ultraviolet light beam, method of producing device and optical exposure apparatus |
| 09/24/2002 | US6456360 Projection exposure apparatus and method |
| 09/24/2002 | US6456358 Surface-treatment apparatus for forming a photoresist-isolating wall on a panel |
| 09/24/2002 | US6456019 Real time measurement of leakage current in high voltage electron guns |
| 09/24/2002 | US6455956 Two-dimensional electric motor |
| 09/24/2002 | US6455862 Lithographic projection apparatus |
| 09/24/2002 | US6455821 System and method to control temperature of an article |
| 09/24/2002 | US6455579 Useful in photochemical polymerization, dye laser, and electroluminescence. |
| 09/24/2002 | US6455479 Stripping composition |
| 09/24/2002 | US6455439 Method of forming a mask |
| 09/24/2002 | US6455438 Fabrication method for a semiconductor device |
| 09/24/2002 | US6455431 Descumming organic residue from semiconductor having patterned photoresist layer in manner which does not impact critical dimension of patterned layer by contacting with plasma etchant where reactive plasma species are generated from ammonia |
| 09/24/2002 | US6455416 Using developer soluble antireflective coating containing dye facilitates formation of trenches directly over (accurately aligned) previously formed vias and minimizes accumulation of resist contaminants in vias upon developing trench mask |
| 09/24/2002 | US6455234 Acetylenic diol ethylene oxide/propylene oxide adducts and their use in photoresist developers |
| 09/24/2002 | US6455233 Exposing defined area of maskless resist material to produce chemical change in property of area so it can be selectively removed or rendered inert with high energy beam of light ions having energy greater than 250 kev |
| 09/24/2002 | US6455232 Method of reducing stop layer loss in a photoresist stripping process using a fluorine scavenger |
| 09/24/2002 | US6455231 Dry film photoimageable compositions |
| 09/24/2002 | US6455228 Integrally layered body comprising substrate, water insoluble antireflection film, photoresist layer comprising alkali soluble resin, onium salt photoacid generator and substituted glycoluril compound, water soluble antireflection coating film |
| 09/24/2002 | US6455227 Structure comprising at least three resist layers laid one upon another, with absorption layer capable of absorbing beams for exposure sandwiched between each two resist layers, and at least one absorption layer is comprised of amorphous carbon |
| 09/24/2002 | US6455226 Polymer formed by polymerizing mixture of norbornylene and maleic anhydride derivative, reducing polymer with reducing agent, reacting with hydroxy protecting group precursor |
| 09/24/2002 | US6455225 Photoresist monomers having stability to post exposure delay, polymers thereof and photoresist compositions containing the same |
| 09/24/2002 | US6455224 Lithographic printing plate precursor |
| 09/24/2002 | US6455223 Composition comprising as base resin dendritic or hyperbranched polymer of phenol derivative having specified weight average molecular weight; high resolution, high sensitivity, minimized line edge roughness, etch resistance |
| 09/24/2002 | US6455222 Precursor comprising substrate having image recording layer containing fine light-heat convertible particles coated with hydrophilic material, which can be made hydrophobic by heating |
| 09/24/2002 | US6455214 Utilizing configuration which can effectively prevent color inconsistencies from occurring due to defocusing upon exposure |
| 09/24/2002 | US6455211 Pattern transfer method and apparatus, and device manufacturing method |
| 09/24/2002 | US6455207 Color filter and a method for producing a color filter |
| 09/24/2002 | US6455205 Method and apparatus for determining phase shifts and trim masks for an integrated circuit |
| 09/24/2002 | US6455203 Performing multiple exposure process on coated substrate so that latent images are superimposed on substrate, developing and etching exposed substrate to produce actual mask patterns |
| 09/24/2002 | US6454987 Micro structure and its manufacture method |
| 09/24/2002 | US6454869 Liquid or supercritical carbon dioxide |
| 09/24/2002 | US6454472 Semiconductor manufacturing apparatus for photolithographic process |
| 09/24/2002 | US6453916 Low angle solvent dispense nozzle design for front-side edge bead removal in photolithography resist process |
| 09/23/2002 | CA2341929A1 Holographic recording material |
| 09/22/2002 | CA2377420A1 Method of coating an image-recording layer by valve-jet |