Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
10/2013
10/31/2013WO2013160083A1 Contamination trap for a lithographic apparatus
10/31/2013WO2013160082A1 Lithographic apparatus
10/31/2013WO2013160027A1 Methods and compositions for providing spaced lithography features on a substrate by self-assembly of block copolymers
10/31/2013WO2013160026A2 Electrostatic clamp, lithographic apparatus and method
10/31/2013WO2013160021A1 Flexible conduit for fluid, lithographic apparatus, and method for manufacturing a device
10/31/2013WO2013160016A1 Lithography apparatus and device manufacturing method
10/31/2013WO2013160008A1 Optical elements comprising magnetostrictive material
10/31/2013WO2013159687A1 Light guide sheet comprising optical micro structure and manufacturing method thereof
10/31/2013US20130288185 Developer composition for printing plate, developer and method for manufacturing printing plate
10/31/2013US20130288184 Method of forming pattern
10/31/2013US20130288183 Method of manufacturing liquid injection head and exposure method
10/31/2013US20130288182 Electron Beam Processing With Condensed Ice
10/31/2013US20130288180 Monomer, polymer, positive resist composition and patterning process
10/31/2013US20130288179 Radiation-sensitive resin composition and compound
10/31/2013US20130288178 Photoresist composition containing a protected hydroxyl group for negative development and pattern forming method using thereof
10/31/2013US20130288167 Methods Of Correcting For Variation Across Substrates During Photolithography
10/31/2013US20130288162 Photocurable composition
10/31/2013US20130287881 Imprint mold for manufacturing bit-patterned medium and manufacturing method of the same
10/31/2013US20130287351 Optical waveguide forming epoxy resin composition, optical waveguide forming curable film, light transmission flexible printed board, and production method for the flexible printed board
10/31/2013US20130286507 Thin-film magnetic head and method of making where the head includes an antireflection film covering a leading shield
10/31/2013US20130286490 Positioning unit and apparatus for adjustment of an optical element
10/31/2013US20130286374 Exposure apparatus
10/31/2013US20130286373 Exposure method, exposure apparatus, and method of manuacturing device
10/31/2013US20130286372 Exposure Device, Exposure Method and Method of Manufacturing Semiconductor Device
10/31/2013US20130286371 Methodology For Implementing Enhanced Optical Lithography For Hole Patterning In Semiconductor Fabrication
10/31/2013US20130286367 Roll-to-roll digital photolithography
10/31/2013US20130286366 Apparatus and method to control vacuum at porous material using multiple porous materials
10/31/2013US20130286365 Method and structure for automated inert gas charging in a reticle stocker
10/31/2013US20130285182 Photosensitive transparent composition for color filter of solid-state imaging device, and production method of color filter of solid-state imaging device, color filter of solid-state imaging device, and solid-state imaging device, each using the same
10/31/2013US20130284947 Method and system for forming patterns using charged particle beam lithography with multiple exposure passes
10/31/2013US20130284212 Method for processing a substrate and apparatus for performing the same
10/31/2013US20130283858 Titania-doped quartz glass and making method
10/31/2013DE102012224022A1 Arrangement for actuation of optical element in optical system, has actuator for exerting force on optical element, where actuator is arranged within vacuum-tight housing, and optical element is arranged outside the housing
10/31/2013DE102012207141A1 Verfahren zur Reparatur von optischen Elementen sowie optisches Element A method for repairing optical elements and optical element
10/31/2013DE102012207003A1 Optische Elemente mit magnetostriktivem Material Optical elements with magnetostrictive material
10/30/2013EP2657771A1 Dynamic multi-purpose composition for the removal of photoresists
10/30/2013EP2657770A1 Dynamic multi-purpose composition for the removal of photoresists and method for its use
10/30/2013EP2657769A2 Method and apparatus to position and align pre-punched printing plates on an imaging cylinder
10/30/2013EP2657767A1 Patterning process
10/30/2013EP2657766A1 Patterning process
10/30/2013EP2657765A1 Flexographic printing original plate
10/30/2013EP2657240A1 Silicon compound, silicon-containing compound, composition for forming resits underlayer film containing the same and patterning process
10/30/2013EP2656146A1 System and method for production of nanostructures over large areas
10/30/2013EP2656145A1 A curable jettable fluid for making a flexographic printing master
10/30/2013EP2656144A1 A curable jettable fluid for making a flexographic printing master
10/30/2013EP2656143A1 Nanoimprint lithography method
10/30/2013EP2656121A1 Photosensitive transparent composition for color filter of solid-state imaging device, and production method of color filter of solid-state imaging device, color filter of solid-state imaging device, and solid-state imaging device, each using the same
10/30/2013CN203259775U Offset-printing plate-making washing waste water cycling treatment device
10/30/2013CN203259774U Developing liquid recycling device
10/30/2013CN203259773U Micromotion module provided with vibration absorption device
10/30/2013CN103380401A Grazing incidence reflector, lithographic apparatus, method for manufacturing grazing incidence reflector and method for manufacturing a device
10/30/2013CN103380400A Positive-acting photosensitive composition and hardened material thereof
10/30/2013CN103380182A Colorant dispersion liquid, colored resin composition for use in color filters, color filter, liquid crystal display device, and organic light-emitting display device
10/30/2013CN103378218A Method of making patterned substrate for nitride epitaxial growth
10/30/2013CN103376673A Pre-alignment device and pre-alignment method
10/30/2013CN103376672A Aligning signal processing system for photolithographic equipment
10/30/2013CN103376671A Dust-proofing thin film assembly
10/30/2013CN103376670A Grid refinement method
10/30/2013CN103376669A Grid refinement method
10/30/2013CN103376668A Metal light cover
10/30/2013CN103376667A Mask stage for exposure device
10/30/2013CN103376666A Lithography machine projection objective assembly tool based on integrated main substrate and measurement bracket
10/30/2013CN103376665A Masking platform horizontal measuring device and method
10/30/2013CN103376664A Reticle stage with station switching function
10/30/2013CN103376663A Interference exposure system and exposure method thereof
10/30/2013CN103376662A Asymmetric aberration compensation device
10/30/2013CN103376661A Photo-curing polysiloxane composition, protective film and element having the protective film
10/30/2013CN103376660A Photoresist composition containing a protected hydroxyl group for negative development and pattern forming method using thereof
10/30/2013CN103376659A 感光性树脂组合物 The photosensitive resin composition
10/30/2013CN103376658A Radiation-sensitive colored composition, color filter, and display device
10/30/2013CN103376657A Photoresist composition and preparation method thereof, color film substrate and display device
10/30/2013CN103376656A Radioactive ray sensitive composition, color filter and colourful liquid crystal display device for forming green pixel
10/30/2013CN103376655A Resin composition for laser engraving, flexible printing plate precursor, flexible printing plate, and process for making the flexible printing plate precursor and the flexible printing plate
10/30/2013CN103376654A Color photosensitive resin composition
10/30/2013CN103376653A Photosensitive water-developable resistance welding composition and photosensitive water-developable resistance welding dry film
10/30/2013CN103376652A Resin composition for laser engraving, flexible printing plate precursor, flexible printing plate, and process for making the flexible printing plate precursor and the flexible printing plate
10/30/2013CN103376651A Resin composition for laser engraving, relief printing plate precursor, relief printing plate, and process for making the relief printing plate precursor and the relief printing plate
10/30/2013CN103376650A Manufacturing method of photosensitive substrate composition for forming light shielding layer
10/30/2013CN103376649A Radioactivity sensitive composition, interlayer insulating film for display element, and forming method thereof
10/30/2013CN103376648A Photosensitive resin composition and applications of the same
10/30/2013CN103376647A Optical waveguide forming epoxy resin composition, optical waveguide forming curable film, light transmission flexible printed board, and production method for the flexible printed board
10/30/2013CN103376646A Nanoimprint lithographic method
10/30/2013CN103376645A General mask and application thereof
10/30/2013CN103376643A Method for correcting layout diagrams
10/30/2013CN103376539A Refraction and reflection type projection objective
10/30/2013CN103375660A Auxiliary supporting device and auxiliary supporting method thereof
10/30/2013CN103375652A Air floating pipe joint component and six-degree-of-freedom air floating pipe joint and mask platform both applying same
10/30/2013CN103373712A Sulfur phase transition compound, semiconductor substrate product, as well as preparation method and application of semiconductor substrate product
10/30/2013CN102738698B Production method of deep submicron etched groove based on ultraviolet lithography process
10/30/2013CN102549498B Photosensitive resin composition for resist material, and photosensitive resin laminate
10/30/2013CN102495444B Four-step grating and preparation method thereof
10/30/2013CN102472984B Composition for removing resists used with copper or copper alloy
10/30/2013CN102455594B Resist pattern calculation method
10/30/2013CN102365586B Photosensitive coloring composition and color filter
10/30/2013CN102298196B Lithography projection objective with large view field and wide spectral line
10/30/2013CN102193321B Controlling method and controlling loop of workpiece-stage vertical position
10/30/2013CN102089709B Radiation-sensitive resin composition
10/30/2013CN102064102B Methods and devices for forming nanostructure monolayers and devices including such monolayers
10/30/2013CN102043332B Photosensitive resin composition, metal-base-containing circuit board and production method thereof
10/30/2013CN101876789B Positive photo-sensitive resin composition and solidification film forming method using same
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