| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 10/03/2002 | US20020139247 Method for purification of lens gases used in photolithography |
| 10/03/2002 | CA2439608A1 Method of producing epoxy compound, epoxy resin composition and its applications, ultraviolet rays-curable can-coating composition and method of producing coated metal can |
| 10/02/2002 | EP1246234A2 Method of manufacturing thin film transistor |
| 10/02/2002 | EP1246229A2 Semiconductor production system |
| 10/02/2002 | EP1246015A1 Substrate holder for the exposure of a printed circuit board |
| 10/02/2002 | EP1246014A1 Lithographic apparatus |
| 10/02/2002 | EP1246013A2 Photoresists, polymers and processes for microlithography |
| 10/02/2002 | EP1246012A2 Lithographic printing plate precursor |
| 10/02/2002 | EP1246011A2 Method of producing a pattern and photomask used in the same |
| 10/02/2002 | EP1245998A2 Device for the exposure of a printed circuit board |
| 10/02/2002 | EP1245985A2 Image printing device with an optic of the Offner-type |
| 10/02/2002 | EP1245984A2 A projection optical system, a projection exposure apparatus, and a projection exposure method |
| 10/02/2002 | EP1245982A2 Apparatus for holding an optical element in an optical device |
| 10/02/2002 | EP1245650A2 Low foam N,N'-dialkylmalamide wetting agents |
| 10/02/2002 | EP1245648A2 Low foam n,n'-dialkyltartaramide wetting agents |
| 10/02/2002 | EP1245405A2 Image recording material |
| 10/02/2002 | EP1245385A2 Wet-offset printing form with photo-thermally convertible material, process and apparatus for creating and/or erasing the image of the wet-offset printing form |
| 10/02/2002 | EP1245384A2 Image exposure control apparatus in multicolor printing press |
| 10/02/2002 | EP1245383A2 Thermal switchable composition and imaging member containing polymethine IR dye and methods of imaging and printing |
| 10/02/2002 | EP1245044A1 Method for determining optimal process targets in microelectronic fabrication |
| 10/02/2002 | EP1244939A1 Device and method in connection with the production of structures |
| 10/02/2002 | EP1244938A1 Method for the production of nanometer range surface decorated substrates |
| 10/02/2002 | EP1244559A1 Compressible plate for flexopgraphic printing and method for obtaining same |
| 10/02/2002 | EP1244548A2 Heat-sensitive imaging element for providing lithographic printing plates |
| 10/02/2002 | EP1105780A4 Reaction force isolation system for a planar motor |
| 10/02/2002 | EP0709738B1 Photosensitive resin compositionsf for printing plates and photosensitive resin plate materials |
| 10/02/2002 | DE10213584A1 Chemisch verstärkende, positiv arbeitende Resistmasse Chemically amplified positive resist composition |
| 10/02/2002 | DE10115914A1 Vorrichtung zur Lagerung eines optischen Elementes in einer Optik Device for storing an optical element in an optical system |
| 10/02/2002 | DE10110728A1 Strahlungsempfindliches Aufzeichnungsmaterial mit elektrisch leitfähiger Rückseitenbeschichtung A radiation-sensitive recording material with an electrically conductive backside coating |
| 10/02/2002 | CN1372168A Developer/rising-liquid composition for preventing image from damage in corrosion-resistant agent |
| 10/02/2002 | CN1372167A Stripe reduced pattern making for print plate |
| 10/02/2002 | CN1372166A Negative picture recording material and cyanine dye |
| 10/02/2002 | CN1371783A Method for making miniature cutter and stereo microstructure |
| 10/02/2002 | CN1091887C Pattern exposure method using electron beam |
| 10/01/2002 | US6459534 Projection optical system and projection exposure apparatus with the same, and device manufacturing method |
| 10/01/2002 | US6459480 Measurement method of Zernike coma aberration coefficient |
| 10/01/2002 | US6459474 Contact exposure device provided with a mask and workpiece interval setting means |
| 10/01/2002 | US6459473 Drive of a wafer stepper |
| 10/01/2002 | US6459472 Lithographic device |
| 10/01/2002 | US6459193 Shadow mask, a method of forming the shadow mask, and a method of manufacturing a semiconductor device with using the shadow mask |
| 10/01/2002 | US6458907 Organometallic polymerizable monomer acid or ester are useful as resists and are sensitive to imaging irradiation while exhibiting enhanced resistance to reactive ion etching. |
| 10/01/2002 | US6458865 Photopolymerizable vinyl ether based monomeric formulations and polymerizable compositions which may include certain novel spiroorthocarbonates |
| 10/01/2002 | US6458864 Chain transfer groups of the formula are suitable for the thermal preparation of macrophotoinitiators which are polymerized photochemically to give block-copolymers. |
| 10/01/2002 | US6458605 Method and apparatus for controlling photolithography overlay registration |
| 10/01/2002 | US6458518 Photoresist stripper composition and method for stripping photoresist using the same |
| 10/01/2002 | US6458517 Mixture of organonitrogen compound, alkylene glycol, monoalkyl ether, sugar(or sugar alcohol) and phosphorous compound |
| 10/01/2002 | US6458515 Solution includes a photosensitive material and a plurality of masking particles within the photosenstive material; screen printing the solution over a substrate |
| 10/01/2002 | US6458513 Forming cavities, masking and etching silicon substrate to form three dimensional structure |
| 10/01/2002 | US6458509 Curable (meth)acrylic compound, crosslinked carboxyl elastic polymer, and adhesion intensifier comprising carboxylbenzotriazole and/or phosphoric acrylate; solders, printed circuits; heat resistance |
| 10/01/2002 | US6458508 Method of protecting acid-catalyzed photoresist from chip-generated basic contaminants |
| 10/01/2002 | US6458507 Ink repellent subbing layer and thermosensitive silicone copolymer with hard and soft segments; infrared radiation emitting lasers |
| 10/01/2002 | US6458506 Photoacid generators and photoresists comprising same |
| 10/01/2002 | US6458503 Fluorinated aromatic acetal polymers and photosensitive compositions containing such polymers |
| 10/01/2002 | US6458497 Mask for manufacturing semiconductor device and method of manufacture thereof |
| 10/01/2002 | US6458431 Embedding particles; photochemistry |
| 10/01/2002 | US6458426 Method for depositing a patterned layer of material over a substrate |
| 10/01/2002 | US6458422 Method for coating a plurality of fluid layers onto a substrate |
| 10/01/2002 | US6458421 Includes preparing fluids such that the first solute is incompatible with the second and third solutes so the first fluid minimizes a strikethrough defect of the second and third fluids to the surface; for imaging, data storage media |
| 10/01/2002 | US6458263 Cantilevered multilevel LIGA devices and methods |
| 10/01/2002 | US6458208 Film forming apparatus |
| 10/01/2002 | US6457882 Substrate processing method and substrate processing apparatus |
| 10/01/2002 | US6457864 Omni-directional high precision friction drive positioning stage |
| 10/01/2002 | US6457587 Integrated reticle sorter and stocker |
| 10/01/2002 | CA2065897C Process and an apparatus for producing a thin photoimageable coating on a metallic-layered substrate |
| 09/30/2002 | CA2375422A1 Image-recording device for a printing form, having macrooptics of the offner type |
| 09/28/2002 | CA2379107A1 Holder for holding a printed circuit for exposure to light |
| 09/28/2002 | CA2379101A1 Apparatus for exposing a face of a printed circuit panel |
| 09/26/2002 | WO2002075905A1 Armature unit, motor, stage device, exposure device, and method of manufacturing device |
| 09/26/2002 | WO2002075796A1 Method of etching organic antireflection coating (arc) layers |
| 09/26/2002 | WO2002075795A1 Method and device for exposure, and method of manufacturing device |
| 09/26/2002 | WO2002075793A2 System and method of providing mask defect printability analysis |
| 09/26/2002 | WO2002075765A1 Method of producing a screen for a color display tube |
| 09/26/2002 | WO2002075455A1 Negative photosensitive resin composition and display device using the same |
| 09/26/2002 | WO2002075246A1 Method for measuring dimensions of pattern |
| 09/26/2002 | WO2002059905A3 Narrow-band spectral filter and the use thereof |
| 09/26/2002 | WO2002046507A3 Onium salts and the use therof as latent acids |
| 09/26/2002 | US20020137826 Organic anti-reflective polymer and method for manufacturing thereof |
| 09/26/2002 | US20020137818 Styrene-maleic anhydride binder copolymer of which the maleic anhydride group is partly esterified with a lower alcohol, the ink composition forming a solder resist film excellent in flexibility, soldering heat resistance, adherence |
| 09/26/2002 | US20020137364 Apparatus having a static eliminator for manufacturing semiconductor devices and a method for eliminating a static electricity on a semiconductor wafer |
| 09/26/2002 | US20020137358 Multiple point support assembly for a stage |
| 09/26/2002 | US20020137353 Method and device for delacquering an area on a mask substrate |
| 09/26/2002 | US20020137303 Reducing asymmetrically deposited film induced registration error |
| 09/26/2002 | US20020137240 Reducing asymmetrically deposited film induced registration error |
| 09/26/2002 | US20020137237 Reducing asymmetrically deposited film induced registration error |
| 09/26/2002 | US20020137096 Solid phase synthesis; photolithography |
| 09/26/2002 | US20020136992 Exposing substrate to projected image while reticle moves in a first direction and the substrate moves in a second direction that includes a tilt angle so the focus of the projected image changes position as the substrate moves |
| 09/26/2002 | US20020136990 Includes steps of depositing diamond like carbon (DLC) layer on a silicon rich etch barrier, placing photoresist on the etch barrier DLC followed by oxygen and fluorine reactive ion etching |
| 09/26/2002 | US20020136989 That reduces word line resistance and increases process window |
| 09/26/2002 | US20020136987 Photosensitive layer includes a polyurethane resin binder comprising an aliphatic cyclic structure which has a carboxyl group as a substituent |
| 09/26/2002 | US20020136986 Includes an acrylated, epoxidized novolak prepolymer, photocurable monomers and an epoxy compound that also has a vinyl group, and clay nanocomposite |
| 09/26/2002 | US20020136982 Photoacid initiator and a polycyclic polymer comprising repeating units that contain pendant acid labile groups such as norbornenecarboxylic acid, tert-butyl ester copolymer with the corresponding linear alkyl ester |
| 09/26/2002 | US20020136981 Post exposure delay (PED)-stabilizer-containing resist material having high sensitivity and high resolution; thiol derivatives, disulfide derivatives and/or thiolsulfonate derivatives |
| 09/26/2002 | US20020136980 Acid generator, a resin whose leaving group includes a residue of a compound having a smaller ionization potential value than p-ethylphenol, and a solvent |
| 09/26/2002 | US20020136971 Manufacturing system in electronic devices |
| 09/26/2002 | US20020136970 Forming between the substrate and resist film an anti-reflective film whose photoabsorbance of the exposure light is greater on the subtrate surface side than on the resist surface side; solves interference problem |
| 09/26/2002 | US20020136968 Colored photosensitive composition |
| 09/26/2002 | US20020136967 Reactive ion etching using a mixed gas including an oxygen containing gas and a halogen containing gas, and a reducing gas for dry etching a metal film; high precision pattern-etched product; dry etching apparatus |
| 09/26/2002 | US20020136966 Photomask blank, photomask and method of manufacture |
| 09/26/2002 | US20020136961 Using a heat sensitive coating of a polymer where aqueous developer solubility of the composition is not increased by incident UV radiation but is increased by delivery of heat |
| 09/26/2002 | US20020136960 Reticle forming methods |