Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
10/2002
10/09/2002CN1373393A Developing liquid mfg. device and method
10/09/2002CN1373143A Organic antireflective coating polymer, antireflective paint composition contg. said polymer, and process for preparing same
10/09/2002CN1373012A Coating device and coating method
10/09/2002CN1092347C Exposure device for making color picture tube
10/09/2002CN1092346C Method for preparing photosensitive resin printing plate
10/09/2002CN1092201C Alkylphenylbisacylphosphine oxides and photo initiator mixtures
10/09/2002CN1092199C Borate coinitiators for photopolymerization
10/09/2002CN1092176C Low metal ion contg. 4,4'-[1-[4-[1-(4-hydroxyphenyl)-1-methylethyl]phenyl]-ethylidene]bisphenol and photoresist compositions therefrom
10/09/2002CN1092113C Support material for making color test prints in analog proof system
10/09/2002CA2381028A1 Photo processing of materials
10/08/2002US6463577 Method of manufacturing mask using independent pattern data files
10/08/2002US6463403 System and method for process matching
10/08/2002US6463184 Method and apparatus for overlay measurement
10/08/2002US6463119 Exposure method, exposure apparatus and semiconductor manufacturing apparatus
10/08/2002US6463084 Device for on-line control of output power of vacuum-UV laser
10/08/2002US6462875 Diffractive optical element
10/08/2002US6462828 Exposure apparatus
10/08/2002US6462818 Overlay alignment mark design
10/08/2002US6462807 Projection exposure apparatus and method
10/08/2002US6462272 Planar resist structure, in particular an encapsulation for electronic component, and thermomechanical production process
10/08/2002US6462107 Photoimageable compositions and films for printed wiring board manufacture
10/08/2002US6462005 Aqueous solution containing a quarternary ammonium salt, a fluoro compound and optionally an organic solvent; protecting deposition film to be removed; no corrosion of conductive layer being decontaminated
10/08/2002US6461971 Method of residual resist removal after etching of aluminum alloy filmsin chlorine containing plasma
10/08/2002US6461881 Stereolithographic method and apparatus for fabricating spacers for semiconductor devices and resulting structures
10/08/2002US6461800 Resist patterning method
10/08/2002US6461796 Forming on substrate resist mask having opening with tapered side wall, forming water soluble resist film on mask to cover taper, allowing film to react with acid to form water insoluble portion, removing water soluble film, doping
10/08/2002US6461795 Manufacture of lithographic printing forms
10/08/2002US6461793 Laser addressable thermal transfer imaging element with an interlayer
10/08/2002US6461791 Polymers, chemical amplification resist compositions and patterning process
10/08/2002US6461790 Polymers, chemical amplification resist compositions and patterning process
10/08/2002US6461789 Polymers, chemical amplification resist compositions and patterning process
10/08/2002US6461788 Polymerizable compounds having cyclohexanelactone structure and polymers
10/08/2002US6461785 Composition for positive photoresist
10/08/2002US6461784 Printing plate with mat particles containing copolymer comprising (meth)acrylamide and another addition polymerizable unsaturated compound, not comprising carboxylic acid or phenolic hydroxyl group; tack-free, storage stable
10/08/2002US6461778 In-line method of measuring effective three-leaf aberration coefficient of lithography projection systems
10/08/2002US6461777 Apparatus comprising unit dividing display device into multiple shot areas, unit setting suspected division area comprising layers of shot area, unit dividing all layers at once, unit creating light resistant coating on unincluded area
10/08/2002US6461776 Forming between the substrate and resist film an anti-reflective film whose photoabsorbance of the exposure light is greater on the subtrate surface side than on the resist surface side; solves interference problem
10/08/2002US6461775 Optical display comprising substrate bearing plurality of pixel elements, each comprising electrically conducting element to operate pixel element, and black matrix disposed between pixel elements and in contact with conducting elements
10/08/2002US6461717 Composition for protecting apertures in substrate during etching, comprising crosslinkable polymers containing hydroxyl groups and having specified molecular weight, thermal acid generator catalysts, crosslinking agents and solvents
10/08/2002US6461691 Curable sealant composition
10/08/2002US6461680 Simplified fabrication method of toroidal charged particle deflector vanes
10/08/2002US6460265 Double-sided wafer exposure method and device
10/03/2002WO2002078412A1 Method for producing printed wiring board and resist material
10/03/2002WO2002078049A2 Multi-spectral uniform light source
10/03/2002WO2002077922A1 Image detection method, image detection apparatus, and wafer treatment apparatus
10/03/2002WO2002077716A2 Scanning probe based lithographic alignment
10/03/2002WO2002077714A1 Self-flame-retardant resist material and insulating material
10/03/2002WO2002077713A1 Method for forming metal pattern
10/03/2002WO2002077712A2 Photoresist composition
10/03/2002WO2002077711A1 Photosensitive resin composition, photosensitive resist for color filter, and process for producing color filter
10/03/2002WO2002077710A2 Photoresist compositions for short wavelength imaging
10/03/2002WO2002077709A2 Photoresist composition
10/03/2002WO2002077692A1 Optical system manufacturing method and exposure device having an optical system manufactured by the manufacturing method
10/03/2002WO2002077676A1 Optical member and method of producing the same, and projection aligner
10/03/2002WO2002077485A1 Multiple chamber fluid mount
10/03/2002WO2002077484A2 Method and device for vibration control
10/03/2002WO2002077321A1 Method for forming metal pattern
10/03/2002WO2002077120A1 Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate
10/03/2002WO2002077058A1 Resin curable with actinic energy ray, photocurable/thermosetting resin composition containing the same, and cured article obtained therefrom
10/03/2002WO2002076966A1 Process for producing epoxy compound, epoxy resin composition and use thereof, ultraviolet-curable can coating composition, and process for producing coated metal can
10/03/2002WO2002063613A3 A system and method for high resolution optical imaging, data storage, lithography, and inspection
10/03/2002WO2002021216A3 Polymers and photoresist compositions comprising electronegative groups
10/03/2002WO2002015238A3 Device and method for optical inspection of semiconductor wafer
10/03/2002WO2002006902A3 Method and system of automatic fluid dispensing for imprint lithography processes
10/03/2002WO2002001297A3 Method for photochemically structuring surfaces and articles structured by said method
10/03/2002WO2001088960A3 Method of molecular-scale pattern imprinting at surfaces
10/03/2002US20020143130 Monomer and polymer for photoresist, photoresist composition, and phosphor layer composition for color cathode ray tube
10/03/2002US20020142614 Heat treatment redistributes Cu particles segregated in the Al-Cu alloy layer during the O2-plasma pretreatment, preventing occurrence of a short-circuit failure.
10/03/2002US20020142511 Method of fabricating semiconductor device having alignment mark
10/03/2002US20020142486 Method of fabricating semiconductor device
10/03/2002US20020142251 Pattern formation method
10/03/2002US20020142250 Processes for producing lithographic printing plate
10/03/2002US20020142249 Negative photosensitive lithographic printing plate
10/03/2002US20020142247 Planographic printing plate precursor
10/03/2002US20020142246 Reduction of inorganic contaminants in polymers and photoresist compositions comprising same
10/03/2002US20020142245 Thermal imaging composition and member and methods of imaging and printing
10/03/2002US20020142244 Photosensitivity; sharp images; high contrast
10/03/2002US20020142238 Extracting pattern; charge particle beam exposure
10/03/2002US20020142229 Semiconductors
10/03/2002US20020142227 Holography recording
10/03/2002US20020142096 Induction gelation; optic diffraction; three-dimensional crosslinking
10/03/2002US20020141633 Pattern data converting method and apparatus
10/03/2002US20020141533 X-ray exposure apparatus
10/03/2002US20020141082 Stage mirror retention system
10/03/2002US20020141076 Combined on-axis and off-axis illumination
10/03/2002US20020141071 Illumination system with reduced heat load
10/03/2002US20020141024 Direct pattern writer
10/03/2002US20020140920 System and method for printing semiconductor patterns using an optimized illumination and reticle
10/03/2002US20020140919 Projection exposure apparatus
10/03/2002US20020140917 Method and apparatus for proper ordering of registration data
10/03/2002US20020140916 Multiple chamber fluid mount
10/03/2002US20020140915 Exposure method and apparatus, and device manufacturing method
10/03/2002US20020140383 Charged particle beam exposing apparatus
10/03/2002US20020140298 Electromagnetic actuator and exposure apparatus having the same
10/03/2002US20020139988 Vibration isolator, device manufacturing apparatus and method, semiconductor manufacturing plant and method of maintaining device manufacturing apparatus
10/03/2002US20020139481 Apparatus and method for exposing substrates
10/03/2002US20020139476 Dry-etching a metal thin film with an etching gas, a mixed gas including of a reactive ion etching gas which contains oxygen and halogen containing gases, and a reducing gas
10/03/2002US20020139387 Compositions for dissolution of low-k dielectric films, and methods of use
10/03/2002US20020139269 Wet offset printing form with a photocatalytically and thermally modifiable material and process and device for producing a printed image and/or for erasing a printed image of a wet offset printing form
10/03/2002US20020139259 Image exposure control apparatus in multicolor printing press
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