G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor

Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
10/2002
10/15/2002	US6465149 Solution to be optically treated, a method for forming an antireflection film, a method for pattern-plating and a method for manufacturing a thin film magnetic head
10/15/2002	US6465148 Comprises a radiation absorbing material and a compound having two or more blocked isocyanate groups
10/15/2002	US6465147 Cross-linker for photoresist, and process for forming a photoresist pattern using the same
10/15/2002	US6465141 Pellicle with light intensity modifying region configured to regulate transmission of light onto wafer to create a non-uniform light transmission profile across wafer exposure field and thereby reduce critical dimension errors
10/15/2002	US6465137 Resist composition and pattern forming process
10/15/2002	US6464692 Controllable electro-optical patternable mask, system with said mask and method of using the same
10/15/2002	US6463664 Multi-axis planar slide system
10/10/2002	WO2002080264A2 Method and apparatus for controlling feature critical dimensions based on scatterometry derived profile
10/10/2002	WO2002080239A2 Process for forming sub-lithographic photoresist features
10/10/2002	WO2002080233A2 Process and apparatus for removing residues from the microstructure of an object
10/10/2002	WO2002080185A1 Stage device, exposure device, and method of manufacturing device
10/10/2002	WO2002079883A1 Lithography system with beam guidance and method for producing digital holograms in a storage medium
10/10/2002	WO2002079882A2 Lithography method
10/10/2002	WO2002079881A2 Lithography apparatus comprising a mobile lens for producing digital holograms
10/10/2002	WO2002079880A2 Method for adjusting the overlay of two masking planes in a photolithographic process
10/10/2002	WO2002079879A1 High performance, photoimageable resin compositions and printing plates prepared therefrom
10/10/2002	WO2002079878A1 Photosensitive film for circuit formation and process for producing printed wiring board
10/10/2002	WO2002079876A2 Lithographic template
10/10/2002	WO2002079874A1 Integrated laser diode array and applications
10/10/2002	WO2002079691A1 Materials, methods, and uses for photochemical generation of acids and/or radical species
10/10/2002	WO2002079337A1 Structural bonding tapes and articles containing the same
10/10/2002	WO2002079287A1 Polycyclic fluorine-containing polymers and photoresists for microlithography
10/10/2002	WO2002079131A1 Optically active compound and photosensitive resin composition
10/10/2002	WO2002067055A3 Template for room temperature, low pressure micro- and nano-imprint lithography
10/10/2002	WO2002045475A3 Protective overcoat for replicated diffraction gratings
10/10/2002	WO2001099161A3 Method of reducing post-development defects in and around openings formed in photoresist by use of multiple development/rinse cycles
10/10/2002	WO2001090820A9 Flexible piezoelectric chuck
10/10/2002	WO2001054184A9 Method for removing residues with reduced etching of oxide
10/10/2002	US20020147319 Printing oligonucleotide arrays
10/10/2002	US20020147291 Lactone ring-containing (meth)acrylate and polymer thereof for photoresist composition
10/10/2002	US20020147290 Cyclic acetal compound, polymer, resist composition and patterning process
10/10/2002	US20020147259 Chemical amplifying type positive resist composition
10/10/2002	US20020146911 Semiconductor device and method of manufacturing the same
10/10/2002	US20020146647 For use in photolithography; fabricating semiconductor device
10/10/2002	US20020146645 Multilayered body for photolithographic patterning
10/10/2002	US20020146644 Suitable for wet lithographic printing
10/10/2002	US20020146642 Lithography characteristics when used as photoresist material
10/10/2002	US20020146641 Chemically amplifying type positive resist composition
10/10/2002	US20020146639 Lithographic photoresist composition and process for its use
10/10/2002	US20020146638 Used to generate resist images; in the manufacture of integrated circuits
10/10/2002	US20020146636 Reverse transfer imaging and methods of printing
10/10/2002	US20020146635 Suitable for direct plate making by means of a semiconductor laser or a YAG laser
10/10/2002	US20020146634 Can be imaged by analog or digital imaging and used in the preparation of negative or positive-working waterless lithographic printing plates
10/10/2002	US20020146633 Fluorinated aromatic acetal polymers and photosensitive compositions containing such polymers
10/10/2002	US20020146629 Useful as a protective material for etching, as back-coating material in the production of a shadow mask
10/10/2002	US20020146628 Method and apparatus for exposure, and device manufacturing method
10/10/2002	US20020146582 To protect the film resist
10/10/2002	US20020146573 Can form a smooth film; storage stability, hardness and wear resistance
10/10/2002	US20020146516 Apparatus for coating of a semiconductor wafer
10/10/2002	US20020146251 Developer producing equipment and method
10/10/2002	US20020145811 Projection exposure apparatus and method
10/10/2002	US20020145808 Optical beam guidance system and method for preventing contamination of optical components contained therein
10/10/2002	US20020145722 Lithographic projection apparatus positioning system, method of manufacturing, device manufactured thereby and computer program
10/10/2002	US20020145721 Stage system and stage driving method for use in exposure apparatus
10/10/2002	US20020145720 Illumination device for projection system and method for fabricating
10/10/2002	US20020145719 DUV scanner linewidth control by mask error factor compensation
10/10/2002	US20020145718 Microlithography reduction objective and projection exposure apparatus
10/10/2002	US20020145717 Lithographic projection apparatus, a grating module, a sensor module, a method of measuring wave front aberrations
10/10/2002	US20020145716 Exposure method and apparatus, and device manufacturing method
10/10/2002	US20020145714 Reticle chucks and methods for holding a lithographic reticle utilizing same
10/10/2002	US20020145713 Scanning exposure apparatus, scanning exposure method, and device manufacturing method
10/10/2002	US20020145712 Microdevice and structural components of the same
10/10/2002	US20020145711 Exposure apparatus, apparatus for manufacturing devices, and method of manufacturing exposure apparatuses
10/10/2002	US20020145710 Exposure apparatus and device manufacturing method using the same
10/10/2002	US20020145694 Liquid crystal display device and method for manufacturing the same
10/10/2002	US20020145396 Real time measurement of leakage current in high voltage electron guns
10/10/2002	US20020144972 Immersing a surface layer of said substrate in a solution that is able to remove the surface layer, and forming bubbles in solution on the surface of the layer, removing the solution; semiconductors
10/10/2002	US20020144719 Solution treatment unit
10/10/2002	US20020144707 Stopping the developing process and removing the resist using immersion in de-ionized water followed by a vacuum dry period
10/10/2002	US20020144618 Drum for fixing sheet-type member
10/10/2002	US20020144616 Apparatus for and method of exposing photo-sensitive printing plates
10/10/2002	DE10206378A1 Positiv arbeitende Resistzusammensetzungen des chemischen Verstärkungstyps The positive-working resist compositions of chemical amplification type
10/10/2002	DE10117481A1 Catadioptric projection objective for microlithography system, has beam splitter arranged near object plane or plane conjugated to object plane
10/10/2002	DE10117025A1 Teilchenoptische Vorrichtung,Beleuchtungsvorrichtung und Projektionssystem sowie Verfahren unter Verwendung derselben A particle-optical device, illumination device and projection system and method using the same
10/10/2002	DE10115875A1 Bebilderungseinrichtung für eine Druckform mit einer Makrooptik vom Offner-Typ Imaging device for a printing form with a macro optics from Offner type
10/09/2002	EP1248499A1 Method and apparatus for production of extreme ultraviolet radiation
10/09/2002	EP1248289A2 Removal of organic anti-reflection coatings in integrated circuits
10/09/2002	EP1248288A1 Exposure method and exposure apparatus
10/09/2002	EP1248282A1 Particle-optical device, illumination device and projection system, and method using them
10/09/2002	EP1248156A2 Process for the removal of resist material
10/09/2002	EP1248155A1 Method of illuminating a material layer
10/09/2002	EP1248154A1 Lithographic manufacturing process and lithographic projection apparatus
10/09/2002	EP1248153A2 X-Ray exposure apparatus
10/09/2002	EP1248152A2 X/Y stage and exposure apparatus using the same
10/09/2002	EP1248151A2 Duv scanner linewidth control by mask error factor compensation
10/09/2002	EP1248150A2 Radiation sensitive material and method for forming pattern
10/09/2002	EP1248149A1 Photosensitive lithographic printing plate
10/09/2002	EP1247297A2 Laser system and method for processing a memory link with a burst of laser pulses having ultrashort pulsewidths
10/09/2002	EP1247141A1 Creation of resist structures
10/09/2002	EP1246706A2 Anti-reflective coating process and apparatus
10/09/2002	EP1141142B1 Improved method for producing thermally cleavable, soluble pigment derivatives
10/09/2002	EP1105373B1 Unsaturated oxime derivatives and the use thereof as latent acids
10/09/2002	EP1066365A4 Acidic composition containing fluoride for removal of photoresists and etch residues
10/09/2002	EP0900237B1 Photoactive compounds for use with narrow wavelength band ultraviolet (uv) curing systems
10/09/2002	CN1373900A Substrate, stage device, method of driving stage, exposure system and exposure method
10/09/2002	CN1373863A Photoresist remover composition
10/09/2002	CN1373862A Data path for high performance pattern generator
10/09/2002	CN1373714A Thermal transfer element with plasticizer-contg. transfer layer and thermal transfer process
10/09/2002	CN1373395A Negative light-sensitive lithographic printing plate
10/09/2002	CN1373394A Photosensitive thermosetting composition

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