G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor

Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
10/2002
10/24/2002	US20020155393 Alternative photoresist stripping solutions
10/24/2002	US20020155392 Edge rinse apparatus and edge rinse method
10/24/2002	US20020155391 Coating a photosensitive photoresist; exposure to light source; development
10/24/2002	US20020155389 Inverse resist coating process
10/24/2002	US20020155385 Controlling transmission light
10/24/2002	US20020155384 System for flushing at least one internal space of an objective
10/24/2002	US20020155383 Mixture containing polymer and organonitrogen compound
10/24/2002	US20020155382 Presensitized plate useful for making lithographic printing plate and method for making lithographic printing plate therefrom
10/24/2002	US20020155380 Forming relief images; transferring image
10/24/2002	US20020155379 Photosensitive monomer, photosensitive polymer and chemically amplified resist composition comprising lactone group having acid-labile protecting group
10/24/2002	US20020155378 Chemical amplifying type positive resist compositions
10/24/2002	US20020155377 Aluminum plate overcoated with photosensitivity layer; aging resistance; lithography printing plates
10/24/2002	US20020155376 Positive resist composition
10/24/2002	US20020155375 Heat sensitive elements; negative working printing plate; graft polymers
10/24/2002	US20020155374 Development in aqueous solution; hydrophilic lithography substrate; radiation sensitive coating
10/24/2002	US20020155372 Multilayer; transparent support; heat sensitive element and release agent
10/24/2002	US20020155369 Method for the production of a printing plate using the dual-feed technology
10/24/2002	US20020155363 Forming libraries of cells; phase shifting masking
10/24/2002	US20020155357 Prioritizing the application of resolution enhancement techniques
10/24/2002	US20020155356 Mask for measuring optical aberration and method of measuring optical aberration
10/24/2002	US20020155189 Apparatus for manufacturing a three-dimensional object
10/24/2002	US20020154730 Methods and devices for holding a mirror for use in X-ray optical systems
10/24/2002	US20020154671 Line selected F2 two chamber laser system
10/24/2002	US20020154670 Electric discharge laser with two-material electrodes
10/24/2002	US20020154669 Laser wavelength control unit with piezoelectric driver
10/24/2002	US20020154668 Very narrow band, two chamber, high rep rate gas discharge laser system
10/24/2002	US20020154395 8-Mirror microlithography projection objective
10/24/2002	US20020154286 Image forming apparatus
10/24/2002	US20020154285 Mechanized retractable pellicles and methods of use
10/24/2002	US20020154284 Illumination optical system and projection exposure apparatus
10/24/2002	US20020154283 Position measuring method and apparatus
10/24/2002	US20020154282 Correction apparatus that corrects optical shift in two optical units, and exposure apparatus having the same
10/24/2002	US20020154281 Lithographic manufacturing process, lithographic projection apparatus, and device manufactured thereby
10/24/2002	US20020154280 Solid freeform fabrication of lightweight lithography stage
10/24/2002	US20020154279 Lithographic projection apparatus, device manufacturing method, and device manufactured thereby
10/24/2002	US20020154207 Banding-reduced imaging of a printing form
10/24/2002	US20020153496 Control of exposure in charged-particle-beam microlithography based on beam-transmissivity of the reticle
10/24/2002	US20020153494 Apparatus and methods for reducing coulombic blur in charged-particle-beam microlithography
10/24/2002	US20020153427 Spraying method of a dispense system
10/24/2002	US20020153362 Pattern generation system using a spatial light modulator
10/24/2002	US20020153099 Apparatus for increased workpiece throughput
10/24/2002	DE10213523A1 Chemisch verstärkende, positiv arbeitende Restismasse Chemically amplified positive working Restismasse
10/24/2002	DE10148209A1 Herstellung von optisch abgebildeten Strukturen mit einer Phasenschiebung von transmittierten Lichtanteilen Preparation of optically imaged structures with a phase shift of the transmitted light components
10/24/2002	DE10116060A1 Method of manufacturing digital holograms in storage medium, requires using a position trigger signal for activation of the write beam
10/24/2002	DE10115435A1 Nassoffset-Druckform mit fotothermisch veränderbarem Material und Verfahren und Vorrichtung zur Erzeugung eines Druckbilds und/oder zur Löschung eines Druckbilds einer Nassoffset-Druckform The wet offset printing form with photo-thermally variable material and method and apparatus for producing a printed image and / or deletion of an image of a wet offset printing form
10/24/2002	DE10115281A1 Verfahren zur Overlayeinstellung zweier Maskenebenen bei einem photolithographischen Prozess zur Herstellung einer integrierten Schaltung Method for setting overlay of two mask layers in a photolithographic process for manufacturing an integrated circuit
10/24/2002	DE10114861A1 Verfahren und Vorrichtung zum Entlacken eines Bereiches auf einem Maskensubstrat Method and apparatus for stripping paint an area on a mask substrate
10/24/2002	CA2443406A1 Photoreactive composition
10/23/2002	EP1251403A1 Method and apparatus for developing photosensitive resin relief printing plate
10/23/2002	EP1251402A1 Lithographic apparatus
10/23/2002	EP1251401A1 Method of measuring the aberration of a projection lens
10/23/2002	EP1251400A2 A photopolymerizable element for use as a flexographic printing plate and a process for preparing the plate from the element
10/23/2002	EP1251399A2 Photoresist composition
10/23/2002	EP1251397A2 Production of photoimaged structures with a phase shift of transmitted light portions
10/23/2002	EP1251014A2 Support for lithographic printing plate and presensitized plate
10/23/2002	EP1250997A1 Manufacturing device for three-dimensional object
10/23/2002	EP1250630A1 Mountable and removable sensor
10/23/2002	EP1114067B1 Polymerisation and/or crosslinking method under electron beam and/or gamma radiation
10/23/2002	EP0854783B1 Process for producing polymeric layers having selectively coloured regions
10/23/2002	CN1376178A Ultraviolet-curable resin composition
10/23/2002	CN1375862A Method for making semiconductor with ruthenium or ruthenium deoxide
10/23/2002	CN1375860A System for making electronic apparatus
10/23/2002	CN1375745A Method of raising photoetching resolution
10/23/2002	CN1375743A Making process of micro text and pattern mold
10/22/2002	US6470230 Supervisory method for determining optimal process targets based on product performance in microelectronic fabrication
10/22/2002	US6469830 Display screen and method of manufacture therefor
10/22/2002	US6469827 Diffraction spectral filter for use in extreme-UV lithography condenser
10/22/2002	US6469773 Stage apparatus, exposure apparatus and device manufacturing method
10/22/2002	US6469361 Semiconductor wafer
10/22/2002	US6469310 Radiation source for extreme ultraviolet radiation, e.g. for use in lithographic projection apparatus
10/22/2002	US6469220 Monomers for photoresist materials with high transparency and a great affinity for the substrate
10/22/2002	US6469197 A (meth)acrylate derivative whose ester portion is a 4,7-methanoindene diol or 1,4:5,8-dimethanonaphthalene diol for making photoresist polymers
10/22/2002	US6468816 Method for sensing conditions within a substrate processing system
10/22/2002	US6468740 Cyclic and substituted immobilized molecular synthesis
10/22/2002	US6468718 Radiation absorbing polymer, composition for radiation absorbing coating, radiation absorbing coating and application thereof as anti-reflective coating
10/22/2002	US6468717 Heat-sensitive lithographic printing plate precursor
10/22/2002	US6468716 Cover film for dry film resist
10/22/2002	US6468714 Negative radiation-sensitive resin composition
10/22/2002	US6468712 Photolithography at very short ultraviolet wavelengths employing a photo-acid generator and an aliphatic polymer that includes one or more protected hydroxyl groups; fluoride excimer lasers; enhanced resolution
10/22/2002	US6468711 Photosensitive composition and method for manufacturing lithographic printing plate
10/22/2002	US6468708 Photohardenable microcapsules encapsulating a color precursor; support comprises a barrier layer that exhibits a low water vapor transmission rate
10/22/2002	US6468586 Environment exchange control for material on a wafer surface
10/22/2002	US6467976 Impurities at a molecular level, such as oxygen, basic substances, ozone, and organic substances, can be prevented from adhering to a substrate; for use in photolithography
10/22/2002	US6467960 Air bearing linear guide for use in a vacuum
10/17/2002	WO2002082872A1 Method and device for producing extreme ultraviolet radiation and soft x-radiation
10/17/2002	WO2002082871A1 Method and device for the generation of far ultraviolet or soft x-ray radiation
10/17/2002	WO2002082601A1 Injection seeded f2 laser with wavelength control
10/17/2002	WO2002082598A1 Injection seeded f2 laser with pre-injected filter
10/17/2002	WO2002082597A1 Injection seeded laser with precise timing control
10/17/2002	WO2002082518A1 An apparatus and a method for forming a pattern using a crystal structure of material
10/17/2002	WO2002082512A1 Method for forming exposure pattern and exposure pattern
10/17/2002	WO2002082188A2 Substrate alignment
10/17/2002	WO2002082186A1 Waterless imageable element with crosslinked silicone layer
10/17/2002	WO2002082185A1 Perfluoroalkylsulfonic acid compounds for photoresists
10/17/2002	WO2002082184A1 Silicon-containing acetal protected polymers and photoresists compositions thereof
10/17/2002	WO2002082183A1 Substrate improvements for thermally imageable composition and methods of preparation
10/17/2002	WO2002082180A1 Imageable element comprising graft polymer
10/17/2002	WO2002081439A1 Novel sulfonium salt and process for producing the same
10/17/2002	WO2002081212A1 Chemical imaging of a lithographic printing plate
10/17/2002	WO2002061506A3 Developer fluid containing diprolene glycol dialkyl ethers

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