Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
10/2002
10/17/2002WO2002052349A3 Process for removal of photoresist after post ion implantation
10/17/2002WO2001059889A9 Bandwidth control technique for a laser
10/17/2002WO2001053065A9 Manufacturing method for multilayer fluorescent information carriers
10/17/2002US20020152454 Design data format and hierarchy management for processing
10/17/2002US20020152452 Illumination optimization for specific mask patterns
10/17/2002US20020152451 Method and apparatus for minimizing optical proximity effects
10/17/2002US20020151666 Such as 2-(1-tert- butoxycarbonylpiperidin-2-yl)ethyl 5-norbornene-2-carboxylate; photolithography; etching/heat resistance; semiconductors
10/17/2002US20020151185 Gas assisted method for applying resist stripper and gas-resist stripper combinations
10/17/2002US20020151184 Method for increased workpiece throughput
10/17/2002US20020151157 Mask for correcting optical proximity effect and method of manufacturing the same
10/17/2002US20020151156 Process for removal of photoresist after post ion implantation
10/17/2002US20020151140 Exposure parameter obtaining method, exposure parameter evaluating method, semiconductor device manufacturing method, charged beam exposure apparatus, and method of the same
10/17/2002US20020150844 Method for formation of semiconductor device pattern, method for designing photo mask pattern, photo mask and process for photo mask
10/17/2002US20020150842 Lithographically patterning of UV cure elastomer thin films
10/17/2002US20020150841 Photomask set for photolithographic operation
10/17/2002US20020150835 Copolymer of a (meth)acrylic acid derivative with a vinyl ether monomer, an allyl ether monomer and an oxygen-containing alicyclic olefin monomer, as a base resin; sensitive to high energy radiation, and etching resistance
10/17/2002US20020150834 An acrylate or methacrylate resin reacting in the presence of an acid, a photo acid generator which generates acid upon exposure, and a compound having the combination of an acetal group and a site which is eliminated by acid in its molecule
10/17/2002US20020150833 Imageable element and composition comprising thermally reversible polymers
10/17/2002US20020150824 Mask for adjusting transmittance of a light and method for manufacturing the same
10/17/2002US20020150750 Pretreated sheet product for lithographic plates
10/17/2002US20020150691 Substrate processing method and substrate processing system
10/17/2002US20020150398 Flexure based macro motion translation stage
10/17/2002US20020150138 Beam seal for line narrowed production laser
10/17/2002US20020149855 Projection objection for microlithography
10/17/2002US20020149849 Interference lithography using holey fibers
10/17/2002US20020149848 Device and method for changing the stress-induced birefringence and/or the thickness of an optical component
10/17/2002US20020149834 Light modulation device and system
10/17/2002US20020149807 Apparatus for and method of recording optically scanned image
10/17/2002US20020149783 Method for determining the distance between periodic structures on an integrated circuit or a photomask
10/17/2002US20020149782 Line profile asymmetry measurment using scatterometry
10/17/2002US20020149758 Positioning device and exposure apparatus including the same
10/17/2002US20020149757 Polarization vector alignment for interference lithography patterning
10/17/2002US20020149756 Projection exposure apparatus
10/17/2002US20020149755 Scanning exposure apparatus
10/17/2002US20020149754 Lithographic apparatus, device manufacturing method, and device manufacturing thereby
10/17/2002US20020149753 Exposure apparatus and device manufacturing method
10/17/2002US20020149751 Interferometric projection system
10/17/2002US20020149137 Computer-controlled layer by layer design fabrication of a three-dimensional object
10/17/2002US20020148989 Process for producing alternate striped electrode array in which transparent electrodes alternate with opaque electrodes, based on single mask designed for the opaque electrodes in self-aligned manner
10/17/2002US20020148978 Real-time prediction of and correction of proximity resist heating in raster scan particle beam lithography
10/17/2002US20020148976 Thermal control of image pattern distortions
10/17/2002US20020148971 Lens assembly for electron beam column
10/17/2002US20020148566 Substrate processing unit
10/17/2002US20020148404 Substrate spinning apparatus
10/17/2002US20020148113 Transfer of patterned metal by cold-welding
10/17/2002DE10206478A1 Vorrichtung und Verfahren zur Änderung der Spannungsdoppelbrechung und/oder der Dicke eines optischen Bauteils Apparatus and method for changing the stress birefringence and / or the thickness of an optical component
10/17/2002DE10139677A1 Verfahren und Vorrichtung zum Erzeugen von extrem ultravioletter Strahlung und weicher Röntgenstrahlung Method and device for generating extreme ultraviolet radiation and soft x-rays
10/17/2002DE10134033A1 Verfahren und Vorrichtung zum Erzeugen von Extrem-Ultraviolettstrahlung/weicher Röntgenstrahlung Method and device for generating extreme ultraviolet radiation / soft x-ray
10/17/2002DE10118048A1 Catadioptric lens used as a projection lens in semiconductor lithography comprises a beam divider partially surrounded by a holder, a mirror, lenses, a plate and an absorption unit arranged between the beam divider and the holder
10/17/2002DE10118047A1 Catadioptric objective, especially for microlithography, has deflection mirrors with mirror surfaces arranged on common base body whose position in objective can be adjusted
10/17/2002CA2442832A1 Chemical imaging of a lithographic printing plate
10/16/2002EP1249734A2 Rectangle/lattice data conversion method for charged particle beam exposure mask pattern and charged particle beam exposure method
10/16/2002EP1249733A2 Exposure method for forming pattern for IC chips on reticle by use of master masks
10/16/2002EP1249732A2 Planographic printing plate material and method of preparing planographic printing plate
10/16/2002EP1249731A2 Photosensitive composition and negative working lithographic printing plate
10/16/2002EP1249343A2 Thermal initiator system using leuco dyes and polyhalogene compounds
10/16/2002EP1249341A1 Lithographic printing plate precursor
10/16/2002EP1249031A1 Electron-optical corrector for eliminating third-order aberrations
10/16/2002EP1092175B1 Microlithography illumination system with depolariser
10/16/2002EP1058697A4 Polymeric films having controlled viscosity response to temperature and shear
10/16/2002EP1009861A4 Gene expression and evaluation system
10/16/2002EP0801327B1 Positive resist composition
10/16/2002CN1375077A Photomask original form having layer for protecting film surface and method for preparing the same, and protective layer-forming liquid for photomask original form
10/16/2002CN1374564A Workstable motion controlling method and system for array IC scanning photoetching
10/16/2002CN1374563A Precise workstable structure for array IC photoetching system
10/16/2002CN1374562A Lamp optical system and laser processing apparatus allocated with the same optical system
10/16/2002CN1374561A Exposure method and exposure apparatus
10/16/2002CN1374560A Projection optics and exposure device with the same projection optics
10/16/2002CN1374559A Original edition for lithographic printing plate
10/16/2002CN1374557A 感光组合物 Photographic composition
10/16/2002CN1374494A Far infrared drying device, drying device constitution body and drying method
10/15/2002US6467076 Method and apparatus for submicron IC design
10/15/2002US6466838 Semiconductor exposure apparatus and device manufacturing method using the same
10/15/2002US6466714 Method of producing phase mask for fabricating optical fiber and optical fiber with bragg's diffraction grating produced by using the phase mask
10/15/2002US6466602 Gas discharge laser long life electrodes
10/15/2002US6466601 Beam seal for line narrowed production laser
10/15/2002US6466382 Optical arrangement
10/15/2002US6466380 Iris diaphragm
10/15/2002US6466373 Trimming mask with semitransparent phase-shifting regions
10/15/2002US6466365 Film coated optical lithography elements and method of making
10/15/2002US6466359 Multi-beam exposure apparatus
10/15/2002US6466315 Method and system for reticle inspection by photolithography simulation
10/15/2002US6466314 Reticle design inspection system
10/15/2002US6466304 Illumination device for projection system and method for fabricating
10/15/2002US6466303 Projection exposure apparatus with a catadioptric projection optical system
10/15/2002US6466301 Transfer apparatus and transfer method
10/15/2002US6465797 Electron beam illumination apparatus, electron beam exposure apparatus, and device manufacturing method
10/15/2002US6465796 Charge-particle beam lithography system of blanking aperture array type
10/15/2002US6465540 Polymer containing epoxized ethylenically unsaturate, diacry-lated polyether and polybasic anhydride with such as a cresol novolac epoxy resin and photoinitiator; dilute alkali deve-lopable; protective films for color filters; printed circuits
10/15/2002US6465537 Photocurable composition, method for production of photocurable composition, photocurable pressure-sensitive adhesive and method for production of photocurable pressure—sensitive adhesive sheet
10/15/2002US6465403 Silicate-containing alkaline compositions for cleaning microelectronic substrates
10/15/2002US6465356 Method for forming fine patterns by thinning developed photoresist patterns using oxygen radicals
10/15/2002US6465352 Method for removing dry-etching residue in a semiconductor device fabricating process
10/15/2002US6465322 Semiconductor processing methods and structures for determining alignment during semiconductor wafer processing
10/15/2002US6465290 Method of manufacturing a semiconductor device using a polymer film pattern
10/15/2002US6465272 Extreme ultraviolet soft x-ray projection lithographic method and mask devices
10/15/2002US6465161 Substrate-treating agent composition comprises a solution containing a salt between an amine and an organic acid such as a sulfonic or carboxylic acid
10/15/2002US6465160 After exposure, before development, photoresist is baked for a period of time sufficient to increase the resist contrast value of the resist pattern and thereby suppress the generation of side-lobes
10/15/2002US6465156 Method for mitigating formation of silicon grass
10/15/2002US6465150 Radiation-sensitive resin composition
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