G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor

Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
10/2002
10/30/2002	EP1253471A2 Method and system for improving focus accuracy in a lithography system
10/30/2002	EP1253470A2 Radiation-sensitive resin composition
10/30/2002	EP1253155A1 Photo-initiator compositions
10/30/2002	EP1253138A2 Novel tertiary amine compounds having an ester structure and processes for preparing same
10/30/2002	EP1252691A1 Wavemeter for gas discharge laser
10/30/2002	EP1252689A1 Deep ultraviolet catadioptric anamorphic telescope
10/30/2002	EP1252553A1 Refractive index regulation for maintaining optical imaging performance
10/30/2002	EP1252552A1 Reticle stocking and sorting management system
10/30/2002	EP1252551A1 Photoinitiator system with acylphosphine oxide initiators
10/30/2002	EP1252366A2 Method for surface patterning using a focused laser
10/30/2002	EP1252239A1 Curable composition containing reactive melamine derivative, cured product, and laminate
10/30/2002	EP1252079A1 Wafer transport system
10/30/2002	EP1252028A2 Temporary bridge for micro machined structures
10/30/2002	EP1252024A2 Device for exposing thermosensitive media
10/30/2002	EP1251974A2 Methods and apparatus for forming submicron patterns on films
10/30/2002	EP1105368B1 Photoactivatable bases containing nitrogen
10/30/2002	EP0956280B1 Non-volatile phenylglyoxalic esters
10/30/2002	CN2519295Y Projection imaging objective lens for quasi molecule laser fine processing
10/30/2002	CN1377477A 形成图形的方法 The method of forming a pattern
10/30/2002	CN1377389A Method for synthesizing polymeric azo dyes
10/30/2002	CN1377362A Organo-silicon compounds and their use as photoinitiators
10/30/2002	CN1376949A Projection optical system, projection exposure device with them thereof and projection exposure method
10/30/2002	CN1376948A Method for nondestructively measuring lateral etched width in etching procedure
10/30/2002	CN1376589A Coated device and method
10/30/2002	CN1093645C Photoresist material and method for producing semiconductor constituted of corrosion resist picture thereof
10/29/2002	US6473520 Pellicle, identification system of the same, and method of identifying the same
10/29/2002	US6473245 Catadioptric lens barrel structure having a plurality of support platforms and method of making the same
10/29/2002	US6473243 Catadioptric imaging system and a projection exposure apparatus provided with said imaging system
10/29/2002	US6473237 Point array maskless lithography
10/29/2002	US6473227 Silica glass optical material for projection lens to be utilized in vacuum ultraviolet radiation lithography, method for producing the same, and projection lens
10/29/2002	US6473226 Silica glass member
10/29/2002	US6473163 Fluorescence radiation filter
10/29/2002	US6473162 Method of computing defocus amount in lithography and lithographic process using the method
10/29/2002	US6473161 Lithographic projection apparatus, supporting assembly and device manufacturing method
10/29/2002	US6473160 Projection exposure apparatus and device manufacturing method including an aperture member having a circular light transmitting portion and a light blocking member
10/29/2002	US6473159 Anti-vibration system in exposure apparatus
10/29/2002	US6473158 Exposure method and exposure apparatus
10/29/2002	US6473157 Method of manufacturing exposure apparatus and method for exposing a pattern on a mask onto a substrate
10/29/2002	US6473156 Scanning exposure apparatus and device manufacturing method
10/29/2002	US6473151 Substrate processing apparatus
10/29/2002	US6472840 Vibration cancellation apparatus and exposure apparatus
10/29/2002	US6472810 Light source device, exposure apparatus and cathode ray tube panel
10/29/2002	US6472777 Capacitive sensor calibration method and apparatus for opposing electro-magnetic actuators
10/29/2002	US6472766 Step mask
10/29/2002	US6472674 Electron beam exposure system and method of manufacturing devices using the same
10/29/2002	US6472673 Lithographic method for producing an exposure pattern on a substrate
10/29/2002	US6472543 Lactone compounds having alicyclic structure and their manufacturing method
10/29/2002	US6472459 Lithographically patterned or negative photoresist mold is filled and compressed to provide green microstructure within surface pattern which is then removed and sintered; micro-electronics; semiconductors; data storage; medical diagnostics
10/29/2002	US6472405 Glycoprotein IIB/IIIA antagonists
10/29/2002	US6472130 Solution of tetramethylammonium hydroxide in water and a process for preparing the solution
10/29/2002	US6472128 Antihalation compositions
10/29/2002	US6472127 Method of forming a photoresist pattern
10/29/2002	US6472123 Photolithography devices such as reticles and semiconductor masks, clear fields by electron-beam processing; exposing a first portion of a photoresist layer over said preform with an electron beam in accordance with a first writing pattern
10/29/2002	US6472122 Very thin layer of alumina, zerconia, or other ceramic, less than 25 microns thick,
10/29/2002	US6472121 Photocurable elements
10/29/2002	US6472120 Photosensitive polymer and chemically amplified photoresist composition containing the same
10/29/2002	US6472112 Method for measuring reticle leveling in stepper
10/29/2002	US6472107 Disposable hard mask for photomask plasma etching
10/29/2002	US6471882 Process for producing head slider
10/29/2002	US6471435 Flexural joint
10/29/2002	US6471421 Supply ports become gradually smaller toward a center portion of the substrate to prevent heaping of solution at the center and promote evenness of the developing solution within the substrate surface; photolithographic semiconductor production
10/29/2002	US6471037 Semiconductor manufacturing apparatus and method
10/29/2002	CA2093115C Imageable recording films
10/28/2002	EP1137675A4 Preparation of partially cross-linked polymers and their use in pattern formation
10/24/2002	WO2002085080A1 Method and device for generating extreme ultraviolet radiation in particular for lithography
10/24/2002	WO2002084832A1 Protection of reticles from electrostatic charges
10/24/2002	WO2002084720A2 Exposure device and substrate processing system and device producing method
10/24/2002	WO2002084719A1 Electron beam exposing device and exposure method
10/24/2002	WO2002084696A1 Electron beam generator and electron beam aligner
10/24/2002	WO2002084406A1 Euv-transparent interface structure
10/24/2002	WO2002084405A1 Lithograph with a trigger mask and method of production of digital holograms in a storage medium
10/24/2002	WO2002084404A1 Lithograph with one-dimensional trigger mask and method for production of digital holograms in a storage medium
10/24/2002	WO2002084403A1 Process for producing acid sensitive liquid composition containing a carbonate
10/24/2002	WO2002084402A2 Process for producing film forming resins for photoresist compositions
10/24/2002	WO2002084401A2 Photoresist compositions comprising solvents for short wavelength imaging
10/24/2002	WO2002084400A2 Preparation of photomasks
10/24/2002	WO2002084399A1 Opc mask manufacturing method, opc mask, and chip
10/24/2002	WO2002084340A1 Microlens for projection lithography and method of preparation thereof
10/24/2002	WO2002084213A1 Periodic patterns and technique to control misalignment
10/24/2002	WO2002083764A1 Photoreactive composition
10/24/2002	WO2002083415A1 Anti-reflective coating composition with improved spin bowl compatibility
10/24/2002	WO2002049078A3 Method for cleaning post-etch residues from a substrate
10/24/2002	WO2002039793A3 Multi-layer printed circuit board fabrication system and method
10/24/2002	WO2001061409A9 Apparatus and method of cleaning reticles for use in a lithography tool
10/24/2002	WO2001061296A9 Method and apparatus for optical system coherence testing
10/24/2002	US20020157081 Method of identifying an extreme interaction pitch region, methods of designing mask patterns and manufacturing masks, device manufacturing methods and computer programs
10/24/2002	US20020156594 Three dimensional reconstruction metrology
10/24/2002	US20020156276 Nitrogen-containing heterocyclic compounds and therapeutic agents for hyperlipidemia comprising the same
10/24/2002	US20020156216 Acid generating agent, additive, solvent and a copolymer of an acrylic acid, ester, anhydride and a cyclic non-aromatic monomers
10/24/2002	US20020156199 Preparation of homo-, co- and terpolymers of substituted styrenes
10/24/2002	US20020156148 Bottom anti-reflective coat forming composition for lithography
10/24/2002	US20020155731 Has a proper strength and an anti-vibration effect.
10/24/2002	US20020155723 Dry-etching method and apparatus, photomasks and method for the preparation thereof, and semiconductor circuits and method for the fabrication thereof
10/24/2002	US20020155715 Gas assisted method for applying resist stripper and gas-resist stripper combinations
10/24/2002	US20020155698 Isolation using an antireflective coating
10/24/2002	US20020155629 Semiconductor processing module with integrated feedback/feed forward metrology
10/24/2002	US20020155588 Very large scale immobilized polymer synthesis
10/24/2002	US20020155492 Arrays for detecting nucleic acids
10/24/2002	US20020155491 Arrays for detecting nucleic acids
10/24/2002	US20020155395 Method for formation of semiconductor device pattern, method for designing photo mask pattern, photo mask and process for photo mask

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