Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
11/2002
11/05/2002US6475707 Wet etching photoresist layer from silicon chip having insulation layer and bottom anti-reflection coating; photolithography; semiconductors
11/05/2002US6475706 Pattern formation method
11/05/2002US6475704 Method for forming fine structure
11/05/2002US6475702 Photosensitive resin composition and photoresist ink for manufacturing printed wiring boards
11/05/2002US6475701 Active energy beam curable composition and printed wiring board
11/05/2002US6475700 Lithographic printing plate precursor
11/05/2002US6475699 Terpolymer of 1-adamantyl-1-alkylalkyl (meth)acrylate, a norbornene, and maleic anhydride or itaconic anhydride; acid generating agent; sensitivity; resolution
11/05/2002US6475698 Polymeric compounds
11/05/2002US6475695 Intermediate image receiving sheet for a thermal transfer recording method
11/05/2002US6475694 Mixture of alkali soluble resin, quinonediazide ester compound and compound which generates an acid upon exposur eto radiation
11/05/2002US6475693 Positively photosensitive resin composition
11/05/2002US6475692 Radiation-sensitive compositions for printing plates for improving their chemical and developer resistance and printing plates comprising such compositions
11/05/2002US6475683 Color filter, process for producing it, and liquid crystal panel
11/05/2002US6475682 Photolithography method, photolithography mask blanks, and method of making
11/05/2002US6475292 Photoresist stripping method
11/05/2002US6475285 Deposition apparatus
11/05/2002US6475233 Stent having tapered struts
11/05/2002US6474236 Plate material placement apparatus and method
11/05/2002CA2190077C Suspended microstructures
10/2002
10/31/2002WO2002086627A1 Prioritizing the application of resolution enhancement techniques
10/31/2002WO2002086626A1 Process for preparing a printing plate
10/31/2002WO2002086625A1 Method and apparatus for the hardening of photopolymer plates
10/31/2002WO2002086624A1 Composition for forming antireflection film for lithography
10/31/2002WO2002086623A1 Optical recording materials
10/31/2002WO2002086174A1 Method and apparatus for treating a substrate with an ozone-solvent solution ii
10/31/2002WO2002085962A1 Improved radiation curable composition
10/31/2002WO2002085832A2 Solid mixtures of alpha-hydroxycarbonyl derivatives of alpha-methylstyrene oligomers and their use
10/31/2002WO2002085808A1 Quartz glass member and projection aligner
10/31/2002WO2002085639A1 Edge transfer lithography
10/31/2002WO2002052303A3 Projection lens
10/31/2002WO2002010480A3 Etching composition and use thereof with feedback control of hf in beol clean
10/31/2002WO2001084235A3 Multiple exposure process for formation of dense rectangular arrays
10/31/2002US20020162088 Charged particle beam exposure system using aperture mask in semiconductor manufacture
10/31/2002US20020161534 Method and apparatus for inspecting a substrate
10/31/2002US20020161527 Method of estimating shape of chemically amplified resist
10/31/2002US20020161150 Ether, polymer, resist composition and patterning process
10/31/2002US20020161148 Copolymer of fluorinated acrylate and norbornene compound
10/31/2002US20020161068 Polymerizable composition, cured material thereof and method for manufacturing the same
10/31/2002US20020160619 Method of manufacturing semiconductor device
10/31/2002US20020160618 Method for patterning an organic antireflection layer
10/31/2002US20020160545 Method of fabricating reflection-mode EUV diffusers
10/31/2002US20020160320 Process for forming sub-lithographic photoresist features by modification of the photoresist surface
10/31/2002US20020160319 Surface treatment of a semiconductor wafer with hexamethyldisilazane; applying and spreading a photoresist liquid; keeping the temperature of the resist lower than that of the edges to delay solvent evaporation; uniform thickness
10/31/2002US20020160318 Method for structuring a photoresist layer
10/31/2002US20020160317 Including a film-forming polymer containing molecule groups convertable into alkali-soluble groups by acid-catalyzed reaction, a photoacid generator and a thermobase generator; semiconductors; crosslinking inhibition; accuracy; smoothness
10/31/2002US20020160316 Including a film-forming polymer containing molecule groups convertable into alkali-soluble groups by acid-catalyzed reaction, a photoacid generator and a thermobase generator; semiconductors; crosslinking inhibition; accuracy; smoothness
10/31/2002US20020160315 Process for structuring a photoresist layer
10/31/2002US20020160314 Adjusting the polarization intensity for high numerical apertures by adjusting the intensity ratio of an S wave to a P wave polarization after penetration by using an optical component to divide the light
10/31/2002US20020160313 Photopolymerization type photosensitive phosphor paste composition and method for forming fluorescent film in PDP by using the same
10/31/2002US20020160311 Charged particle beam exposure apparatus, device manufacturing method, and charged particle beam applied apparatus
10/31/2002US20020160310 Photosensitive recording; applying actinic radiation; photopolymerization
10/31/2002US20020160309 Photopolymerization; three-dimensional object
10/31/2002US20020160303 Unsaturated ether containing polymer
10/31/2002US20020160302 Forming relief images
10/31/2002US20020160301 Overcoating semiconductor substrate with photosensitive polymer; exposure to radiation in presence of acid generator
10/31/2002US20020160300 Positive-type image-forming material and planographic printing plate precursor
10/31/2002US20020160299 Polyurethanes
10/31/2002US20020160298 Method for producing article coated with patterned film and photosensitive composition
10/31/2002US20020160297 Low abosorbing resists for 157 nm lithography
10/31/2002US20020160296 Emitting polarized light; positioning emitter sheets between electrodes
10/31/2002US20020160295 Photopolymerizable composition
10/31/2002US20020160285 Ambient condition sensor for a photosensitive media cartridge
10/31/2002US20020160284 Overlapping multilayer; variations in incline; reduction in lens defects
10/31/2002US20020160281 Determination variations; calibration
10/31/2002US20020160279 Pattern formation method, mask for exposure used for pattern formation, and method of manufacturing the same
10/31/2002US20020160278 Method for designing photolithographic reticle layout, reticle, and photolithographic process
10/31/2002US20020160277 Dividing pattern into zones; drawing
10/31/2002US20020160276 Vacuum ultraviolet transmitting silicon oxyfluoride lithography glass
10/31/2002US20020160274 Method of reshaping a patterned organic photoresist surface
10/31/2002US20020159217 Electrostatic chuck and substrate processing apparatus
10/31/2002US20020159152 Apparatus for optical beam shaping and diffusing and associated methods
10/31/2002US20020159142 Illuminating apparatus
10/31/2002US20020159049 Measuring method of illuminance unevenness of exposure apparatus, correcting method of illuminance unevennes, manufacturing method of semiconductor device, and exposure apparatus
10/31/2002US20020159048 Wavefront aberration measuring method and unit, exposure apparatus, device manufacturing method, and device
10/31/2002US20020159046 Base assembly for a stage chamber of a wafer manufacturing system
10/31/2002US20020159045 Wafer stage carrier and removal assembly
10/31/2002US20020159044 High resolution maskless lithography field lens for telecentric system
10/31/2002US20020159043 Aligner having shared rotation shaft
10/31/2002US20020159042 Chamber assembly for an exposure apparatus
10/31/2002US20020159041 Scanning exposure apparatus, scanning exposure method and mask
10/31/2002US20020159040 Specification determining method, projection optical system making method and adjusting method, exposure apparatus and making method thereof, and computer system
10/31/2002US20020158964 Laser exposure device
10/31/2002US20020158963 Information transfer device and method of exposing printable photosensitive films/papers in a printing machine for electronically readable information storage
10/31/2002US20020158342 Nanofabrication
10/31/2002US20020158317 Semiconductor package and method of preparing same
10/31/2002US20020158235 Negative actinic ray-sensitive paste and pattern-forming method by use of the same
10/31/2002US20020158214 Optical proximity correction with rectangular contact
10/31/2002US20020158197 AFM-based lithography metrology tool
10/31/2002US20020158193 Overlay alignment metrology using diffraction gratings
10/31/2002US20020158185 Method and system for improving focus accuracy in a lithography system
10/31/2002US20020157952 Adding sulfuric acid to an acid treatment solution which contains a non-alkaline metal ions to produce sulfate, and recovering the regenerated acid treatment solution by separating the sulfate (aluminum sulfate)
10/31/2002US20020157603 Coating apparatus having a cascade wall and metering blade, and a cleaning and recirculation arrangement for the coating apparatus
10/31/2002US20020157421 Method for producing titania-doped fused silica glass
10/31/2002DE10214543A1 Information transfer arrangement has non-rotating light source in main cylinder directed towards contact gap, and arrangement for selective input of light into photosensitive recording material
10/31/2002DE10120701A1 Verfahren zur Steuerung eines Prozeßgerätes zur sequentiellen Verarbeitung von Halbleiterwafern A method for controlling a process device for the sequential processing of semiconductor wafers
10/31/2002DE10064292C1 Vorrichtung zum Transportieren eines Filmes An apparatus for transporting a film
10/30/2002EP1253619A2 Charged particle beam exposure apparatus and device manufacturing method using same
10/30/2002EP1253601A2 Methods and devices for holding a mirror for use in X-ray optical systems
10/30/2002EP1253497A1 Method for adjusting processing parameters of plate-like objects in a processing tool
10/30/2002EP1253472A2 Alkaline developer for lithographic printing plate and method for preparing lithographic printing plate
1 ... 863 864 865 866 867 868 869 870 871 872 873 874 875 876 877 878 879 880 881 882 883 ... 1272