Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
11/2002
11/07/2002WO2002089192A1 Method of wet etching an inorganic antireflection layer
11/07/2002WO2002089149A1 Euvl multilayer structures
11/07/2002WO2002088858A1 Method for adjusting processing parameters of at least one plate-like object in a processing tool
11/07/2002WO2002088845A1 Resin composition, process for producing resin composition, and method of forming resin film
11/07/2002WO2002088843A2 Exposure method and apparatus
11/07/2002WO2002088687A1 Base stabilization system
11/07/2002WO2002088192A1 Photo-initiator compositions
11/07/2002WO2002088077A2 Resist compositions with polymers having pendant groups containing plural acid labile moieties
11/07/2002WO2002088036A1 Method for producing titania-doped fused silica extreme ultraviolet lithography substrates glass
11/07/2002WO2002087894A1 Method for thermally transferring oriented materials for organic electronic displays and devices
11/07/2002WO2002087882A1 Method and device for regenerative processing and printing
11/07/2002WO2002031595A3 Dissolution inhibitors in photoresist compositions for microlithography
11/07/2002US20020166107 Method and apparatus for generating masks utilized in conjunction with dipole illumination techniques
11/07/2002US20020165328 Base polymer containing an ester group to be decomposed to a carboxylic acid to become soluble in the developer for a photoresist used in fine working of a semiconductor using ultraviolet ray; heat resistance; optics; adhesion
11/07/2002US20020164873 Process and apparatus for removing residues from the microstructure of an object
11/07/2002US20020164590 Solid support for use in the determination, classification and mapping of biopolymer sequences
11/07/2002US20020164548 Using as photoresist a binder resin containing units of hydroxystyrene, a tert-butyl acrylate, and cyclic esters of (meth)acrylic acid such as isobornyl acrylate
11/07/2002US20020164546 Electronic chip on a wafer, by developing on the wafer a first mask at lower resolution, etching first mask under a first set of conditions to achieve a higher resolution mask, then using it as a hard mask for etching lower layer
11/07/2002US20020164545 Forming a semiconductive antireflection film on the rear of the substrate having a specified band gap energy and reflectance that satisfies an equation relating refractive indexes of the substrate and the film
11/07/2002US20020164543 Less residue attached to the sidewalls of the bi-layer after photoresist developement; non-photosensitive polymer layer and top photoresist layer formed over material layer to be patterned; dry etching using photoresist as mask
11/07/2002US20020164542 Photosensitive insulating paste composition and photosensitive film made therefrom
11/07/2002US20020164541 Photoresist comprising fluoroalkylated units of phthalimide and norbornene-based esters such as 2-methoxybutyl-2-adamantanyl 5-norbornene-2-carboxylate; etch resistance, heat resistance and adhesiveness
11/07/2002US20020164540 Chemical amplifying type positive resist composition
11/07/2002US20020164539 Controlled aging of photoresists for faster photospeed
11/07/2002US20020164538 Fluorine-containing styrene acrylate copolymers and use thereof in lithographic photoresist compositions
11/07/2002US20020164534 Method for producing metal mask and metal mask
11/07/2002US20020164414 Measuring concentration in tank; supplying to substrate; calibration; photolithography
11/07/2002US20020164065 System and method of providing mask defect printability analysis
11/07/2002US20020164064 System and method of providing mask quality control
11/07/2002US20020163793 EUV-transparent interface structure
11/07/2002US20020163741 Optical element holding device
11/07/2002US20020163738 Aberration correcting optical system
11/07/2002US20020163737 Illumination system with reduced energy loading
11/07/2002US20020163733 Dual-imaging optical system
11/07/2002US20020163730 Illumination optical system and laser processor having the same
11/07/2002US20020163649 Film thickness measuring method and apparatus, and thin film device manufacturing method and manufacturing apparatus using same
11/07/2002US20020163631 Lifting support assembly for an exposure apparatus
11/07/2002US20020163630 Movable support in a vacuum chamber and its application in lithographic projection apparatuses
11/07/2002US20020163629 Methods and apparatus employing an index matching medium
11/07/2002US20020163628 Transfer apparatus and transfer method
11/07/2002US20020163313 Pulse power system for extreme ultraviolet and x-ray sources
11/07/2002US20020163307 Short-arc discharge lamp
11/07/2002US20020163108 Process of producing plasma display panel
11/07/2002US20020162998 Positive-type, photosensitivity; flat panel displays
11/07/2002US20020162975 High output extreme ultraviolet source
11/07/2002US20020162791 Method for fabricating three dimensional structures
11/07/2002US20020162579 For removing unwanted film layers, such as a thick photoresist layer from a wafer surface after solder bumping
11/07/2002US20020162578 Wet dip method for photoresist and polymer stripping without buffer treatment step
11/07/2002US20020162469 Lithographic imaging with printing members having multiphase laser-responsive layers
11/07/2002DE10147011A1 Chemisch verstärkte Resistzusammensetzung und Verfahren zur Bildung eines gemusterten Films unter Verwendung derselben A chemically amplified resist composition and method for forming a patterned film using the same
11/07/2002DE10137859A1 Lithograph mit eindimensionaler Triggermaske und Verfahren zum Herstellen digitaler Hologramme in einem Speichermedium Lithograph with one-dimensional trigger mask and method of producing digital holograms in a storage medium
11/07/2002DE10121561A1 Bebilderung und Löschung einer Druckform aus Polymermaterial mit Imid-Gruppen Imaging and deletion of a printing form of polymer material with imide groups
11/07/2002DE10121347A1 Device for holding an optical element especially for semiconductor lithography has recesses in lens mount held at reduced pressure
11/07/2002DE10121346A1 Objektiv, insbesondere Projektionsobjektiv für die Halbleiter-Lithographie Lens, and in particular projection objective for semiconductor lithography
11/07/2002DE10117488A1 Flushing gas flow distributor for laser ablation, comprises a tube with spaced inlets at its closed end to give laminar flow towards its open end
11/07/2002DE10116059A1 Lithogroph mit bewegter Linse und Verfahren zum Herstellen digitaler Hologramme in einem Speichermedium Lithogroph with a moving lens and method for producing digital holograms in a storage medium
11/07/2002CA2445268A1 Photo-initiator compositions
11/07/2002CA2381021A1 Clock generator for an image-setting device
11/06/2002EP1255164A1 Lithographic apparatus
11/06/2002EP1255163A2 High output extreme ultraviolet source
11/06/2002EP1255162A1 Lithographic apparatus
11/06/2002EP1255161A1 Photosensitive resin composition
11/06/2002EP1254915A2 Acid-labile polymer and resist composition
11/06/2002EP1254780A2 Recording material and image forming method
11/06/2002EP1254768A2 Imaging and erasure of a printing form made from a polymer having imide groups
11/06/2002EP1254451A1 Magnetic pole fabrication process and device
11/06/2002EP1203427A4 High pulse rate pulse power system with liquid cooling
11/06/2002EP1166180A4 Semiconductor wafer processing system with vertically-stacked process chambers and single-axis dual-wafer transfer system
11/06/2002EP1082641B1 Photosensitive paste, substrate for plasma display panel using the same, and method of production of the substrate
11/06/2002EP1074043A4 Process for ashing organic materials from substrates
11/06/2002EP0818515B1 Waterborne photosensitive resin composition
11/06/2002CN1378662A Composite relief image printing elements
11/06/2002CN1378661A Polymer for chemically amplified resist and resist composition using same
11/06/2002CN1378239A Optical mask structure and microphotograph process
11/06/2002CN1378103A Clamping piece for clamping printed circuit board to explosure
11/06/2002CN1378102A Method for reducing optical proximity effect
11/06/2002CN1378101A Control method for forming small section oblique angle in metal film electrode and its product
11/06/2002CN1377900A Free-radical polymerised compound
11/06/2002CN1093945C Device for light exposure double-sided printed circuit plate through wiring artworks
11/05/2002US6477700 Reticle having discriminative pattern narrower in pitch than the minimum pattern width but wider than minimum width in the pattern recognition
11/05/2002US6477440 Methods of treating a semiconductor wafer
11/05/2002US6477225 X-ray mask and method for providing same
11/05/2002US6477193 Extreme repetition rate gas discharge laser with improved blower motor
11/05/2002US6477192 Device for on-line control of output power of vacuum-UV laser
11/05/2002US6476917 Pattern reading apparatus
11/05/2002US6476913 Inspection method, apparatus and system for circuit pattern
11/05/2002US6476905 Step and scan exposure system equipped with a plurality of attenuator blades for exposure control
11/05/2002US6476904 Projection exposure method and apparatus
11/05/2002US6476402 Apparatus for pyroelectric emission lithography using patterned emitter
11/05/2002US6476401 Moving photocathode with continuous regeneration for image conversion in electron beam lithography
11/05/2002US6476400 Method of adjusting a lithography system to enhance image quality
11/05/2002US6476382 System and method for measuring the size of a focused optical spot
11/05/2002US6476381 Nano-pattern lithographic fabrication using pulled micro-pipette and method thereof
11/05/2002US6476240 Polymers derived from an unsaturated fused cyclic hydrocarbon (such as perhydro-2,3-didehydro-1,4:5,8-dimethanonaphthalene) joined by a linker to an ester group having one or two protected hydroxyls; use as photoresist
11/05/2002US6476092 Photopolymerizable composition containing a polymerizable acrylic compound with hetero-substituted methyl or halo-substituted methyl at the alpha position
11/05/2002US6475966 Plasma etching residue removal
11/05/2002US6475921 Mask for producing rectangular openings in a substrate
11/05/2002US6475880 Cassette invertor method
11/05/2002US6475811 System for and method of using bacteria to aid in contact hole printing
11/05/2002US6475708 Alkylene carbonate; organic peroxide; n-substituted morpholine; additional component selected from the group consisting of: 2-(2- aminoethoxy) ethanol; propylene glycol monomethyl ether; isopropyl alcohol; and benzyl alcohol.
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