G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor

Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
11/2002
11/14/2002	US20020168494 Decoloring dyes
11/14/2002	US20020168191 Substrate processing system and substrate processing method
11/14/2002	US20020168049 Method and apparatus for generating high output power gas discharge based source of extreme ultraviolet radiation and/or soft x-rays
11/14/2002	US20020167986 Gas discharge ultraviolet laser with enclosed beam path with added oxidizer
11/14/2002	US20020167975 Laser spectral engineering for lithographic process
11/14/2002	US20020167788 Apparatus for exposing a face of a printed circuit panel
11/14/2002	US20020167740 Lens system, in particular a projection lens system for semiconductor lithography
11/14/2002	US20020167737 Catadioptric reduction lens
11/14/2002	US20020167734 Catadioptric projection objective
11/14/2002	US20020167675 Interferometer system
11/14/2002	US20020167653 Lithography apparatus
11/14/2002	US20020167651 Lithographic apparatus, device manufacturing method, and device manufactured thereby
11/14/2002	US20020167650 Projection optical system and exposure apparatus with the same
11/14/2002	US20020167649 Backside alignment system and method
11/14/2002	US20020167622 Liquid crystal display apparatus and method of manufacturing the same
11/14/2002	US20020167584 Method and apparatus for exposing printing forms
11/14/2002	US20020167117 Depositing film on substrate to provide a mold having a protruding feature and recess; urging mold into film whereby thickness of film under protruding feature is reduced and thin region is formed in film; removing mold; processing relief
11/14/2002	US20020166982 Exposure method, plane alignment method, exposure apparatus, and device manufacturing method
11/14/2002	US20020166978 Aligner
11/14/2002	US20020166882 Ticket dispensing modules and method
11/14/2002	US20020166468 Patterning mask and method
11/14/2002	DE10207053A1 Clock generator for imaging device, compares actual value signal and nominal value signal representing angular position of printing form
11/14/2002	DE10120659A1 Structuring of photoresist layer in integrated circuit manufacture involves exposing photoresist layer comprising film-forming polymer and photosensitive acid generator to light, contacting layer with base and developing after heating
11/13/2002	EP1256849A1 Method of calibrating a lithographic apparatus
11/13/2002	EP1256848A2 Optical exposure method and lithographic projection apparatus
11/13/2002	EP1256847A1 Lithographic apparatus with purge gas system
11/13/2002	EP1256846A2 Optical proximity correction
11/13/2002	EP1256845A2 Cylindrical outer surface scanning apparatus
11/13/2002	EP1256844A1 Lithographic apparatus
11/13/2002	EP1256843A1 Method of calibrating a lithographic apparatus
11/13/2002	EP1256842A2 Film rewinder
11/13/2002	EP1256734A1 Hydrostatic gas bearing, hydrostatic gas bearing device for use in vacuum environment, and gas recovering method for the hydrostatic gas bearing device
11/13/2002	EP1256461A2 Method of processing planographic printing plate and plate processed by this method
11/13/2002	EP1256444A1 Positive-working lithographic printing plate precursor
11/13/2002	EP1256149A1 Electric discharge laser with acoustic chirp correction
11/13/2002	EP1256033A1 Zoom illumination system for use in photolithography
11/13/2002	EP1256032A1 Liquid, radiation-curable composition, especially for stereolithography
11/13/2002	EP1256031A2 Apparatus and method of cleaning reticles for use in a lithography tool
11/13/2002	EP1152839B1 Method and device for treating substrates
11/13/2002	EP1144198B1 Thermal transfer element for forming multilayer devices
11/13/2002	EP1137969A4 Method of using a modulated exposure mask
11/13/2002	EP1089799A4 Apparatus and method for recovering photoresist developers and strippers
11/13/2002	EP0942329B1 Novel process for preparing resists
11/13/2002	EP0916175B1 A gas discharge laser having an electrostatic precipitator
11/13/2002	EP0808480B1 Photoactive compounds
11/13/2002	CN1379968A Production of dense mist of micrometric droplets in particular for extreme UV lithography
11/13/2002	CN1379866A Beam positioning in microlithographic writing
11/13/2002	CN1379445A Miniaturization process for reducing size of contact window
11/13/2002	CN1379442A Miniaturization process for multi-layer thin photoresist
11/13/2002	CN1379441A Method for decreasing side lobes of miniaturization process
11/13/2002	CN1379288A Etching method and quantitative analysis method of etching liquid
11/13/2002	CN1379287A Press plate picture making equipment having offner type optical utensil
11/13/2002	CN1379286A 曝光装置 Exposure device
11/13/2002	CN1379285A Manufacturing device and method of refined developing liquid
11/13/2002	CN1379284A Manufacturing method of pattern form and photomask membrane used in said method
11/13/2002	CN1379070A Low foaming N,N'-dialkyltartraimine wetting agent
11/13/2002	CN1379069A Low foaming N,N'-dialkyl malic imine wetting agent
11/13/2002	CN1379060A Protective film composition for cylindrical shock insulator of liquid crystal display element
11/13/2002	CN1378917A Resin relief plate for forming film
11/13/2002	CN1094208C 光敏正作用光敏组合物及其生产方法 Photosensitive positive working photosensitive composition and production method thereof
11/13/2002	CN1094201C 微量改变透镜赤道直径的可变焦距透镜 Trace varying lens equatorial diameter of the zoom lens
11/12/2002	US6481004 Circuit pattern design method, exposure method, charged-particle beam exposure system
11/12/2002	US6480518 Synthetic quartz glass member for use in ArF excimer laser lithography
11/12/2002	US6480369 System for receiving and retaining a substrate
11/12/2002	US6480330 Ultraviolet polarization beam splitter for microlithography
11/12/2002	US6480324 Methods involving direct write optical lithography
11/12/2002	US6480283 Lithography system using quantum entangled photons
11/12/2002	US6480279 Inspection method, apparatus and system for circuit pattern
11/12/2002	US6480263 Apparatus and method for phase shift photomasking
11/12/2002	US6480262 Illumination optical apparatus for illuminating a mask, method of manufacturing and using same, and field stop used therein
11/12/2002	US6480261 Photolithographic system for exposing a wafer using a programmable mask
11/12/2002	US6480260 Mask clamping apparatus, e.g. for a lithographic apparatus
11/12/2002	US6479991 Stage mechanism, exposure apparatus and device manufacturing method in which a coil unit of a driving mechanism is moved substantially in synchronism with a stage
11/12/2002	US6479924 Ferroelectric emitter
11/12/2002	US6479904 Semiconductor device with registration accuracy measurement mark
11/12/2002	US6479884 Interim oxidation of silsesquioxane dielectric for dual damascene process
11/12/2002	US6479879 Low defect organic BARC coating in a semiconductor structure
11/12/2002	US6479832 Surface height detecting apparatus and exposure apparatus using the same
11/12/2002	US6479830 Low-sputter-yield coating for hardware near laser-produced plasma
11/12/2002	US6479820 Electrostatic charge reduction of photoresist pattern on development track
11/12/2002	US6479706 Aminobenzophenones and photopolymerizable compositions including the same
11/12/2002	US6479596 Epoxy acrylates
11/12/2002	US6479401 Method of forming a dual-layer anti-reflective coating
11/12/2002	US6479219 Polymers having silicon-containing acetal or ketal functional groups
11/12/2002	US6479217 Photosensitive recording; applying actinic radiation; photopolymerization
11/12/2002	US6479215 Photosensitive resin plate for letterpress printing
11/12/2002	US6479213 Polysiloxane synthesized by the reaction of a silane compound having an amino group with an aromatic acid anhydride and a copolymerization alkali soluble siloxane component
11/12/2002	US6479212 Photosensitive resin, resist composition using the photosensitive resin, pattern formation method using the resist composition, device produced by the pattern formation method, and exposure method
11/12/2002	US6479211 Positive photoresist composition for far ultraviolet exposure
11/12/2002	US6479210 Comprising an organic material containing substituent(s) capable of being released in the presence of acid, and acid generators of at least one onium salt and sulfone and/or sulfonate compounds; resolution, sensitivity
11/12/2002	US6479209 Positive photosensitive composition suitably used when the exposure light source used is a far ultraviolet beam of 250 nm or less
11/12/2002	US6479201 Optical exposure apparatus of scanning exposure system and its exposing method
11/12/2002	US6479200 Providing a library of optical characteristic traces, each of which corresponds to a grating structure comprised of a plurality of photoresist features having a known profile
11/12/2002	US6479018 Detection of a gaseous substance emanating from a layer of polymeric composition
11/12/2002	US6478974 Microfabricated filter and shell constructed with a permeable membrane
11/12/2002	US6478484 Feed-forward mechanism from latent images to developer system for photoresist linewidth control
11/12/2002	US6477908 Pedestal with vibration sensor, and exposure apparatus having the same
11/12/2002	CA2091903C Copolymerization process and optical copolymer produced therefrom
11/07/2002	WO2002089198A1 Method for controlling a process device for sequential processing of semiconductor wafers
11/07/2002	WO2002089193A1 Method of wet etching a silicon and nitrogen containing material

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