G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor

Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
11/2002
11/20/2002	EP1258915A1 Method of detecting defects on a semiconductor device in a processing tool and an arrangement therefore
11/20/2002	EP1258834A1 Method for performing an alignment measurement of two patterns in different layers on a semiconductor wafer
11/20/2002	EP1258781A2 Interferometer system
11/20/2002	EP1258780A2 Optical imaging system with polarising means and crystalline quartz plate therefor
11/20/2002	EP1258369A2 A positive type photosensitive image-forming material for an infrared laser and a positive type photosensitive composition for an infrared laser
11/20/2002	EP1258351A2 Photosensitive composition, photosensitive lithographic printing plate, and process for producing lithographic printing plate
11/20/2002	EP1258288A2 Method and apparatus for chemical and biochemical reactions using photo-generated reagents
11/20/2002	EP1258060A1 Fast wavelength correction technique for a laser
11/20/2002	EP1258059A1 Bandwidth control technique for a laser
11/20/2002	EP1257924A1 Process monitoring system for lithography lasers
11/20/2002	EP1257882A2 Device for detecting wave fronts
11/20/2002	EP1257881A1 Laser imaged printing plates comprising a multi-layer slip film
11/20/2002	EP1257880A2 Resist materials for 157-nm lithography
11/20/2002	EP1257879A2 Radiation sensitive copolymers, photoresist compositions thereof and deep uv bilayer systems thereof
11/20/2002	EP1257878A1 A mold for nano imprinting
11/20/2002	EP1257613A2 Near infrared sensitive photopolymerizable composition
11/20/2002	EP1124832B1 Oxime derivatives and the use thereof as latent acids
11/20/2002	CN1380993A Polymers containing oyxgen and sulfur alicylic units and photoresist compositions comprising same
11/20/2002	CN1380888A Hydrogenated ring-opening metathesis copolymer and process for producing the same
11/20/2002	CN1380584A Exposure method for forming IC chip image in intermeidate mask using main mask
11/20/2002	CN1380583A Printing plate making method by using column image machine to make column image PS plate
11/20/2002	CN1380245A Production method of millimetric wave voltage-controlled phase shifter for microelectronic machine
11/20/2002	CN1094655C Forming polyimide coatings by screen printing method
11/20/2002	CN1094604C Colored photosensitive resin composition
11/19/2002	US6484183 Method and system for providing a polymorphism database
11/19/2002	US6484060 Layout for measurement of overlay error
11/19/2002	US6483936 Monitor pattern for photolithography
11/19/2002	US6483639 Optical system for integrated circuit fabrication
11/19/2002	US6483638 Ultra-broadband UV microscope imaging system with wide range zoom capability
11/19/2002	US6483591 Pattern reading apparatus
11/19/2002	US6483580 Spectroscopic scatterometer system
11/19/2002	US6483575 Image forming device and method for processing photosensitive media having microencapsulated imaging material
11/19/2002	US6483574 Lithography system with variable area substrate tiling
11/19/2002	US6483573 Projection exposure system and an exposure method in microlithography
11/19/2002	US6483569 Exposure method and exposure apparatus
11/19/2002	US6483120 Control system for a charged particle exposure apparatus
11/19/2002	US6483117 Symmetric blanking for high stability in electron beam exposure systems
11/19/2002	US6483083 Heat treatment method and a heat treatment apparatus for controlling the temperature of a substrate surface
11/19/2002	US6483071 Method and system for precisely positioning a waist of a material-processing laser beam to process microstructures within a laser-processing site
11/19/2002	US6482868 Accelerators useful for energy polymerizable compositions
11/19/2002	US6482742 Fluid pressure imprint lithography
11/19/2002	US6482662 Semiconductor device fabricating method
11/19/2002	US6482578 Aqueous developer for negative working lithographic printing plates
11/19/2002	US6482577 Method of forming a positive image through infrared exposure utilizing diazonaphthoquinone imaging composition
11/19/2002	US6482576 Surface smoothing of stereolithographically formed 3-D objects
11/19/2002	US6482575 Method of preparing barrier rib master pattern for barrier rib transfer and method of forming barrier ribs
11/19/2002	US6482573 Exposure correction based on reflective index for photolithographic process control
11/19/2002	US6482571 On-press development of thermosensitive lithographic plates
11/19/2002	US6482570 Method for producing lithographic printing plate
11/19/2002	US6482569 Process for forming a polyimide pattern with photosensitive composition for i-line stepper
11/19/2002	US6482568 Radiation-sensitive resin composition
11/19/2002	US6482567 Oxime sulfonate and N-oxyimidosulfonate photoacid generators and photoresists comprising same
11/19/2002	US6482566 Hydroxycarborane photoresists and process for using same in bilayer thin film imaging lithography
11/19/2002	US6482565 Photoresist cross-linker and photoresist composition comprising the same
11/19/2002	US6482564 Disposing active primer between receptor substrate and a thermal transfer donor; disposing transfer assist layer on active primer; selectively thermally transferring portion of transfer layer from donor to receptor
11/19/2002	US6482559 Method of optical proximity correction
11/19/2002	US6482558 Conducting electron beam resist thin film layer for patterning of mask plates
11/19/2002	US6482556 Thermosensible transfer film and method of using the same
11/19/2002	US6482555 For making a mask for optically transferring a lithographic pattern corresponding to an integrated circuit from the mask onto semiconductor substrate, using an optical exposure tool
11/19/2002	US6482554 Method for manufacturing a semiconductor device, photolithography mask and method for manufacturing the same
11/19/2002	US6482552 Reticle forming methods
11/19/2002	US6482551 Optical article and process for forming article
11/19/2002	US6482472 Method for producing a photopolymerizing lithographic plate including coating and conveying a web using rubber rollers before and after the coating step
11/19/2002	US6481119 Apparatus for removing organic antireflection coating
11/19/2002	CA2071147C Gas pyrolysis forming technique of a mostly oxygen and silicon-based coating
11/18/2002	CA2380985A1 Image-recording device for generating a number of image spots in a projection line
11/14/2002	WO2002091807A1 High flux, high energy photon source
11/14/2002	WO2002091449A2 Etching a substrate in a process zone
11/14/2002	WO2002091440A1 Optical characteristic measuring method, exposure method, and device manufacturing method
11/14/2002	WO2002091422A2 Raster shaped beam, electron beam exposure strategy using a two dimensional multiplexel flash field
11/14/2002	WO2002091084A2 Resist with reduced line edge roughness
11/14/2002	WO2002091083A1 Photoimageable composition
11/14/2002	WO2002091082A1 Positive photosensitive resin compositions and semiconductor device
11/14/2002	WO2002091081A2 Functionalising polymeric materials
11/14/2002	WO2002091080A1 Organic bottom antireflective coating for high performance mask making optical imaging
11/14/2002	WO2002091079A1 Photo mask, production method of the same, pattern forming method using the photo mask
11/14/2002	WO2002091078A1 Methods and apparatus employing an index matching medium
11/14/2002	WO2002091057A1 Systems and methods for scanning a beam of light across a specimen
11/14/2002	WO2002091030A2 Method and apparatus for manufacturing plastic optical lenses and molds
11/14/2002	WO2002090423A1 Polysiloxane, process for production thereof and radiation-sensitive resin composition
11/14/2002	WO2002080233A3 Process and apparatus for removing residues from the microstructure of an object
11/14/2002	WO2002073699A3 Nanofabrication
11/14/2002	WO2002069045A3 Anti-reflective coating material, semiconductor product with an arc layer and methods
11/14/2002	WO2002048797A3 Exposure apparatus and method using active tiling
11/14/2002	US20020170021 Process control using three dimensional reconstruction metrology
11/14/2002	US20020169266 Polymeric compound and resin composition for photoresist
11/14/2002	US20020169226 Phenolic resins for use as permanent mask resist pattern; heat resistance, humidity-heat resistance, adhesibility, mechanical properties, and electrical properties
11/14/2002	US20020168876 Contact planarization using nanoporous silica materials
11/14/2002	US20020168839 Resist pattern having accurate recess while preventing diffraction of light
11/14/2002	US20020168838 Method for performing lithographic process to a multi-layered photoresist layer
11/14/2002	US20020168594 Method for reducing roughness of photoresist through cross-linking reaction of deposit and photoresist
11/14/2002	US20020168593 Photolithography; forming patterns using polarized light; development
11/14/2002	US20020168591 Rapid thermal oxidation; etching
11/14/2002	US20020168590 Method of forming storage nodes in a DRAM
11/14/2002	US20020168589 Controlling patterns; conformal layer before photoresist
11/14/2002	US20020168585 Method of designing photosensitive composition and lithography process
11/14/2002	US20020168584 Photopolymerization using acid generator
11/14/2002	US20020168583 Resolution, sensitivity
11/14/2002	US20020168581 Silicon-containing polymer, resist composition and patterning process
11/14/2002	US20020168578 Adjustment windows; accuracy design; preventing erasing

1 ... 860 861 862 863 864 865 866 867 868 869 870 871 872 873 874 875 876 877 878 879 880 ... 1272