Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
11/2013
11/06/2013CN203277341U Photo mask box
11/06/2013CN203275877U Industrial image aligning device
11/06/2013CN203275876U Micromotion working platform of silicon wafer platform of a photoetching machine
11/06/2013CN203275875U Exposure machine provided with mechanical arm
11/06/2013CN203275874U Exposure machine cabinet frame
11/06/2013CN203275873U Humidification mechanism in exposure machine cabinet frame
11/06/2013CN203275872U Photoresist coating device and photoresist coating system
11/06/2013CN203275699U Bandwidth-controllable fiber grating inscription device
11/06/2013CN103384850A Positive photoresist composition, coating film thereof, and novolac phenol resin
11/06/2013CN103384450A Method for manufacturing circuit board with patterned conducting layer
11/06/2013CN103383980A Method for preparing orderly gallium nitride nano pillar array with ultraviolet soft imprinting
11/06/2013CN103383531A Mask alignment device and photoetching device using same
11/06/2013CN103383530A Positive photoresist-cleaning agent composition
11/06/2013CN103383529A Positive photo-resist removing solution composition
11/06/2013CN103383528A Environmental system including vaccum scavange for an immersion lithography apparatus
11/06/2013CN103383527A Environmental system including vaccum scavange for an immersion lithography apparatus
11/06/2013CN103383526A Coarse/precision laminated workbench
11/06/2013CN103383525A Lithography apparatus having dual reticle edge masking assemblies and method of use
11/06/2013CN103383524A Defocus measuring method for photoetching equipment
11/06/2013CN103383523A Photomask, image transfer method and manufacturing method of flat panel display
11/06/2013CN103383522A Photo mask, pattern transfer method and flat panel display manufacturing method
11/06/2013CN103381327A 过滤器装置 Filter means
11/06/2013CN102880004B Photoinduced polymer holographic recording material and preparation method thereof
11/06/2013CN102778811B Preparation method of nickel oxide based memory film fine pattern
11/06/2013CN102749804B Optical cemented component manufacturing method
11/06/2013CN102692812B Extreme UV-Light photomask, manufacturing method for the same, and method for patterning base material
11/06/2013CN102666732B Compound and color filter
11/06/2013CN102629082B Design method of extreme ultra-violet lithography compound eye lighting system
11/06/2013CN102585066B Poly (methyl) acrylate oligomer containing vinyl ether functional group
11/06/2013CN102566297B Photoetching system
11/06/2013CN102566277B Cationic polymerization imaging composition for high-sensitive photopolymerization plate
11/06/2013CN102540749B Photoetching method
11/06/2013CN102495468B Projection objective structural optimization method for reducing deformation of extreme ultra-violet lithography system
11/06/2013CN102468274B Shadow effect analyzing structure, and forming method and analyzing method thereof
11/06/2013CN102466981B Method for testing linewidth uniformity
11/06/2013CN102460300B Photopolymerizable resin composition
11/06/2013CN102436142B Black photosensitive resin composition and light blocking layer using the same
11/06/2013CN102402123B Method for monitoring focal length of photoetching machine
11/06/2013CN102395924B Photosensitive resin composition, photosensitive element utilizing the composition, method for formation of resist pattern, and process for production of printed circuit board
11/06/2013CN102378935B Imaging optics and projection exposure installation for microlithography with an imaging optics of this type
11/06/2013CN102346380B Method for optimizing photoetching configuration parameters based on normalization steepest descent method
11/06/2013CN102346379B Method for optimizing photoetching configuration parameters based on steepest descent method
11/06/2013CN102323726B Method for realizing high-precision gray scale exposure by scanning
11/06/2013CN102269937B Online detection device and method for wave aberration of projection objective of photoetching machine
11/06/2013CN102260870B Preparation method of sub-micron-sized two-dimensional dielectric cylindrical photonic crystal
11/06/2013CN102253521B Liquid crystal display device and manufacturing method thereof
11/06/2013CN102227474B Resin composition and display device formed using same
11/06/2013CN102203677B Exposure unit and method for exposing substrate
11/06/2013CN102193327B Lithographic apparatus and device manufacturing method
11/06/2013CN102193312B Curing composition, color filter and manufacturing method thereof, liquid crystal display and image display apparatus
11/06/2013CN102142445B Array substrate of active component and production method thereof
11/06/2013CN102073221B System and method for in situ lens cleaning in immersion lithography
11/06/2013CN102053503B Determination method of mask pattern and effective light source distribution
11/06/2013CN101918397B Photoactive compound and photosensitive resin composition comprising the same
11/06/2013CN101833247B Measuring system for the optical measurement of projecting object lens of micro-lithography projection exposure system
11/06/2013CN101730865B Vaccum suction frame for ultraviolet rays exposure apparatus
11/06/2013CN101576718B Immersion lithographic apparatus, drying device, immersion measuring apparatus and method of manufacturing the device
11/05/2013US8577529 Control apparatus for vehicle
11/05/2013US8576485 Photo-induced dichroic polarizers and fabrication methods thereof
11/05/2013US8576375 Optical member-holding apparatus, method for adjusting position of optical member, and exposure apparatus
11/05/2013US8575575 System, method and apparatus for laser produced plasma extreme ultraviolet chamber with hot walls and cold collector mirror
11/05/2013US8575288 Photocurable resin composition for forming overcoats RGB pixels black matrixes or spacers in color filter production, and color filters
11/05/2013US8574824 Sub-wavelength lithography via rabi oscillations
11/05/2013US8574823 Multi-level layer
11/05/2013US8574821 MEMS fabrication process base on SU-8 masking layers
11/05/2013US8574820 Method for fabricating semiconductor device
11/05/2013US8574819 Method for forming fine pattern
11/05/2013US8574818 Method for preparing a photo-crosslinkable composition
11/05/2013US8574817 Positive resist composition and patterning process
11/05/2013US8574816 Positive resist composition and patterning process
11/05/2013US8574815 Patterning nano-scale patterns on a film comprising unzipping copolymers
11/05/2013US8574814 Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the composition
11/05/2013US8574813 Resist composition for immersion exposure and method of forming resist pattern
11/05/2013US8574812 Resist composition and method for producing resist pattern
11/05/2013US8574811 Resist composition and method for producing resist pattern
11/05/2013US8574810 Dual tone development with a photo-activated acid enhancement component in lithographic applications
11/05/2013US8574809 Positive resist composition and method of forming resist pattern
11/05/2013US8574794 Photosensitive resin composition
11/05/2013US8574714 Method of manufacturing an engraved plate
11/05/2013US8573120 Apparatus for thermal development with supporting surface for a development medium
10/2013
10/31/2013WO2013163100A1 Photosensitive, developer-soluble bottom anti-reflective coating material
10/31/2013WO2013162829A1 Photocurable composition
10/31/2013WO2013162821A1 Dark field diffraction based overlay
10/31/2013WO2013162015A1 Light-curing/heat-curing resin composition, hardened material, and printed circuit board
10/31/2013WO2013161976A1 Radiation sensitive composition, light-blocking film and solid-state imaging element
10/31/2013WO2013161968A1 Photosensitive resin composition, cured product, interlayer insulating film, tft active matrix substrate and liquid crystal display device
10/31/2013WO2013161943A1 Production method for permanent film for optical material, cured film produced thereby, and organic el display device and liquid-crystal display device using same
10/31/2013WO2013161942A1 Production method for permanent film for optical material, cured film produced thereby, and organic el display device and liquid-crystal display device using same
10/31/2013WO2013161862A1 Chemically amplified positive photosensitive resin composition, method for manufacturing hardened film, hardened film, organic el display device, and liquid-crystal display device
10/31/2013WO2013161861A1 Photosensitive resin composition, method for forming cured film, cured film, organic el display device, and liquid-crystal display device
10/31/2013WO2013161858A1 Controller, stage device, exposure device, and control method
10/31/2013WO2013161829A1 Partial hydrolysis condensation product, ink-repellent agent, negative-type photosensitive resin composition, cured film, partition wall, and optical element
10/31/2013WO2013161803A1 Solder resist composition, cured film, and method for producing cured film
10/31/2013WO2013161756A1 Photosensitive resin composition, photosensitive film, permanent mask resist and process for producing permanent mask resist
10/31/2013WO2013161616A1 Color material dispersion for color filter, colored resin composition for color filter, color filter, liquid-crystal display device, and organic light-emitting display device
10/31/2013WO2013161605A1 Pattern forming method, pattern forming apparatus, and non-transitory computer-readable recording medium
10/31/2013WO2013161372A1 Composition for forming silicon-containing euv resist lower layer film including additive
10/31/2013WO2013160652A1 A method for photoimaging a substrate
10/31/2013WO2013160256A1 Optical component for guiding a radiation beam
10/31/2013WO2013160123A1 Lithographic apparatus comprising an actuator, and method for protecting such actuator
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