G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor

Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
11/2002
11/26/2002	US6485890 Lithographic printing forms
11/26/2002	US6485887 Amplification
11/26/2002	US6485886 Oxime derivatives and the use thereof as latent acids
11/26/2002	US6485885 Photopolymerizable thermosetting resin compositions
11/26/2002	US6485884 Emitting polarized light; positioning emitter sheets between electrodes
11/26/2002	US6485883 Mixture of polymer and compound which generated an acid
11/26/2002	US6485782 Coating film forming method and coating apparatus
11/26/2002	US6485576 Method for removing coating bead at wafer flat edge
11/26/2002	US6485568 Apparatus for coating substrates with materials, particularly for lacquering si-wafers
11/26/2002	US6485306 Locus-recordable portable handwriting device
11/26/2002	US6485153 Exposure apparatus and method
11/26/2002	US6485130 Bonding process
11/26/2002	US6484638 Method of offset printing with a reusable substrate
11/21/2002	WO2002093906A1 A tdi detecting device, a feed-through equipment and electron beam apparatus using these devices
11/21/2002	WO2002093703A1 Improved fan for gas discharge laser
11/21/2002	WO2002093702A1 Gas discharge laser with improved beam path
11/21/2002	WO2002093700A1 Laser spectral engineering for lithographic process
11/21/2002	WO2002093699A1 FOUR KHz GAS DISCHARGE LASER SYSTEM
11/21/2002	WO2002093639A2 Arrangement and method for detecting defects on a substrate in a processing tool
11/21/2002	WO2002093626A1 Aligning method and aligner, and method and system for conveying substrate
11/21/2002	WO2002093567A2 Focus error correction method and apparatus
11/21/2002	WO2002093485A1 Method for performing an alignment measurement of two patterns in different layers on a semiconductor wafer
11/21/2002	WO2002093265A1 Devices and methods for exposure of photoreactive compositions with light emitting diodes
11/21/2002	WO2002093264A1 Developer for alkaline-developable lithogaphic printing plates
11/21/2002	WO2002093263A1 Photoresist composition for deep ultraviolet lithography
11/21/2002	WO2002093262A1 Thick film photoresists and methods for use thereof
11/21/2002	WO2002093261A1 Use of partially fluorinated polymers in applications requiring transparency in the ultraviolet and vacuum ultraviolet
11/21/2002	WO2002093260A1 Mask and production method therefor, optical element and production method therefor, and illuminating opticdal device provided with the optical element and exposure system
11/21/2002	WO2002093259A1 Rule base opc evaluating method, and simulation base opc model evaluating method
11/21/2002	WO2002093258A1 Method for producing stamping tools
11/21/2002	WO2002093257A2 Microlithographic projection illumination system
11/21/2002	WO2002093256A1 Imaging materials comprising electrically conductive polymer particle layers
11/21/2002	WO2002093255A2 Photosensitive coloring compositon, color filter using the compositon and method of producing the same
11/21/2002	WO2002093254A1 Lithography system and method for device manufacture
11/21/2002	WO2002093253A1 Backside alignment system and method
11/21/2002	WO2002093209A2 Lens system consisting of fluoride crystal lenses
11/21/2002	WO2002093201A2 Preferred crystal orientation optical elements from cubic materials
11/21/2002	WO2002092651A1 Polymer suitable for photoresist compositions
11/21/2002	WO2002092559A1 Fluorinated triphenylsulfonium salts
11/21/2002	WO2002092352A1 High resolution laserable assemblages for laser-induced thermal image transfer
11/21/2002	WO2002078049A3 Multi-spectral uniform light source
11/21/2002	WO2002073307A3 Thermally cured underlayer for lithographic application
11/21/2002	WO2002050613A3 Method of curing a photosensitive material using evanescent wave energy
11/21/2002	WO2002039186A3 Photoacid generators in photoresist compositions for microlithography
11/21/2002	WO2002033489A3 Compositions for microlithography
11/21/2002	WO2002015252A3 A method for producing a metal film, a thin film device having such metal film and a liquid crystal display device having such thin film device
11/21/2002	US20020173680 Polymer containing spirocyclic olefin monomers, such as 2,5-dioxo-5',6'-didehydro-spiro(tetrahydrofuran-3,2'-norbornane); forming relief images
11/21/2002	US20020173609 Silicon-containing polymer and bilayer resist composition based thereon
11/21/2002	US20020173156 Adjustment concentration of ozone dissolved in acid solution; corrosion resistance
11/21/2002	US20020173151 Removal photoresist; applying pressure sensitive adhesive; releasing
11/21/2002	US20020172901 Method of exposing a lattice pattern onto a photo-resist film
11/21/2002	US20020172897 Mask layer is deposited via evaporation, patterning, then reactive ion etching, then dissolving remaining photoresis; photolithography
11/21/2002	US20020172896 Antireflective coating compositions
11/21/2002	US20020172895 Vapor phase surface modification of composite substrates to form a molecularly thin release layer
11/21/2002	US20020172894 Large bandwidth, polarization insensitive, low loss devices for multi-channel broadcasting
11/21/2002	US20020172891 Employs dampening water; images formed via infrared laser irradiation
11/21/2002	US20020172890 Electron beam projection utilizing multiple exposures with different current densities
11/21/2002	US20020172889 Comprises support having water-wettable surface and heat-sensitive layer which exhibits high sensitivity and is fit for scanning exposure based on digital signals
11/21/2002	US20020172888 For lithographic printing plates comprising hydrophilic anodized aluminum base; adhesion; porosity
11/21/2002	US20020172887 Electroluminescence; optics; electronics
11/21/2002	US20020172886 Acid generators; for the production of semiconductor integrated circuits, photoresists
11/21/2002	US20020172885 For increasing sensitivity of photoresist useful for microfabrication of integrated circuits utilizing deep ultraviolet rays (from excimer lasers) and x-rays; resolution; profile
11/21/2002	US20020172876 Method of calibration of a lithographic apparatus, mask for use in calibration of lithographic apparatus, lithographic apparatus, device manufacturing method, device manufactured thereby
11/21/2002	US20020172875 High performance, photoimageable resin compositions and printing plates prepared therefrom
11/21/2002	US20020172873 Copolymer containing hydroxyalkyl meth(acrylate), a (meth)acrylic acid having been partially reacted through carboxy group and hydroxyalkyl(meth)acrylate reacted through hydroxy group with (meth)acryloylalkyl isocyanate compound
11/21/2002	US20020172411 Method and apparatus for inspection by pattern comparison
11/21/2002	US20020172048 Lamp locking mechanism
11/21/2002	US20020171944 Condenser optical system and illumination optical apparatus provided with the optical system
11/21/2002	US20020171922 Multilayer reflective mirrors for EUV, wavefront-aberration-correction methods for same, and EUV optical systems comprising same
11/21/2002	US20020171844 Cyclic error reduction in average interferometric position measurements
11/21/2002	US20020171828 Method and system for controlling the photolithography process
11/21/2002	US20020171818 Optical exposure method, device manufacturing method and lithographic projection apparatus
11/21/2002	US20020171817 Lithography device wich uses a source of radiation in the extreme ultraviolet range and multi-layered mirrors with a broad spectral band in this range
11/21/2002	US20020171816 Computer architecture for and method of high-resolution imaging using a low-resolution image transducer
11/21/2002	US20020171815 Method for manufacturing exposure apparatus and method for manufacturing micro device
11/21/2002	US20020171188 Holder for holding a printed circuit for exposure to light
11/21/2002	US20020171048 Mirror projection system for a scanning lithographic projection apparatus, and lithographic apparatus comprising such a system
11/21/2002	US20020171047 Integrated laser diode array and applications
11/21/2002	US20020171029 TEM modes of nanowire arrays for use in photolithography
11/21/2002	US20020171028 Focus error correction method and apparatus
11/21/2002	US20020170907 Heating device, method for evaluating heating device and pattern forming method
11/21/2002	US20020170897 Methods for preparing ball grid array substrates via use of a laser
11/21/2002	US20020170880 Scanning probe based lithographic alignment
11/21/2002	US20020170879 Methods and apparatus for forming submicron patterns on films
11/21/2002	US20020170878 Etching resistance of protein-based photoresist layers
11/21/2002	DE10209594A1 Verfahren zum Bilden einer Maske für Ladungsteilchenstrahl- Belichtung und Programm zum Verarbeiten von Strukturdaten zum Bilden einer derartigen Maske A method for forming a mask for exposure and Ladungsteilchenstrahl- program for processing data structure for forming such a mask
11/21/2002	DE10124566A1 Optisches Abbildungssystem mit Polarisationsmitteln und Quarzkristallplatte hierfür Optical imaging system with polarization means and quartz crystal plate this
11/21/2002	DE10124474A1 Microlithographic exposure involves compensating path difference by controlled variation of first and/or second optical paths; image plane difference is essentially independent of incident angle
11/21/2002	DE10124215A1 Bebilderungseinrichtung zur Erzeugung einer Anzahl von Bildpunkten in einer Projektionslinie Imaging device for generating a number of image points in a projection line
11/21/2002	DE10123727A1 Objective for microlithographic projection, includes lens element with axis perpendicular to specified fluoride crystal plane
11/21/2002	DE10123725A1 Objective for microlithographic projection, includes lens element with axis perpendicular to specified fluoride crystal plane
11/21/2002	DE10120676A1 Verfahren zur Strukturierung einer Photolackschicht A method for patterning a photoresist layer
11/21/2002	DE10120675A1 Verfahren zur Strukturierung einer Photolackschicht A method for patterning a photoresist layer
11/21/2002	DE10120674A1 Verfahren zur Strukturierung einer Photolackschicht A method for patterning a photoresist layer
11/21/2002	DE10120673A1 Verfahren zur Strukturierung einer Photolackschicht A method for patterning a photoresist layer
11/21/2002	DE10120661A1 Photoresist composition for integrated circuit production, comprises film-forming polymer giving alkali-soluble groups by acid-catalyzed elimination and groups reacting with amplifying agent and photo- and thermo-acid generators
11/21/2002	DE10120660A1 Structurization of photoresist, for producing integrated circuit, comprises exposing resist containing film-forming polymer with latent alkali-soluble groups and photobase generator, acid-catalyzed elimination and development
11/21/2002	CA2352921A1 Lamp locking mechanism
11/20/2002	EP1259098A1 Method to control the color temperature of an illuminated area
11/20/2002	EP1259060A2 Imaging device for generating a number of image points in a projection line

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