Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
11/2002
11/28/2002US20020177076 Exposure method suitable for use in projection exposure process for printing patterns of various sizes and shapes onto resist-coated substrate by projection exposure
11/28/2002US20020177075 Forming photoresist with pattern on substrate, putting both photoresist and substrate in low pressure environment, treating photoresist with electron beam to harden at least part of photoresist
11/28/2002US20020177074 Planographic printing plate precursor and planographic printing method
11/28/2002US20020177073 Liquid, radiation-curable composition, especially for producing flexible cured articles by stereolithography
11/28/2002US20020177072 Composition for photoimaging
11/28/2002US20020177071 Exposing photosensitive lithographic printing plate having photosensitive layer comprising photopolymerizable composition formed on a support surface to laser light having wavelength of 650 to 1,300 nm
11/28/2002US20020177070 Containing an alkaline-soluble resin as a base material which includes an oxetane structure
11/28/2002US20020177069 Cross-linking monomers for photoresist, and process for preparing photoresist polymers using the same
11/28/2002US20020177068 Forms photoresist pattern having low dependence on and good adhesion to substrate, high transparency in wavelength range of uv, x-rays radiation, strong resistance to dry etching, excellencies in sensitivity, resolution and developability
11/28/2002US20020177067 Includes perfluoro-2,2-dimethy-1,3-dioxole derivatives and vinyl derivatives; for F2 excimer laser
11/28/2002US20020177066 Includes a maleic anhydride repeating unit, a norbornene repeating unit, and at least one silicon group-containing norbornene repeating unit
11/28/2002US20020177057 Measurement of critical dimensions of etched features
11/28/2002US20020177056 Rectangle/lattice data conversion method for charged particle beam exposure mask pattern and charged particle beam exposure method
11/28/2002US20020177054 Projection lens exposes pattern to illumination; for fabrication of semiconductor chips, integrated circuits
11/28/2002US20020177053 Imaging and erasing of a printing form made of polymer material containing imide groups
11/28/2002US20020177052 Via controlling pressure between cavity and housing to prevent damage; for high resolution patterns on semiconductor wafers
11/28/2002US20020177051 Phase shift mask, method of exposure, and method of producing semiconductor device
11/28/2002US20020177048 Exposure method and apparatus
11/28/2002US20020176936 Comprising coating solution discharge member for discharging coating solution to substrate which is positioned in a downward part; photolithography
11/28/2002US20020176928 Coating film forming method and system
11/28/2002US20020176793 For computerized production of three dimensional sintered bodies by solid freeform fabrication, including binding agent charged with metal powder
11/28/2002US20020176166 Polarizer and microlithography projection system with a polarizer
11/28/2002US20020176096 Position detecting method and apparatus, exposure apparatus and device manufacturing method
11/28/2002US20020176094 Apparatus for mounting an optical element in an optical system
11/28/2002US20020176082 Exposure method and apparatus
11/28/2002US20020176065 Multiple image reticle for forming layers
11/28/2002US20020176064 Board-stage for an aligner
11/28/2002US20020176063 Projection optical system, and projection exposure apparatus having the projection optical system, projection method thereof, exposure method thereof and fabricating method for fabricating a device using the projection exposure apparatus
11/28/2002US20020176062 Programmable photolithographic mask system and method
11/28/2002US20020176060 Semiconductor exposure apparatus and method of driving the same
11/28/2002US20020176029 Semipermeable liquid crystal display device and manufacturing method thereof
11/28/2002US20020175963 Plate producing apparatus
11/28/2002US20020175300 Position detection method and apparatus
11/28/2002US20020175295 Method for aligning electron beam projection lithography tool
11/28/2002US20020174937 Methods and apparatus for manufacturing patterned ceramic green-sheets and multilayered ceramic devices
11/28/2002US20020174935 Methods for manufacturing patterned ceramic green-sheets and multilayered ceramic packages
11/28/2002US20020174829 Exhaust flow control system
11/28/2002US20020174825 Method of growing oriented single crystals with reuseable crystal seeds or crystal nuclei
11/28/2002DE10222387A1 Negative photoresist composition for thick films, e.g. for production of electronic connections, contains novolak resin, plasticiser resin, crosslinker and acid generator
11/28/2002DE10124803A1 Polarisator und Mikrolithographie-Projektionsanlage mit Polarisator Polarizer and microlithography projection system with polarizer
11/28/2002DE10122484A1 Verfahren und Vorrichtung zur Belichtung von Druckformen Method and apparatus for the exposure of printing plates
11/28/2002DE10120987A1 Projection exposure system has optical component with correction surface(s) shaped to influence projection optics imaging characteristic and forming (part of) object protective cover
11/28/2002DE10120446A1 Projection exposure system, especially for micro-lithography, has position sensitive correction sensor element that detects wavefront of measurement light beam or beams
11/28/2002CA2448386A1 Method of lift-off microstructuring deposition material on a substrate, substrates obtainable by the method, and use thereof
11/27/2002EP1261044A2 Method for producing organic electroluminescent element
11/27/2002EP1260871A2 Position detecting method and apparatus, exposure apparatus and device manufacturing method
11/27/2002EP1260868A2 Method for removing resist material
11/27/2002EP1260867A1 Developing solution composition and process for forming image using the composition
11/27/2002EP1260866A2 Additive composition for rinse water and method for surface treatment of lithographic printing plates
11/27/2002EP1260865A2 Device for exposure of a peripheral area of a wafer
11/27/2002EP1260864A1 Positive photosensitive composition
11/27/2002EP1260863A1 Micropatterning of plasma polymerized coatings
11/27/2002EP1260862A1 Lithographic apparatus, device manufacturing methods, method of manufacturing a reflector and phase shift mask
11/27/2002EP1260861A1 Method of manufacturing a reflector, reflector manufactured thereby, phase shift mask and lithographic apparatus making use of them
11/27/2002EP1260849A1 Polarisation compensator and microlithography projection device with polarisation compensator
11/27/2002EP1260845A2 Catadioptric reduction lens
11/27/2002EP1260563A1 UV curing intaglio ink
11/27/2002EP1260362A2 Negative-working thermal imaging member and methods of imaging and printing
11/27/2002EP1260361A2 Method for making lithographic printing plate
11/27/2002EP1259859A1 In-situ lithography mask cleaning
11/27/2002EP1259842A1 System and method for writing fiber gratings
11/27/2002EP1259663A2 Method and device for growing large-volume oriented monocrystals
11/27/2002EP1117714B1 Water soluble positive-working photoresist composition
11/27/2002CN1382268A Antireflective coating material for photoresists
11/27/2002CN1382161A Photoinitiator formulations
11/27/2002CN1381871A High-contrast ratio diaphragm mask
11/27/2002CN1381860A Metal or metal compound pattern and the patten formed method and electron emission device, electronic source and imaging device using the pattern
11/27/2002CN1381770A Multiple exposing method
11/27/2002CN1381769A Method for increasing focusing depth in heliography
11/27/2002CN1381768A Conformal photosensitive resin composition and semiconductor device using it
11/27/2002CN1095095C Device for supporting artwork for light exposure installation of flat piece
11/27/2002CN1095093C Exposure mask and method for forming photoetching rubber pattern using the exposure mask
11/26/2002USRE37913 Exposure method and projection exposure apparatus
11/26/2002US6487712 Method of manufacturing mask for conductive wirings in semiconductor device
11/26/2002US6487711 Method of analyzing factor responsible for errors in wafer pattern, and apparatus for producing photolithographic mask
11/26/2002US6487503 Method of estimating shape of chemically amplified resist
11/26/2002US6487229 Beam delivery system for molecular fluorine (F2) laser
11/26/2002US6487228 Narrow band excimer or molecular fluorine laser with adjustable bandwidth
11/26/2002US6487063 Electrostatic wafer chuck, and charged-particle-beam microlithography apparatus and methods comprising same
11/26/2002US6487018 Aperture and optical device using the same
11/26/2002US6486956 Reducing asymmetrically deposited film induced registration error
11/26/2002US6486955 Shape measuring method and shape measuring device, position control method, stage device, exposure apparatus and method for producing exposure apparatus, and device and method for manufacturing device
11/26/2002US6486941 Guideless stage
11/26/2002US6486940 High numerical aperture catadioptric lens
11/26/2002US6486939 Electronically controlled universal phase-shifting mask for stepper exposure system
11/26/2002US6486602 High-pressure discharge lamp electrode having a dendritic surface layer thereon
11/26/2002US6486558 Semiconductor device having a dummy pattern
11/26/2002US6486492 Integrated critical dimension control for semiconductor device manufacturing
11/26/2002US6486290 Polyimides, process for producing the same and photosensitive composition containing the same
11/26/2002US6486283 Organic anti-reflective coating polymer, anti-reflective coating composition methods of preparation thereof
11/26/2002US6486228 Bis-acylphosphine oxides and acylphosphine oxides for curing photopolymerizable compositions without yellowing; use in white surface coatings, as negative photoresists, in printing plates
11/26/2002US6486227 Zinc-complex photoinitiators and applications therefor
11/26/2002US6486074 Methods of masking and etching a semiconductor substrate, and ion implant lithography methods of processing a semiconductor substrate
11/26/2002US6486073 Method for stripping a photo resist on an aluminum alloy
11/26/2002US6486071 Spherical shaped semiconductor integrated circuit
11/26/2002US6486058 Method of forming a photoresist pattern using WASOOM
11/26/2002US6485895 Methods for forming line patterns in semiconductor substrates
11/26/2002US6485894 Method to self-align a lithographic pattern to a workpiece
11/26/2002US6485893 Resist pattern forming method and film forming method
11/26/2002US6485891 Exposure apparatus and method
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