G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor

Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
12/2002
12/05/2002	US20020180944 Exposure device
12/05/2002	US20020180943 Lithographic apparatus, device manufacturing method, and device manufactured thereby
12/05/2002	US20020180942 Projection exposure apparatus, projection exposure method and method of manufacturing the projection exposure apparatus
12/05/2002	US20020180941 Method and apparatus for diffractive transfer of a mask grating
12/05/2002	US20020180940 Lithographic apparatus, device manufacturing method, and device manufactured thereby
12/05/2002	US20020180312 Low-mass and compact stage devices exhibiting six degrees of freedom of fine motion, and microlithography systems comprising same
12/05/2002	US20020180133 Method and apparatus for processing workpiece by using X-Y stage capable of improving position accuracy
12/05/2002	US20020179867 Methods and systems for determining flatness, a presence of defects, and a thin film characteristic of a specimen
12/05/2002	US20020179864 Methods and systems for determining a thin film characteristic and an electrical property of a specimen
12/05/2002	US20020179857 Method of measuring and calibrating inclination of electron beam in electron beam proximity exposure apparatus, and electron beam proximity exposure apparatus
12/05/2002	US20020179856 Charged particle beam lithography apparatus for forming pattern on semi-conductor
12/05/2002	US20020179855 Charged particle beam exposure apparatus and method
12/05/2002	US20020179852 Apparatus and method for removing photomask contamination and controlling electrostatic discharge
12/05/2002	US20020179850 Positioning stage with stationary actuators
12/05/2002	US20020179845 Particle-optical apparatus, illumination apparatus and projection system as well as a method employing the same
12/05/2002	US20020179333 Circuit board and manufacturing method therefor
12/05/2002	US20020179283 Device and method for manufacturing semiconductor
12/05/2002	DE10222134A1 Schaltplattentisch für ein Ausrichtgerät Circuit board table for an aligner
12/05/2002	DE10211892A1 Linearer Schrittmotor, Objektträgervorrichtung und Belichtungsvorrichtung Linear stepper motor, slide apparatus and exposure apparatus
12/05/2002	DE10151080C1 Device for producing extreme ultraviolet radiation used in the semiconductor industry comprises a discharge chamber surrounded by electrode housings through which an operating gas flows under a predetermined pressure
12/05/2002	DE10127227A1 Katadioptrisches Reduktionsobjektiv A catadioptric reduction objective
12/05/2002	DE10127086A1 Reflector for electromagnetic waves in wavelength range below 200 mm
12/05/2002	DE10125372A1 Substance for use as anti-reflective coating, e.g. in photolithography, comprises polyhydroxyamide or polybenzoxazole and a methine, azomethine, coumarin, triphenylmethane or azo compound
12/05/2002	DE10124736A1 Test reticle for proximity characterizing of scanner lenses in lithography technology
12/05/2002	DE10121179A1 Determining image distortions of optical illuminated devices comprises applying photo-active layer on substrate, and forming latent image in photo-active layer
12/05/2002	DE10121178A1 Determining image distortions of photomasks comprises applying photo-active layer on substrate, and forming latent image of mask in photo-active layer
12/04/2002	EP1263028A1 Exposure mask, method for manufacturing the mask, and exposure method
12/04/2002	EP1262836A1 Lithographic apparatus
12/04/2002	EP1262835A2 Compact stage of low mass with device for fine positioning in six degrees of freedom for microlithography
12/04/2002	EP1262834A1 Lithography information control system
12/04/2002	EP1262833A1 Lithography information control system
12/04/2002	EP1262832A1 Lithographic apparatus, device manufacturing method, and device manufactured thereby
12/04/2002	EP1262831A2 Antireflective coating compositions
12/04/2002	EP1262830A1 Polymer for chemically amplified resist and chemically amplified resist composition containing the same
12/04/2002	EP1262829A1 Photosensitive composition
12/04/2002	EP1262828A1 Recording material
12/04/2002	EP1262509A1 Imide-benzoxazole polycondensate and process for producing the same
12/04/2002	EP1262506A1 Photocationic initiator combinations
12/04/2002	EP1262319A2 Negative-working photosensitive composition and negative-working photosensitive lithographic printing plate
12/04/2002	EP1262318A2 Lithographic printing plate precursor
12/04/2002	EP1262317A1 Plate producing apparatus
12/04/2002	EP1262316A1 Method and apparatus for making a printing plate
12/04/2002	EP1262229A1 Coloring composition containing a pigment coated by a polyhydroxyalkanoate
12/04/2002	EP1261878A2 Precision stage
12/04/2002	EP0923613B1 Aqueous developable photosensitive polyurethane-methacrylate
12/04/2002	CN1383187A Mfg. method for semiconductor device
12/04/2002	CN1095553C Positive photoresist compsn. contg. 2,4-dinitro-1-naphthol
12/03/2002	US6490308 Laser gas replenishment method
12/03/2002	US6490307 Method and procedure to automatically stabilize excimer laser output parameters
12/03/2002	US6490305 Beam delivery system for molecular fluorine (F2) laser
12/03/2002	US6490105 Stage mirror retention system
12/03/2002	US6490026 Method and system for aligning object to be processed with predetermined target article
12/03/2002	US6490025 Exposure apparatus
12/03/2002	US6489984 Pixel cross talk suppression in digital microprinters
12/03/2002	US6489620 Astigmatism-correction device and charged-particle-beam microlithography apparatus and methods comprising same
12/03/2002	US6489432 Organic anti-reflective coating polymer and preparation thereof
12/03/2002	US6489423 Organic anti-reflective polymer and method for manufacturing thereof
12/03/2002	US6489380 Mixtures of fillers, heterocylic ethers, nitriles, lewis acid catalysts and/or brownsted acids having high flexibility and hermetic sealing, used in semiconductor applications
12/03/2002	US6489374 Organonitrogen compounds that yield amines, imines or amidines when exposed to visible or ultraviolet radiation; polymerization catalysts used in one-pot systems having storage stability
12/03/2002	US6489238 Method to reduce photoresist contamination from silicon carbide films
12/03/2002	US6489085 Change in temperature of the photoresist material with crosslinking polymers leads only to a minor change in critical dimension, giving a larger processing window for carrying out thermal flow
12/03/2002	US6489083 Selective sizing of features to compensate for resist thickness variations in semiconductor devices
12/03/2002	US6489082 Coating photosensitive composition containing hydroxy carboxylic acid which is rendered a lactone upon irradiation
12/03/2002	US6489081 Organosilyl radical generators and their applications
12/03/2002	US6489080 Positive resist composition
12/03/2002	US6489078 IR radiation-sensitive imaging element and a method for producing lithographic plates therewith
12/03/2002	US6489068 Process for observing overlay errors on lithographic masks
12/03/2002	US6489067 Mask used in reduction projection exposure in photolithography
12/03/2002	US6489065 Holographic medium and process for use thereof
12/03/2002	US6489042 Covercoats to protect the circuitry
12/03/2002	US6488872 Microfabricated devices and method of manufacturing the same
12/03/2002	US6488847 Process and equipment for recovering developer from photoresist development waste and reusing it
12/03/2002	US6487969 Heat sensitive printing plate precursors
11/2002
11/28/2002	WO2002095811A1 Lighting optical device, exposure system, and production method of micro device
11/28/2002	WO2002095805A2 Laser parrering of devices
11/28/2002	WO2002095787A2 Anti-charging layer for beam lithography and mask fabrication
11/28/2002	WO2002095542A2 Workpiece sorter operating with modular bare workpiece stockers and/or closed container stockers
11/28/2002	WO2002095510A2 Enhanced fieldbus device alerts in a process control system
11/28/2002	WO2002095502A1 Resist remover composition
11/28/2002	WO2002095501A1 Resist remover composition
11/28/2002	WO2002095500A1 Resist remover composition
11/28/2002	WO2002095499A1 Method for manufacturing a stamper for optical disc production, a stamper obtained by the method, and an optical disc obtained with such stamper
11/28/2002	WO2002095498A2 Lithographic method of manufacturing a device
11/28/2002	WO2002095497A2 Method of lift-off microstructuring deposition material on a substrate, substrates obtainable by the method, and use thereof
11/28/2002	WO2002095466A1 Optical lattice structure
11/28/2002	WO2002095353A2 Multi-photon imaging and quantum lithography
11/28/2002	WO2002095328A1 Method and apparatus for dimension measurement of a pattern formed by lithographic exposure tools
11/28/2002	WO2002094952A1 Uv curing intaglio ink
11/28/2002	WO2002094904A1 Photosensitive resin, photosensitive resin compositions containing the same and cured articles of the compositions
11/28/2002	WO2002073122A3 Cyclic error reduction in average interferometric position measurements
11/28/2002	WO2002044805A3 Method of increasing the conductivity of a transparent conductive layer
11/28/2002	WO2001069970A3 Hearing aid format selector
11/28/2002	US20020177319 Fluid pressure bonding
11/28/2002	US20020177317 Immediate improvement of dewatering on paper machine; does not negatively affect web formation
11/28/2002	US20020177262 Gas assisted method for applying resist stripper and gas-resist stripper combinations
11/28/2002	US20020177245 Method and apparatus for controlling feature critical dimensions based on scatterometry derived profile
11/28/2002	US20020177085 Self-aligned photolithographic process for forming silicon-on-insulator devices
11/28/2002	US20020177083 Anti-charging layer for beam lithography and mask fabrication
11/28/2002	US20020177082 Self-aligned aperture masks having high definition apertures
11/28/2002	US20020177081 Substrate for forming a resist pattern, process for producing the substrate and process for forming a resist pattern of the chemical amplification type

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