| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 12/10/2002 | US6493063 Critical dimension control improvement method for step and scan photolithography |
| 12/10/2002 | US6493062 Driving apparatus and exposure apparatus |
| 12/10/2002 | US6493059 Installation for exposing a double-sided printed circuit card to light |
| 12/10/2002 | US6492701 Semiconductor device having anti-reflective cap and spacer, method of manufacturing the same, and method of manufacturing photoresist pattern using the same |
| 12/10/2002 | US6492649 Projection exposure apparatus, projection exposure method, optical cleaning method and method of fabricating semiconductor device |
| 12/10/2002 | US6492647 Electron guns for lithography tools |
| 12/10/2002 | US6492441 Diazonapthoquinonesulfonyl-substituted polymer suitable for use in anti-reflective coating of a semiconductor device |
| 12/10/2002 | US6492311 Ethyenediaminetetraacetic acid or its ammonium salt semiconductor process residue removal composition and process |
| 12/10/2002 | US6492310 Boric acid containing compositions for stripping residues from semiconductor substrates |
| 12/10/2002 | US6492308 Post chemical-mechanical planarization (CMP) cleaning composition |
| 12/10/2002 | US6492278 Method of manufacturing semiconductor device |
| 12/10/2002 | US6492272 Carrier gas modification for use in plasma ashing of photoresist |
| 12/10/2002 | US6492257 Water vapor plasma for effective low-k dielectric resist stripping |
| 12/10/2002 | US6492189 Method of arranging exposed areas including a limited number of test element group (TEG) regions on a semiconductor wafer |
| 12/10/2002 | US6492186 Method for detecting an endpoint for an oxygen free plasma process |
| 12/10/2002 | US6492097 Photolithography; forming positive photoresist layer; first photomask with opaque main lines and scattering bars on either side; second photomask having light pervious isolines |
| 12/10/2002 | US6492096 Patterned molecular self-assembly |
| 12/10/2002 | US6492094 Lithography for fast processing of large areas utilizing electron beam exposure |
| 12/10/2002 | US6492093 Positive-working mixture contains polymeric binder insoluble in water but soluble or swellable in alkaline solution and the cyanine dye having enolate of pyrimidine 2,4,6-trione and indolium, quinolinium, or benzothiazolium group |
| 12/10/2002 | US6492092 Such as isobornylmethacrylate-p-hydroxyphenylmethacrylamide copolymer with 1,4-cyclohexanedimethanol diglycidyl ether crosslinker; insoluble to topcoat resist solvents, minimizes reflectivity, etch rate comparable to novolaks |
| 12/10/2002 | US6492091 Actinic ray or radiation acid generator, a resin containing a monocyclic or polycyclic hydrocarbon structure, and an onium salt of a carboxylic acid; for microphotofabrication using a deep ultraviolet ray |
| 12/10/2002 | US6492090 Micropatterning using electron beams or ultraviolet rays |
| 12/10/2002 | US6492089 Polymer, resist composition and patterning process |
| 12/10/2002 | US6492088 Homo- or copolymers of unsaturated or active hydrogen poly-carbonyls; deep ultraviolet photolithography; miniture semi-conductor integrated circuits; etch and heat resistance; high sensitivity, adhesiveness and resolution |
| 12/10/2002 | US6492087 Photoacid labile unit attached to such as polyhydroxystyrene that can generate multiple anions or acidic groups such as hydroxyl, particularly phenolic, compounds via a deprotection reaction without releasing volatile components |
| 12/10/2002 | US6492086 Terpolymers of m- and p-hydroxystyrene and acrylic ester of alkyladamantyl, ethylfencyl, tricyclo decanyl, or pinanyl group; imaging at short wavelengths; high resolution relief images |
| 12/10/2002 | US6492085 Positive photoresist composition and process and synthesizing polyphenol compound |
| 12/10/2002 | US6492077 Multiple-reticle mask holder and aligner |
| 12/10/2002 | US6492075 Chemical trim process |
| 12/10/2002 | US6492073 Removal of line end shortening in microlithography and mask set for removal |
| 12/10/2002 | US6492072 Vacuum ultraviolet transmitting silicon oxyfluoride lithography glass |
| 12/10/2002 | US6492067 Removable pellicle for lithographic mask protection and handling |
| 12/10/2002 | US6491871 System for determining receptor-ligand binding affinity |
| 12/10/2002 | US6491825 Method for using a magnetic treatment apparatus for fluids |
| 12/10/2002 | US6491764 Rotating substrate, supplying liquid and supplying a gaseous substance partially miscible with the liquid to the surface of the substrate so that when mixed it lowers the surface tension of the liquid; for integrated circuits, displays |
| 12/10/2002 | US6491763 Processes for treating electronic components |
| 12/10/2002 | US6491452 Developing method and developing apparatus |
| 12/10/2002 | US6491392 Dynamically stabilized contact lenses |
| 12/10/2002 | US6490975 Infrared laser-imageable lithographic printing members and methods of preparing and imaging such printing members |
| 12/05/2002 | WO2002098189A2 Method and apparatus for generating high output power gas discharge based source of extreme ultraviolet radiation and/or soft x-rays |
| 12/05/2002 | WO2002097533A1 Photoresists processable under biocompatible conditions for multi-biomolecule patterning |
| 12/05/2002 | WO2002097532A1 Photosensitive resin composition and photosensitive dry film resist and photosensitive cover ray film using the same |
| 12/05/2002 | WO2002097510A1 Compact imaging head and high speed multi-head laser imaging assembly and method |
| 12/05/2002 | WO2002097508A1 Optical system and exposure system provided with the optical system |
| 12/05/2002 | WO2002097486A2 Hybrid optical component for x ray applications and method associated therewith |
| 12/05/2002 | WO2002097485A2 Method for controlled modification of the reflective qualities of a multi-layer |
| 12/05/2002 | WO2002097363A1 Position detection apparatus, position detection method, electronic part carrying apparatus, and electronic beam exposure apparatus |
| 12/05/2002 | WO2002096969A1 Light- and heat-curing resin composition |
| 12/05/2002 | WO2002096961A1 Use of cinnamic acid groups containing acetal polymers for radiation-sensitive compositions and lithographic printing plates |
| 12/05/2002 | WO2002096649A1 Coating composition and method for preparing radiation sensitive plate useful in lithographic printing and the like |
| 12/05/2002 | WO2002089192A8 Method of wet etching an inorganic antireflection layer |
| 12/05/2002 | WO2001097724A3 Liquid crystal mask for ophthamological laser surgery |
| 12/05/2002 | US20020184605 Method and apparatus of evaluating layer matching deviation based on CAD information |
| 12/05/2002 | US20020183989 Overlay error model, sampling strategy and associated equipment for implementation |
| 12/05/2002 | US20020183879 Method for controlling a process appliance for the sequential processing of semiconductor wafers |
| 12/05/2002 | US20020183529 Novel tetrahydrofuran compounds having alicyclic structure |
| 12/05/2002 | US20020183219 Used for removing photoresist or other residue from a substrate, such as an integrated circuit |
| 12/05/2002 | US20020183202 Recording material and image forming method |
| 12/05/2002 | US20020182955 Structural bonding tapes and articles containing the same |
| 12/05/2002 | US20020182891 Method of forming dielectric film and dielectric film |
| 12/05/2002 | US20020182890 Forming a molecular film by using a photolytic organic silicon compound that contains an aromatic hydrocarbon group, as a starting material; irradiating the molecular film with a light |
| 12/05/2002 | US20020182877 Photo-processing of materials in the presence of reactive fluid |
| 12/05/2002 | US20020182830 Method of forming a resist pattern for blocking implantation of an impurity into a semiconductor substrate |
| 12/05/2002 | US20020182817 Resist mask for measuring the accuracy of overlaid layers |
| 12/05/2002 | US20020182760 Methods and systems for determining a presence of macro defects and overlay of a specimen |
| 12/05/2002 | US20020182549 Providing a substrate having a layer of photoresist formed thereon; providing a plurality of reticles havingpatterns with a second pitch; exposure to form exposure regions; performing a development ofphotoresist layer |
| 12/05/2002 | US20020182547 Creating a uniform layer of the photosensitive material on the substrate by spinning; partially but not fully drying the layer; heating to fully dry; producing relief pattern layer; developing exposed portions of the surface relief pattern |
| 12/05/2002 | US20020182545 Exposing a partial area of a resist film formed on a surface of a substrate to light of different intensities; developing the resist film exposed |
| 12/05/2002 | US20020182543 Spraying an aqueous developing liquid at a temperature of not lower than 40 degrees C. under liquid at a temperature of not lower than 40 degrees C. under a high pressure to a photosensitive resin letterpress printing plate after exposure |
| 12/05/2002 | US20020182542 Electron emission lithography apparatus and method using a selectively grown carbon nanotube |
| 12/05/2002 | US20020182541 Used for producing integrated circuits |
| 12/05/2002 | US20020182540 For forming an electrode arrangement for a plasma display panel device |
| 12/05/2002 | US20020182539 Image-recording material |
| 12/05/2002 | US20020182537 Light-sensitive composition and light-sensitive lithographic printing plate |
| 12/05/2002 | US20020182536 Polyimides and polyamic acids |
| 12/05/2002 | US20020182535 Resolution, sensitivity and smoothness on side surfaces of a transferred pattern; photolithography |
| 12/05/2002 | US20020182534 Resist compositions with polymers having pendant groups containing plural acid labile moieties |
| 12/05/2002 | US20020182533 Radiation-sensitive recording material having an electrically conductive back coating |
| 12/05/2002 | US20020182531 Positive photoresist composition |
| 12/05/2002 | US20020182530 Photopolymerizable composition and recording material |
| 12/05/2002 | US20020182529 Producing hydrophobic polymer fine particles having a highly hydrophilic surface. |
| 12/05/2002 | US20020182522 Photosensitive black matrix |
| 12/05/2002 | US20020182521 Method of manufacturing semiconductor device |
| 12/05/2002 | US20020182518 High reflectance areas for reflecting radiation of an alignment beam of radiation, and low reflectance areas for reflecting less radiation of the alignment beam, comprising scattering structures for scattering and absorbing radiation |
| 12/05/2002 | US20020182516 Needle comb reticle pattern for critical dimension and registration measurements using a registration tool and methods for using same |
| 12/05/2002 | US20020182514 Organic bottom antireflective coating for high performance mask making using optical imaging |
| 12/05/2002 | US20020182360 Material for forming protective film |
| 12/05/2002 | US20020182339 Irradiation crosslinking a mixture of an epoxy compound, polyol like a polyetherpolyol or a polyesterpolyol, and a photoinitiator and applying the exposed composition onto a substrate thereby forming a coating upon the substrate. |
| 12/05/2002 | US20020182257 A microscopic image product comprising a light source that produces light that is made of entangled photons; used in lithography and other applications producing improved resolution for microscopic images. |
| 12/05/2002 | US20020181808 Static pressure air bearing |
| 12/05/2002 | US20020181125 Catadioptric objective |
| 12/05/2002 | US20020181119 Systems and methods for scanning a beam of light across a specimen |
| 12/05/2002 | US20020180990 Method and apparatus for dimension measurement of a pattern formed by lithographic exposure tools |
| 12/05/2002 | US20020180986 Methods and systems for determining a critical dimension, a presence of defects, and a thin film characteristic of a specimen |
| 12/05/2002 | US20020180985 Methods and systems for determining at least one characteristic of defects on at least two sides of a specimen |
| 12/05/2002 | US20020180961 Methods and systems for determining an adhesion characteristic and a thickness of a specimen |
| 12/05/2002 | US20020180948 Apparatus for preforming measurement of a dimension of a test mark for semiconductor processing |
| 12/05/2002 | US20020180947 Multiple image reticle for forming layers |
| 12/05/2002 | US20020180946 Motion feed-through into a vacuum chamber and its application in lithographic projection apparatus |
| 12/05/2002 | US20020180945 Connection assembly of wafer stage chamber |