G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor

Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
12/2002
12/17/2002	US6494627 Image-recording apparatus
12/17/2002	US6494584 Ultraviolet optical device having an optical part with a gas sprayed thereon
12/17/2002	US6494137 Support for lithographic printing plate and presensitized plate
12/12/2002	WO2002099938A1 Injection seeded f2 laser with line selection and discrimination
12/12/2002	WO2002099857A1 Anti-reflective coating and methods of making the same
12/12/2002	WO2002099856A1 Electron beam exposure-use mask and electron beam exposure method
12/12/2002	WO2002099818A1 Reflecting device for electromagnetic waves
12/12/2002	WO2002099534A2 Lighting system with a plurality of individual grids
12/12/2002	WO2002099533A2 Alternating phase-shift mask inspection method and apparatus
12/12/2002	WO2002099531A2 ANTI-REFLECTIVE COATING COMPOSITIONS FOR USE WITH LOW k DIELECTRIC MATERIALS
12/12/2002	WO2002099500A2 Correction of birefringence in cubic crystalline projection lenses and optical systems
12/12/2002	WO2002098870A1 Substituted oxime derivatives and the use thereof as latent acids
12/12/2002	WO2002084402A3 Process for producing film forming resins for photoresist compositions
12/12/2002	WO2002080239A3 Process for forming sub-lithographic photoresist features
12/12/2002	US20020188925 Pattern-creating method, pattern-processing apparatus and exposure mask
12/12/2002	US20020188924 Optical proximity correction for phase shifting photolithographic masks
12/12/2002	US20020188417 Methods and systems for determining a property of a specimen prior to, during, or subsequent to an etch process
12/12/2002	US20020188412 System for calculating exposure energy
12/12/2002	US20020188034 Photosensitive resin compositions for color filter applications
12/12/2002	US20020188033 Active energy beam curable composition and ink
12/12/2002	US20020187636 Exposure control for phase shifting photolithographic masks
12/12/2002	US20020187611 Methods of forming transistor gates; and methods of forming programmable read-only memory constructions
12/12/2002	US20020187573 Method of deforming a pattern and semiconductor device formed by utilizing deformed pattern
12/12/2002	US20020187442 Yield and line width performance for liquid polymers and other materials
12/12/2002	US20020187440 Printing fine pattern and masking pattern overcoating substrate; exposure to light source
12/12/2002	US20020187439 Process for producing acid sensitive liquid composition containing a carbonate
12/12/2002	US20020187438 Development method for manufacturing semiconductors
12/12/2002	US20020187437 Development method for manufacturing semiconductors
12/12/2002	US20020187436 Overcoating with zones of film forming polymer; heating photoresists; development
12/12/2002	US20020187435 Method of illuminating a layer of a material, in particular of photosensitive resin
12/12/2002	US20020187434 Process for device fabrication in which the size of lithographically produced features is subsequently reduced
12/12/2002	US20020187433 Process for patterning a membrane
12/12/2002	US20020187430 Method of forming patterned thin film and method of fabricating micro device
12/12/2002	US20020187429 Flexography printing plates; drawing images; using ester solvents
12/12/2002	US20020187427 Additive composition for both rinse water recycling in water recycling systems and simultaneous surface treatment of lithographic printing plates
12/12/2002	US20020187423 Substrate treating method
12/12/2002	US20020187422 Antireflective silicon-containing compositions as hardmask layer
12/12/2002	US20020187421 Method of producing photoresist
12/12/2002	US20020187420 Novel copolymers and photoresist compositions
12/12/2002	US20020187419 Photoresist composition for deep ultraviolet lithography
12/12/2002	US20020187408 Antihalation compositions
12/12/2002	US20020187407 Using ultraviolet radiation; prevention polarization; lithography patterns
12/12/2002	US20020187406 Amplification of pattern segments; writing on substrate using electron beams
12/12/2002	US20020187353 Epoxy resin composition, and adhesive film and prepreg using the composition, and multilayer printed-wiring board using them, and process for manufacturing the same
12/12/2002	US20020186879 Alternating phase-shift mask inspection method and apparatus
12/12/2002	US20020186815 Star pinch plasma source of photons or neutrons
12/12/2002	US20020186814 Star pinch X-ray and extreme ultraviolet photon source
12/12/2002	US20020186811 Illumination system with a grating element
12/12/2002	US20020186741 Very narrow band excimer or molecular fluorine laser
12/12/2002	US20020186739 Injection seeded F2 laser with wavelength control
12/12/2002	US20020186462 Optical imaging system with polarizer and a crystalline-quartz plate for use therewith
12/12/2002	US20020186359 Lithography system and method for device manufacture
12/12/2002	US20020186358 Method and apparatus for controlling a stepper
12/12/2002	US20020186357 Electron beam exposure apparatus, reduction projection system, and device manufacturing method
12/12/2002	US20020186356 Optical proximity correction method utilizing gray bars as sub-resolution assist features
12/12/2002	US20020186355 Projection optical system, projection exposure apparatus, and projection exposure method
12/12/2002	US20020185983 Dual force mode fine stage apparatus
12/12/2002	US20020185598 Array foreshortening measurement using a critical dimension scanning electron microscope
12/12/2002	US20020185468 Method for producing and/or renewing an etching mask
12/12/2002	US20020185225 Substrate processing method and substrate processing apparatus
12/12/2002	US20020185151 Plasma process for removing polymer and residues from substrates
12/12/2002	US20020184788 Process for drying an object having microstructure and the object obtained by the same
12/12/2002	DE10127449A1 Illumination system has grid element with individual grids, grid period, physical stop in stop plane located after grid element in beam path from object plane to field plane
12/12/2002	DE10127320A1 Objective for microlithographic projection, includes lens element with axis perpendicular to specified fluoride crystal plane
12/12/2002	DE10126637A1 Diffractive optical element used e.g. in the production of lenses has a surface made from an alkali and/or alkaline earth halide with a lattice structure or a structure similar to a lattice
12/11/2002	EP1265271A1 X-ray projection exposure device, x-ray projection exposure method, and semiconductor device
12/11/2002	EP1265107A2 Position detection method and apparatus
12/11/2002	EP1265106A2 Lithographic apparatus and device manufacturing method
12/11/2002	EP1265105A2 Lithographic apparatus and device manufacturing method
12/11/2002	EP1265104A1 Lithographic apparatus, device manufacturing method, and device manufactured thereby
12/11/2002	EP1265103A1 Active components and photosensitive resin compositions containing the same
12/11/2002	EP1265040A2 Environmental control equipment, method for developing apparatus
12/11/2002	EP1264687A2 Direct drawing type lithographic printing plate precursor and production method thereof
12/11/2002	EP1264220A2 Patterning methods and systems using reflected interference patterns
12/11/2002	EP1264217A1 Method and apparatus for controlling photoresist baking processes
12/11/2002	EP1264216A1 Method of reducing defects
12/11/2002	EP1264215A1 Device for transferring a pattern to an object
12/11/2002	EP1264214A2 Photopolymerizable composition sensitive to light in a green to infrared region of the optical spectrum
12/11/2002	EP1263606A2 Dual-layer self-contained recording paper incorporating hollow microspheres
12/11/2002	EP1263590A2 Thermally imageable element and lithographic printing plate
12/11/2002	EP0934366B1 Solventless primers which are hardenable by radiation
12/11/2002	EP0883825B1 Process for the production of optical components with coupled optical waveguides and optical components produced by said method
12/11/2002	CN2525562Y Base board exposure device
12/11/2002	CN2525561Y Automatic film loading device for laser drawing machine
12/11/2002	CN1384972A Removal of photoresist and residue from substrate using supercritical carbon dioxide process
12/11/2002	CN1384530A Image forming method, exposure mask for forming image and its making process
12/11/2002	CN1384521A Manufacture of plasma display plate
12/11/2002	CN1384399A 光刻胶组合物 Photoresist composition
12/11/2002	CN1384138A Photosensitive insulated glue composition and photosensitive film of the glue
12/10/2002	US6493867 Digital photolithography system for making smooth diagonal components
12/10/2002	US6493423 Method of generating extremely short-wave radiation, method of manufacturing a device by means of said radiation, extremely short-wave radiation source unit and lithographic projection apparatus provided with such a radiation source unit
12/10/2002	US6493374 Smart laser with fast deformable grating
12/10/2002	US6493370 Laser gas replenishment method
12/10/2002	US6493156 High resolution lens
12/10/2002	US6493151 Variable focus lens by small changes of the equatorial lens diameter
12/10/2002	US6493143 Diffractive optical element and optical system incorporating the same
12/10/2002	US6493082 Inspection method, apparatus and system for circuit pattern
12/10/2002	US6493066 Exposure apparatus
12/10/2002	US6493065 Alignment system and alignment method in exposure apparatus
12/10/2002	US6493064 Method and apparatus for registration control in production by imaging

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