Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
12/2002
12/19/2002US20020192591 Photosensitive compositions
12/19/2002US20020192588 Sensitivity, decreased color contamination, excellent color reproduction
12/19/2002US20020192579 Gas purge method and exposure apparatus
12/19/2002US20020192578 Using same inspection wavelength as an exposure wavelength for use in exposure apparatus and using detection optical system of inspection apparatus having a numerical aperture larger than a numerical aperture of projection optical system
12/19/2002US20020192577 Forming first separated features on a surface, forming second separated features on surface interleaved between first separated features, and illuminating first and second separated features and detecting an interference pattern
12/19/2002US20020192573 Exposure mask, method for manufacturing the mask, and exposure method
12/19/2002US20020192569 Devices and methods for exposure of photoreactive compositions with light emitting diodes
12/19/2002US20020192362 Method of producing a screen for a color display tube
12/19/2002US20020192358 Substrate processing apparatus and substrate processing method
12/19/2002US20020191661 High rep-rate laser with improved electrodes
12/19/2002US20020191654 Laser lithography light source with beam delivery
12/19/2002US20020191288 Microlithographic illumination method and a projection lens for carrying out the method
12/19/2002US20020191195 Interferometer system and method of manufactruing projection optical system using same
12/19/2002US20020191180 Exposure apparatus and a device manufacturing method using the same
12/19/2002US20020191173 Balanced positioning system for use in lithographic apparatus
12/19/2002US20020191172 Laser output control method, laser apparatus and exposure apparatus
12/19/2002US20020191171 Exposure apparatus and method
12/19/2002US20020191170 Illumination system and exposure apparatus and method
12/19/2002US20020191169 Projection optical system and projection and light exposure apparatus using it
12/19/2002US20020191168 Method for forming optical thin film and optical element provided with optical thin film
12/19/2002US20020191167 Semiconductor exposure apparatus and device manufacturing method using the same
12/19/2002US20020191166 Exposure apparatus
12/19/2002US20020191165 Lithographic apparatus, device manufacturing method, and device manufactured thereby
12/19/2002US20020191164 Device for processing of a strip-shaped workpiece
12/19/2002US20020191163 Exposure apparatus
12/19/2002US20020190642 Radiation flux monitor for EUV lithography
12/19/2002US20020190228 Method for measuring optical feature of exposure apparatus and exposure apparatus having means for measuring optical feature
12/19/2002US20020190207 Methods and systems for determining a characteristic of micro defects on a specimen
12/19/2002US20020190189 Light exposure apparatus
12/19/2002US20020189758 Substrate processing apparatus, substrate inspection method and substrate procesing system
12/19/2002US20020189756 Polymeric mold for providing a micro-scale part
12/19/2002US20020189639 Cleaning water for cleaning a wafer and method of cleaning a wafer
12/19/2002US20020189476 Planographic printing plate precursor
12/19/2002US20020189471 Method and device for producing a printing block
12/19/2002CA2446722A1 Oxime ester photoinitiators having a combined structure
12/18/2002EP1267213A1 Lithographic projection apparatus
12/18/2002EP1267212A2 Lithographic apparatus and device manufacturing method
12/18/2002EP1267211A1 UV-sensitive imaging element for making lithographic printing plates
12/18/2002EP1267210A2 Positive resist composition
12/18/2002EP1267209A1 Maskless exposure system using mems devices
12/18/2002EP1266923A1 Polyester film as support for dry film resist
12/18/2002EP1266922A1 Photocurable/thermosetting composition for forming matte film
12/18/2002EP1266751A2 Printing plate precursor, image forming method employing the same, and printing method
12/18/2002EP1266266A1 Novel photosensitive resin compositions
12/18/2002EP1266265A1 Platemaking system and method using an imaging mask made from photochromic film
12/18/2002EP1266264A1 Non-aromatic chromophores for use in polymer anti-reflective coatings
12/18/2002EP1266254A1 Ultra-high resolution imaging devices
12/18/2002EP1265753A2 Planographic thermal processless imaging member and methods of use
12/18/2002EP0917544B1 Water soluble and oxygen-impermeable polymeric layers
12/18/2002EP0890136B1 Two-dimensionally balanced positioning device with two object holders, and lithographic device provided with such a positioning device
12/18/2002EP0691001B1 Water-developable photosensitive plates especially suited for commercial flexographic printing
12/18/2002CN1386300A Method of producing semiconductor integrated circuit device and method of producion multi-chip module
12/18/2002CN1386273A Method of manufacturnig an optically scannable information carrier
12/18/2002CN1386214A Aqueous surfactant solution for developing coating film layer
12/18/2002CN1386133A Coloring composition
12/18/2002CN1386095A Imaging media containing heat developable photosensitive microcapsule
12/18/2002CN1386072A Method of forming protective coating
12/18/2002CN1385885A Inorganic anti-reflection film SiON surface trating method for photoetching
12/18/2002CN1385884A Novel button anti-reflection film structure
12/18/2002CN1385878A Method for forming net-structure photoresist layer
12/18/2002CN1385760A Method for making lye, lye and application, lye conter and use thereof
12/18/2002CN1385759A Method for making three-dimension microstructure and its exposure device
12/18/2002CN1385758A Method for making microstructured unit, method for making electronic device and equipment for making same
12/18/2002CN1385757A Antireflection coating composition
12/18/2002CN1385756A Method for making electronic component using wet corrosion agent
12/18/2002CN1385755A Foam-removing agent composition for photoresist solution
12/18/2002CN1385318A Print method for lithographic plate and lithographic plate for said method
12/18/2002CN1096702C Photoresist developing process
12/18/2002CN1096628C Process for producing surfactant having low metal ion level and developer produced therefrom
12/18/2002CN1096627C Compound microarray chip preparing process based on electronic screen plate and silk screen print technology
12/18/2002CN1096313C Method and device for selective removal of material by irradiation
12/17/2002US6496746 Method and apparatus for automatically generating schedules for wafer processing within a multichamber semiconductor wafer processing tool
12/17/2002US6496528 Line narrowing unit with flexural grating mount
12/17/2002US6496350 Electrostatic wafer chucks and charged-particle-beam exposure apparatus comprising same
12/17/2002US6496306 Catadioptric optical system and exposure apparatus having the same
12/17/2002US6496292 Method and apparatus for shaping a laser-beam intensity profile by dithering
12/17/2002US6496257 Projection exposure apparatus and method
12/17/2002US6496249 Exposure apparatus
12/17/2002US6496248 Stage device and exposure apparatus and method
12/17/2002US6496247 Exposure apparatus and exposure method
12/17/2002US6496246 Optical assembly for an exposure apparatus
12/17/2002US6496245 Developing method and developing apparatus
12/17/2002US6496093 Displacement device
12/17/2002US6495934 Method of manufacturing linear motor, linear motor, stage apparatus equipped with linear motor and exposure apparatus
12/17/2002US6495870 Semiconductor device and method for patterning the semiconductor device in which line patterns terminate at different lengths to prevent the occurrence of a short or break
12/17/2002US6495847 Stage control apparatus and exposure apparatus
12/17/2002US6495839 Microlithography projection objective and projection exposure apparatus
12/17/2002US6495450 Isolation using an antireflective coating
12/17/2002US6495384 Method for manufacturing diffraction grating and method for manufacturing semiconductor laser
12/17/2002US6495312 Directing light to the bead along non-parallel paths; solvent removal
12/17/2002US6495310 Overcoat is substantially conformally coated on the photosensitive layer surface so that the surface of the overcoat has peaks and valleys substantially corresponding to the major peaks and valleys of the substrate microscopic
12/17/2002US6495307 Chemically amplified positive resist composition
12/17/2002US6495306 Chemically amplified positive resist composition
12/17/2002US6495305 Curable polyacrylate binder with halogenated side groups, light attenuating compound or binder pendant group, cross-linking agent and catalyst; high etch rate microlithography; integrated circuits with submicron features
12/17/2002US6495298 Photopolymerizable resin compositions and use thereof
12/17/2002US6495297 Type mask for combining off axis illumination and attenuating phase shifting mask patterns
12/17/2002US6495250 Pigmented porous material
12/17/2002US6495202 Substantially little drop in transmissivity over time
12/17/2002US6494966 Rinsing a substrate with a pattern in water to remove active materials; rinsing in an acid having an acid concentration below that which attacks the substrate to dissolve surface contaminants; chrome photomasks; phase-shift masks
12/17/2002US6494953 Dispenser apparatus and associated method of heating