Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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12/19/2002 | US20020192591 Photosensitive compositions |
12/19/2002 | US20020192588 Sensitivity, decreased color contamination, excellent color reproduction |
12/19/2002 | US20020192579 Gas purge method and exposure apparatus |
12/19/2002 | US20020192578 Using same inspection wavelength as an exposure wavelength for use in exposure apparatus and using detection optical system of inspection apparatus having a numerical aperture larger than a numerical aperture of projection optical system |
12/19/2002 | US20020192577 Forming first separated features on a surface, forming second separated features on surface interleaved between first separated features, and illuminating first and second separated features and detecting an interference pattern |
12/19/2002 | US20020192573 Exposure mask, method for manufacturing the mask, and exposure method |
12/19/2002 | US20020192569 Devices and methods for exposure of photoreactive compositions with light emitting diodes |
12/19/2002 | US20020192362 Method of producing a screen for a color display tube |
12/19/2002 | US20020192358 Substrate processing apparatus and substrate processing method |
12/19/2002 | US20020191661 High rep-rate laser with improved electrodes |
12/19/2002 | US20020191654 Laser lithography light source with beam delivery |
12/19/2002 | US20020191288 Microlithographic illumination method and a projection lens for carrying out the method |
12/19/2002 | US20020191195 Interferometer system and method of manufactruing projection optical system using same |
12/19/2002 | US20020191180 Exposure apparatus and a device manufacturing method using the same |
12/19/2002 | US20020191173 Balanced positioning system for use in lithographic apparatus |
12/19/2002 | US20020191172 Laser output control method, laser apparatus and exposure apparatus |
12/19/2002 | US20020191171 Exposure apparatus and method |
12/19/2002 | US20020191170 Illumination system and exposure apparatus and method |
12/19/2002 | US20020191169 Projection optical system and projection and light exposure apparatus using it |
12/19/2002 | US20020191168 Method for forming optical thin film and optical element provided with optical thin film |
12/19/2002 | US20020191167 Semiconductor exposure apparatus and device manufacturing method using the same |
12/19/2002 | US20020191166 Exposure apparatus |
12/19/2002 | US20020191165 Lithographic apparatus, device manufacturing method, and device manufactured thereby |
12/19/2002 | US20020191164 Device for processing of a strip-shaped workpiece |
12/19/2002 | US20020191163 Exposure apparatus |
12/19/2002 | US20020190642 Radiation flux monitor for EUV lithography |
12/19/2002 | US20020190228 Method for measuring optical feature of exposure apparatus and exposure apparatus having means for measuring optical feature |
12/19/2002 | US20020190207 Methods and systems for determining a characteristic of micro defects on a specimen |
12/19/2002 | US20020190189 Light exposure apparatus |
12/19/2002 | US20020189758 Substrate processing apparatus, substrate inspection method and substrate procesing system |
12/19/2002 | US20020189756 Polymeric mold for providing a micro-scale part |
12/19/2002 | US20020189639 Cleaning water for cleaning a wafer and method of cleaning a wafer |
12/19/2002 | US20020189476 Planographic printing plate precursor |
12/19/2002 | US20020189471 Method and device for producing a printing block |
12/19/2002 | CA2446722A1 Oxime ester photoinitiators having a combined structure |
12/18/2002 | EP1267213A1 Lithographic projection apparatus |
12/18/2002 | EP1267212A2 Lithographic apparatus and device manufacturing method |
12/18/2002 | EP1267211A1 UV-sensitive imaging element for making lithographic printing plates |
12/18/2002 | EP1267210A2 Positive resist composition |
12/18/2002 | EP1267209A1 Maskless exposure system using mems devices |
12/18/2002 | EP1266923A1 Polyester film as support for dry film resist |
12/18/2002 | EP1266922A1 Photocurable/thermosetting composition for forming matte film |
12/18/2002 | EP1266751A2 Printing plate precursor, image forming method employing the same, and printing method |
12/18/2002 | EP1266266A1 Novel photosensitive resin compositions |
12/18/2002 | EP1266265A1 Platemaking system and method using an imaging mask made from photochromic film |
12/18/2002 | EP1266264A1 Non-aromatic chromophores for use in polymer anti-reflective coatings |
12/18/2002 | EP1266254A1 Ultra-high resolution imaging devices |
12/18/2002 | EP1265753A2 Planographic thermal processless imaging member and methods of use |
12/18/2002 | EP0917544B1 Water soluble and oxygen-impermeable polymeric layers |
12/18/2002 | EP0890136B1 Two-dimensionally balanced positioning device with two object holders, and lithographic device provided with such a positioning device |
12/18/2002 | EP0691001B1 Water-developable photosensitive plates especially suited for commercial flexographic printing |
12/18/2002 | CN1386300A Method of producing semiconductor integrated circuit device and method of producion multi-chip module |
12/18/2002 | CN1386273A Method of manufacturnig an optically scannable information carrier |
12/18/2002 | CN1386214A Aqueous surfactant solution for developing coating film layer |
12/18/2002 | CN1386133A Coloring composition |
12/18/2002 | CN1386095A Imaging media containing heat developable photosensitive microcapsule |
12/18/2002 | CN1386072A Method of forming protective coating |
12/18/2002 | CN1385885A Inorganic anti-reflection film SiON surface trating method for photoetching |
12/18/2002 | CN1385884A Novel button anti-reflection film structure |
12/18/2002 | CN1385878A Method for forming net-structure photoresist layer |
12/18/2002 | CN1385760A Method for making lye, lye and application, lye conter and use thereof |
12/18/2002 | CN1385759A Method for making three-dimension microstructure and its exposure device |
12/18/2002 | CN1385758A Method for making microstructured unit, method for making electronic device and equipment for making same |
12/18/2002 | CN1385757A Antireflection coating composition |
12/18/2002 | CN1385756A Method for making electronic component using wet corrosion agent |
12/18/2002 | CN1385755A Foam-removing agent composition for photoresist solution |
12/18/2002 | CN1385318A Print method for lithographic plate and lithographic plate for said method |
12/18/2002 | CN1096702C Photoresist developing process |
12/18/2002 | CN1096628C Process for producing surfactant having low metal ion level and developer produced therefrom |
12/18/2002 | CN1096627C Compound microarray chip preparing process based on electronic screen plate and silk screen print technology |
12/18/2002 | CN1096313C Method and device for selective removal of material by irradiation |
12/17/2002 | US6496746 Method and apparatus for automatically generating schedules for wafer processing within a multichamber semiconductor wafer processing tool |
12/17/2002 | US6496528 Line narrowing unit with flexural grating mount |
12/17/2002 | US6496350 Electrostatic wafer chucks and charged-particle-beam exposure apparatus comprising same |
12/17/2002 | US6496306 Catadioptric optical system and exposure apparatus having the same |
12/17/2002 | US6496292 Method and apparatus for shaping a laser-beam intensity profile by dithering |
12/17/2002 | US6496257 Projection exposure apparatus and method |
12/17/2002 | US6496249 Exposure apparatus |
12/17/2002 | US6496248 Stage device and exposure apparatus and method |
12/17/2002 | US6496247 Exposure apparatus and exposure method |
12/17/2002 | US6496246 Optical assembly for an exposure apparatus |
12/17/2002 | US6496245 Developing method and developing apparatus |
12/17/2002 | US6496093 Displacement device |
12/17/2002 | US6495934 Method of manufacturing linear motor, linear motor, stage apparatus equipped with linear motor and exposure apparatus |
12/17/2002 | US6495870 Semiconductor device and method for patterning the semiconductor device in which line patterns terminate at different lengths to prevent the occurrence of a short or break |
12/17/2002 | US6495847 Stage control apparatus and exposure apparatus |
12/17/2002 | US6495839 Microlithography projection objective and projection exposure apparatus |
12/17/2002 | US6495450 Isolation using an antireflective coating |
12/17/2002 | US6495384 Method for manufacturing diffraction grating and method for manufacturing semiconductor laser |
12/17/2002 | US6495312 Directing light to the bead along non-parallel paths; solvent removal |
12/17/2002 | US6495310 Overcoat is substantially conformally coated on the photosensitive layer surface so that the surface of the overcoat has peaks and valleys substantially corresponding to the major peaks and valleys of the substrate microscopic |
12/17/2002 | US6495307 Chemically amplified positive resist composition |
12/17/2002 | US6495306 Chemically amplified positive resist composition |
12/17/2002 | US6495305 Curable polyacrylate binder with halogenated side groups, light attenuating compound or binder pendant group, cross-linking agent and catalyst; high etch rate microlithography; integrated circuits with submicron features |
12/17/2002 | US6495298 Photopolymerizable resin compositions and use thereof |
12/17/2002 | US6495297 Type mask for combining off axis illumination and attenuating phase shifting mask patterns |
12/17/2002 | US6495250 Pigmented porous material |
12/17/2002 | US6495202 Substantially little drop in transmissivity over time |
12/17/2002 | US6494966 Rinsing a substrate with a pattern in water to remove active materials; rinsing in an acid having an acid concentration below that which attacks the substrate to dissolve surface contaminants; chrome photomasks; phase-shift masks |
12/17/2002 | US6494953 Dispenser apparatus and associated method of heating |