| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
|---|
| 12/26/2002 | US20020197545 X-ray transmission film is held by the holding frame with an even step-like structure defined at its peripheral portion. |
| 12/26/2002 | US20020197543 Identifying cutting areas for phase shift regions based upon characteristics of said pattern; assigning phase values to phase shift windows in the phase shift regions by cutting the phase shift regions in selected ones of the cutting areas |
| 12/26/2002 | US20020197542 Phase error monitor pattern and application |
| 12/26/2002 | US20020197539 Photolithography method for fabricating thin film |
| 12/26/2002 | US20020197496 Polyester film as support for dry film resist |
| 12/26/2002 | US20020197400 Spin-coater with self-cleaning cup and method of using |
| 12/26/2002 | US20020197079 Non-water-based resist stripping liquid management apparatus and non-water-based resist stripping liquid management method |
| 12/26/2002 | US20020196968 Review work supporting system |
| 12/26/2002 | US20020196896 Exposure method, exposure apparatus, X-ray mask, semiconductor device and microstructure |
| 12/26/2002 | US20020196831 Gas discharge laser with means for removing gas impurities |
| 12/26/2002 | US20020196830 Laser chamber insulator with sealed electrode feedthrough |
| 12/26/2002 | US20020196629 Illumination apparatus, illumination-controlling method, exposure apparatus, device fabricating method |
| 12/26/2002 | US20020196550 Catadioptric objective |
| 12/26/2002 | US20020196533 Catadioptric optical system and exposure apparatus having the same |
| 12/26/2002 | US20020196473 Method of automated setting of imaging and processing parameters |
| 12/26/2002 | US20020196448 Interferometer system and lithographic step-and-scan apparatus provided with such a system |
| 12/26/2002 | US20020196421 Stage device, exposure apparatus and method |
| 12/26/2002 | US20020196420 Near-field exposure system selectively applying linearly polarized exposure light to exposure mask |
| 12/26/2002 | US20020196419 Illumination apparatus, exposure apparatus, and device fabricating method using the same |
| 12/26/2002 | US20020196418 Scanning exposure in which an object and pulsed light are moved relatively, exposing a substrate by projecting a pattern on a mask onto the substrate with pulsed light from a light source, light sources therefor, and methods of manufacturing |
| 12/26/2002 | US20020196417 Projection exposure method and apparatus |
| 12/26/2002 | US20020196416 Projection exposure method and apparatus |
| 12/26/2002 | US20020195539 Focus monitoring method, focus monitoring apparatus, and method of manufacturing semiconductor device |
| 12/26/2002 | US20020195419 Antireflective hard mask compositions |
| 12/26/2002 | US20020195200 Gas assisted method for applying resist stripper and gas-resist stripper combinations |
| 12/26/2002 | US20020195013 Printing method of planographic printing plate and planographic printing plate processed by this method |
| 12/25/2002 | CN1387676A Improved apparatus and method for integrated circuit planarization |
| 12/25/2002 | CN1387675A Method for producing uniform large-grained and grain boundary location manipulated polycrystalline thin film semiconductors using sequential lateral solidifcation |
| 12/25/2002 | CN1387673A Method and apparatus for supercritical processing of multiple workpieces |
| 12/25/2002 | CN1387636A UV-absorbing support layers and flexographic printing elements comprising same |
| 12/25/2002 | CN1387232A Photoetch process with multiple dosages and regional exposure |
| 12/25/2002 | CN1387090A Method for removing anticorrosive additive material |
| 12/25/2002 | CN1387089A Method for decreasing optical near effect error in photoetch process |
| 12/25/2002 | CN1386818A Composition contg. azacyclic compound and glycol for grain decoration of resin material, removal of stain and removal of resin material |
| 12/25/2002 | CN1386635A Imaging device for generating multiple image points in one projection line |
| 12/25/2002 | CN1097210C Light sensitive composition contg. arylhydrazo dye |
| 12/25/2002 | CN1097091C Cleaning agent article for cleaning photoresist during mfg. semiconductor |
| 12/25/2002 | CN1097073C 聚合物组合物和抗蚀材料 Polymer composition and a resist material |
| 12/25/2002 | CN1097057C Borate photoinitiators obtained from polyboranes |
| 12/24/2002 | US6499007 Parameter editing method and semiconductor exposure system |
| 12/24/2002 | US6499003 Method and apparatus for application of proximity correction with unitary segmentation |
| 12/24/2002 | US6498803 Narrow band excimer or molecular fluorine laser with adjustable bandwidth |
| 12/24/2002 | US6498801 Solid state laser for microlithography |
| 12/24/2002 | US6498685 Maskless, microlens EUV lithography system |
| 12/24/2002 | US6498649 Pattern reading apparatus |
| 12/24/2002 | US6498640 Method to measure alignment using latent image grating structures |
| 12/24/2002 | US6498635 Forming liquid crystal-on-silicon display and optical interference layers of silicon oxide and nitride; metallization of semiconductor wafers; photolithography |
| 12/24/2002 | US6498401 Alignment mark set and method of measuring alignment accuracy |
| 12/24/2002 | US6498352 Method of exposing and apparatus therefor |
| 12/24/2002 | US6498351 Illumination system for shaping extreme ultraviolet radiation used in a lithographic projection apparatus |
| 12/24/2002 | US6498350 Crash prevention in positioning apparatus for use in lithographic projection apparatus |
| 12/24/2002 | US6498349 Electrostatically focused addressable field emission array chips (AFEA's) for high-speed massively parallel maskless digital E-beam direct write lithography and scanning electron microscopy |
| 12/24/2002 | US6498226 Prepared from a cycloaliphatic diamine, especially adamantanediamine, and a cycloaliphatic fused ring dianhydride; heat resistance, low dielectric constant, and high transparency. |
| 12/24/2002 | US6498106 Prevention of defects formed in photoresist during wet etching |
| 12/24/2002 | US6498087 Method of increasing the conductivity of a transparent conductive layer |
| 12/24/2002 | US6497996 Fine pattern forming method |
| 12/24/2002 | US6497994 Photolithographic process for the formation of a one-piece needle |
| 12/24/2002 | US6497993 Forming apertures in dielectric layers on semiconductor substrates by photoresist removal |
| 12/24/2002 | US6497992 Process for manufacturing semiconductor integrated circuit device |
| 12/24/2002 | US6497989 Method of manufacturing a planographic printing plate |
| 12/24/2002 | US6497987 Photosensitive lithocholate derivative and chemically amplified photoresist composition containing the same |
| 12/24/2002 | US6497982 Method for suppressing optical proximity effect bias within a wafer |
| 12/24/2002 | US6497981 Method of forming color filter array |
| 12/24/2002 | US6497048 Resist-dispenser nozzle calibration tool and method thereof |
| 12/20/2002 | WO2002000756A1 Insulating resin composition, adhesive resin composition and adhesive sheeting |
| 12/20/2002 | CA2413759A1 Resin composition for insulation material, resin composition for adhesive and adhesion sheet |
| 12/19/2002 | WO2002102122A1 Star pinch x-ray and extreme ultraviolet photon source |
| 12/19/2002 | WO2002101804A1 Exposure device, device manufacturing method, and temperature stabilization flow passage device |
| 12/19/2002 | WO2002101802A1 Electron beam exposure system, electron beam exposing method, and method for fabricating semiconductor element |
| 12/19/2002 | WO2002101801A1 Device ande method for predicting circuit pattern transfer characteristics and device and method for providing exposure system performance information and information outputting system and information outputting method |
| 12/19/2002 | WO2002101602A1 Apparatus and methods for modeling process effects and imaging effects in scanning electron microscopy |
| 12/19/2002 | WO2002101469A1 Method of processing lithographic printing plate precursors |
| 12/19/2002 | WO2002101468A2 Design and layout of phase shifting photolithographic masks |
| 12/19/2002 | WO2002101467A1 Method of forming thick resist pattern |
| 12/19/2002 | WO2002101466A2 Exposure control for phase shifting photolithographic masks |
| 12/19/2002 | WO2002101465A2 Phase conflict resolution for photolithographic masks |
| 12/19/2002 | WO2002101464A2 Optical proximity correction for phase shifting photolithographic masks |
| 12/19/2002 | WO2002101463A1 Patterning compositions using e-beam lithography and structures and devices made thereby |
| 12/19/2002 | WO2002100903A1 Oxime ester photoinitiators having a combined structure |
| 12/19/2002 | WO2002077712A3 Photoresist composition |
| 12/19/2002 | WO2002073245A3 High power incoherent light source with laser array |
| 12/19/2002 | WO2002067292A3 Semiconductor package and method of preparing same |
| 12/19/2002 | WO2000043731A9 Multiple alignment mechanisms near shared processing device |
| 12/19/2002 | US20020194576 Method of evaluating the exposure property of data to wafer |
| 12/19/2002 | US20020193901 Exposure apparatus and method |
| 12/19/2002 | US20020193622 For use as additives in chemical amplification photolithography, photoresists |
| 12/19/2002 | US20020193542 Photosensitive polymer and chemically amplified photoresist composition containing the same |
| 12/19/2002 | US20020192983 Method for fabricating organic thin film |
| 12/19/2002 | US20020192945 Method of forming wiring structure by using photo resist having optimum development rate |
| 12/19/2002 | US20020192693 Apparatus for polymer synthesis |
| 12/19/2002 | US20020192684 Arrays for detecting nucleic acids |
| 12/19/2002 | US20020192602 Forming nesting contour on a fiber optic array; nesting a surface of non-planar article against contour; exposing photoresist optically connected to proximal optical fiber surface within contours; developing; etching |
| 12/19/2002 | US20020192601 Producing a film by using an organic solvent solution containing as essential components a thermoplastic resin, a photopolymerizable monomer and a photopolymerization initiator, exposing the film to light and developing the film |
| 12/19/2002 | US20020192598 Defining multiple position-measurement marks on the reticle; using a reticle-inspection device detecting respective positional coordinates of marks on the reticle; mounting reticle in the microlithography apparatus and detecting |
| 12/19/2002 | US20020192597 Method of manufacturing photopolymer plates |
| 12/19/2002 | US20020192596 Photosensitive resin composition and color filter |
| 12/19/2002 | US20020192595 Multi-layered resist structure and manufacturing method of semiconductor device |
| 12/19/2002 | US20020192594 High etch rates as well as good light-absorbing properties |
| 12/19/2002 | US20020192593 Used as chemically amplified resist, exhibits high sensitivity, resolution, radiation transmittance, and surface smoothness, and is free from the problem of partial insolublization during overexposure |
| 12/19/2002 | US20020192592 Negative-working resist composition for electron beams or X-rays |