| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 01/02/2003 | EP1269514A2 An enhanced resist strip in a dielectric etcher using downstream plasma |
| 01/02/2003 | EP1269468A1 Apparatus having line source of radiant energy for exposing a substrate |
| 01/02/2003 | EP1269266A1 A method of improving photomask geometry |
| 01/02/2003 | EP1269265A2 Exposure device and method for compensating optical defects |
| 01/02/2003 | EP1269264A2 Method for evaluation of reticle image using aerial image simulator |
| 01/02/2003 | EP1269261A2 Solid imaging compositions for preparing polypropylene-like articles |
| 01/02/2003 | EP1269259A1 Solventless, resistless direct dielectric patterning |
| 01/02/2003 | EP1269258A1 Organic polymeric antireflective coatings deposited by chemical vapor deposition |
| 01/02/2003 | EP1269256A1 Three dimensional optical memory storage |
| 01/02/2003 | EP1268660A1 Lithographic printing plate having high chemical resistance |
| 01/02/2003 | EP1268216A1 Printing plate in the form of a roller and method for obtaining same |
| 01/02/2003 | EP1268209A2 Ablatable processless imaging member and method of use |
| 01/02/2003 | EP1268189A1 Flame retardant optical films |
| 01/02/2003 | EP1032866A4 Solid-capped liquid photopolymer printing elements |
| 01/02/2003 | EP1005668A4 Releasable photopolymer printing plate and method of forming same |
| 01/02/2003 | EP0944708B1 Non-corrosive cleaning composition for removing plasma etching residues |
| 01/02/2003 | EP0804431B9 GLYCOPROTEIN IIb/IIIa ANTAGONISTS |
| 01/02/2003 | EP0759192B1 Process control strip and a method of recording |
| 01/01/2003 | CN1388920A Photosensitive polysilazane composition, method of forming pattern therefrom, and method of burning coating film thereof |
| 01/01/2003 | CN1388919A Composition having refractive index sensitively changealbe by radiation and method for forming refractive index pattern |
| 01/01/2003 | CN1388918A Method of forming optical images, mask for use in this method, method of manufacturing a device using this method, and apparatus for carrying out this method |
| 01/01/2003 | CN1388414A Material for preservative formation |
| 01/01/2003 | CN1388413A Real-time pattern contour monitoring method |
| 01/01/2003 | CN1388412A Photo sensitive composition and negative lithographic printing plate |
| 01/01/2003 | CN1388009A Supporting body for lithographic printing plate and lithographic printing plate originals |
| 01/01/2003 | CN1387998A Composition of forme produced with polymer materials having imide group and composition elimination |
| 01/01/2003 | CN1387997A Method and equipment for producing a printing block |
| 01/01/2003 | CN1097851C Method for forming capacitor |
| 01/01/2003 | CN1097688C Method and system for preventing in continent drop |
| 01/01/2003 | CN1097601C Process for producing photoetching rubber composition with very lower content of metalion |
| 12/31/2002 | USRE37946 Exposure method and projection exposure apparatus |
| 12/31/2002 | US6501824 X-ray mask with a micro-actuator |
| 12/31/2002 | US6501535 Exposure control method and apparatus |
| 12/31/2002 | US6501534 Automated periodic focus and exposure calibration of a lithography stepper |
| 12/31/2002 | US6501533 Scanning type exposure apparatus and method |
| 12/31/2002 | US6501532 Exposure apparatus and method of controlling the same |
| 12/31/2002 | US6501083 Methods for calculating cumulative dose of exposure energy from regions of a microlithography reticle for use in correcting proximity effects |
| 12/31/2002 | US6500971 Ester compounds having alicyclic and oxirane structures and method for preparing the same |
| 12/31/2002 | US6500961 Microstructure patterns for photoresists |
| 12/31/2002 | US6500878 Improving adhesion of acrylate resins |
| 12/31/2002 | US6500875 Photopolymerization initiator having a solubility in water of 3 percent by weight or more, especially an ethoxylated p-(2-hydroxyethyl)-2-hydroxyisobutyrophenone |
| 12/31/2002 | US6500605 Removal of photoresist and residue from substrate using supercritical carbon dioxide process |
| 12/31/2002 | US6500604 Forming chemically resistant protective material layer on surface of chemically sensitive organic thin film, forming photoresist on exposed surface, patterning photoresist, transferring pattern by dry etching |
| 12/31/2002 | US6500601 Method of manufacturing photopolymer plates |
| 12/31/2002 | US6500599 Precursor comprising support bearing ink-receptive light-heat conversion layer containing compound converting laser light to heat and hardened hydrophilic layer, wherein part of conversion layer remains at laser light-irradiated area |
| 12/31/2002 | US6500591 Forming plurality of latent images in resist on substrate which cover printing field of lens system of lithographic tool, each image having associated focus, determining scattered energy as function of associated focus, averaging |
| 12/31/2002 | US6500291 Device and method for lamination |
| 12/31/2002 | US6500270 For removing remaining resist layer film after etching without swelling the insulation film (acrylic or polyimide resin); semiconductors; liquid crystal displays |
| 12/31/2002 | US6499935 Photomask case, transporting apparatus, and transporting method |
| 12/31/2002 | US6499893 Image-recording device |
| 12/31/2002 | US6499880 Static pressure air bearing |
| 12/31/2002 | US6499777 End-effector with integrated cooling mechanism |
| 12/31/2002 | CA2102987C Formation of microstructures using a preformed photoresist sheet |
| 12/29/2002 | CA2390193A1 Reflective hood for heat-shrinking film onto an open-topped container and method of using same |
| 12/29/2002 | CA2390192A1 Method and apparatus for marking shrink wrap lid for beverage container |
| 12/27/2002 | WO2002103776A2 Method for relating photolithography overlay target damage and chemical mechanical planarization (cmp) fault detection to cmp tool identification |
| 12/27/2002 | WO2002103766A1 Scanning exposure method and scanning exposure system, and device production method |
| 12/27/2002 | WO2002103764A1 Electron beam exposure system |
| 12/27/2002 | WO2002103455A2 Method and apparatus for imaging with fiber optic arrays on non-flat surfaces |
| 12/27/2002 | WO2002103431A1 Catadioptric system and exposure system provided with the system |
| 12/27/2002 | WO2002103413A1 Optical member, process for producing the same, and projection aligner |
| 12/27/2002 | WO2002103310A1 Birefringence measurement at deep-ultraviolet wavelengths |
| 12/27/2002 | WO2002103285A1 Interferometer system |
| 12/27/2002 | WO2002102952A1 Aqueous buffered fluoride-containing etch residue removers and cleaners |
| 12/27/2002 | WO2002102908A2 Marking substrates |
| 12/27/2002 | WO2002102867A1 'high ortho' novolak copolymers and composition thereof |
| 12/27/2002 | WO2002102858A1 Fluorine-containing compounds and polymers derived therefrom |
| 12/27/2002 | WO2002102759A1 Novel adamantane derivative |
| 12/27/2002 | WO2002093254A8 Lithography system and method for device manufacture |
| 12/27/2002 | WO2002085832A3 Solid mixtures of alpha-hydroxycarbonyl derivatives of alpha-methylstyrene oligomers and their use |
| 12/27/2002 | WO2002082185B1 Perfluoroalkylsulfonic acid compounds for photoresists |
| 12/27/2002 | WO2002071153A3 Method for uniformly coating a substrate |
| 12/27/2002 | WO2002071152A3 Method of controlling the thickness of layers of photoresist |
| 12/27/2002 | WO2002065482A3 Collector with an unused area for lighting systems having a wavelength of ≤ 193 nm |
| 12/27/2002 | WO2002016477A3 Organosilicate resins as hardmasks for organic polymer dielectrics in fabrication of microelectronic devices |
| 12/27/2002 | CA2451426A1 Fluorine-containing compounds and polymers derived therefrom |
| 12/26/2002 | US20020199157 Mixed-mode optical proximity correction |
| 12/26/2002 | US20020198333 First set of recurring monomers comprising an epoxide ring reacted with a light attenuating compound so as to open the epoxide ring, a second set of reccuring monomers comprising unreacted epoxide rings, appyling to a substrate, and curing |
| 12/26/2002 | US20020198294 Base polymer of a polyamide having pendant hydroxyl groups or polybenzoxazole and as dye component methine dyes, azomethine dyes, coumarin dyes, triarylmethane dyes and/or azo dyes and their derivatives; ARC coatings (antireflective coatings) |
| 12/26/2002 | US20020198269 Antireflective porogens |
| 12/26/2002 | US20020197887 Method of removing a photoresist layer on a semiconductor wafer |
| 12/26/2002 | US20020197878 Film forming method and film forming apparatus |
| 12/26/2002 | US20020197876 Single-chamber dual-temperature photoresist dry strip |
| 12/26/2002 | US20020197869 Water-based resist stripping liquid management apparatus and water-based resist stripping liquid management method |
| 12/26/2002 | US20020197867 Environmental control equipment/method for developing apparatus |
| 12/26/2002 | US20020197835 Anti-reflective coating and methods of making the same |
| 12/26/2002 | US20020197819 Method of manufacturing semiconductor device including a step of forming element isolation trench and semiconductor device |
| 12/26/2002 | US20020197749 Method of monitoring and controlling a photoresist edge bead |
| 12/26/2002 | US20020197747 Method for etching organic film, method for fabricating semiconductor device and pattern formation method |
| 12/26/2002 | US20020197746 Substrate processing apparatus and substrate processing method |
| 12/26/2002 | US20020197565 Method of transferring photomask patterns |
| 12/26/2002 | US20020197564 Stabilized infrared-sensitive polymerizable systems |
| 12/26/2002 | US20020197563 Thermal switchable composition and imaging member containing polymethine IR dye and methods of imaging and printing |
| 12/26/2002 | US20020197559 Polymers, resist compositions and patterning process, novel tetrahydrofuran compounds and their preparation |
| 12/26/2002 | US20020197558 Photoacid generators for use in photoresist compositions |
| 12/26/2002 | US20020197557 Transmittance of a chemically amplified resist against light of a wavelength shorter than a 180 nm band is improved when polymer includes a polyhydroxystyrene derivative having hexafluoroisopropyl alcohol on its side chain |
| 12/26/2002 | US20020197556 Polymer having one or more polar functional groups, wherein at least one of the functional groups is protected with a silyl ketal group; an acid generator; and a solvent |
| 12/26/2002 | US20020197555 One filter sheet of a self-supported fibrous matrix having immobilized therein a particulate filter aid and a particulate ion exchange resin; other filter sheet of a self supporting matrix of fibers, such as cellulose fibers |
| 12/26/2002 | US20020197554 Solution coating a light emitting material onto the donor element; and selectively thermal transferring the emitter layer from the donor element to a receptor and proximate to a second device layer that is incompatible with the solvent. |
| 12/26/2002 | US20020197548 Especially for use with a scanning-type exposure apparatus. |