| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 01/07/2003 | US6503682 Photoresist composition, preparation method thereof and method for forming a pattern during semiconductor processing using the photoresist composition |
| 01/07/2003 | US6503672 Lithography; higher current for faster patterning; imaging/ resolution; semiconductors |
| 01/07/2003 | US6503671 Lithography system for accomplishing a smaller size and higher performance of a semiconductor device |
| 01/07/2003 | US6503667 Method for fabricating mask |
| 01/07/2003 | US6503568 Resist coating and recycling method |
| 01/07/2003 | US6503003 Film forming method and film forming apparatus |
| 01/07/2003 | US6502426 VUV transmitting silicon oxyfluoride glass, said silicon oxyfluoride glass containing a plurality of doped O2 molecules with absorption bands: excimer laser exposure of at least 9.92 E6 pulses at 2 mJ/cm2- pulse. supplying an oxygen doping |
| 01/07/2003 | CA2265294C Method of lithographic imaging with reduced debris-generated performance degradation and related constructions |
| 01/07/2003 | CA2078722C Alkylbisacylphosphine oxides |
| 01/03/2003 | WO2003001633A2 Method and device utilizing driving force to deliver deposition compound |
| 01/03/2003 | WO2003001537A1 Material and method for making an electroconductive pattern |
| 01/03/2003 | WO2003001521A2 Method for the production of an optical disk matrix |
| 01/03/2003 | WO2003001300A1 Thermally sensitive coating compositions containing mixed diazo novolaks useful for lithographic elements |
| 01/03/2003 | WO2003001299A1 Material having a conductive pattern; and a material and method for making a conductive pattern |
| 01/03/2003 | WO2003001298A1 Process of machining polymers using a beam of energetic ions |
| 01/03/2003 | WO2003001297A2 Method for determining lithographic focus and exposure |
| 01/03/2003 | WO2003001295A1 Radiation-curable resin composition and rapid prototyping process using the same |
| 01/03/2003 | WO2003001294A1 Resist compositions with polymers having 2-cyano acrylic monomer |
| 01/03/2003 | WO2003001293A1 Photosensitive polyimide precursor compositions |
| 01/03/2003 | WO2003001271A1 Optical system and exposure system provided with the optical system |
| 01/03/2003 | WO2002042844A3 Stamp, method and apparatus for using said stamp |
| 01/03/2003 | WO2002041076A3 Photolithographic mask |
| 01/03/2003 | CA2451613A1 Thermally sensitive coating compositions containing mixed diazo novolaks useful for lithographic elements |
| 01/03/2003 | CA2451260A1 Method for the production of an optical disk matrix |
| 01/02/2003 | US20030005405 Method for improving substrate alignment |
| 01/02/2003 | US20030005395 Method and apparatus for determining optimum size of LSI chip |
| 01/02/2003 | US20030004289 Radiation transparent, sensitivity, chemical resistance |
| 01/02/2003 | US20030004283 Protective coatings |
| 01/02/2003 | US20030004076 Screening mask having a stress-relieving area |
| 01/02/2003 | US20030004075 Cleaning solution for removing residue |
| 01/02/2003 | US20030003760 Photoresist coating method and apparatus |
| 01/02/2003 | US20030003756 Method for forming contact by using arf lithography |
| 01/02/2003 | US20030003742 Gas assisted method for applying resist stripper and gas-resist stripper combinations |
| 01/02/2003 | US20030003724 Manufacturing method of the semiconductor device |
| 01/02/2003 | US20030003714 Method for forming fine pattern in semiconductor device |
| 01/02/2003 | US20030003683 Plasma enhanced method for increasing silicon-containing photoresist selectivity |
| 01/02/2003 | US20030003659 Method for manufacturing semiconductor memory device by using photoresist pattern exposed with ArF laser beam |
| 01/02/2003 | US20030003475 Arrays for detecting nucleic acids |
| 01/02/2003 | US20030003408 Method for improved line patterning by chemical diffusion |
| 01/02/2003 | US20030003407 Substrate with a developed photoresist layer, exposed to ultraviolet light that is generated from neon and hardening the photoresist layer |
| 01/02/2003 | US20030003406 Film of thermo-resist applied to a substrate surface is scanned by a focused heat source without a phototool |
| 01/02/2003 | US20030003405 Surface smoothing of stereolithographically formed 3-D objects |
| 01/02/2003 | US20030003404 Method for manufacturing multi-level interconnections with dual damascene process |
| 01/02/2003 | US20030003403 Layers of photoresist are irradiated to cause the creation of a chemical within that portion and then the passage of time and/or the application of heat causes propagation to another portion |
| 01/02/2003 | US20030003402 Developed in a near vertical orientation with developer solution showered onto the layer, rinsed and dried by flowing air or nitrogen over the surface |
| 01/02/2003 | US20030003399 Thermal initiator system using leuco dyes and polyhalogene compounds |
| 01/02/2003 | US20030003398 Photosensitive composition, cured article thereof, and printed circuit board using the same |
| 01/02/2003 | US20030003397 Organic anti-reflective coating polymer, anti-reflective coating composition comprising the same and methods of preparation thereof |
| 01/02/2003 | US20030003393 Photoresist, photolithography method using the same, and method for producing photoresist |
| 01/02/2003 | US20030003392 Compound wherein a carboxyl group is protected by an acid labile group, especially a polymer from an unsaturated ester |
| 01/02/2003 | US20030003391 High resolution photoresist compositions |
| 01/02/2003 | US20030003390 Interlayer remains substantially intact when the thermal transfer element is exposed to imaging radiation to selectively transfer the thermal transfer layer. |
| 01/02/2003 | US20030003389 Thermal transfer of a black matrix containing carbon black |
| 01/02/2003 | US20030003388 Photosensitive resin composition |
| 01/02/2003 | US20030003385 Carrying out the correction for each region of the image field making use of the corresponding set of rules. |
| 01/02/2003 | US20030003384 Aligning method, exposure method, exposure apparatus, and device manufacturing method |
| 01/02/2003 | US20030003383 Device manufacturing method, device manufactured thereby and a mask for use in the method |
| 01/02/2003 | US20030003380 Surface smoothing of stereolithographically formed 3-D objects |
| 01/02/2003 | US20030003379 Photoresist monomers, polymers thereof and photoresist compositons containing the same |
| 01/02/2003 | US20030003372 Each reflector comprising: a first mirror; and a second mirror separated from said first mirror by a gap. |
| 01/02/2003 | US20030003371 Removed by employing methods which provide a gradual sloped region in the transparent or semi-transparent substrate which is formed in an area of the substrate opposite to that of the opaque image which is formed thereon. |
| 01/02/2003 | US20030003180 Surface smoothing of stereolithographically formed 3-D objects |
| 01/02/2003 | US20030003032 For conducting a light directed chemical synthesis or reaction on a substrate using a computer controlled digital light processing micromirror array |
| 01/02/2003 | US20030002973 Wafer handling system and wafer handling method |
| 01/02/2003 | US20030002878 Critical dimension monitoring from latent image |
| 01/02/2003 | US20030002756 Hydrostatic gas bearing, hydrostatic gas bearing device for use in vacuum environment, and gas recovering method for the hydrostatic gas bearing device |
| 01/02/2003 | US20030002147 High NA system for multiple mode imaging |
| 01/02/2003 | US20030002130 Compositions and methods involving direct write optical lithography |
| 01/02/2003 | US20030002043 Periodic patterns and technique to control misalignment |
| 01/02/2003 | US20030002031 Determination of center of focus by diffraction signature analysis |
| 01/02/2003 | US20030002026 Apparatus for monitoring discharge of photoresist |
| 01/02/2003 | US20030002024 Exposure apparatus and illumination apparatus |
| 01/02/2003 | US20030002023 Projection exposure system as well as a process for compensating image defects occurring in the projection optics of a projection exposure system, in particular for microlithography |
| 01/02/2003 | US20030002022 Control of a distribution of illumination in an exit pupil of an EUV illumination system |
| 01/02/2003 | US20030002021 Exposure apparatus and exposure method |
| 01/02/2003 | US20030002020 Projection exposure apparatus |
| 01/02/2003 | US20030001798 Multi-exposure drawing method and apparatus therefor |
| 01/02/2003 | US20030001155 Pattern forming method and semiconductor device manufactured by ussing said pattern forming method |
| 01/02/2003 | US20030001114 Projection exposure method and apparatus |
| 01/02/2003 | US20030001107 Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 01/02/2003 | US20030001103 Wafer chuck, exposure system, and method of manufacturing semiconductor device |
| 01/02/2003 | US20030000920 Etching method using photoresist etch barrier |
| 01/02/2003 | US20030000724 Thermomechanical process for producing a planar resist structure |
| 01/02/2003 | US20030000453 Optical element and manufacturing method thereof |
| 01/02/2003 | EP1271250A2 Method of developing a lithographic printing plate precursor |
| 01/02/2003 | EP1271249A1 Method for forming resist pattern in reverse-tapered shape |
| 01/02/2003 | EP1271248A1 Lithographic apparatus |
| 01/02/2003 | EP1271247A1 Device manufacturing method and a mask for use in the method |
| 01/02/2003 | EP1271246A1 Method for monitoring the quality of a lithographic structuring step |
| 01/02/2003 | EP1271245A2 Applying apparatus and method of controlling film thickness for enabling uniform thickness |
| 01/02/2003 | EP1271244A1 Method for fabricating an organic thin film |
| 01/02/2003 | EP1271243A2 Image forming material, color filter master plate, and color filter |
| 01/02/2003 | EP1271242A2 Mask pattern magnification correction method, magnification correction apparatus, and mask structure |
| 01/02/2003 | EP1270644A1 Active energy ray-curable polyimide resin composition |
| 01/02/2003 | EP1270636A1 Photocurable composition, process for producing photocurable composition, photocurable pressure-sensitive adhesive sheet, process for producing photocurable pressure-sensitive adhesive sheet, and method of bonding |
| 01/02/2003 | EP1270553A2 Acid generator, sulfonic acid, sulfonic acid derivatives and radiation-sensitive resin composition |
| 01/02/2003 | EP1270218A2 Lithographic printing plate precursor and production method of lithographic printing plate |
| 01/02/2003 | EP1270217A1 Method of making a heat-mode lithographic printing plate precursor |
| 01/02/2003 | EP1270215A1 Method of lithographic printing |
| 01/02/2003 | EP1269525A1 Resist nozzle calibration tool and method therefor |