| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 01/09/2003 | WO2001068567A3 Photostructured paste |
| 01/09/2003 | US20030009739 Pattern data generation system, method and program for pattern data generation, reticle fabricating method, and semiconductor device manufacturing method using the pattern data |
| 01/09/2003 | US20030008996 Utilized for image forming materials, for example, stereolithography, holography, lithographic printing plate precursors, color proofs, photoresists and color filters, and photosetting resin materials such as ink, paint, adhesive |
| 01/09/2003 | US20030008968 Coating a patterned resist layer on a substrate surface with an aqueous coating solution comprising a water-soluble resin and a water-soluble amine compound; drying; heat treatment to effect thermal shrinkage of the coating layer; removing |
| 01/09/2003 | US20030008530 Method of manufacturing semiconductor laser element |
| 01/09/2003 | US20030008522 Applying composition that includes at least one silicon-based dielectric precursor to a substrate, gelling or aging the applied coating, separating coating, curing |
| 01/09/2003 | US20030008502 Comprising imaging polymer and radiation sensitive acid generator, imaging polymer comprising cyano-modified acrylic monomer units comprising an acrylic moiety with a cyano group pendant therefrom |
| 01/09/2003 | US20030008302 Sequencing of surface immobilized polymers utilizing microfluorescence detection |
| 01/09/2003 | US20030008247 Imaging Materials comprising electrically conductive polymer particle layers |
| 01/09/2003 | US20030008246 Method and apparatus for enhancing resist sensitivity and resolution by application of an alternating electric field during post-exposure bake |
| 01/09/2003 | US20030008245 Fine structure and devices employing it |
| 01/09/2003 | US20030008242 Detecting the sidewall angles and comparing them with previously set threshold values set to guarantee a neglectable resist flow for any structure sizes on the pattern that will be projected onto the resist |
| 01/09/2003 | US20030008241 Aliphatic cyclic hydrocarbon group containing resin enhances in the dissolution rate in an alkaline developing solution by an acid, and an acid generator |
| 01/09/2003 | US20030008240 Method for producing resist structures |
| 01/09/2003 | US20030008238 Process of drying a cast polymeric film disposed on a workpiece |
| 01/09/2003 | US20030008237 Substrate coated with an ionic thermal acid generator and a resin with a photoresist layer overtop |
| 01/09/2003 | US20030008233 Negative-working photoresist composition |
| 01/09/2003 | US20030008232 (Meth)acrylate compounds having a norbornane, bicyclo(2.2.2) octane, 7-oxanorbornane or cyclohexane ring structure and a gamma-butyrolactone ring structure connected together by a linker, useful in forming polymer with high transparency |
| 01/09/2003 | US20030008231 Polymers, resist compositions and patterning process |
| 01/09/2003 | US20030008230 Thiophene-containing photo acid generators for photolithography |
| 01/09/2003 | US20030008228 Support having a rear surface and an image recording layer disposed on the support, and image recording layer having a front surface including, a radical generating onium salt, and a radically polymerizable compound |
| 01/09/2003 | US20030008223 An image recording layer including a polymer compound which contains a functional group with a hydrophilic/hydrophobic character being changable by heat, acid or irradiation and is directly chemically bonded to the substrate |
| 01/09/2003 | US20030008217 Preparing a substrate for a pattern-formed structure having a characteristic-modifiable layer whose characteristic at a surface thereof can be modified by the action of a photocatalyst |
| 01/09/2003 | US20030008216 Assist features for contact hole mask patterns |
| 01/09/2003 | US20030008215 Method for correcting optical proximity effects in a lithographic process using the radius of curvature of shapes on a mask |
| 01/09/2003 | US20030008066 Supplying mixture of solvent dissolved photoresist; rotating target; spreading radial; controlling thickness; semiconductors |
| 01/09/2003 | US20030007712 Diffraction-optical component, illumination system and exposure system comprising such a diffraction-optical component as well as an exposure method employing such an exposure system |
| 01/09/2003 | US20030007596 Method for adjusting gap between two objects and exposure method using the same, gap adjusting apparatus, and exposure apparatus |
| 01/09/2003 | US20030007253 Large-apertured projection lens with minimal diaphragm error |
| 01/09/2003 | US20030007236 System and method for focusing an elastically deformable lens |
| 01/09/2003 | US20030007158 Method and apparatus to reduce effects of sheared wavefronts on interferometric phase measurements |
| 01/09/2003 | US20030007153 Alignment system of semiconductor exposure apparatus and diaphragm unit of the alignment system |
| 01/09/2003 | US20030007143 In-situ source metrology instrument and method of use |
| 01/09/2003 | US20030007140 Stage apparatus and method of driving the same |
| 01/09/2003 | US20030007139 Aligner |
| 01/09/2003 | US20030007138 Projection optical system, a projection exposure apparatus, and a projection exposure method |
| 01/09/2003 | US20030007137 Illumination device, exposure apparatus and exposure method |
| 01/09/2003 | US20030007136 Exposure apparatus |
| 01/09/2003 | US20030007066 Image-recording device for a printing form having macrooptics of the offner type |
| 01/09/2003 | US20030006527 Method of fabricating micron-and submicron-scale elastomeric templates for surface patterning |
| 01/09/2003 | US20030006383 Plasma focus light source with improved pulse power system |
| 01/09/2003 | US20030006381 Method and apparatus for pyroelectric lithography using patterned emitter |
| 01/09/2003 | US20030006380 Gas flushing system for use in lithographic apparatus |
| 01/09/2003 | US20030006361 Direct gear driven carriage assembly for an imaging system |
| 01/09/2003 | US20030006212 Method of making phase mask for machining optical fiber and optical fiber having bragg diffraction grating produced using the phase mask for machining optical fiber |
| 01/09/2003 | US20030006143 Directed assembly of functional heterostructures |
| 01/09/2003 | US20030005839 Device for selecting and conveying printing plates |
| 01/08/2003 | EP1274287A1 Debris removing system for use in X-ray source |
| 01/08/2003 | EP1274121A1 Wafer chuck for supporting a semiconductor wafer |
| 01/08/2003 | EP1273974A2 Method for reducing a pattern dimension in a photoresist layer |
| 01/08/2003 | EP1273973A1 Method for adjusting a temperature in a resist process |
| 01/08/2003 | EP1273972A1 Developer for photopolymerizable presensitized plate for use in making lithographic printing plate and method for preparing lithographic printing plate |
| 01/08/2003 | EP1273971A2 Process for photopolymerization by exposure of a photosensitive lithographic printing plate |
| 01/08/2003 | EP1273970A2 Positive photosensitive composition |
| 01/08/2003 | EP1273969A2 Positive resist composition |
| 01/08/2003 | EP1273964A1 Device for selecting and conveying printing plates |
| 01/08/2003 | EP1273052A1 Method for producing organic light-emitting diodes |
| 01/08/2003 | EP1273034A2 Automated process monitoring and analysis system for semiconductor processing |
| 01/08/2003 | EP1273033A1 Inhibition of titanium corrosion |
| 01/08/2003 | EP1273024A2 Bi-directional electron beam scanning apparatus |
| 01/08/2003 | EP1272903A2 Apparatus for generating a laser pattern on a photomask and associated methods |
| 01/08/2003 | EP1272902A2 Method for two dimensional adaptive process control of critical dimensions during spin coating process |
| 01/08/2003 | EP1272901A1 Photoimageable, aqueous acid soluble polyimide polymers |
| 01/08/2003 | EP1272288A1 Processes and apparatus for treating electronic components |
| 01/08/2003 | EP1208146A4 Screen coating composition and method for applying same |
| 01/08/2003 | EP1169401B1 Radiation curable coating composition comprising a secondary curing agent |
| 01/08/2003 | EP1119590B1 Substituted phthalocyanine |
| 01/08/2003 | EP1079973B1 Waterless lithographic plate |
| 01/08/2003 | EP0974074B1 Highly transparent, colour-pigmented high molecular weight material |
| 01/08/2003 | EP0969918B1 Method for producing structured, self-organized molecular monolayers of individual molecular species |
| 01/08/2003 | EP0800704B1 Method of manufacturing a semiconductor device |
| 01/08/2003 | CN1390435A Method for obtaining an extraeme ultraviolet radiation source, radiation source and use in lithography |
| 01/08/2003 | CN1390360A Plasma focus light source with improved pulse power system |
| 01/08/2003 | CN1390318A Photosensitive resin composltion, photo sensitive element using the same, method for producing resist pattern, resist pattern and substrate having the resist pattern laminated thereon |
| 01/08/2003 | CN1389903A Environment control device of display device and its environment control method |
| 01/08/2003 | CN1098532C Material for anti reflection film and method of manufacturing semiconductor device using said material |
| 01/07/2003 | USRE37962 Photopolymerization addition polymers, sensitizers and titanocene |
| 01/07/2003 | US6504903 Laser-excited plasma light source, exposure apparatus and its making method, and device manufacturing method |
| 01/07/2003 | US6504896 X-ray illumination optical system and x-ray reduction exposure apparatus |
| 01/07/2003 | US6504861 Laser gas replenishment method |
| 01/07/2003 | US6504860 Purge monitoring system for gas discharge laser |
| 01/07/2003 | US6504652 Apparatus and method for laser processing |
| 01/07/2003 | US6504644 Modulator design for pattern generator |
| 01/07/2003 | US6504609 Inspection method, apparatus and system for circuit pattern |
| 01/07/2003 | US6504599 Nm-order alignment precision; spring constants. |
| 01/07/2003 | US6504597 Optical arrangement |
| 01/07/2003 | US6504581 Liquid crystal display apparatus and manufacturing method thereof |
| 01/07/2003 | US6504162 Stage device, control system, and method for stabilizing wafer stage and wafer table |
| 01/07/2003 | US6504160 Stage device for an exposure apparatus and semiconductor device manufacturing method which uses said stage device |
| 01/07/2003 | US6503959 Photocurable composition containing an α-cyanoacrylate and a metallocene compound |
| 01/07/2003 | US6503852 Manufacturing process for semiconductor device, photomask, and manufacturing apparatus for semiconductor device |
| 01/07/2003 | US6503694 Water, base, and nonionic surfactant comprising (poly)oxyalkylene glycol alkylphenol; actinic ray-sensitive resists; printed and integrated circuits |
| 01/07/2003 | US6503693 UV assisted chemical modification of photoresist |
| 01/07/2003 | US6503692 Microelectronics; lithography; mixture of crosslinked organosilicon polymer, chromogens and acid generator |
| 01/07/2003 | US6503689 Crosslinked polymeric particles including one or more chromophore units such as anthracenyl methacrylate; relief images |
| 01/07/2003 | US6503688 A coating layer containing a polysubstituted triphenylene compound on the substrate surface, the polysubstituted triphenylene compound being an electron beam resist material |
| 01/07/2003 | US6503687 Alicyclic photosensitive polymer, resist composition containing the same and method of preparing the resist composition |
| 01/07/2003 | US6503686 Photoresists are comprised of a fluoroalcohol functional group and a nitrile-containing compound which together simultaneously mpart high ultraviolet (UV) transparency and developability in basic media |
| 01/07/2003 | US6503685 Heat-sensitive composition comprising a substance which absorbs light and generates heat, an anionic self water-dispersible resin particle, and a fluorine base surfactant |
| 01/07/2003 | US6503683 Screen printing stencil composition with improved water resistance |