| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 11/13/2013 | EP2662729A1 Method for preparation of lithographic printing plate |
| 11/13/2013 | EP2662728A1 Lithography system, method of clamping and wafer table |
| 11/13/2013 | EP2662727A2 Compound for resist and radiation-sensitive composition |
| 11/13/2013 | EP2661747A1 Method of making holographic recording materials and articles formed thereby |
| 11/13/2013 | EP2661328A1 Method of improving print performance in flexographic printing plates |
| 11/13/2013 | CN103392150A Exposure device and microlens array structure |
| 11/13/2013 | CN103389627A Photoresist cleaning liquid |
| 11/13/2013 | CN103389626A Environment-friendly printing treatment system |
| 11/13/2013 | CN103389625A Communication method of immersion liquid transmission system applied to immersion lithography machine |
| 11/13/2013 | CN103389624A Exposure device, exposure method, method for manufacturing device and opening plate |
| 11/13/2013 | CN103389623A Focusing and leveling device |
| 11/13/2013 | CN103389622A Photoresist resin composition, photoresist and method for manufacturing liquid equipment |
| 11/13/2013 | CN103389621A Oxime ester sulfonate type photo-acid generator |
| 11/13/2013 | CN103389620A Photosensitive resin composition for color filter and uses thereof |
| 11/13/2013 | CN103389619A Polyol polymer photosensitive resist and preparation method thereof |
| 11/13/2013 | CN103389583A Polarized light modulation component |
| 11/13/2013 | CN103389564A Projection object lens |
| 11/13/2013 | CN103389558A Axial lens adjusting device for photoetching objective lens |
| 11/13/2013 | CN103389554A Support height adjustable optical element multipoint support structure |
| 11/13/2013 | CN103389533A Method for manufacturing color filter and color filter |
| 11/13/2013 | CN103389529A Preparation method of micro-lens array component |
| 11/13/2013 | CN103387765A Photosensitive composition for solder resist printing ink or photoresist |
| 11/13/2013 | CN103387636A Sesquiterpene-containing film-forming resin and positive 248 nm photoresist thereof |
| 11/13/2013 | CN102768464B Photosensitive conductive aluminium paste and preparation method |
| 11/13/2013 | CN102576197B Method of improving print performance in flexographic printing plates |
| 11/13/2013 | CN102566338B Method for correcting alignment positions in photoetching alignment system |
| 11/13/2013 | CN102486617B Precise adjusting apparatus |
| 11/13/2013 | CN102445849B Light sensitive resin composition |
| 11/13/2013 | CN102393607B Positive photosensitive resin composition, and semiconductor device and display using same |
| 11/13/2013 | CN102361913B Novel polyamic acid, polyimide, photosensitive resin composition comprising same, and dry film produced from the composition |
| 11/13/2013 | CN102360122B Fly-eye lens |
| 11/13/2013 | CN102216855B A photoresist stripping composition for manufacturing LCD |
| 11/13/2013 | CN102203672B Imprint lithography system and method |
| 11/13/2013 | CN102203136B Photoinitiator mixtures |
| 11/13/2013 | CN102023480B Radiation-sensitive resin composition for forming cured product such as protective film for display device, insulating film or spacer, cured product, and process for forming cured product |
| 11/13/2013 | CN102004398B Two-side exposure device |
| 11/13/2013 | CN101866108B Photosetting and thermosetting solder resist composition, and printed wiring board using the same |
| 11/13/2013 | CN101833251B Microelectronic cleaning composition containing halogen oxygen acids, salts and derivatives thereof |
| 11/13/2013 | CN101479233B Radiation curable amino(meth)acrylates |
| 11/13/2013 | CN101462973B Nitrogen-containing polyfunctionality metacrylic acid ester monomer, preparation and use thereof |
| 11/12/2013 | US8582081 Device for the low-deformation replaceable mounting of an optical element |
| 11/12/2013 | US8580486 Salt having fluorine-containing carbanion structure, derivative thereof, photoacid generator, resist material using the photoacid generator, and pattern forming method |
| 11/12/2013 | US8580485 Method for forming three-dimensional pattern |
| 11/12/2013 | US8580484 Photosensitive compositions useful for forming active patterns, methods of forming such active patterns and organic memory devices incorporating such active patterns |
| 11/12/2013 | US8580483 Method of making nozzle chip |
| 11/12/2013 | US8580482 Copolymer and top coating composition |
| 11/12/2013 | US8580481 Resist polymer and resist composition |
| 11/12/2013 | US8580480 Radiation-sensitive resin composition, method for forming resist pattern, polymer and compound |
| 11/12/2013 | US8580479 Lithography using photoresist with photoinitiator and photoinhibitor |
| 11/12/2013 | US8580478 Latent acids and their use |
| 11/12/2013 | US8580477 Aqueous base-developable negative-tone films based on functionalized norbornene polymers |
| 11/12/2013 | US8580467 Method for fabricating color filter substrate |
| 11/12/2013 | US8578854 Curing of photo-curable printing plates using a light tunnel of mirrored walls and having a polygonal cross-section like a kaleidoscope |
| 11/12/2013 | CA2714788C Merged-mask micro-machining process |
| 11/12/2013 | CA2663076C Method and apparatus for production of a cast component |
| 11/07/2013 | WO2013165915A1 Cylindrical polymer mask and method of fabrication |
| 11/07/2013 | WO2013165211A1 Novel polyamic acid, photosensitive resin composition, dry film and circuit board |
| 11/07/2013 | WO2013164207A1 Illumination optical unit and optical system for euv projection lithography |
| 11/07/2013 | WO2013164187A1 Design rule and lithographic process co-optimization |
| 11/07/2013 | WO2013164145A1 Active torsion mode control for stage |
| 11/07/2013 | US20130296215 Water-rich stripping and cleaning formulation and method for using same |
| 11/07/2013 | US20130296214 Aqueous cleaner for the removal of post-etch residues |
| 11/07/2013 | US20130295508 Apparatus for thermal development with a conformable support |
| 11/07/2013 | US20130295507 Processes to form aqueous precursors, hafnium and zirconium oxide films, and hafnium and zirconium oxide patterns |
| 11/07/2013 | US20130295506 Resist pattern-forming method, and radiation-sensitive resin composition |
| 11/07/2013 | US20130295505 Radiation-sensitive resin composition, and radiation-sensitive acid generating agent |
| 11/07/2013 | US20130295495 Photoresist composition for forming a color filter and method of manufacturing a substrate for a display device |
| 11/07/2013 | US20130295323 Crosslinkable graft polymer non preferentially wetted by polystyrene and polyethylene oxide |
| 11/07/2013 | US20130293962 Irradiation module for a measuring apparatus |
| 11/07/2013 | US20130293872 Monitoring apparatus and method particularly useful in photolithographically processing substrates |
| 11/07/2013 | US20130293869 System for measuring the image quality of an optical imaging system |
| 11/07/2013 | US20130293866 Mask plate and exposing method |
| 11/07/2013 | US20130293865 Linear Stage for Reflective Electron Beam Lithography |
| 11/07/2013 | US20130293864 Exposure apparatus and device fabrication method |
| 11/07/2013 | US20130293863 Movable body apparatus, movable body drive method, exposure apparatus, exposure method, and device manufacturing method |
| 11/07/2013 | US20130293862 Polarization-modulating optical element |
| 11/07/2013 | US20130293861 Illumination system of a microlithographic projection exposure apparatus |
| 11/07/2013 | US20130293860 Exposure apparatus, exposure method, and method for producing device |
| 11/07/2013 | US20130293859 Large field projection objective for lithography |
| 11/07/2013 | US20130293858 Anisotropic phase shifting mask |
| 11/07/2013 | US20130293855 Exposure apparatus and device manufacturing method |
| 11/07/2013 | US20130293854 Exposure apparatus and device fabrication method |
| 11/07/2013 | DE102012219543A1 Arrangement structure for extreme UV (EUV) projection exposure system, has gas flow supply unit that is provided to supply flow of gas through optic element, such that heat exchange takes place between optic element and flow of gas |
| 11/07/2013 | DE102012218125A1 Axicon system i.e. microlithographic projection exposure system, for manufacturing e.g. LCDs, has axicon element with light entrance surface having stepped profile, and another axicon element with light exit surface having stepped profile |
| 11/07/2013 | DE102012207377A1 Beleuchtungsoptik sowie optisches System für die EUV-Projektionslithographie Illumination optics and optical system for EUV projection lithography |
| 11/07/2013 | DE102012207369A1 Optisches Element mit einer Beschichtung und Verfahren zur Überprüfung des optischen Elements An optical element with a coating and method of verifying the optical element |
| 11/07/2013 | DE102012008745A1 Anstrahlmodul für eine Messvorrichtung Anstrahlmodul for a measuring device |
| 11/06/2013 | EP2660854A2 Projection optical system, exposure apparatus and exposure method |
| 11/06/2013 | EP2660853A2 Projection optical system, exposure apparatus and exposure method |
| 11/06/2013 | EP2660852A2 Projection optical system, exposure apparatus and exposure method |
| 11/06/2013 | EP2660655A1 Lithography system, method of clamping and wafer table |
| 11/06/2013 | EP2660654A1 Infrared sensitive and chemical treatment free photosensitive composition and lithographic plate fabricated by using same |
| 11/06/2013 | EP2660638A1 Large view field projection lithography objective |
| 11/06/2013 | EP2660257A1 Aromatic hydrocarbon resin, composition for forming lithographic underlayer film, and method for forming multilayer resist pattern |
| 11/06/2013 | EP2660068A1 Planographic printing plate precursor and planographic printing method |
| 11/06/2013 | EP2660027A2 Method for manufacturing nano-imprint mould, method for manufacturing light-emitting diode using the nano imprint mould manufactured thereby, and light-emitting diode manufactured thereby |
| 11/06/2013 | EP2659309A1 Simultaneous measurement of multiple overlay errors |
| 11/06/2013 | EP2659308A1 Liquid immersion member, immersion exposure apparatus, exposing method, device fabricating method, program, and storage medium |
| 11/06/2013 | EP2659307A1 Process for fabricating high-precision objects by high-resolution lithography and dry deposition and objects thus obtained |
| 11/06/2013 | EP2659305A1 Method and device scanning a two-dimensional brush through an acousto-optic deflector (aod) having an extended field in a scanning direction |