| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 01/16/2003 | US20030012234 Six to ten KHz, or greater gas discharge laser system |
| 01/16/2003 | US20030011896 Optical system and exposure apparatus having the optical system |
| 01/16/2003 | US20030011894 Catadioptric objective |
| 01/16/2003 | US20030011893 Optical system and exposure apparatus equipped with the optical system |
| 01/16/2003 | US20030011860 Multi-exposure drawing method and apparatus therefor |
| 01/16/2003 | US20030011786 Methods and systems for determining overlay and flatness of a specimen |
| 01/16/2003 | US20030011771 Exposure apparatus and exposure method |
| 01/16/2003 | US20030011763 Projection exposure apparatus and method |
| 01/16/2003 | US20030011756 Projection exposure apparatus with a catadioptric projection optical system |
| 01/16/2003 | US20030011755 Projection exposure apparatus and method, catadioptric optical system and manufacturing method of devices |
| 01/16/2003 | US20030010937 Pattern generation method and apparatus using cached cells of hierarchical data |
| 01/16/2003 | US20030010936 Optically detectable alignment marks producing an enhanced signal-amplitude change from scanning of a detection light over the alignment mark, and associated alighment-detection methods |
| 01/16/2003 | US20030010935 Stage assembly having a follower assembly |
| 01/16/2003 | US20030010934 Lens array for electron beam lithography tool |
| 01/16/2003 | US20030010933 Mark-detection methods and charged-particle-beam microlithography methods and apparatus comprising same |
| 01/16/2003 | US20030010912 Methodology for critical dimension metrology using stepper focus monitor information |
| 01/16/2003 | US20030010902 Optical system with a plurality of optical elements |
| 01/16/2003 | US20030010748 Positive photosensitive compositions |
| 01/16/2003 | US20030010289 Environment exchange control for material on a wafer surface |
| 01/16/2003 | US20030010241 Patterning method with micro- contact printing and its printed product |
| 01/16/2003 | US20030010240 Method of lithographic printing without dampening liquid |
| 01/16/2003 | DE20023055U1 Photolithographic exposure unit for e.g. manufacturing DNA chips, scans target areas of biological material selectively with highly-focused flying spot illumination |
| 01/15/2003 | EP1276016A2 Exposure apparatus |
| 01/15/2003 | EP1276015A2 Stage apparatus and method of driving the same |
| 01/15/2003 | EP1276014A1 Method of detecting a raised area of a semiconductor wafer |
| 01/15/2003 | EP1276013A2 Method for making lithographic printing plate |
| 01/15/2003 | EP1276012A2 Resist patterning process |
| 01/15/2003 | EP1276011A1 Photocurable/thermosetting resin composition, photosensitive dry film formed therefrom, and method of forming pattern with the same |
| 01/15/2003 | EP1276010A2 Radiation-sensitive, positive working coating composition based on carboxylic copolymers |
| 01/15/2003 | EP1275995A2 Optical system with a plurality of optical elements |
| 01/15/2003 | EP1275676A1 Hydrogenated ring-opening metathesis copolymer and process for producing the same |
| 01/15/2003 | EP1275668A1 Photocurable composition, cured object, and process for producing the same |
| 01/15/2003 | EP1275666A1 Novel fluoropolymer having acid-reactive group and chemical amplification type photoresist composition containing the same |
| 01/15/2003 | EP1275665A1 Resins curable with actinic radiation, process for the production thereof, and photo- and thermo-setting resin composition |
| 01/15/2003 | EP1275518A1 Thermal transfer recording material |
| 01/15/2003 | EP1275138A1 Method of forming structures on a semiconductor substrate |
| 01/15/2003 | EP1275036A1 Abbe error correction system and method |
| 01/15/2003 | EP1275033A1 Pattern generation system using a spatial light modulator |
| 01/15/2003 | EP1275032A1 Mitigation of photoresist outgassing in vacuum lithography |
| 01/15/2003 | EP1275031A1 A substrate for and a process in connection with the product of structures |
| 01/15/2003 | EP1275030A1 Device for homogeneous heating of an object |
| 01/15/2003 | EP1275029A1 Scanning framing blade apparatus |
| 01/15/2003 | EP1274783A2 Stabilized cationically polymerizable composition, and adhesive film and conductor circuit comprising the same |
| 01/15/2003 | EP1274581A1 A method and an apparatus for controlling light intensity in connection with the exposure of photosensitive material |
| 01/15/2003 | EP1196788A4 Merged-mask micro-machining process |
| 01/15/2003 | EP1078454B1 Planar resist structure, especially an encapsulation for electric components and a thermomechanical method for the production thereof |
| 01/15/2003 | EP1024958B1 Manufacture of lithographic printing forms |
| 01/15/2003 | CN1391697A X射线变焦镜头 X-ray lens |
| 01/15/2003 | CN1391664A Ultraviolet and vacuum ultraviolet transparent polymer compositions and their uses |
| 01/15/2003 | CN1391263A Washing water and method for cleaning wafers |
| 01/15/2003 | CN1391139A Substrate processing devices |
| 01/15/2003 | CN1391138A Substrate processing devices |
| 01/15/2003 | CN1391137A Device for explosuring printing circuit board |
| 01/15/2003 | CN1391128A Videograph processing devices |
| 01/15/2003 | CN1391118A Technology for preparing electrostatic-type full-light switch for miniature machine |
| 01/15/2003 | CN1390898A Welding-resistant low-alkaline ink for developing and photosenstive imaging |
| 01/15/2003 | CN1099052C Photoresist copolymer and its composition |
| 01/14/2003 | US6507641 X-ray-generation devices, X-ray microlithography apparatus comprising same, and microelectronic-device fabrication methods utilizing same |
| 01/14/2003 | US6507553 Nanometer scale data storage device and associated positioning system |
| 01/14/2003 | US6507474 Using localized ionizer to reduce electrostatic charge from wafer and mask |
| 01/14/2003 | US6507440 Components with an anamorphotic effect for reducing an aspect ratio of a raster element in an illumination system |
| 01/14/2003 | US6507390 Method and apparatus for a reticle with purged pellicle-to-reticle gap |
| 01/14/2003 | US6507389 Photolithography system having a frequency domain filtering mask |
| 01/14/2003 | US6507148 Photosensitive paste, a plasma display and a method for the production thereof |
| 01/14/2003 | US6507034 Charge beam exposure apparatus, charge beam exposure method, and charge beam exposure mask |
| 01/14/2003 | US6507027 Apparatus and methods for charged-particle-beam microlithography exhibiting reduced four-fold aberrations |
| 01/14/2003 | US6506831 Novolac polymer planarization films with high temperature stability |
| 01/14/2003 | US6506688 Method for removing photoresist layer on wafer edge |
| 01/14/2003 | US6506558 Deprotecting nucleoside, nucleotide or amino acid to form polypeptide or polynucleotide |
| 01/14/2003 | US6506544 Exposure method and exposure apparatus and mask |
| 01/14/2003 | US6506543 Using super-resolution near-field structure to form a pattern with a smaller line width on a photoresist layer |
| 01/14/2003 | US6506542 Imagewise exposing a flexographic recording material comprising a support and at least one photopolymerizable layer crosslinkable by actinic radiation, with actinic radiation; washing off uncrosslinked areas with developer and drying |
| 01/14/2003 | US6506541 Block copolymer comprising at least two blocks A of polymerised mono-vinyl aromatic monomer, at least one block B of polymerised conjugated diene monomer; total polymerised mono-vinyl aromatic monomer content is 5-25% |
| 01/14/2003 | US6506540 Photopolymerizable composition |
| 01/14/2003 | US6506537 Radiation-sensitive resin composition |
| 01/14/2003 | US6506536 Contacting hydrocarbyl substituted isocytosine and a diisocyanate to produce an adduct, contacting the adduct and a polymer to form a supermolecular polymer |
| 01/14/2003 | US6506535 Positive working photoresist composition |
| 01/14/2003 | US6506534 Negative resist composition, method for the formation of resist patterns and process for the production of electronic devices |
| 01/14/2003 | US6506533 Polymer comprising at least one pendent infra-red absorbing group having an electromagnetic radiation absorption maximum in the range of about 700 nm to about 1200 nm, wherein the polymer does not dissolve in a developer liquid |
| 01/14/2003 | US6506497 Spin-on-glass anti-reflective coatings for photolithography |
| 01/14/2003 | US6506453 Liquid film formed on substrate having temperature distribution for correcting temperature distribution of liquid film caused by heat of evaporation due to volatilization of solvent in liquid film, solvent removed to form coating film |
| 01/14/2003 | US6506441 Novolac polymer planarization films with high temperature stability |
| 01/14/2003 | CA2213875C Thin-film imaging recording constructions incorporating metallic inorganic layers and optical interference structures |
| 01/14/2003 | CA2093413C Improved ablation-transfer imaging/recording |
| 01/09/2003 | WO2003003531A1 Line narrowing unit with flexural grating mount |
| 01/09/2003 | WO2003003446A2 Control of solid state dimensional features |
| 01/09/2003 | WO2003003429A1 Projection optical system, exposure system and method |
| 01/09/2003 | WO2003003124A1 Photoresist stripper composition |
| 01/09/2003 | WO2003003123A2 Critical dimension monitoring from latent image |
| 01/09/2003 | WO2003003122A2 Method of measuring critical dimension and overlay in single step |
| 01/09/2003 | WO2003003121A1 Positive resist composition of chemical amplification type, resist coated material, method of forming resist pattern, and process for producing semiconductor device |
| 01/09/2003 | WO2003003120A1 Thiophene-containing photo acid generators for photolithography |
| 01/09/2003 | WO2003003072A2 Optical element and manufacturing method therefor |
| 01/09/2003 | WO2003001869A2 Method and apparatus for use of plasmon printing in near-field lithography |
| 01/09/2003 | WO2002093567A3 Focus error correction method and apparatus |
| 01/09/2003 | WO2002080264A3 Method and apparatus for controlling feature critical dimensions based on scatterometry derived profile |
| 01/09/2003 | WO2002073318A9 Method and device for vibration control |
| 01/09/2003 | WO2002069037A3 Attenuated embedded phase shift photomask blanks |
| 01/09/2003 | WO2002061809A3 Configurable patterning device and a method of making integrated circuits using such a device |
| 01/09/2003 | WO2002027408A3 Dynamic mask projection stereo micro lithography |