| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 01/22/2003 | EP1277777A2 Stabilized cationically-curable compositions |
| 01/22/2003 | EP1277776A1 Photocurable resin composition for sealing material and method of sealing |
| 01/22/2003 | EP1277088A1 Optical reduction system with elimination of reticle diffraction induced bias |
| 01/22/2003 | EP1277087A1 Opc optimization |
| 01/22/2003 | EP1277086A1 Selectively colorable polymerizable compositions |
| 01/22/2003 | EP1277085A1 Method for measuring diffusion of photogenerated catalyst in chemically amplified resists |
| 01/22/2003 | EP1277073A2 Optical reduction system with control of illumination polarization |
| 01/22/2003 | EP1276555A2 A method of fabricating coded particles |
| 01/22/2003 | EP1053510B1 Process for producing a photoresist composition having a reduced tendency to produce particles |
| 01/22/2003 | EP0983277B1 Polyborate coinitiators for photopolymerization |
| 01/22/2003 | EP0976008B1 An apparatus and a method for illuminating a light-sensitive medium |
| 01/22/2003 | CN1392973A Developing solution for photoresist |
| 01/22/2003 | CN1392972A Method and apapratus for developing photosensitive resin relief printing plate |
| 01/22/2003 | CN1392971A Photosensitive composition, cured article thereof, and printed circuit board using same |
| 01/22/2003 | CN1392905A Method for producing metal mask and metal mask |
| 01/22/2003 | CN1392596A Organic film forming method |
| 01/22/2003 | CN1392594A Coating device and method for controlling film thickness to realize uniform film thickness |
| 01/22/2003 | CN1392593A Mixed exposure method of combining contact exposure and direct electronic beam writing technology |
| 01/22/2003 | CN1392592A Method for forming T-shaped gate with multilayer film and through once electronic beam exposure and multiple developing |
| 01/22/2003 | CN1392454A Substrate processing device, liquid processing device and liquid processing method |
| 01/22/2003 | CN1392453A Optical nearing correcting method |
| 01/22/2003 | CN1392452A Phase error detection pattern and its use |
| 01/22/2003 | CN1392060A Lithographic printing plate front body and method for producing lithographic printing plate |
| 01/22/2003 | CN1099697C Process for producing semiconductor device |
| 01/22/2003 | CN1099614C Method for providing sacrificial spacer for micro-mechanical devices |
| 01/22/2003 | CN1099610C Method for manufacturing fine pattern, and color filter, shading pattern filter and color LCD element formed by using same |
| 01/22/2003 | CN1099429C Fractionation of phenol for maldehyde condensate and photoresist compositions produced therefrom |
| 01/21/2003 | US6509971 Interferometer system |
| 01/21/2003 | US6509970 Wavelength monitoring apparatus for laser light for semiconductor exposure |
| 01/21/2003 | US6509957 Stage device and exposure apparatus |
| 01/21/2003 | US6509956 Projection exposure method, manufacturing method for device using same, and projection exposure apparatus |
| 01/21/2003 | US6509955 Lens system for maskless photolithography |
| 01/21/2003 | US6509954 Aperture stop having central aperture region defined by a circular ARC and peripheral region with decreased width, and exposure apparatus and method |
| 01/21/2003 | US6509953 Apparatus for exposing a pattern onto an object with controlled scanning |
| 01/21/2003 | US6509952 Method and system for selective linewidth optimization during a lithographic process |
| 01/21/2003 | US6509951 Lithographic projection apparatus having a temperature controlled heat shield |
| 01/21/2003 | US6509923 Inner drum type image recording device |
| 01/21/2003 | US6509577 Systems and methods for exposing substrate periphery |
| 01/21/2003 | US6509572 Charged particle beam lithography apparatus for forming pattern on semi-conductor |
| 01/21/2003 | US6509571 Proximity exposure method by oblique irradiation with light |
| 01/21/2003 | US6509481 Tetrahydrofuran compounds having alicyclic structure |
| 01/21/2003 | US6509261 Wiring forming method |
| 01/21/2003 | US6509252 Method of manufacturing semiconductor device |
| 01/21/2003 | US6509251 Method of forming a resist pattern for blocking implantation of an impurity into a semiconductor substrate |
| 01/21/2003 | US6509142 Apparatus and method for exposing substrates |
| 01/21/2003 | US6509141 Removal of photoresist and photoresist residue from semiconductors using supercritical carbon dioxide process |
| 01/21/2003 | US6509138 Solventless, resistless direct dielectric patterning |
| 01/21/2003 | US6509137 For increasing photolithography process window magnitude; photoresist layer is formed on substrate, exposed through a photomask, followed by developing and stabilization; repeated until desired thickness obtained |
| 01/21/2003 | US6509136 Process of drying a cast polymeric film disposed on a workpiece |
| 01/21/2003 | US6509135 Polymer, resist composition and patterning process |
| 01/21/2003 | US6509134 Used to generate resist images; in the manufacture of integrated circuits |
| 01/21/2003 | US6509132 Lithographic printing plate precursor |
| 01/21/2003 | US6509131 System preferably using microcapsule technology, and a method of applying a photographic image to a receptor element; CYCOLOR films or prints having images directly transferred e.g. shirt, without requiring the use of commercial equipment |
| 01/21/2003 | US6509127 Method of electron-beam exposure |
| 01/21/2003 | US6508949 Method for correcting characteristics of attenuated phase-shift mask |
| 01/21/2003 | US6508940 Process for recovering onium hydroxides from solutions containing onium compounds |
| 01/21/2003 | US6508887 Resist removing composition and resist removing method using the same |
| 01/21/2003 | CA2225567C Heat-sensitive composition and method of making a lithographic printing form with it |
| 01/21/2003 | CA2224441C Photogeneration of amines from .alpha.-aminoacetophenones |
| 01/16/2003 | WO2003005424A1 Coating device and coating method |
| 01/16/2003 | WO2003005129A1 Method for manufacturing photosensitive resin printing plate, and developer treatment device |
| 01/16/2003 | WO2003005128A1 Sensor for determining radiated energy and use thereof |
| 01/16/2003 | WO2003005127A1 Photosensitive resin composition, process of forming patterns with the same, and electronic components |
| 01/16/2003 | WO2003005126A1 Resist curable resin composition and cured article thereof |
| 01/16/2003 | WO2003005125A1 Method for the production of printing plate using particule growing acceleration by an additive polymer |
| 01/16/2003 | WO2003005124A1 A stamp having an antisticking layer and a method of forming of repairing such a stamp |
| 01/16/2003 | WO2003005123A2 Method for the production of microstructures and nanostructures using imprint lithography |
| 01/16/2003 | WO2003005097A1 Projection optical system and exposure device having the projection optical system |
| 01/16/2003 | WO2003005067A2 Method and apparatus to reduce effects of sheared wavefronts on interferometric phase measurements |
| 01/16/2003 | WO2003004987A1 Optical member for optical lithography and evaluation method therefor |
| 01/16/2003 | WO2003004719A1 Mask and substrate holder arrangement |
| 01/16/2003 | WO2002047917A3 Receiver element for adjusting the focus of an imaging laser |
| 01/16/2003 | WO2002046829A3 Dynamically stabilized contact lenses |
| 01/16/2003 | WO2002041080A3 Process for reducing edge roughness in patterned photoresist |
| 01/16/2003 | WO2002039720A3 Apparatus and method for global and local feature extraction in digital images |
| 01/16/2003 | WO2001083844A3 Method for depositing metal and metal oxide films and patterned films |
| 01/16/2003 | US20030014235 System and method for process matching |
| 01/16/2003 | US20030013832 Novel styrene polymer, chemically amplified positive resist composition and patterning process |
| 01/16/2003 | US20030013831 Novel polymer suitable for photoresist compositions |
| 01/16/2003 | US20030013303 Full image exposure of field with alignment marks |
| 01/16/2003 | US20030013258 Photomask esd protection and an anti-esd pod with such protection |
| 01/16/2003 | US20030013213 Exposure system, device production method, semiconductor production factory, and exposure apparatus maintenance method |
| 01/16/2003 | US20030013100 Nucleic acid reading and analysis system |
| 01/16/2003 | US20030013049 Photoacid generator systems for short wavelength imaging |
| 01/16/2003 | US20030013043 Method for making lithographic printing plate |
| 01/16/2003 | US20030013039 Resist composition and patterning process |
| 01/16/2003 | US20030013038 Resin which has a polymerization unit derived from p-hydroxystyrene and a polymerization unit having a group unstable against acid, and a dialkanesulfonate of isopropylidenedicyclohexanol |
| 01/16/2003 | US20030013037 Maleimide-photoresist monomers containing halogen, polymers thereof and photoresist compositions comprising the same |
| 01/16/2003 | US20030013036 Formed by nitrating a polyvinylphenol or a novalak and reacting the the hydroxy group with with a halide comprising an acid labile protecting group, such as 2-(1-bromoethyl)-1,3-difluorobenzene |
| 01/16/2003 | US20030013035 Photosensitive compositions having mixtures of alkoxy and non-alkoxy diazonium salt containing compounds |
| 01/16/2003 | US20030013026 Illumination tools and for detecting the presence of impure matters on the surface of the wafer. |
| 01/16/2003 | US20030013023 Disposable hard mask for photomask plasma etching |
| 01/16/2003 | US20030013022 Method for experimentally verifying imaging errors in photomasks |
| 01/16/2003 | US20030012889 Method of treating a substrate |
| 01/16/2003 | US20030012868 Method for dispensing flowable substances on microelectronic substrates |
| 01/16/2003 | US20030012866 Acts as a positive electron beam resist, is transparent to ultraviolet light and depolymerizes when heated; forming nano-fluidic devices |
| 01/16/2003 | US20030012373 Semiconductor manufacturing system and information management method |
| 01/16/2003 | US20030012333 Illumination system, particularly for EUV lithography |
| 01/16/2003 | US20030012332 Method for manufacturing a microstructure by using a high energy light source |
| 01/16/2003 | US20030012245 Narrow band electric discharge gas laser having improved beam direction stability |