| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 01/28/2003 | US6512572 Exposure apparatus, method, and storage medium |
| 01/28/2003 | US6512571 Anti-vibration system for exposure apparatus |
| 01/28/2003 | US6512535 Laser drawing apparatus and laser drawing method |
| 01/28/2003 | US6512237 Charged beam exposure method and charged beam exposure apparatus |
| 01/28/2003 | US6512087 Fractionation of resins using a static mixer and a liquid-liquid centrifuge |
| 01/28/2003 | US6512067 Polymer, resist composition and patterning process |
| 01/28/2003 | US6512020 Oxime derivatives and the use thereof as latent acids |
| 01/28/2003 | US6511916 Method for removing the photoresist layer in the damascene process |
| 01/28/2003 | US6511897 Method of manufacturing semiconductor device as well as reticle and wafer used therein |
| 01/28/2003 | US6511795 Process for making pictorial reproductions |
| 01/28/2003 | US6511794 Method of forming resist pattern, and exposure device |
| 01/28/2003 | US6511792 Organic solvent developer |
| 01/28/2003 | US6511791 Exposure through reticle mask; repositioning; semiconductors, integrated circuits |
| 01/28/2003 | US6511790 Containing either an amphoteric or cationic surfactant; sharp and clear images; inhibits insoluble binder and/or IR absorber and adherence of insoluble matter to plate surface; photolithography; stable processing |
| 01/28/2003 | US6511789 Photochemical crosslinking; mixture or blend |
| 01/28/2003 | US6511787 Acrylic resin containing hexafluoroisopropanol units having high transmittance to ultraviolet radiation having high transparency, substrate adhesion, alkali development, and acid-elimination capability for lithographic microprocessing |
| 01/28/2003 | US6511786 Resist pattern is formed by using a chemically amplified resist material including a polyhydroxystyrene derivative and an acid generator as principal constituents |
| 01/28/2003 | US6511785 Chemically amplified positive resist composition and patterning method |
| 01/28/2003 | US6511783 Negative resist composition |
| 01/28/2003 | US6511781 Polyhydroxystyrene resin having a protective base which varies in polarity by acid catalyst and photoacid generator, admixed with a styrene derivative which increases contrast in dissolving rate between exposed and unexposed resist |
| 01/28/2003 | US6511703 Protective overcoat for replicated diffraction gratings |
| 01/28/2003 | US6511547 Low temperature removal of photoresists from substrate surfaces using solutions comprising acyclic esters-2+ and water soluble alcohols or ethers |
| 01/28/2003 | US6511540 Spin coating spindle and chuck assembly |
| 01/28/2003 | US6511315 Multizonal layouts for coaters, developers, heaters and robots arround conveyors used for working semiconductors or liquid crystal displays |
| 01/28/2003 | US6510755 Slide apparatus and its stage mechanism for use in vacuum |
| 01/28/2003 | US6510730 System and method for facilitating selection of optimized optical proximity correction |
| 01/25/2003 | CA2386593A1 Method and apparatus for structuring a surface to form hydrophilic and hydrophobic regions |
| 01/23/2003 | WO2003007365A2 Semiconductor processing module with integrated feedback/feed forward metrology |
| 01/23/2003 | WO2003007341A2 Tunable radiation source providing a planar irradiation pattern for processing semiconductor wafers |
| 01/23/2003 | WO2003007085A1 Sulfoxide pyrolid(in)one alkanolamine stripping and cleaning composition |
| 01/23/2003 | WO2003007084A1 Method for production of printed wiring board |
| 01/23/2003 | WO2003007083A1 Method for producing intaglio printing plates |
| 01/23/2003 | WO2003007082A1 Imaging system utilizing light emitting diodes for preparation of print screens |
| 01/23/2003 | WO2003007081A1 Methods using topcoat for photoresist |
| 01/23/2003 | WO2003007080A1 Method for forming fine pattern |
| 01/23/2003 | WO2003007079A1 Resist compositions |
| 01/23/2003 | WO2003007078A2 Photocurable resist inks |
| 01/23/2003 | WO2003007077A2 Molecular transfer lithography |
| 01/23/2003 | WO2003007076A2 Photosensitive compositions having mixtures of alkoxy and non-alkoxy diazonium salt containing compounds |
| 01/23/2003 | WO2003007075A2 Method and apparatus for diffractive transfer of a mask grating |
| 01/23/2003 | WO2003007046A1 Optical system and exposure apparatus having the optical system |
| 01/23/2003 | WO2003007045A1 Projection optical system production method |
| 01/23/2003 | WO2003006599A1 Microelectronic cleaning compositions containing ammonia-free fluoride salts |
| 01/23/2003 | WO2003006598A1 Ammonia-free alkaline microelectronic cleaning compositions with improved substrate compatibility |
| 01/23/2003 | WO2003006597A1 Ammonia-free alkaline microelectronic cleaning compositions with improved substrate compatibility |
| 01/23/2003 | WO2003006413A1 Process for production of fluorine-containing norbornene derivatives |
| 01/23/2003 | WO2003006407A1 Process for producing ether compound |
| 01/23/2003 | WO2002095805A3 Laser parrering of devices |
| 01/23/2003 | WO2002068527A3 NOVEL β-OXO COMPOUNDS AND THEIR USE IN PHOTORESIST |
| 01/23/2003 | WO2002059184A3 Molecular imprinting of small particles, and production of small particles from solid state reactants |
| 01/23/2003 | WO2002048796A3 Projection system for euv lithography |
| 01/23/2003 | WO2002021583A9 Aligner and method of manufacturing a device |
| 01/23/2003 | WO2002008835A3 High-resolution overlay alignment methods and systems for imprint lithography |
| 01/23/2003 | WO2002007211A3 Multi-layer registration control for photolithography processes |
| 01/23/2003 | WO2001097270A3 Substrate cleaning apparatus and method |
| 01/23/2003 | WO2001081976A3 Apparatus, system, and method for active compensation of aberrations in an optical system |
| 01/23/2003 | US20030018443 Method for edge bias correction of topography-induced linewidth variation |
| 01/23/2003 | US20030018406 Method and system for manufacturing semiconductor devices |
| 01/23/2003 | US20030018153 Photolithography |
| 01/23/2003 | US20030018150 Reflection-inhibiting resinn used in process for forming photoresist pattern |
| 01/23/2003 | US20030017713 Workpiece stage of a resist curing device |
| 01/23/2003 | US20030017644 Compound semiconductor device and manufacturing method thereof |
| 01/23/2003 | US20030017631 Method of arranging exposed areas including a limited number of TEG regions on a semiconductor wafer |
| 01/23/2003 | US20030017630 In-Line system having overlay accuracy measurement function and method for the same |
| 01/23/2003 | US20030017484 Arrays for detecting nucleic acids |
| 01/23/2003 | US20030017425 Pattern formation method |
| 01/23/2003 | US20030017424 Method and apparatus for fabricating complex grating structures |
| 01/23/2003 | US20030017420 Lower sulfite/sulfate concentration on the wafer due to plasma treatment translates into less moisture pick up and prevents high aspect ratio collapse; microelectronics |
| 01/23/2003 | US20030017418 Method of processing a lithographic printing plate precursor |
| 01/23/2003 | US20030017415 Where the acid generator is at least two compounds of a sulfonium salt compound not having an aromatic ring, a triarylsulfonium salt compound, and a compound having a phenacylsulfonium salt structure; far ultraviolet rays |
| 01/23/2003 | US20030017414 Photosensitive resin composition |
| 01/23/2003 | US20030017412 Photoresist monomers containing fluorine-substituted benzylcarboxylate and photoresist polymers comprising the same |
| 01/23/2003 | US20030017411 Planographic printing plate precursor |
| 01/23/2003 | US20030017404 Chemical amplification photoresist monomers, polymers therefrom and photoresist compositions containing the same |
| 01/23/2003 | US20030017402 Extreme ultraviolet soft x-ray projection lithographic method and mask devices |
| 01/23/2003 | US20030017256 For applying photoresist to semiconductor wafer via spin coating based on thickness values; lithography |
| 01/23/2003 | US20030016780 Soft X-ray reduction projection exposure system, soft X-ray reduction projection exposure method and pattern formation method |
| 01/23/2003 | US20030016521 Backlighting system for displays |
| 01/23/2003 | US20030016363 Gas discharge ultraviolet wavemeter with enhanced illumination |
| 01/23/2003 | US20030016342 Aligner |
| 01/23/2003 | US20030016341 Exposure method and method of manufacturing semiconductor device |
| 01/23/2003 | US20030016340 Lithographic projection apparatus, device manufacturing method, device manufactured thereby, and measurement method |
| 01/23/2003 | US20030016338 Exposure apparatus and method |
| 01/23/2003 | US20030016116 Method of depositing a thin metallic film and related apparatus |
| 01/23/2003 | US20030015699 Integrated critical dimension control for semiconductor device manufacturing |
| 01/23/2003 | US20030015674 Measuring configuration and method for measuring a critical dimension of at least one feature on a semiconductor wafer |
| 01/23/2003 | US20030015669 Tunable radiation source providing a VUV wavelength planar illumination pattern for processing semiconductor wafers |
| 01/23/2003 | US20030015494 Single layer resist lift-off process and apparatus for submicron structures |
| 01/23/2003 | US20030015290 Substrate processing apparatus, substrate processing method, and exposure apparatus |
| 01/23/2003 | US20030015274 Reflective hood for heat-shrinking film onto an open-topped container and method of using same |
| 01/23/2003 | CA2453201A1 Imaging system utilizing light emitting diodes for preparation of print screens |
| 01/22/2003 | EP1278236A1 Method of dicing a compound semiconductor wafer and compound semiconductor substrate thereby formed |
| 01/22/2003 | EP1278231A2 Substrate processing apparatus, substrate precessing method, and exposure apparatus |
| 01/22/2003 | EP1278103A1 Lithographic apparatus |
| 01/22/2003 | EP1278094A2 Geometrical beamsplitter and method for manufacturing the same |
| 01/22/2003 | EP1278089A2 Lithographic apparatus and device manufacturing method |
| 01/22/2003 | EP1277830A1 Detergent composition |
| 01/22/2003 | EP1277821A1 Near-infrared-absorbing composition and optical material |
| 01/22/2003 | EP1277815A1 Water-based coating composition curable with actinic energy ray, coated metallic material with cured film of the composition, production process, and method of bonding coated metallic material |
| 01/22/2003 | EP1277778A2 Stabilized cationically-curable compositions |