| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 01/30/2003 | US20030022958 Resist ink composition |
| 01/30/2003 | US20030022953 Antireflective porogens |
| 01/30/2003 | US20030022800 Aqueous buffered fluoride-containing etch residue removers and cleaners |
| 01/30/2003 | US20030022511 Plasma ashing process |
| 01/30/2003 | US20030022470 Parallel, individually addressable probes for nanolithography |
| 01/30/2003 | US20030022462 Stereolithographic method and apparatus for fabricating spacers for semiconductor devices and resulting structures |
| 01/30/2003 | US20030022396 Exposure apparatus and control method therefor, and semiconductor device manufacturing method |
| 01/30/2003 | US20030022112 Photolithographic exposure of a pattern onto a nonplanar surface being structured perpendicular to the surface |
| 01/30/2003 | US20030022111 Photoresist compound and method for structuring a photoresist layer |
| 01/30/2003 | US20030022109 Via negative-working radiation sensitive phenolic resin from formalin and bisphenol A; heat resistance; low water absorption; electroluminescent display |
| 01/30/2003 | US20030022108 Styrene-anhydride copolymer containing amido group, the process for producing the same and use thereof |
| 01/30/2003 | US20030022104 Dissolved in high-boiling solvent having low toxicity (propylene glycol); can be developed with water without affecting strong adhesion; screen printing; blade coating |
| 01/30/2003 | US20030022103 Such as poly(maleic anhydride/hexafluorobutyl-5-norbornene-2-carboxylate/2,6-difluoro-1 -methylbenzylacrylate); for production of semiconductors/integrated circuits; photolithography |
| 01/30/2003 | US20030022102 Electroconductive wiring formed in dielectric body for use in electric/electronic appliances, and communication devices; electroless plating |
| 01/30/2003 | US20030022101 Photoresist monomers, polymers thereof and photoresist compositions containing the same |
| 01/30/2003 | US20030022100 Photoresist monomers, polymers thereof and photoresist compositions containing the same |
| 01/30/2003 | US20030022099 Photoresist with adjustable polarized light reaction and photolithography process using the photoresist |
| 01/30/2003 | US20030022098 Photoresist composition |
| 01/30/2003 | US20030022097 High resolution; for use in deep ultraviolet photolithography; improved photosensitivity, line-edge roughness |
| 01/30/2003 | US20030022096 Process for making lithographic printing plate |
| 01/30/2003 | US20030022095 Negative type radiation sensitive resin composition |
| 01/30/2003 | US20030022094 For planographic printing plate precursors, color proofs, photoresists and color filters; high infrared radiation absorption; semiconductor lasers |
| 01/30/2003 | US20030022093 Comprises novalak and photosenitizer; for manufacturing semiconductors and flat panel displays; no tailing |
| 01/30/2003 | US20030022092 Comprises diazo couplers; suppresses discoloration over time without decreasing light resistance of color developed portion; preservability |
| 01/30/2003 | US20030022079 Field correction of overlay error |
| 01/30/2003 | US20030022078 A selected region(in which a gate electrode of transistor, a contact or via hole is formed) is selected from the pattern, and when a minute shape is present in selected region, the selected region is redivided into a pluralilty of ractangles |
| 01/30/2003 | US20030022077 Wafer is located in a plane where spherical aberrations of the projection column reduce a negative defocussing effect caused by chromatic aberrations in the projection column |
| 01/30/2003 | US20030022076 Semiconductive substrate processing methods and methods of processing a semiconductive substrate |
| 01/30/2003 | US20030022075 Defining at least two zones within a field of a mask having similar overlay error values, modifying the coordinates of a feature of the mask in response to a correction for the zone to the feature is mapped |
| 01/30/2003 | US20030022071 A mask produced by making use of the pattern computing software program |
| 01/30/2003 | US20030022070 Method for fabricating continuous space variant attenuating lithography mask for fabrication of devices with three-dimensional structures and microelectronics |
| 01/30/2003 | US20030021968 X-ray printing personalization technique |
| 01/30/2003 | US20030021906 Method of coating solution on substrate surface using a slit nozzle |
| 01/30/2003 | US20030021887 Compositions containing heterocylcic nitrogen compounds and glycols for texturing resinous material and desmearing and removing resinous material |
| 01/30/2003 | US20030021671 Substrate processing apparatus, method of controlling substrate, and exposure apparatus |
| 01/30/2003 | US20030021467 Overlay marks, methods of overlay mark design and methods of overlay measurements |
| 01/30/2003 | US20030021466 Overlay marks, methods of overlay mark design and methods of overlay measurements |
| 01/30/2003 | US20030021465 Overlay marks, methods of overlay mark design and methods of overlay measurements |
| 01/30/2003 | US20030021463 Method and apparatus for circuit pattern inspection |
| 01/30/2003 | US20030021214 Exposure apparatus of an optical disk master, method of exposing an optical disk master and pinhole mechanism |
| 01/30/2003 | US20030021040 Catadioptric reduction lens |
| 01/30/2003 | US20030021026 Intrinsic birefringence compensation for below 200 nanometer wavelength optical lithography components with cubic crystalline structures |
| 01/30/2003 | US20030021015 Film coated optical lithography elements and method of making |
| 01/30/2003 | US20030020924 Interferometer system |
| 01/30/2003 | US20030020921 Interferometric apparatus and method with phase shift compensation |
| 01/30/2003 | US20030020894 Removable Optical pellicle |
| 01/30/2003 | US20030020893 Exposure apparatus and method, and device fabricating method |
| 01/30/2003 | US20030020892 Exposure apparatus and method |
| 01/30/2003 | US20030020891 Substrate holding apparatus and exposure apparatus using the same |
| 01/30/2003 | US20030020890 Debris removing system for use in X-ray light source |
| 01/30/2003 | US20030020889 Stage unit, measurement unit and measurement method, and exposure apparatus and exposure method |
| 01/30/2003 | US20030020888 Exposure apparatus, exposure method, method of adjusting pressure of projection optical system and method of assembling exposure apparatus |
| 01/30/2003 | US20030020800 Pattern drawing device and manufacturing method of pattern drawing body |
| 01/30/2003 | US20030020184 Substrate provided with an alignment mark, method of designing a mask, computer program, mask for exposing said mark, device manufacturing method, and device manufactured thereby |
| 01/30/2003 | US20030020026 Method of detecting pattern defects of a conductive layer in a test key area |
| 01/30/2003 | US20030020025 Lithographic method using ultra-fine probe needle |
| 01/30/2003 | US20030019833 Microfabricated elastomeric valve and pump systems |
| 01/30/2003 | US20030019782 Packaged radiation sensitive coated workpiece process for making and method of storing same |
| 01/30/2003 | US20030019578 Substrate processing apparatus equipping with high-pressure processing unit |
| 01/30/2003 | US20030019188 Method and apparatus for marking shrink wrap lid for beverage container |
| 01/30/2003 | DE10142318C1 Semiconductor structure for measuring critical dimensions and overlay accuracy, has substrate provided with two different periodic patterns with overlap indicating overlay error |
| 01/29/2003 | EP1280246A1 Gas discharge laser |
| 01/29/2003 | EP1280188A2 Substrate holding apparatus and exposure apparatus |
| 01/29/2003 | EP1280184A2 Inspecting system for particle-optical imaging of an object, deflection device for charged particles and method for operating the same |
| 01/29/2003 | EP1280009A2 Photolithographic structuring method |
| 01/29/2003 | EP1280008A2 Illumination system, projection exposure apparatus and device manufacturing method |
| 01/29/2003 | EP1280007A2 Imaging apparatus |
| 01/29/2003 | EP1280006A2 Method for making lithographic printing plate |
| 01/29/2003 | EP1279984A1 Method and device for holding optical member, optical device, exposure apparatus, and device manufacturing method |
| 01/29/2003 | EP1279923A2 Method and apparatus for circuit pattern inspection |
| 01/29/2003 | EP1279519A2 Image forming material and ammonium compound |
| 01/29/2003 | EP1279518A2 Process and device for structuring a surface into hydrophilic and hydrophobic regions |
| 01/29/2003 | EP1279169A1 Utilization of beam crosslinkable polymer compositions as data recording medium |
| 01/29/2003 | EP1279072A2 Uv-enhanced silylation process to increase etch resistance of ultra thin resists |
| 01/29/2003 | EP1279071A1 Multi depth substrate fabrication processes |
| 01/29/2003 | EP1279070A1 Non-contact seal using purge gas |
| 01/29/2003 | EP1279069A2 Polymers for photoresist compositions for microlithography |
| 01/29/2003 | EP1279068A1 Nanostructures |
| 01/29/2003 | EP1278786A2 Copolymers for photoresists and processes therefor |
| 01/29/2003 | EP1278644A1 Thermal transfer of crosslinked materials |
| 01/29/2003 | EP1278633A1 Lithographic imaging with printing members having multiphase laser-responsive layers |
| 01/29/2003 | EP1212784A4 Methods for producing uniform large-grained and grain boundary location manipulated polycrystalline thin film semiconductors using sequential lateral solidification |
| 01/29/2003 | EP1157407A4 Methods utilizing scanning probe microscope tips and products therefor or produced thereby |
| 01/29/2003 | CN1394358A Laser system and method for processing memory link with burst of laser pulses having ultrashort pulsewidths |
| 01/29/2003 | CN1394357A Cleaning solution for removing residue |
| 01/29/2003 | CN1394297A Pattern generation system using spatial light modulator |
| 01/29/2003 | CN1394296A 感光性树脂组合物 The photosensitive resin composition |
| 01/29/2003 | CN1394111A Method for etching laminated assembly containing polyimide layer |
| 01/29/2003 | CN1393906A Process for preparing lower storage junctions of DRAM |
| 01/29/2003 | CN1393747A Method for controlling treater |
| 01/29/2003 | CN1393740A Etching process |
| 01/29/2003 | CN1393739A Process for decreasing photoresist roughness by cross-linking reaction of deposit on photoresist |
| 01/28/2003 | US6513151 Method and system for evaluating new product masks that includes detecting defects on reticle containing new product mask and evaluating yield impact of such defects |
| 01/28/2003 | US6512874 High performance acrylate materials for optical interconnects |
| 01/28/2003 | US6512780 System for compensating directional and positional fluctuations in light produced by a laser |
| 01/28/2003 | US6512641 Projection exposure apparatus and method |
| 01/28/2003 | US6512631 Broad-band deep ultraviolet/vacuum ultraviolet catadioptric imaging system |
| 01/28/2003 | US6512625 Light modulation device and system |
| 01/28/2003 | US6512606 Device comprising photopolymer medium with recorded format hologram, including data writing polymerization initiator comprising light absorbing nanoparticles which initiate thermal chemistry, for permitting data writing over hologram |
| 01/28/2003 | US6512573 Projection exposure apparatus and exposure method |