Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
02/2003
02/06/2003US20030027060 Photoresist and process for structuring such a photoresist
02/06/2003US20030026961 Ceramic blank with a photostructurable functional layer containing platinum and method for production thereof
02/06/2003US20030026959 Metal or metal compound pattern and forming method of pattern, and electron emitting device, electron source, and image-forming apparatus using the pattern
02/06/2003US20030026501 Real time data conversion for a digital display
02/06/2003US20030026472 Pattern forming method, mask manufacturing method, and LSI manufacturing method
02/06/2003US20030026471 Overlay marks, methods of overlay mark design and methods of overlay measurements
02/06/2003US20030026176 Image-recording device for generating a number of image spots in projection line
02/06/2003US20030026001 Geometric beamsplitter and method for its fabrication
02/06/2003US20030025991 Ultraviolet and vacuum ultraviolet antireflection substrate
02/06/2003US20030025981 Micromachined optical phase shift device
02/06/2003US20030025979 Surface distortion compensated photolithography
02/06/2003US20030025908 Inspection method and apparatus for projection optical systems
02/06/2003US20030025895 Apparatus and methods for detecting tool-induced shift in microlithography apparatus
02/06/2003US20030025894 Optical system and exposure apparatus provided with the optical system
02/06/2003US20030025893 Projection exposure apparatus and projection exposure method
02/06/2003US20030025891 Lithographic apparatus, device manufacturing method, and device manufactured thereby
02/06/2003US20030025890 Exposure apparatus and exposure method capable of controlling illumination distribution
02/06/2003US20030025889 Exposure apparatus and control method therefor, and device manufacturing method
02/06/2003US20030025245 Composite substrate carrier
02/06/2003US20030025244 Process for fabricating composite substrate carrier
02/06/2003US20030025085 Low-aberration deflectors for use in charged-particle-beam optical systems, and methods for fabricating such deflectors
02/06/2003US20030024899 Exposure method utilizing optical proximity corrected exposure patterns, an apparatus for generating optical proximity corrected exposure data, and an exposure apparatus for optical proximity corrected exposure data
02/06/2003DE10106861C1 Production of fine resist structures in a photoresist layer during the manufacture of microelectronic components by applying a photoresist layer, applying and exposing 2 masks at different wavelengths and developing resist
02/06/2003CA2453237A1 Photosensitive resin composition
02/05/2003WO2002096667A1 Laser thermal transfer recording method
02/05/2003EP1282157A2 Apparatus and method for controlling the temperature of a substrate
02/05/2003EP1282139A1 Multilayer-coated reflective mirrors for x-ray optical systems, and methods for producing same
02/05/2003EP1282011A2 Reflective projection lens for EUV photolithography
02/05/2003EP1282010A1 Photosensitive resin composition, photosensitive element comprising the same, method for producing resist pattern, and method for producing printed wiring board
02/05/2003EP1281731A1 Coloring composition
02/05/2003EP1281176A2 Phase contrast variation of a photo-induced refractive material
02/05/2003EP1280740A2 Glass preform and methods and apparatus for manufacture thereof
02/05/2003EP1280664A1 Chemical imaging of a lithographic printing plate
02/05/2003EP1280654A1 Method for applying a layer containing at least polymeric material
02/05/2003EP1086147A4 Process for producing purified solutions of blocked polyhydroxystyrene resin
02/05/2003EP1082470A4 Microchamber
02/05/2003EP1025464A4 Composite relief image printing plates
02/05/2003CN1395294A Ashing device and method, and method for mfg. semiconductor
02/05/2003CN1395242A Optical disk original disk exposure device and method, and pinhole mechanism
02/05/2003CN1394743A Metal net fabric for screen printing
02/05/2003CN1101007C Illumination method and apapratus for formation of micro patterns
02/05/2003CN1101001C Method for produicng light wave guide device
02/05/2003CA2418715A1 Laser thermal transfer recording method
02/04/2003US6515741 Optical device and method for line-narrowed excimer or molecular fluorine laser
02/04/2003US6515736 Tapered fingers extend into recesses; self-centering; lithography, semiconductors
02/04/2003US6515734 Exposure apparatus
02/04/2003US6515731 Substrate processing apparatus and substrate processing method
02/04/2003US6515694 Illumination device and optical processing apparatus using the same
02/04/2003US6515409 Charged-particle beam exposure apparatus, exposure system, control method therefor, and device manufacturing method
02/04/2003US6515381 Cantilever stage
02/04/2003US6515342 Method and system for providing inorganic vapor surface treatment for photoresist adhesion promotion
02/04/2003US6515295 Device for exposure of the peripheral area of a film circuit board
02/04/2003US6515292 A photocathode electron projector is formed with a sample attached to an anode and a patterned quartz mask attached to a cathode. The quartz mask is patterned with Au-Pd layers that emit electrons when illuminated by ultraviolet light that is
02/04/2003US6515277 Scanning probe microscope assembly and method for making confocal, spectrophotometric, near-field, and scanning probe measurements and associated images
02/04/2003US6515272 Method and apparatus for improving signal to noise ratio of an aerial image monitor
02/04/2003US6515165 Process for producing t-butyl esters of bridged-ring polycarboxylic acids
02/04/2003US6515150 Photoresist resin; exposure to high energy radiation; development
02/04/2003US6515149 Acetal compound, polymer, resist composition and patterning response
02/04/2003US6515073 Anti-reflective coating-forming composition
02/04/2003US6515038 Resist compositions containing polymers having dialkyl malonate groups for use in chemically amplified resists
02/04/2003US6514909 Dual layer self-contained paper incorporating hollow spherical plastic pigment
02/04/2003US6514734 Polybifunctional reagent having a polymeric backbone and latent reactive moieties and bioactive groups
02/04/2003US6514676 Method for forming micropattern of resist
02/04/2003US6514672 Dry development process for a bi-layer resist system
02/04/2003US6514669 Comprising a binder resin which is a copolymer having carboxyl groups, an organo-solvent and a main pigment dissolved in the solvent
02/04/2003US6514668 Photosensitive lithographic printing plate
02/04/2003US6514667 Lithography structure
02/04/2003US6514666 Photoresist monomers, polymers thereof and photoresist compositions containing it
02/04/2003US6514665 Additives for improving post exposure delay stability of photoresist
02/04/2003US6514664 Radiation sensitive compositions containing image quality and profile enhancement additives
02/04/2003US6514663 Bottom resist
02/04/2003US6514661 Process for forming a colored image having a dominant attribute
02/04/2003US6514658 Polyimide or precursor thereof soluble in alkaline solution, a photosensitive acid generator, and a compound having a phenolic hydroxyl group; positive-type, heat resistance
02/04/2003US6514657 Photosensitive composition for lithographic printing plate and photosensitive lithographic printing plate
02/04/2003US6514656 Planographic printing plate with alkali water phenolic polymer, light and heat decomposing compound, crosslinkable compound and infrared ray absorbing agent; durably printing by solid state or semiconductor laser
02/04/2003US6514647 Not penetrating resist film in after development section
02/04/2003US6514644 Dispersion stability; developability
02/04/2003US6514643 Overlay target exposure device utilizing pitch determination to minimize impact of lens aberrations
02/04/2003US6514570 Solution processing apparatus and method
02/04/2003US6514446 Colored articles and compositions and methods for their fabrication
02/04/2003US6514122 System for manufacturing semiconductor device utilizing photolithography technique
02/04/2003US6514073 Resist processing method and resist processing apparatus
02/04/2003US6513996 Integrated equipment to drain water-hexane developer for pattern collapse
02/04/2003US6513654 SMIF container including an electrostatic dissipative reticle support structure
02/04/2003US6513537 Substrate processing method and substrate processing apparatus
02/04/2003US6513433 Precursor comprising hydrophilic support bearing heat sensitive layer containing particulate polymer having heat reactive group and/or microcapsule containing compound having heat reactive group, and thermoplastic particulate polymer
01/2003
01/30/2003WO2003009063A2 Real time analysis of periodic structures on semiconductors
01/30/2003WO2003009062A1 Compensation of birefringence in a lens composed of crystal lenses
01/30/2003WO2003009050A1 Intrinsic birefringence compensation for below 200 nanometer wavelength optical lithography components with cubic crystalline structures
01/30/2003WO2003009021A1 Delay element made from a cubic crystal and corresponding optical system
01/30/2003WO2003009015A1 Optical element having lanthanum fluoride film
01/30/2003WO2003008404A2 Sulfonium salts as phtoinitiators for radiation curable systems
01/30/2003WO2002095542A9 Workpiece sorter operating with modular bare workpiece stockers and/or closed container stockers
01/30/2003WO2002069390A9 Grating test patterns and methods for overlay metrology
01/30/2003WO2002061191A3 Fibrous structure having increased surface area and process for making same
01/30/2003WO2002023274A3 Photoresist composition
01/30/2003WO2002003142A9 Electric microcontact printing method and apparatus
01/30/2003WO2001088467A9 Data age adjustments
01/30/2003WO2001069969A3 Remote programming and control means for a hearing aid
01/30/2003US20030023339 Mask pattern magnification correction method, magnification correction apparatus, and mask structure