Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
02/2003
02/13/2003US20030030030 Stripper
02/13/2003US20030030016 Reticles and rapid reticle-evaluation methods for use in charged-particle-beam microlithography
02/13/2003US20030030014 Lithography system comprising a converter platc and means for protecting the converter plate
02/13/2003US20030029912 Lithography rework analysis method and system
02/13/2003US20030029838 Mehtod for detecting removal of organic material from a semiconductor device in a manufacturing process
02/13/2003US20030029835 Method of etching organic antireflection coating (ARC) layers
02/13/2003US20030029765 Composite kinematic coupling
02/13/2003US20030029378 Apparatus for coating on printing clinders
02/13/2003US20030029035 Wiring forming method
02/13/2003CA2424557A1 Radiation sensitive dielectric constant changing composition and dielectric constant changing method
02/12/2003EP1283546A1 Method for detecting removal of organic material from a semiconductor device in a manufacturing process
02/12/2003EP1283446A2 Workpiece stage of a resist curing device
02/12/2003EP1282839A1 Use of rta furnace for photoresist baking
02/12/2003EP1282838A1 Process for preparing a flexographic printing plate
02/12/2003EP1282837A1 Device, method and computer programme product for the transmission of data
02/12/2003EP1282523A1 Ink receptor sheet and its process of use
02/12/2003EP1282466A2 Method for producing microcapsules having improved wall characteristics
02/12/2003EP1070157A4 Method for removing photoresist and plasma etch residues
02/12/2003EP1025169B1 Use of dimerdiolalcoxylate (meth)acrylic acid esters as constituents for radiation cured coatings
02/12/2003EP1000386B1 Rubber-based aqueous developable photopolymers and photocurable elements comprising same
02/12/2003EP0939920B1 Planographic printing
02/12/2003EP0926146B1 Chromene compounds
02/12/2003EP0845708B1 Plate for waterless lithography
02/12/2003EP0611997B1 Photopolymerizable composition
02/12/2003CN1396937A Polynuclear epoxy compound, resin obtained therefrom curable with actinic energy ray, and photocurable/thermosetting resin composition containing the same
02/12/2003CN1396648A Immersion method of minute hole
02/12/2003CN1396628A Method for making compound semiconductor device
02/12/2003CN1396627A Method for smaller pattern by thermal constraction of water-soluble resin coating on photoresist
02/12/2003CN1396494A Measuring method and correction method for illumination irregularity of exposure device
02/12/2003CN1396493A Method for making miniature structure using high-energy light source
02/12/2003CN1396212A Active energy line solidified polyimide resin composition
02/12/2003CN1396007A Chemical applying method and its applying device
02/12/2003CN1101280C Photoresist coating device and coating method
02/11/2003US6519761 Photomask designing method, a photomask designing apparatus, a computer readable storage medium, a photomask, a photoresist, photosensitive resin, a base plate, a microlens, and an optical element
02/11/2003US6519760 Method and apparatus for minimizing optical proximity effects
02/11/2003US6519759 Photomask pattern shape correction method and corrected photomask
02/11/2003US6519758 Method of checking exposure patterns formed over photo-mask
02/11/2003US6519501 Method of determining optimum exposure threshold for a given photolithographic model
02/11/2003US6519024 Exposure apparatus and device manufacturing apparatus and method
02/11/2003US6518936 Precision etched radome
02/11/2003US6518721 Oscillation isolator
02/11/2003US6518210 Exposure apparatus including silica glass and method for producing silica glass
02/11/2003US6518199 Method and system for coating and developing
02/11/2003US6518196 Method of manufacturing semiconductor device
02/11/2003US6518194 Intermediate transfer layers for nanoscale pattern transfer and nanostructure formation
02/11/2003US6518191 Method for etching organic film, method for fabricating semiconductor device and pattern formation method
02/11/2003US6518189 Method and apparatus for high density nanostructures
02/11/2003US6518180 Method for fabricating semiconductor device and method for forming mask suitable therefor
02/11/2003US6518168 Self-assembled monolayer directed patterning of surfaces
02/11/2003US6517999 Method of removing photoresist film
02/11/2003US6517998 Method for removing photoresist film and apparatus used therefor
02/11/2003US6517997 Production of an integrated optical device
02/11/2003US6517995 Fabrication of finely featured devices by liquid embossing
02/11/2003US6517994 Amplified photoresist
02/11/2003US6517993 Radiation transparent; sensitivity
02/11/2003US6517992 N-sulfonyloxyimide compound and radiation-sensitive resin composition using the same
02/11/2003US6517991 Positive photosensitive composition
02/11/2003US6517990 Photosensitive polymer including copolymer of alkyl vinyl ether and resist composition containing the same
02/11/2003US6517988 Radiation-sensitive, positive working coating composition based on carboxylic copolymers
02/11/2003US6517987 Positive-working presensitized plate useful for preparing a lithographic printing plate
02/11/2003US6517983 Aberration estimating mask pattern
02/11/2003US6517982 Mask set for use in phase shift photolithography technique which is suitable to form random patterns, and method of exposure process using the same
02/11/2003US6517980 Photosensitive resin composition, color filter, and copolymer resin useful for them
02/11/2003US6517977 Semiconductors
02/11/2003US6517951 Smokeless
02/11/2003US6517928 Recording material comprising matt protrusions formed by screen printing
02/11/2003US6517665 Liga developer apparatus system
02/11/2003US6516722 Lithographic printing machine and lithographic printing method
02/06/2003WO2003010803A1 Exposure device, exposure method, method of producing semiconductor device, electrooptic device, and electronic equipment
02/06/2003WO2003010802A1 Stage apparatus, exposure system and exposure method, and device production method
02/06/2003WO2003010801A1 Method and device for development
02/06/2003WO2003010799A2 Plasma ashing process
02/06/2003WO2003010605A2 Pattern generation method and apparatus using cached cells of hierarchical data
02/06/2003WO2003010604A1 Method for printing a near-field photoinduced stable structure and optical fibre tip therefor
02/06/2003WO2003010603A1 Positive type radiosensitive composition and method for forming pattern
02/06/2003WO2003010602A1 Photosensitive resin composition
02/06/2003WO2003010601A1 Method of preparing optically imaged high performance photomasks
02/06/2003WO2003010598A1 Removable optical pellicle
02/06/2003WO2002009170A3 Method and apparatus for performing final critical dimension control
02/06/2003WO2001036901A3 Systems and methods for quantifying nonlinearities in interferometry systems
02/06/2003US20030027882 2,4,6-triarylpyrylium salt; electron donor mixture of (i) a combination of an aromatic olefin and an aromatic carbonyl compound and/or (ii) a radical forming peroxy or azo compound.
02/06/2003US20030027705 Incorporating hydrogen molecules into a synthetic quartz glass body by heat treating the synthetic quartz glass body, varying the pressure of the gas containing hydrogen either continuously or stepwise in at least a part of heat treatment
02/06/2003US20030027425 Patterned product and its manufacturing method
02/06/2003US20030027382 Manufacturing method of semiconductor device
02/06/2003US20030027368 Monitoring processing tendencies of processing tools adapted to process wafers, measuring characteristic of particular incoming wafer, identifying tool having processing tendency complimentary to characteristic, routing wafer to that tool
02/06/2003US20030027349 Analysis of fluorite sample; obtain sample containing calcium fluoride, screen sample by way of spectrum analysis, monitor crystal formation
02/06/2003US20030027087 Process for structuring a photoresist layer on a semiconductor substrate
02/06/2003US20030027086 Thick film photoresists and methods for use thereof
02/06/2003US20030027085 Placing semiconductor substrate with photoresist within pressuer chamber; pressurization; introducing supercritical carbon dioxide and stripper into chamber; mixing until photoresist is removed from semiconductor substrate; flushing
02/06/2003US20030027084 Method and apparatus for using an excimer laser to pattern electrodeposited photoresist
02/06/2003US20030027083 Method of preparing optically imaged high performance photomasks
02/06/2003US20030027080 Providing a photoresist having a trenches; and filling trenches
02/06/2003US20030027079 Method of producing conductive or semiconducting structured polymers
02/06/2003US20030027078 Blocked isocyanate compound-containing composition for forming a radiation absorbing coating and anti-reflective coating formed therefrom
02/06/2003US20030027077 Photoresist compositions for short wavelength imaging
02/06/2003US20030027076 For forming relief images
02/06/2003US20030027075 Novel polymers, processes for polymer synthesis and photoresist compositions
02/06/2003US20030027065 Mask for measuring optical aberration and method of measuring optical aberration
02/06/2003US20030027064 Exposure method for correcting dimension variation in electron beam lithography, and recording medium for recording the same
02/06/2003US20030027061 Can be imaged with short wavelength radiation
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