Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
02/2003
02/20/2003US20030034570 Field correction of overlay error
02/20/2003US20030034567 Semiconductor device
02/20/2003US20030034525 Method of increasing the conductivity of a transparent conductive layer
02/20/2003US20030034457 Electron-optical corrector for eliminating third-order aberations
02/20/2003US20030034329 Lithographic method for molding pattern with nanoscale depth
02/20/2003US20030033977 Coating apparatus
02/19/2003EP1284444A1 Lithographic apparatus and device manufacturing method
02/19/2003EP1284443A1 Photoresist compositions
02/19/2003EP1283991A1 Positive-working, infrared-sensitive lithographic printing plate and method of imaging
02/19/2003EP0986776B1 Liquid photosensitive composition
02/19/2003CN1398362A Antireflective coating compsns.
02/19/2003CN1398271A Fluoropolymer having acic-reactive group and chemical amplification type photoresist compsn. contg. same
02/19/2003CN1397986A Method for stripping metal
02/19/2003CN1397842A Pattern plotter and mfg. method of pattern plotter body
02/19/2003CN1397841A Positive film type light sensitiveness anticorrosion additive compsn. and application thereof
02/19/2003CN1397840A Process for preparing nano metal sulfide as physically developing clear
02/19/2003CN1397588A Photocationic solidified resin compsn. and its application
02/19/2003CN1101822C Molecular complex compounds as photoinitiators
02/18/2003USRE37996 Manufacturing method or an exposing method for a semiconductor device or a semiconductor integrated circuit device and a mask used therefor
02/18/2003US6522940 Method and system for varying die shape to increase wafer productivity
02/18/2003US6522808 Receiving optical fiber to be exposed to laser beam; data processing with capture module; steering assembly
02/18/2003US6522777 Combined 3D- and 2D-scanning machine-vision system and method
02/18/2003US6522776 Method for automated determination of reticle tilt in a lithographic system
02/18/2003US6522716 Multilayer-film reflective mirrors, extreme UV microlithography apparatus comprising same, and microelectronic-device manufacturing methods utilizing same
02/18/2003US6522484 Projection objective
02/18/2003US6522483 Optical reduction system with elimination of reticle diffraction induced bias
02/18/2003US6522465 Transmitting spectral filtering of high power extreme ultra-violet radiation
02/18/2003US6522433 Interference lithography using holey fibers
02/18/2003US6522392 Optical systems and methods of compensating rotationally non-symmetrical image defects in an optical system
02/18/2003US6522390 Projection exposure method and apparatus
02/18/2003US6522389 Scanning exposure photo-mask and method of scanning exposure and scanning exposure system
02/18/2003US6522387 Microlithography projection apparatus
02/18/2003US6522386 Exposure apparatus having projection optical system with aberration correction element
02/18/2003US6522385 Air shower head of photolithography equipment for directing air towards a wafer stage
02/18/2003US6522384 Exposure method and apparatus, and device manufacturing method
02/18/2003US6522350 Imaging device, imaging method, and printing device
02/18/2003US6522003 Semiconductor device and method of manufacturing the same
02/18/2003US6521903 Deflection noise reduction in charged particle beam lithography
02/18/2003US6521901 System to reduce heat-induced distortion of photomasks during lithography
02/18/2003US6521877 Optical arrangement having improved temperature distribution within an optical element
02/18/2003US6521543 Multiple exposure method
02/18/2003US6521393 Pattern formation method
02/18/2003US6521392 Methods for measuring and adjusting illumination uniformity obtained from a charged-particle illumination-optical system
02/18/2003US6521390 Heat-combustible polymeric binder, at least one IR- absorbing material and at least one aliphatic diester; computer-to-plate- technology
02/18/2003US6521385 Using computers
02/18/2003US6520692 Exposure apparatus for printing plates
02/18/2003US6520088 Re-usable printing form with a printing surface and method for forming images on the printing surface
02/18/2003US6520083 Apparatus for producing printing plates having movable journal for axial removal of plate
02/13/2003WO2003012837A1 Semiconductor manufacturing apparatus control system
02/13/2003WO2003012550A1 Method for developing lithographic printing plate precursors using a coating attack-suppressing agent
02/13/2003WO2003012549A2 Lithograph comprising a moving cylindrical lens system
02/13/2003WO2003012548A2 System for measuring an optical system, especially an objective
02/13/2003WO2003012547A1 Composition having permitivity being radiation-sensitively changeable and method for forming permitivity pattern
02/13/2003WO2003012529A2 Objective, particularly a projection objective for use in semiconductor lithography
02/13/2003WO2003012367A1 Passive zero shear interferometers
02/13/2003WO2003011974A1 Polyamic acid resin composition
02/13/2003WO2003011915A1 Fluorinated optical polymer composition
02/13/2003WO2003011595A2 Laser spectral engineering for lithographic process
02/13/2003WO2002095787A3 Anti-charging layer for beam lithography and mask fabrication
02/13/2003WO2002077484A8 Method and device for vibration control
02/13/2003WO2002073317A3 Lithography method and apparatus with simplified reticles
02/13/2003WO2002065538A3 Post chemical-mechanical planarization (cmp) cleaning composition
02/13/2003WO2002050583A3 Optical devices made from radiation curable fluorinated compositions
02/13/2003WO2002043140A3 Imaging layer as hard mask for organic low-k materials
02/13/2003WO2002043122A3 Parallel plate development with the application of a differential voltage
02/13/2003US20030033046 Method and system for manufacturing semiconductor devices
02/13/2003US20030032567 Cleaning solutions including nucleophilic amine compound having reduction and oxidation potentials
02/13/2003US20030032302 Substrate processing apparatus and substrate processing method
02/13/2003US20030032298 Method for etching an antireflective coating and for fabricating a semiconductor device
02/13/2003US20030032280 Method for filling fine hole
02/13/2003US20030032217 Stereolithographic method and apparatus for fabricating spacers for semiconductor devices and resulting structures
02/13/2003US20030031960 Adding replenisher to the developer so that the activity of the developer remains relatively constant; the replenisher comprises the alkaline material and the coating attack-suppressing agent
02/13/2003US20030031959 Exposing the bead with light from an exposing source along a plurality of non-parallel paths approximately normal to the surface of the photoresist bead.
02/13/2003US20030031958 Comprising a metal alkoxide (especially titanium tetrabutoxide), a beta -diketone (acetylacetone or benzoylacetone) and acrylic acid or methacrylic acid as main ingredients.
02/13/2003US20030031957 Depositing an antireflective compound in a layer on said substrate surface by chemical vapor deposition; and applying a photoresist layer to said antireflective compound layer to yield the circuit precursor.
02/13/2003US20030031956 Lithographic process
02/13/2003US20030031953 Polymers, resist compositions and patterning process
02/13/2003US20030031952 Polymers, resist compositions and patterning process
02/13/2003US20030031951 Photosensitive composition, photosensitive lithographic printing plate, and process for producing lithographic printing plate
02/13/2003US20030031950 A compound capable of generating an acid upon irradiation; a resin capable of decomposing by the action of an acid to increase the solubility; and a specified dissolution-inhibiting compound.
02/13/2003US20030031949 Novel polymers and photoresist compositions comprising same
02/13/2003US20030031948 Simultaneously developing and gumming the imaged element with an aqueous solution comprising one or more water-soluble polyhydroxy compounds that contain 4 or more contiguous CHOH groups, e.g., mannitol, glucamine or gulonic acid
02/13/2003US20030031943 Focus monitoring method, focus monitoring system, and device fabricating method
02/13/2003US20030031941 Multiple pass write method and reticle
02/13/2003US20030031938 Lithographic apparatus, device manufacturing methods, devices manufactured thereby, method of manufacturing a reflector, reflector manufactured thereby and phase shift mask
02/13/2003US20030031789 Organosiloxanes
02/13/2003US20030031545 System and method for reticle protection and transport
02/13/2003US20030031365 Multiple-exposure drawing apparatus and method thereof
02/13/2003US20030031216 Control system for a two chamber gas discharge laser
02/13/2003US20030031017 Illumination system, projection exposure apparatus and device manufacturing method
02/13/2003US20030030917 Catadioptric imaging system and a projection exposure apparatus provided with said imaging system
02/13/2003US20030030916 Projection optical system and exposure apparatus having the projection optical system
02/13/2003US20030030782 Six degree of freedom wafer fine stage
02/13/2003US20030030781 Imaging apparatus
02/13/2003US20030030780 Projection exposure system
02/13/2003US20030030779 Anti-vibration system for exposure apparatus
02/13/2003US20030030778 Vacuum compatible air bearing stage
02/13/2003US20030030402 Stage assembly and exposure apparatus including the same
02/13/2003US20030030224 Positioning apparatus
02/13/2003US20030030050 Apparatus and method of inspecting semiconductor wafer
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