Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
02/2003
02/26/2003EP1286220A2 Exposure apparatus and exposing method
02/26/2003EP1286219A2 Method of recording identifier and set of photomasks
02/26/2003EP1286218A2 Lithographic patterning using a high transmission attenuated phase-shift mask and multiple exposures of optimised coherence
02/26/2003EP1286188A2 Cholesteric liquid crystal color filter and process for producing the same
02/26/2003EP1286131A1 Coordinate measuring table and coordinate measuring machine
02/26/2003EP1285749A2 Planographic printing plate precursor
02/26/2003EP1285312A1 Method of controlling photoresist stripping process and regenerating photoresist stripper composition based on near infrared spectrometer
02/26/2003EP1285223A2 Data age adjustments
02/26/2003EP1285222A1 Interferometric apparatus and method
02/26/2003EP1285221A1 In-situ mirror characterization
02/26/2003EP1284866A2 Aqueous dispersions for color imaging
02/26/2003EP0993490B1 Method for producing fine pigment dispersions
02/26/2003EP0985021B1 Non-corrosive stripping and cleaning composition
02/26/2003EP0880818B1 Low voltage electrostatic clamp for substrates such as dielectric substrates
02/26/2003CN1399796A Method and apparatus for personalization of semiconductor
02/26/2003CN1399790A Method and apparatus for supercritical processing of multiple workpieces
02/26/2003CN1399170A Method of forming photoresist with etching resistance
02/26/2003CN1398726A Method and device for forming surface with both hydrophilic area and hydrophobic area
02/26/2003CN1398680A Coating apparatus
02/26/2003CN1102161C Photocurable composition
02/25/2003US6526564 Method and apparatus for reference distribution aerial image formation
02/25/2003US6526547 Method for efficient manufacturing of integrated circuits
02/25/2003US6526329 Substrate processing system and substrate processing method
02/25/2003US6526164 Intelligent photomask disposition
02/25/2003US6526118 Projection exposure apparatus and method, and illumination optical system thereof
02/25/2003US6526085 Performance control system and method for gas discharge lasers
02/25/2003US6525817 Inspection method and apparatus for projection optical systems
02/25/2003US6525806 Apparatus and method of image enhancement through spatial filtering
02/25/2003US6525805 Backside alignment system and method
02/25/2003US6525804 Exposure device capable of aligning while moving mask
02/25/2003US6525803 Balanced positioning system for use in lithographic apparatus
02/25/2003US6525802 Kinematic mounted reference mirror with provision for stable mounting of alignment optics
02/25/2003US6525324 Charged-particle-beam projection optical system
02/25/2003US6525295 Laser imaging apparatus
02/25/2003US6525153 Photoresists; sensitizing photoacid initiator to longer wavelengths photolithography
02/25/2003US6525152 Copolymer for improving the chemical and developer resistance of positive working printing plates
02/25/2003US6524964 Method for forming contact by using ArF lithography
02/25/2003US6524937 Selective T-gate process
02/25/2003US6524936 Process for removal of photoresist after post ion implantation
02/25/2003US6524775 Solvent mixture of di(C1-C3)alkyl carbonate and cyclopentanone
02/25/2003US6524774 Method of controlling photoresist thickness based upon photoresist viscosity
02/25/2003US6524770 Hexaaryl biimidazole compounds as photoinitiators, photosensitive composition and method of manufacturing patterns using the compounds
02/25/2003US6524769 Photosensitive resin
02/25/2003US6524765 Micropatterning material for VLSI fabrication; improved sensitivity, resolution and etching resistance; copolymer of di-tert-butyl 1-(bicyclo(2.2.1)hept-2-en-5-yl) propane-2,2-dicarboxylate and maleic anhydride
02/25/2003US6524764 Positive-type photosensitive polyimide precursor composition
02/25/2003US6524757 Forming pattern using alkaline developers; photopolymerization
02/25/2003US6524753 Method for manufacturing phase shift mask
02/25/2003US6524689 Castellation technique for improved lift-off of photoresist in thin-film device processing and a thin-film device made thereby
02/25/2003US6524051 Wafer positioning device with storage capability
02/25/2003US6523695 Method and apparatus for operating a vibration isolation system having electronic and pneumatic control systems
02/25/2003US6523471 Chemical imaging of a lithographic printing plate
02/20/2003WO2003015139A1 Stage system, exposure device, and method of manufacturing device
02/20/2003WO2003015121A2 Slit lens arrangement for particle beams
02/20/2003WO2003014833A2 Collector with fastening devices for fastening mirror shells
02/20/2003WO2003014832A1 Methods and apparatus for use in photopolymer plate manufacture
02/20/2003WO2003014831A2 Photosensitive, flexo printing element and method for the production of newspaper flexo printing plates
02/20/2003WO2003014830A1 Resist pattern swelling material, and method for patterning using same
02/20/2003WO2003014827A1 An interferometer system for a semiconductor exposure system
02/20/2003WO2003014178A1 Process and composition for rapid mass production of holographic recording article
02/20/2003WO2003014177A1 Resin composition, composition for solder resist, and cured article obtained therefrom
02/20/2003WO2003013993A1 Reticle protection and transport
02/20/2003WO2002082188A3 Substrate alignment
02/20/2003WO2002077710A3 Photoresist compositions for short wavelength imaging
02/20/2003WO2002071154A3 Method of uniformly coating a substrate
02/20/2003WO2002054837A3 Direct pattern writer
02/20/2003US20030037309 Management system and management method of semiconductor exposure apparatuses
02/20/2003US20030036750 Controllable electro-optical patternable mask, system with said mask and method of using the same
02/20/2003US20030036618 Exposing polymer and photoacid generator with a light of 180 nm or less wavelength, and conducting baking and development.
02/20/2003US20030036603 E.g., spiro(7-oxa-5-norbornene-2,3'- succinic anhydride, -tetrahydrofuran-2'-one, and -(2',2'-dimethyl)tetrahydrofuran))
02/20/2003US20030036293 Method for manufacturing a semiconductor device
02/20/2003US20030036281 Method of substrate processing and photoresist exposure
02/20/2003US20030036270 Determining exposure time of wafer photolithography process
02/20/2003US20030036204 Surface plasmon enhanced illumination system
02/20/2003US20030036025 Method of recording identifier and set of photomasks
02/20/2003US20030036024 Developer for alkaline-developable lithographic printing plates
02/20/2003US20030036023 Supercritical fluid(SCF) silylation process
02/20/2003US20030036020 Photosensitive conductive paste, method for forming conductive pattern using the same, and method for manufacturing ceramic multilayer element
02/20/2003US20030036019 Capable of hardening upon exposure to a suitable radiation; imaging such a plate using laser radiation; faster photospeed and better curing efficiency as desired for digital laser exposure
02/20/2003US20030036018 Interpolymer of unsaturated carboxylic acid and unsaturated epoxide, which has a molecular weight of 800-7000; polyunsaturated compound;photoinitiator; and a solvent
02/20/2003US20030036017 Polyester film support; photosensitive elastomer composition comprising a diene-vinylaromatic thermoplastic elastomer, a liquid diene rubber, a polyunsaturated compound (e.g., a C9-16 alkylene diacrylate) and a photoinitiator
02/20/2003US20030036016 Particularly sub-170 nm such as 157 nm.; a fluorine-containing polymer, a photoactive component, and a solvent component that is a mixture of least two distinct solvents
02/20/2003US20030036015 Inclusion of a sufficient amount of base counteracts the detrimental effects of photoacid generators, thus providing resists having submicron linewidth resolution.
02/20/2003US20030036007 Field correction of overlay error
02/20/2003US20030036006 Fluorescence microscopy inspection of an imaged resist layer prior to any type of development processing.
02/20/2003US20030036005 Method for producing a photomask and corresponding photomask
02/20/2003US20030035903 Solventless thermosetting photosensitive via-filling ink
02/20/2003US20030035887 Each of the first objects, i.e., a nanoparticle, is embedded in a mobile binder,i.e, a stabilizer, by energy to provide a controlled linkage; ultrahigh density magnetic data storage; photosensitive detectors; nonagglomerating catalysts
02/20/2003US20030035599 Friction-drive stage
02/20/2003US20030035508 Exposure apparatus and exposing method
02/20/2003US20030035116 Interferometer system
02/20/2003US20030035114 In-situ mirror characterization
02/20/2003US20030035095 Reversed, double-helical bellows seal
02/20/2003US20030035094 Reaction force isolation frame
02/20/2003US20030035093 System and method for switching position signals during servo control of a device table
02/20/2003US20030035091 Illumination apparatus, projection exposure apparatus, and device fabricating method
02/20/2003US20030035090 Scanning exposure method and apparatus
02/20/2003US20030035089 Method for improved resolution of patterning using binary masks with pupil filters
02/20/2003US20030035088 Positioning apparatus
02/20/2003US20030035087 Exposure apparatus and air-conditioning apparatus for use with exposure apparatus
02/20/2003US20030034695 Wafer stage with magnetic bearings
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