Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
03/2003
03/04/2003US6529531 Fast wavelength correction technique for a laser
03/04/2003US6529463 Very-high-density memory device utilizing a scintillating data-storage medium
03/04/2003US6529341 Magnetic recording/reproduction device using preformat information
03/04/2003US6529321 Protective overcoat for replicated diffraction gratings
03/04/2003US6529282 Method of controlling photolithography processes based upon scatterometric measurements of photoresist thickness, and system for accomplishing same
03/04/2003US6529266 Device and method for flat holding of a substrate in microlithography
03/04/2003US6529265 Illumination unit and a method for point illumination of a medium
03/04/2003US6529264 Support structure for a projection exposure apparatus and projection exposure apparatus having the same
03/04/2003US6529263 Position detection apparatus having a plurality of detection sections, and exposure apparatus
03/04/2003US6529262 System and method for performing lithography on a substrate
03/04/2003US6529260 Lifting support assembly for an exposure apparatus
03/04/2003US6528836 Photomask ESD protection and an anti-ESD pod with such protection
03/04/2003US6528806 Charged-particle-beam microlithography apparatus, reticles, and methods for reducing proximity effects, and device-manufacturing methods comprising same
03/04/2003US6528799 Device and method for suppressing space charge induced aberrations in charged-particle projection lithography systems
03/04/2003US6528552 Permanent protective coating of a printed wiring board; aluminum hydroxide, inorganic molybdenum compound, zinc stannate or zinc hydroxystannate in a resin
03/04/2003US6528398 Thinning of trench and line or contact spacing by use of dual layer photoresist
03/04/2003US6528341 Method of forming a sion antireflection film which is noncontaminating with respect to deep-uv photoresists
03/04/2003US6528331 Method for identifying and controlling impact of ambient conditions on photolithography processes
03/04/2003US6528240 Pattern formation method
03/04/2003US6528238 Reduce diffraction caused by the reticle and improve the resolution
03/04/2003US6528236 Photosensitive resin composition, multilayer printed wiring board and process for production thereof
03/04/2003US6528235 Reducing reflection of exposure radiation; heated crosslinked polymer
03/04/2003US6528233 Chemical amplification type negative-working resist composition for electron beams or X-rays
03/04/2003US6528232 Chemically amplified photoresist composition using the novel sulfonium salt compound as the photoacid generator
03/04/2003US6528231 Photosensitive resin composition can form a resin layer having excellent heat resistance
03/04/2003US6528230 Dye precursor, image forming material, and image forming method
03/04/2003US6528229 Mixture of polymer and acid generators
03/04/2003US6528228 Ink receptive top layer comprising a diazonaphthoquinone moiety; underlayer soluble in aqueous alkaline developer and has a 1 minute soak loss in 80 wt % diacetone alcohol/20 wt % water of less than 20 wt %
03/04/2003US6528219 Dynamic alignment scheme for a photolithography system
03/04/2003US6528218 Method of fabricating circuitized structures
03/04/2003US6528217 Electrically programmable photolithography mask
03/04/2003US6528128 Method of treating a substrate
03/04/2003US6527966 Forming a pattern composed of an etchable layer by conducting dry etching of an etchable layer formed on a substrate for semiconductor through a mask of patterned radiation sensitive material coating formed on the etchable layer
03/04/2003US6527867 Method for enhancing anti-reflective coatings used in photolithography of electronic devices
03/04/2003US6527862 Flow controller
02/2003
02/27/2003WO2003017363A1 Adhesive tape
02/27/2003WO2003017344A1 Mask replacement method and exposure device
02/27/2003WO2003017343A1 Dry developing method
02/27/2003WO2003017342A2 Method for the production of a self-adjusted structure on a semiconductor wafer
02/27/2003WO2003017317A1 Lithography system comprising a protected converter plate
02/27/2003WO2003017006A2 A method of substrate processing and photoresist exposure
02/27/2003WO2003017005A1 Stable energy detector for extreme ultraviolet radiation detection
02/27/2003WO2003017004A2 Optical array
02/27/2003WO2003017003A2 Diaphragm for an integrator unit
02/27/2003WO2003017002A1 Composition for forming antireflective film for use in lithography
02/27/2003WO2003017001A1 Photosensitive resin composition for photoresist
02/27/2003WO2003016977A2 Objective with pupil obscuration
02/27/2003WO2003016976A2 Device for adjusting an optical element
02/27/2003WO2003016815A1 In-situ mirror characterization
02/27/2003WO2003016781A2 Surface plasmon enhanced illumination system
02/27/2003WO2003016069A1 Multicolor image forming material and multicolor image forming method using the same
02/27/2003WO2002095353A3 Multi-photon imaging and quantum lithography
02/27/2003WO2002088077A3 Resist compositions with polymers having pendant groups containing plural acid labile moieties
02/27/2003WO2002077709A3 Photoresist composition
02/27/2003WO2002069044A3 Polymers and photoresist compositions
02/27/2003WO2002056468A3 Method and system for efficient and accurate filtering and interpolation
02/27/2003WO2002012948A3 Pneumatic control system and method for shaping deformable mirrors in lithographic projection systems
02/27/2003WO2001075501A9 Method and device for holding optical member, optical device, exposure apparatus, and device manufacturing method
02/27/2003US20030040831 Moving mechanism and stage system in exposure apparatus
02/27/2003US20030040738 Controllable liquid crystal matrix mask particularly suited for performing ophthamological surgery, a laser system with said mask and a method of using the same
02/27/2003US20030040447 In aqueous solution containing amine
02/27/2003US20030040192 Method for fabricating semiconductor device
02/27/2003US20030039928 Forming semiconductor wafer; lithography
02/27/2003US20030039925 Methods for forming a photosensitive insulating film pattern and reflection electrode each having an irregular upper surface and method for manufacturing a LCD having reflection electrode using the same
02/27/2003US20030039921 Chemically amplified negative photoresist composition for the formation of thick films, photoresist base material and method of forming bumps using the same
02/27/2003US20030039920 Fine pattern polymer; rectangular shapes; silylated surface resolution, development
02/27/2003US20030039919 Optical coatings; photoresists for photolithography
02/27/2003US20030039918 Chemical amplifying type positive resist composition
02/27/2003US20030039916 Positive resist composition
02/27/2003US20030039915 Photopolymer sachet
02/27/2003US20030039905 Method for controlling the quality of a lithographic structuring step
02/27/2003US20030039903 Semiconductor structure, capacitor, mask and methods of manufacture thereof
02/27/2003US20030039896 Exposure device, exposure method, semiconductor device manufacturing method, electro-optical device, and electronic appliance
02/27/2003US20030039893 Phase shifting masking
02/27/2003US20030039892 Radiation transparent plate; overcoating with opacity film; forming pattern
02/27/2003US20030039795 Photopolymerizable resin based on acrylic ester, and an additive based on at least one selected from the group consisting of benzotriazole and a derivative of benzotriazole, and a photointiator.
02/27/2003US20030039440 For handling of an optical fiber during multiple processing operations that may be automatic
02/27/2003US20030039388 Machine vision and semiconductor handling
02/27/2003US20030039291 Gas discharge laser, method of operating a gas discharge laser, and use of a sintered filter
02/27/2003US20030039042 Multilayer-coated reflective mirrors for X-ray optical systems, and methods for producing same
02/27/2003US20030039029 Reflection type demagnification optical system, exposure apparatus, and device fabricating method
02/27/2003US20030039028 High numerical aperture projection for microlithography
02/27/2003US20030038937 Projection exposure apparatus and device manufacturing method using the same
02/27/2003US20030038931 Illumination optical apparatus, exposure apparatus and method of exposure
02/27/2003US20030038929 Exposure system, exposure apparatus and coating and developing exposure apparatus
02/27/2003US20030038255 Fluid jet electric discharge source
02/27/2003US20030038250 Process conditions change monitoring systems that use electron beams, and related monitoring methods
02/27/2003US20030038244 Electrostatically focused addressable field emission array chips (AFEA's) for high-speed massively parallel maskless digital e-beam direct write lithography and scanning electron microscopy
02/27/2003US20030038243 Charged-particle-beam (CPB) optical systems, and CPB Microlithography systems comprising same, that cancel external magnetic fields
02/27/2003US20030038225 Lithographic apparatus, device manufacturing method, device manufactured thereby, control system, computer program, and computer program product
02/27/2003US20030037878 Exposure apparatus and semiconductor device manufacturing method
02/27/2003US20030037688 Method for holding sheet material, and image recording apparatus
02/27/2003US20030037568 For an ultraviolet light optical system in which light in a wavelength region of 200 mn or less, such as an argon fluoride excimer laser is used
02/27/2003CA2420978A1 Multi-color image-forming material and method for forming multi-color image using the same
02/26/2003EP1286387A2 Method to reduce photoresist contamination from silicon carbide films
02/26/2003EP1286385A2 Device for debonding thin wafers
02/26/2003EP1286381A2 Means for monitoring process conditions change in electron beam systems and related monitoring methods
02/26/2003EP1286223A1 Method of measuring the aberration of a lithographic projection system
02/26/2003EP1286222A1 Lithographic apparatus and device manufacturing method
02/26/2003EP1286221A2 Positioning apparatus
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