Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
03/2003
03/11/2003US6531259 Pattern formation method and pattern formation material
03/11/2003US6531257 Organic binder having an acid functional group, a copper powder with a surface layer of thickness .1 mu m and copper oxide as a main component, and a photosensitive organic component
03/11/2003US6531251 Calculating exposure dose at specified regions of the sensitive substrate to determine expected proximity effects at the specified regions; mathematical equations; making microelectronics
03/11/2003US6531184 Multilayer of liquids; flexography printing sleeves; infrared radiation sensitivity
03/11/2003US6530340 Apparatus for manufacturing planar spin-on films
03/11/2003CA2214881C Lithographic imaging system for interchangeable plate cylinders
03/06/2003WO2003019295A1 Bathochromic mono- and bis-acylphosphine oxides and sulfides and their use as photoinitiators
03/06/2003WO2003019294A1 Imageable composition containing infrared absorber with counter anion derived from a non-volatile acid
03/06/2003WO2003019293A1 Negative working imageable composition containing sulfonic acid
03/06/2003WO2003019292A1 Negative type colored photosensitive composition
03/06/2003WO2003019272A2 Exposure mask
03/06/2003WO2003019111A1 Dynamic interferometric controlling direction of input beam
03/06/2003WO2003019110A1 Multiple-pass interferometry
03/06/2003WO2003018663A1 Deodorizing agent for sulfur- or nitrogen-containing initiators
03/06/2003WO2002012928A3 Diffraction spectral filter for use in extreme-uv lithography condenser
03/06/2003WO2002010721A3 Methods for high-precision gap and orientation sensing between a transparent template and substrate for imprint lithography
03/06/2003US20030045731 (1,3-dioxolan-4-yl)alkyl 5-norbornene-2-carboxylate useful-as a monomer to form a polymer
03/06/2003US20030045127 Develop processing method of a resist surface of a substrate for reduced processing time and reduced defect density
03/06/2003US20030045122 Nanolithography with pi-conjugated azo dyes and azo-metal complexes
03/06/2003US20030045076 Semiconductor device production method
03/06/2003US20030045071 Method for fabricating semiconductor memory device
03/06/2003US20030044734 The method results in the edge of any recessed area receiving a double exposure, thus ensuring that the resist is properly cleared in this area.
03/06/2003US20030044731 Solution of a low concentration is supplied first onto a wafer and left to stand to permit a developing reaction to proceed, followed by further supplying a developing solution of a higher concentration, letting it stand and rinsing
03/06/2003US20030044728 Micro-structure having a plurality of step-like elements
03/06/2003US20030044727 Method for manufacturing transparent soft mold for forming barrier ribs of PDP and method for forming barrier ribs using the same
03/06/2003US20030044726 Conformally forming an antireflectance coating layer over an inter-metal dielectric layer including at least one via opening extending perpendicular to a thickness therethrough
03/06/2003US20030044724 The reticle is moved between a first exposure to a first light and a second exposure to a second light.
03/06/2003US20030044722 Process for improving critical dimension uniformity
03/06/2003US20030044721 Fabrication method of semiconductor integrated circuit device
03/06/2003US20030044718 Acid generator; resin containing a polyalicyclic group or a furanone, cyclopentanone, pyrrolidone or tetrahydrothiophenone group
03/06/2003US20030044717 Positive photosensitive composition
03/06/2003US20030044716 Comprising a resin, a photoacid generator compound, and an acid; improved storage stability; preferably contains an ester solvent such as ethyl lactate or propylene glycol monomethyl ether acetate
03/06/2003US20030044715 Positive photoresist composition
03/06/2003US20030044703 The simulation is based on calculations of resist development rate; resist is estimated by focusing on the separation of resist molecules that occurs during resist development
03/06/2003US20030044702 Semiconductor structure and method for determining critical dimensions and overlay error
03/06/2003US20030044701 Method and apparatus for controlling radiation beam intensity directed to microlithographic substrates
03/06/2003US20030044700 Method of figuring exposure energy
03/06/2003US20030044697 Methods and apparatus for correcting the proximity effect in a charged-particle-beam microlithography system and devices manufactured from the same
03/06/2003US20030044696 Verification photomask
03/06/2003US20030044694 Improved the accuracy of critical dimensions of the mask pattern.
03/06/2003US20030044693 Irradiating the substrate while moving it axially relative to a radiation source.
03/06/2003US20030044692 Optical proximity correction verification mask
03/06/2003US20030044691 Process and composition for rapid mass production of holographic recording article
03/06/2003US20030044688 Crosslinking agent having two or more (alk)acryloyl(poly)oxyalkyleneoxyalkylphenylene groups used to crosslink oxyalkylene mono(alk)acrylate monoalkyl ethers; oxyalkylene dialkyl ether solvent
03/06/2003US20030044590 X-ray printing personalization technique
03/06/2003US20030044542 Method for forming a liquid film on a substrate
03/06/2003US20030044103 Columnar optical device and method for manufacturing the same
03/06/2003US20030044057 Method of checking overlap accuracy of patterns on four stacked semiconductor layers
03/06/2003US20030043876 Lithography laser with beam delivery and beam pointing control
03/06/2003US20030043462 Optical unit having plural optical elements
03/06/2003US20030043456 Multilayer extreme ultraviolet mirrors with enhanced reflectivity
03/06/2003US20030043455 Collector for an illumination system with a wavelength of less than or equal to 193 nm
03/06/2003US20030043384 Dynamic interferometer controlling direction of input beam
03/06/2003US20030043376 Beam splitting apparatus, transmittance measurement apparatus, and exposure apparatus
03/06/2003US20030043360 Methods and apparatus for stereolithographic processing of components and assemblies
03/06/2003US20030043359 Apparatus for generating partially coherent radiation
03/06/2003US20030043358 Methods for determining focus and astigmatism in charged-particle-beam microlithography
03/06/2003US20030043357 Vacuum chamber having instrument- mounting bulkhead exhibiting reduced deformation in response to pressure differential, and energy-beam systems comprising same
03/06/2003US20030043356 Projection exposure apparatus and method
03/06/2003US20030043354 Lithographic apparatus, device manufacturing method, and device manufactured thereby
03/06/2003US20030043352 Exposure apparatus and a device manufacturing method which keep temperature of a diaphragm of a projection optical system substantially constant
03/06/2003US20030043321 Slant reflector with bump structure and fabricating method thereof
03/06/2003US20030042920 Exposure apparatus, control method for the same, and device fabricating method
03/06/2003US20030042853 Mercury discharge lamp of the short arc type
03/06/2003US20030042579 Semiconductor structure and method for determining critical dimensions and overlay error
03/06/2003US20030042434 Multiple electron beam lithography system with multiple beam modulated laser illumination
03/06/2003US20030042183 Resist recycling apparatus and method for recycling the same
03/06/2003US20030041893 Solar cell, method for manufacturing the same, and apparatus for manufacturing the same
03/06/2003US20030041881 For peeling and removal of disused material such as photoresist films; for use on semiconductor wafers, hard discs, liquid crystal displays, or flat panel displays in lithography
03/06/2003US20030041759 Coating fluid for printing plates and method of making a printing plate
03/06/2003US20030041447 Vibration control utilizing signal detrending
03/06/2003CA2454914A1 Bathochromic mono- and bis-acylphosphine oxides and sulfides and their use as photoinitiators
03/05/2003EP1288722A2 Method for preparing lithographic printing plate
03/05/2003EP1288721A2 Photolithography with multiple level substrate
03/05/2003EP1288720A1 Plate-making method of printing plate
03/05/2003EP1288718A2 Process for the fabrication of a phase mask for optical fiber processing, optical fiber-processing phase mask, optical fiber with bragg grating, and dispersion compensation device using the optical fiber
03/05/2003EP1288716A1 Phase-shift mask
03/05/2003EP1287986A1 Method and device for regenerative processing and printing
03/05/2003EP1287984A1 Lithographic printing plate precursor sensitive to infrared laser radiation
03/05/2003EP1287592A1 Gas discharge laser with blade-dielectric electrode
03/05/2003EP1287550A2 Post chemical-mechanical planarization (cmp) cleaning composition
03/05/2003EP1287549A1 An apparatus and a method for forming a pattern using a crystal structure of material
03/05/2003EP1287405A2 Self-contained imaging assembly having improved peel strength
03/05/2003EP1192041B1 Method and device for producing an object by means of stereolithography
03/05/2003EP1135267B1 Method for decoratively shaping a painted substrate surface
03/05/2003EP1036789B1 Novel aromatic sulfonium compounds, photoacid generators comprising the same, photopolymerizable compositions containing the same, stereolithographic resin compositions, and stereolithographic process
03/05/2003CN2539207Y Water baffler for processing and conveying circuit boards
03/05/2003CN2539206Y Approximate parallel light gain controlling structure for exposure device
03/05/2003CN1401103A Process monitoring system for lithography lasers
03/05/2003CN1401096A High-resolution photosnesiitve resin composition usable with I-line and method of forming patter
03/05/2003CN1400635A Substrate processing apparatus
03/05/2003CN1400632A Liquid film forming method and solid film forming method
03/05/2003CN1400629A Three-D stereo mask
03/05/2003CN1400507A Lighting system, projecting exposure apparatus and device making process
03/05/2003CN1400506A Exposure process
03/05/2003CN1400505A Image forming material and ammonium compound
03/05/2003CN1102623C Curing process for cationically photocurable
03/05/2003CA2400912A1 A multi-layer thermally imageable element
03/04/2003US6529790 Computation of die-per-wafer considering production technology and wafer size
03/04/2003US6529623 Eliminating localized lens aberration
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