Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
11/2013
11/20/2013CN103400757A Method for manufacturing grid lines with high uniformity through double exposure
11/20/2013CN103400754A Method for manufacturing grid lines with high uniformity through double exposure
11/20/2013CN103400753A Method for manufacturing grid lines with high uniformity through double exposure
11/20/2013CN103399468A Method and device for stripping photoresist layer
11/20/2013CN103399467A Process for producing resist composition, filtering apparatus, resist composition applicator, and resist composition
11/20/2013CN103399466A Three-degree-of-freedom decoupling and modeling method for macro dynamic part of workpiece platform
11/20/2013CN103399465A Method for realizing dual-face alignment photoetching by utilization of one-face exposure machine
11/20/2013CN103399464A Dynamic gas lock
11/20/2013CN103399463A Illumination device of projection mask aligner and application method of illumination device
11/20/2013CN103399462A Exposure film of printed circuit board
11/20/2013CN103399461A Mask planarization method based on double-layer glue technology
11/20/2013CN103399460A Manufacturing method for large size joint-free nano-sized roller mold
11/20/2013CN103399459A Method for preparation of metal/medium nano-multilayer film high quality section
11/20/2013CN103399414A Method for eliminating zero-order diffraction spots of diffractive optical element
11/20/2013CN103399406A Diffractive optical element for shaping gauss beam into flat-topped beam, and preparation method thereof
11/20/2013CN103399388A Airbag supporting device for optical element
11/20/2013CN103399387A Multi-airbag support device for optical element in lithographic projection lens system
11/20/2013CN103396743A Resin porous membrane with adhesive layer,method for producing resin porous membrane with adhesive layer, and filter member
11/20/2013CN103395307A Preparation method of internal electrode of chip-type electronic component
11/20/2013CN102799063B Method for preparing photoresist template and patterned ZnO nanorod array
11/20/2013CN102621819B Detection method for lithography machine projecting lens large aberration
11/20/2013CN102590989B Method for selecting non-spherical position of lithography lens
11/20/2013CN102566263B Imprint lithography
11/20/2013CN102540284B Preparation method of micro-lens array based on negative photoresist and mask moving exposure process
11/20/2013CN102346371B Photoresist compositions and methods of forming photolithographic patterns
11/20/2013CN102317863B Photoactive compound and photosensitive resin composition containing the same
11/20/2013CN102221790B Immersion lithographic apparatus
11/20/2013CN102165370B Photosensitive siloxane polyimide resin composition
11/20/2013CN102112921B Flame-retardant photocurable resin composition, dry film and cured product of same, and printed circuit board using composition thereof
11/20/2013CN102112920B Flame-retardant photocurable resin composition, dry film and cured product of same, and printed circuit board using composition thereof
11/20/2013CN102084296B Positive photosensitive resin composition, cured film, protective film, insulation film, and semiconductor device and display device using same
11/20/2013CN102053497B Positive type radiation-sensitive resin composition, inter-layer insulating film and method for forming the same
11/20/2013CN102047180B Film type photodegradable transfer material
11/20/2013CN102037043B Novel polyimide precursor composition, use of the same, and production method of the same
11/20/2013CN101943864B Positive resist composition and patterning process
11/20/2013CN101916050B Lithographic apparatus and device manufacturing method
11/20/2013CN101910942B Method for replicating master molds
11/20/2013CN101765811B Lithographic apparatus and device manufacturing method
11/20/2013CN101681106B A lithographic printing plate precursor
11/20/2013CN101680746B Moving body device, exposure device, pattern formation device, and device manufacturing method
11/20/2013CN101673059B Lithographic apparatus and device manufacturing method
11/20/2013CN101614953B Method and system for evaluating an object that has a repetitive pattern
11/20/2013CN101373341B Photoresist apparatus for removing edge
11/19/2013US8587766 Lithographic apparatus and device manufacturing method
11/19/2013US8586290 Patterning process and chemical amplified photoresist composition
11/19/2013US8586289 Aromatic hydrocarbon resin and composition for forming underlayer film for lithography
11/19/2013US8586288 Method of forming resist pattern
11/19/2013US8586287 Fabrication method of cylindrical gratings
11/19/2013US8586286 Resin composition for optical waveguide, and optical waveguide produced by using the resin composition
11/19/2013US8586285 Methods for forming sheeting with a composite image that floats and a master tooling
11/19/2013US8586284 Photosensitive resin composition, photosensitive element, method of forming resist pattern, and process for producing printed wiring board
11/19/2013US8586283 Near-infrared absorbing film compositions
11/19/2013US8586282 Resist composition and patterning process
11/19/2013US8586281 Positive resist composition and method of forming resist pattern
11/19/2013US8586280 Composition, process of preparation and method of application and exposure for light imaging paper
11/19/2013US8586279 Imaging particulates, paper and process, and imaging of paper using dual wavelength light
11/19/2013US8586268 Oxime ester photoinitiators
11/19/2013US8585830 Substrate processing apparatus and substrate processing method
11/14/2013WO2013168903A1 Thinner composition
11/14/2013WO2013168698A1 Conductive film
11/14/2013WO2013168675A1 Negative photosensitive resin composition, method for manufacturing hardening relief pattern, and semiconductor device
11/14/2013WO2013168610A1 Resist underlayer film-forming composition
11/14/2013WO2013168457A1 Surface position measurement device, surface position measurement method, exposure device, and device production method
11/14/2013WO2013168456A1 Surface position measurement device, exposure device, and device production method
11/14/2013WO2013167770A1 Method for the synthesis of curcumin
11/14/2013WO2013167515A1 Oxime ester photoinitiators
11/14/2013WO2013167463A1 Lithographic apparatus
11/14/2013WO2013167409A1 Assembly for a projection exposure apparatus for euv projection lithography
11/14/2013WO2013166735A1 Color filter and manufacturing method thereof
11/14/2013WO2013125933A3 Chalcogenide as-se-s electron beam resist
11/14/2013US20130303421 Photoresist stripping technique
11/14/2013US20130302990 Organic film composition, method for forming organic film and patterning process using this, and heat-decomposable polymer
11/14/2013US20130302736 Resist composition, method for forming resist pattern, and compound
11/14/2013US20130302735 Monomers, polymers and photoresist compositions
11/14/2013US20130302728 Photoresist compositions
11/14/2013US20130302727 Photoresist composition and method of forming a color filter using the same
11/14/2013US20130302726 Chemical amplification resist composition, resist film using the composition, resist-coated mask blanks, resist pattern forming method, photomask and polymer compound
11/14/2013US20130302724 Mask and method of forming pattern by using the same
11/14/2013US20130302209 High Efficiency Solid-State Light Source and Methods of Use and Manufacture
11/14/2013US20130301153 Color filter and manufacturing method thereof
11/14/2013US20130301028 Substrate Table, Lithographic Apparatus and Device Manufacturing Method
11/14/2013US20130301027 Exposure method, exposure apparatus, and device manufacturing method
11/14/2013US20130301025 Lithographic Apparatus and Device Manufacturing Method Utilizing Data Filtering
11/14/2013US20130301024 Method of operating a projection exposure tool for microlithography
11/14/2013US20130301023 Reflective optical element and euv lithography appliance
11/14/2013US20130301022 Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine
11/14/2013US20130301021 Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine
11/14/2013US20130301020 Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine
11/14/2013US20130301019 Exposure method and apparatus, maintenance method and device manufacturing method
11/14/2013US20130301018 Wafer table having sensor for immersion lithography
11/14/2013US20130301017 Lithographic apparatus and device manufacturing method
11/14/2013US20130301016 Wafer table having sensor for immersion lithography
11/14/2013US20130301015 Apparatus and method for providing fluid for immersion lithography
11/14/2013US20130298792 Lithographic printing plate precursor
11/14/2013US20130298402 Oleophobic ink jet orifice plate
11/14/2013US20130298398 Photosensitive resin composition, photosensitive element, method for forming resist pattern, and method for manufacturing printed wiring board
11/14/2013DE102013200137A1 Microlithographic projection exposure system operating method for manufacturing e.g. LCDs, involves illuminating regions of plane in rotational positions of lambda/two-plate, and adjusting mirror arrangement with light pulses
11/14/2013DE102012220925A1 Damping arrangement for dissipating vibrational energy of e.g. mirror, in microlithographic projection exposure apparatus, has flux guide producing magnetic circuit between two components by gap
11/14/2013DE102012218220A1 Projection exposure system for semiconductor lithography, has retainer that is arranged in reduction kinematics unit, such that space between support unit and bearing point is varied to specific range
11/14/2013DE102012207866A1 Baugruppe für eine Projektionsbelichtungsanlage für die EUV-Projektionslithografie Assembly for a projection exposure apparatus for EUV projection lithography
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