Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
03/2003
03/13/2003US20030049946 Woven faced or warp knitted fabric composed of meta-aramid and/or polyamideimide fibers, including woven mesh back of low thermal shrinkage fibers which form interwoven backing scrim on face fabric, having specified ratio of face to back yarns
03/13/2003US20030049872 Mask alignment structure for IC layers
03/13/2003US20030049572 Method for forming patterned insulating elements and methods for making electron source and image display device
03/13/2003US20030049571 Exposing a substrate with the patterned photoresist to a vapor which penetrates the surface and heating for a time to cause the photoresist to flow
03/13/2003US20030049570 Forming a film of a chemically amplified resist on a substrate, exposing to light, developing and rinsing with an alkaline liquid
03/13/2003US20030049569 1-10 micrometer thick crystaline membrane surrounded by a frame of a bulk type crystalline material
03/13/2003US20030049568 Method for producing a structured layer on a semiconductor substrate
03/13/2003US20030049567 Coating a photoresist pattern on a mask oxide layer, exposing and developing
03/13/2003US20030049566 Heating the antireflective compound so as to vaporize it, and then pyrolizing to form stable diradicals which are polymerized on a substrate surface
03/13/2003US20030049565 Photoresist composition and method of forming a photoresist pattern with a controlled remnant ratio
03/13/2003US20030049564 Comprises photosensitive polymer layer over aluminum substrate; sludge- and blinding- free; electroconductivity; high strength; durability
03/13/2003US20030049561 Etch improved resist systems containing acrylate (or methacrylate) silane monomers
03/13/2003US20030049560 Wherein active primer is disposed between thermal transfer donor sheet and receptor to assist selective thermal transfer; binder improves adhesion
03/13/2003US20030049548 Integrated circuits; dielectrics; photolithography
03/13/2003US20030049546 Charged-particle-beam microlithography reticles including exposure alignment marks associated with individual subfields
03/13/2003US20030049412 Process of forming a pattern on a substrate
03/13/2003US20030049381 Methods utilizing scanning probe microscope tips and products therefor or produced thereby
03/13/2003US20030048988 Method for fabricating chirped fiber bragg gratings
03/13/2003US20030048960 Exposure method and apparatus, and device manufacturing method using the same
03/13/2003US20030048872 Method of making <200 nm wavelength fluoride crystal lithogrphy/laser optical elements
03/13/2003US20030048547 Projection Objective
03/13/2003US20030048467 Image recorder having more than one recording head and image recording system containing the image recorder
03/13/2003US20030048458 Method for determining lithographic focus and exposure
03/13/2003US20030048456 Multiple-pass interferometry
03/13/2003US20030048429 Exposure system of semiconductor wafer and method for operating the same
03/13/2003US20030048428 Lithographic apparatus, device manufacturing method and device manufactured thereby
03/13/2003US20030048427 Electron beam lithography system having improved electron gun
03/13/2003US20030048425 Exposure apparatus, method of controlling same, and method of manufacturing devices
03/13/2003US20030047694 Method of measuring aberration of a projection system of a lithographic apparatus, device manufacturing method, and device manufactured thereby
03/13/2003US20030047693 Base stabilization system
03/13/2003US20030047692 Measuring method and measuring apparatus, exposure method and exposure apparatus
03/13/2003US20030047535 System and process for automated microcontact printing
03/13/2003US20030047136 Photoresist supply apparatus capable of controlling flow length of photoresist and method of supplying photoresist using the same
03/13/2003US20030046821 Reticle, and pattern positional accuracy measurement device and method
03/13/2003CA2458619A1 Line selected f2 two chamber laser system
03/13/2003CA2458111A1 Laser lithography light source with beam delivery
03/13/2003CA2457869A1 Very narrow band, two chamber, high rep rate gas discharge laser system
03/13/2003CA2456960A1 Method of actinically imaging
03/12/2003EP1291920A2 Solar cell, method for manufacturing the same, and apparatus for manufacturing the same
03/12/2003EP1291910A1 Wafer chuck, exposure system, and method of manufacturing semiconductor device
03/12/2003EP1291859A2 Manufacturing method of stamper for optical information medium, photoresist master therefor, stamper for optical information medium and optical information medium
03/12/2003EP1291722A2 Method of recording identifier and set of photomasks
03/12/2003EP1291721A1 Lithographic apparatus and device manufacturing method
03/12/2003EP1291720A2 Zoom system for illumination apparatus
03/12/2003EP1291719A1 Projection exposure apparatus
03/12/2003EP1291718A2 Photopolymerizable composition
03/12/2003EP1291695A2 Catadioptric optical reduction system with high numerical aperture
03/12/2003EP1291680A2 Multilayer-film mirrors for use in extreme UV optical systems, and methods for manufacturing such mirrors exhibiting improved wave aberrations
03/12/2003EP1291392A1 Oxonol infrared radiation sensitive compounds
03/12/2003EP1291173A1 Thermal switchable composition and imaging member containing complex oxonol IR dye and methods of imaging and printing
03/12/2003EP1291172A2 A multi-layer thermally imageable element
03/12/2003EP1291171A2 Coating fluid for printing plates and method of making a printing plate
03/12/2003EP1290710A2 Method of producing rib for plasma display panel substrate
03/12/2003EP1290500A1 Active reticle, method for making same, ion projecting lithography method using same and equipment therefor
03/12/2003EP1290499A1 Photosensitive resin composition and photosensitive material using the same
03/12/2003EP1290498A1 Method for creating an integrated circuit stage wherein fine and large patterns coexist
03/12/2003EP1290497A1 Method in connection with the production of a template and the template thus produced
03/12/2003EP1290496A2 Modification of mask layout data to improve mask fidelity
03/12/2003EP1289967A1 Triazine-based compound comprising functionalized alkylthio groups, and photopolymerization initiator
03/12/2003EP1289769A1 Polymers and their use in imagable products and image-forming methods
03/12/2003EP1289768A2 Imaging media containing heat developable photosensitive microcapsules
03/12/2003EP1232516A4 Method and radiation generating system using microtargets
03/12/2003EP1040511B1 Integrated material management module
03/12/2003CN1402897A High power gas discharge laser with helium purged line narrowing unit
03/12/2003CN1402841A Positive type photosensitive polyimide resin composition
03/12/2003CN1402840A Non-aromatic chromophores for use in polymer anti-reflective coatings
03/12/2003CN1402830A Precision stage
03/12/2003CN1402691A Wafer transport system
03/12/2003CN1402322A Monitoring system and method for monitoring process condition change by electron beam
03/12/2003CN1402090A Stripping liquor for photoresist and photoresist stripping method therewith
03/12/2003CN1402089A Stripping liquid composition for photoresist
03/12/2003CN1402088A Original plate of lithographic plate
03/12/2003CN1402087A Alkali processing liquor, method and device for preparing processing liquor, and method and device for supply thereof
03/12/2003CN1402047A Process for mfg. multi-phase diffraction optic element
03/12/2003CN1401826A Method and apparatus for pollution-less electromachining metal printing cylinder
03/12/2003CN1103066C Photoimageable composition having improved flexibility adhesion and stripping characteristics
03/12/2003CN1103065C Photoimageable composition having improved photoinitiator system
03/12/2003CN1103064C Method for changing of gray scale of picture
03/11/2003US6532585 Method and apparatus for application of proximity correction with relative segmentation
03/11/2003US6532462 Gene expression and evaluation system using a filter table with a gene expression database
03/11/2003US6532327 Controlled tension to the central portion of the optical fiber changes the refractive index characteristics during exposure to an interference pattern of high intensity actinic radiation
03/11/2003US6532247 Laser wavelength control unit with piezoelectric driver
03/11/2003US6532097 Image registration apparatus having an adjustable reflective diffraction grating and method
03/11/2003US6532057 Exposure apparatus and method
03/11/2003US6532056 Alignment system and projection exposure apparatus
03/11/2003US6531861 Movement actuator/sensor systems
03/11/2003US6531793 Displacement device
03/11/2003US6531786 Durable reference marks for use in charged-particle-beam (CPB) microlithography, and CPB microlithography apparatus and methods comprising same
03/11/2003US6531706 Surface position detecting system and method having an optimum value
03/11/2003US6531681 Apparatus having line source of radiant energy for exposing a substrate
03/11/2003US6531627 Pendant ester groups on norbornene and 1,4:5,8-dimethanonaph-thalene backbone monomers, excellent reactivity; photosensitivity
03/11/2003US6531562 Such as 2-(1-tert- butoxycarbonylpiperidin-2-yl)ethyl 5-norbornene-2-carboxylate; photolithography; etching/heat resistance; semiconductors
03/11/2003US6531521 Using light shielding vessel
03/11/2003US6531436 Corrosion inhibitor of catechol, benzotriazole, 2-mercaptobenzimidazole, gallic acid or their derivatives; polar aprotic solvent and base; electronics, thin film heads
03/11/2003US6531402 Method for etching organic film, method for fabricating semiconductor device and pattern formation method
03/11/2003US6531267 Process for producing acid sensitive liquid composition containing a carbonate
03/11/2003US6531265 Using a Fence Creation and Elimination (FCE) planarization process; for VLSI (Very Large Scale Integration) technology; replaces chemical mechanical polishing to eliminate it associated defects
03/11/2003US6531264 Integrated circuit manufacture
03/11/2003US6531263 Photopolymerizable flexographic printing elements comprising SIS/SBS mixtures as binder for the production of flexographic printing plates
03/11/2003US6531260 Photoresist
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