Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
03/2003
03/20/2003US20030053035 Lithographic apparatus and method
03/20/2003US20030052606 Short-arc discharge lamp
03/20/2003US20030052548 Lithographic apparatus and motor for use in the apparatus
03/20/2003US20030052342 Method for forming a pattern and a semiconductor device
03/20/2003US20030052311 Two-photon absorption composition
03/20/2003US20030052284 Lithographic apparatus, device manufacturing method, and device manufactured thereby
03/20/2003US20030052279 Ultraviolet-light irradiation apparatus
03/20/2003US20030052251 Method for adjusting illumination parameters of a laser imagestter
03/20/2003US20030052105 Laser sintering apparatus
03/20/2003US20030052081 Method for producing active or passive components on a polymer basis for integrated optical devices
03/20/2003US20030052078 Production process of electronic component using wet etching, electronic component, and suspension for hard disk
03/20/2003US20030051790 Conveyorized vacuum applicator and method of applying a dry film resist to a printed circuit board
03/20/2003US20030051742 Method and apparatus for treating a substrate with an ozone-solvent solution II
03/20/2003US20030051740 Forming chrome photomasks and phase-shift masks without producing chrome opaque defects.
03/20/2003US20030051739 Apparatus for in situ cleaning of carbon contaminated surfaces
03/20/2003US20030051621 Sheet material holding device
03/20/2003US20030051507 Treating the glass having a hydrogen molecule content of less than 1 x 1017 molecules/cm3 at a temperature of from 300 to 600 degrees C. in a hydrogen gas-containing atmosphere at a pressure of from 2 to 30 atms.
03/20/2003CA2457946A1 Process for the preparation of hydroxy-vinyl-aromatic polymers or copolymers by anionic or controlled radical polymerization
03/19/2003EP1293836A2 Device for exposure of a strip-shaped workpiece with a meander correction device
03/19/2003EP1293834A2 Illumination apparatus
03/19/2003EP1293833A1 High resolution printing technique by using a mask pattern adapted to the technique
03/19/2003EP1293832A1 Projection exposure apparatus and method
03/19/2003EP1293831A1 Projection exposure apparatus and method
03/19/2003EP1293830A1 Projection exposure apparatus and method
03/19/2003EP1293829A2 Device for exposure of a peripheral area of a wafer
03/19/2003EP1293508A1 Organometallic precursor for forming metal pattern
03/19/2003EP1293355A1 Thermal transfer film, thermal transfer recording medium, and method for image formation using the same
03/19/2003EP1293341A2 Image recorder having more than one recording head and image recording system containing the image recorder
03/19/2003EP1292973A2 Method to restore hydrophobicity in dielectric films and materials
03/19/2003EP1292969A2 Patterning method using a removable inorganic antireflection coating
03/19/2003EP1292968A2 Displacement device
03/19/2003EP1292864A2 Method of reducing post-development defects in and around openings formed in photoresist by use of multiple development/rinse cycles
03/19/2003EP1292863A2 Multiphoton absorption method using patterned light
03/19/2003EP1292862A2 Multipass multiphoton absorption method and apparatus
03/19/2003EP1292861A2 Multidirectional photoreactive absorption method
03/19/2003EP1292860A2 Use of carboxyl group-containing acetal polymers in light-sensitive compositions and lithographic printing plates
03/19/2003EP1292859A2 Data storage medium comprising colloidal metal and preparation process thereof
03/19/2003EP1292852A2 Microfabrication of organic optical elements
03/19/2003EP1292718A2 Method for depositing metal and metal oxide films and patterned films
03/19/2003EP1292361A1 Methods utilizing scanning probe microscope tips and products therefor or produced thereby
03/19/2003EP1240556A4 Photolithography method, photolithography mask blanks, and method of making
03/19/2003EP1092174B1 Photocurable elastomeric polymers
03/19/2003CN1404626A A method for producing a metal film, a thin film device having such metal film and a liquid crystal display device having such thin film device
03/19/2003CN1404584A Organic polymeric antireflective coatings deposited by chemical vapor deposition
03/19/2003CN1404122A Detection method of electric defect in inner conducting layer of tested area
03/19/2003CN1403877A Nonaqueous protective film stripping liquid handling apparatus and nonaqueous protective film stripping liquid handling method
03/19/2003CN1403876A Stripping liquid for photoetching colloid and photoetching colloid stripping method using the same stripping liquid
03/19/2003CN1403875A Exposure energy predicting method
03/19/2003CN1403874A Photo-sensitive conducting resin, conductor pattern forming method and manufacturing method of ceramic laminated structural parts
03/19/2003CN1403873A Optical proximity effect correcting method
03/19/2003CN1403561A Diluent composition for washing photosensitive resin
03/18/2003USRE38038 Exposure method and projection exposure apparatus
03/18/2003US6536015 Apparatus and method of correcting layout pattern data, method of manufacturing semiconductor devices and recording medium
03/18/2003US6535829 System for calculating exposure energy
03/18/2003US6535280 Phase-shift-moiré focus monitor
03/18/2003US6535274 Projection exposure device
03/18/2003US6535273 Microlithographic illumination system with depolarizer
03/18/2003US6535270 Exposure apparatus and air-conditioning apparatus for use with exposure apparatus
03/18/2003US6534921 Method for removing residual metal-containing polymer material and ion implanted photoresist in atmospheric downstream plasma jet system
03/18/2003US6534917 Mercury-filled discharge lamp with stabilized light intensity
03/18/2003US6534777 Surface position detecting system and method having a sensor selection
03/18/2003US6534766 Charged particle beam system and pattern slant observing method
03/18/2003US6534671 Photocurable halofluorinated acrylates
03/18/2003US6534459 Resist residue remover
03/18/2003US6534425 Mask design and method for controlled profile fabrication
03/18/2003US6534250 Photo-reactive benzocyclobutenones and polymers thereform for self-photocuring, photo-crosslinking and photopatterning without catalysts
03/18/2003US6534249 Method of making low cost integrated out-of-plane micro-device structures
03/18/2003US6534246 Multilayer containing photoresist
03/18/2003US6534245 With cured photosensitive deielectric
03/18/2003US6534243 Chemical feature doubling process
03/18/2003US6534241 Method of actinically imaging a semiconductor
03/18/2003US6534240 Requires no development processing and provides a printing plate having an excellent press life
03/18/2003US6534239 Resist compositions with polymers having pendant groups containing plural acid labile moieties
03/18/2003US6534238 Thermal digital lithographic printing plate
03/18/2003US6534235 Photosensitive resin composition and process for forming pattern
03/18/2003US6534234 Superposing a photosensitive planographic printing plate and a protection paper alternately to protect the surface of the photosensitive layer from abrasion
03/18/2003US6534225 Removed by employing methods which provide a gradual sloped region in the transparent or semi-transparent substrate which is formed in an area of the substrate opposite to that of the opaque image which is formed thereon.
03/18/2003US6534221 Method for fabricating continuous space variant attenuating lithography mask for fabrication of devices with three-dimensional structures and microelectronics
03/18/2003US6533847 Adsorption apparatus
03/18/2003CA2322005C Reliable, modular, production quality narrow-band krf excimer laser
03/18/2003CA2302249C Lithographic printing plates for use with laser imaging apparatus
03/13/2003WO2003021732A1 Laser lithography light source with beam delivery
03/13/2003WO2003021731A1 SIX TO TEN KHz, OR GREATER GAS DISCHARGE LASER SYSTEM
03/13/2003WO2003021728A2 Very narrow band, two chamber, high rep rate gas discharge laser system
03/13/2003WO2003021727A2 Line selected f2 two chamber laser system
03/13/2003WO2003021360A2 Phase-shift-moire focus monitor
03/13/2003WO2003021359A1 Imaged members and method of preparation thereof
03/13/2003WO2003021358A1 Blue-sensitized holographic media
03/13/2003WO2003021357A1 Free-acid containing polymers and their use in photoresists
03/13/2003WO2003021356A1 Method of actinically imaging
03/13/2003WO2003021354A2 Non-mechanical fabrication of carbon-containing work pieces
03/13/2003WO2003021352A1 Reticle and optical characteristic measuring method
03/13/2003WO2003021351A2 Phase-shift mask
03/13/2003WO2003020725A1 Coumarin compounds
03/13/2003WO2002091030A3 Method and apparatus for manufacturing plastic optical lenses and molds
03/13/2003WO2002071105A3 Method of fabricating reflection-mode euv diffraction elements
03/13/2003WO2002041389A3 A method for monitoring line width of electronic circuit patterns
03/13/2003WO2002025376A3 Oxime derivatives and the use thereof as latent acids
03/13/2003WO2001097725A3 Electro-optical mask controllable pattern
03/13/2003US20030050398 Novel epoxy compounds having an alicyclic structure, polymer compounds, resist materials, and patterning methods
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