Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
03/2003
03/25/2003US6537835 Method of manufacturing semiconductor device and apparatus of automatically adjusting semiconductor pattern
03/25/2003US6537738 System and method for making smooth diagonal components with a digital photolithography system
03/25/2003US6537736 Patten formation method
03/25/2003US6537735 Functionalized polymeric substance has the property that it is developer insoluble prior to delivery of infrared radiation and developer soluble thereafter
03/25/2003US6537734 Stopping the developing process and removing the resist using immersion in de-ionized water followed by a vacuum dry period
03/25/2003US6537732 Resist pattern and method of forming same, method of forming thin-film pattern, and method of manufacturing micro device
03/25/2003US6537731 Developer and process for preparing flexographic printing forms
03/25/2003US6537730 Thermal imaging composition and member containing sulfonated IR dye and methods of imaging and printing
03/25/2003US6537729 Solid imaging compositions for preparing polyethylene-like articles
03/25/2003US6537728 Structures, lithographic mask forming solutions, mask forming methods, field emission display emitter mask forming methods, and methods of forming plural field emission display emitters
03/25/2003US6537727 Resist composition comprising photosensitive polymer having loctone in its backbone
03/25/2003US6537726 Polymeric unit derived from 3-hydroxy-1-adamantyl(meth)acrylate and polymeric unit derived from beta-(meth)acryloyloxy-gamma-butyrolactone; adhesion, sensitivity, resolution
03/25/2003US6537725 Planographic printing plate
03/25/2003US6537724 Photoresist composition for resist flow process, and process for forming contact hole using the same
03/25/2003US6537723 Photosensitive composition for manufacturing optical waveguide, production method thereof and polymer optical waveguide pattern formation method using the same
03/25/2003US6537722 Infrared-imageable recording material and offset printing plates produced from it
03/25/2003US6537719 Photosensitive resin composition
03/25/2003US6537718 Positive photoresist composition for exposure to far ultraviolet ray
03/25/2003US6537717 Photohardenable microencapsulated coloring agents
03/25/2003US6537710 Processor controls a display of an image on the electronically programmed mask, wherein the display replicates conventional type masks; optical contrast; characteristics easily changed or reprogrammed by the processor.
03/25/2003US6537708 Electrical critical dimension measurements on photomasks
03/25/2003US6537645 Photosensitive pastes and substrates for plasma display panel using the same
03/25/2003US6537459 Method and apparatus for etching-manufacture of cylindrical elements
03/25/2003US6537419 Gas distribution plate assembly for providing laminar gas flow across the surface of a substrate
03/25/2003US6537373 Method of forming film and apparatus thereof
03/25/2003US6536964 Spin coating film thickness can be maintained at a predetermined thickness even when the atmospheric pressure changes in a clean room; semiconductor wafers, photoresists
03/25/2003US6536735 Vibration isolating apparatus for table for mounting device sensitive to vibrations and method therefor
03/25/2003US6536449 Semiconductor wafer residues left after photoresist ashing and/or reactive ion etching processes; halogen containing gas (fluorocarbon) and ammonia and substantially no oxygen
03/25/2003US6536344 Printing plate automatic exposing device
03/25/2003US6536130 Overlay mark for concurrently monitoring alignment accuracy, focus, leveling and astigmatism and method of application thereof
03/25/2003CA2040621C Photocurable composition comprising maleic anhydride adduct of polybutadiene or butadiene copolymers
03/24/2003CA2399197A1 Pin plate for use in array printing and method for making the pin plate
03/20/2003WO2003024171A2 Method of treating photoresists using electrodeless uv lamps
03/20/2003WO2003023833A1 Homogenization of a spatially coherent radiation beam and printing and inspection, respectively, of a pattern on a workpiece
03/20/2003WO2003023832A1 Exposure method and system, and device production method
03/20/2003WO2003023521A1 A zoom system, in particular, a zoom system for an illumination device of a microlithographic projection system
03/20/2003WO2003023519A1 Environmentally durable, self-sealing optical articles
03/20/2003WO2003023518A1 Method for high resolution patterning using low-energy electron beam, process for preparing nano device using the method
03/20/2003WO2003023517A1 Method for high resolution patterning using soft x-ray, process for preparing nano device using the method
03/20/2003WO2003023494A1 Improved method and apparatus using an slm
03/20/2003WO2003023488A1 Graphics engine for high precision lithography
03/20/2003WO2003023481A1 Optical system, projection optical system, exposure device having the projection optical system, and method for manufacturing micro device using the exposure device
03/20/2003WO2003023480A1 Optical system anhd exposure system provided with the optical system, and production method for device
03/20/2003WO2003023082A2 System and process for automated microcontact printing
03/20/2003WO2003022949A1 Cationic polymerizable adhesive composition and anisotropically electroconductive adhesive composition
03/20/2003WO2003022895A1 Process for the preparation of hydroxy-vinyl-aromatic polymers or copolymers by anionic or controlled radical polymerization
03/20/2003WO2003022594A1 Photosensitive resin composition for printing plate precursor capable of laser engraving
03/20/2003WO2003022571A1 Process for the production of patterned ceramic green-sheets and multilayered ceramic devices
03/20/2003WO2003022506A1 Ultrashort pulse laser ablation appartus and method using it to form reticles
03/20/2003WO2003005067A3 Method and apparatus to reduce effects of sheared wavefronts on interferometric phase measurements
03/20/2003WO2003001297A3 Method for determining lithographic focus and exposure
03/20/2003WO2002099534A9 Lighting system with a plurality of individual grids
03/20/2003WO2002098189A3 Method and apparatus for generating high output power gas discharge based source of extreme ultraviolet radiation and/or soft x-rays
03/20/2003WO2002097485A3 Method for controlled modification of the reflective qualities of a multi-layer
03/20/2003WO2002093639A3 Arrangement and method for detecting defects on a substrate in a processing tool
03/20/2003WO2002057814A3 Diffraction grating-based wavelength selection unit
03/20/2003WO2002009163A8 Flare measuring method and flare measuring device, exposure method and exposure system, method of adjusting exposure system
03/20/2003WO2001063363A3 Photoacid generators and photoresists comprising same
03/20/2003US20030056189 Fabrication methods of semiconductor integrated circuit device and photomask
03/20/2003US20030055855 Method and system for efficient and accurate filtering and interpolation
03/20/2003US20030055120 Used to fabricate planar optical waveguides with low loss and low birefringence
03/20/2003US20030054658 Dry silylation plasma etch process
03/20/2003US20030054656 Method for manufacturing semiconductor device including two-step ashing process of N2 plasma gas and N2/H2 plasma gas
03/20/2003US20030054646 Using hydrofluoric acid and sulfuric acid; leaving polycry-stalline silicon, silicon nitride and/or aluminum containing layers intact
03/20/2003US20030054642 Production method of semiconductor device and production system of semiconductor device
03/20/2003US20030054580 Semiconductor device and a manufacturing method of the same
03/20/2003US20030054578 Monolithic three-dimensional structures
03/20/2003US20030054574 Position detection apparatus, alignment apparatus and methods therefor, and exposure apparatus and device manufacturing method
03/20/2003US20030054294 Antireflective coating over substrate; patterned photoresist; annealing
03/20/2003US20030054293 Heat resistance, dimensional stability;printed circuits
03/20/2003US20030054292 Forming photoresist by photolithography
03/20/2003US20030054290 Polymer, resist material and patterning method
03/20/2003US20030054289 Polymer, resist composition and patterning process
03/20/2003US20030054287 Resist composition
03/20/2003US20030054286 Positive resist composition
03/20/2003US20030054285 Chemically amplified negative photoresist, and photoresist composition
03/20/2003US20030054284 Radiation-sensitive composition, insulating film and organic el display element
03/20/2003US20030054283 Positive photoresist composition and process for synthesizing polyphenol compound
03/20/2003US20030054282 Actinically imageable and infrared heated printing plate
03/20/2003US20030054268 Semiconductor lithography structures; forming latent images; applying photoresist to semiconductor; calibration
03/20/2003US20030054266 Photosensitive transfer recording material and process for producing color filter
03/20/2003US20030054265 Photosensitive solution for forming picture cell and color filter produced by using the same
03/20/2003US20030054263 Multilayer; first mask having separation patterns; second mask is high density, overlapping patterns; transferring exposure
03/20/2003US20030054158 Colored articles and compositions and methods for their fabrication
03/20/2003US20030054153 Support cylinder; photopolymer
03/20/2003US20030054117 Polymeric antireflective coatings deposited by plasma enhanced chemical vapor deposition
03/20/2003US20030053738 Light leakage detecting device of an optical transmission system using fiber optic cable
03/20/2003US20030053732 Method for apodizing a planar waveguide grating
03/20/2003US20030053678 Device for exposure of a strip-shaped workpiece with a meander correction device
03/20/2003US20030053594 Discharge source with gas curtain for protecting optics from particles
03/20/2003US20030053588 Radiation-generating devices utilizing multiple plasma-discharge sources and microlithography apparatus and methods utilizing the same
03/20/2003US20030053221 System for converting optical beams to collimated flat-top beams
03/20/2003US20030053217 Illumination apparatus, exposure apparatus using the same, and device fabricating method
03/20/2003US20030053074 Interferometric stage system
03/20/2003US20030053058 Alignment mark, alignment apparatus and method, exposure apparatus, and device manufacturing method
03/20/2003US20030053057 Position detection method and apparatus, and exposure method and apparatus
03/20/2003US20030053040 Focal point position detecting method in semiconductor exposure apparatus
03/20/2003US20030053039 Device for exposure of a peripheral area of a wafer
03/20/2003US20030053037 Coordinate measuring stage and coordinate measuring instrument
03/20/2003US20030053036 Production method of projection optical system
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