Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
03/2003
03/27/2003US20030059705 Addition polymer; photopolymerization; sensitivity, storage stability
03/27/2003US20030059691 Automatic measurement; calibration; adjustment accuracy; controlling exposure of optical pattern
03/27/2003US20030059690 Joining substrates by anode coupling; positioning marking; forming penetration aperture
03/27/2003US20030059688 Post exposure modification of critical dimensions in mask fabrication
03/27/2003US20030059687 Anti-resonance mask for off-axis photolithography
03/27/2003US20030059686 Process for production of pattern-forming body
03/27/2003US20030059618 Waterproofing, heta resistance, radiation transparent; encapsulating electronics
03/27/2003US20030059552 Chemical resistance; uniform film thickness; mixture of phenolic resin and acid generator
03/27/2003US20030059543 Insulating paste composition for rib formation and method of rib pattern formation
03/27/2003US20030059344 A printing plate comprising a silica substrate and a plurality of pins, each pin was formed by reactive ion etching to remove selected areas of wafer without covered by the photoresist layer
03/27/2003US20030058986 Apparatus and methods for surficial milling of selected regions on surfaces multilayer-film reflective mirrors as used in X-ray optical systems
03/27/2003US20030058555 Multifaceted reflecting mirror, illumination optical system based on use of the same, and semiconductor exposure apparatus
03/27/2003US20030058529 Reflective spectral filtering of high power extreme ultra-violet radiation
03/27/2003US20030058515 MEMS-based valve device
03/27/2003US20030058444 Inspection method, apparatus and system for circuit pattern
03/27/2003US20030058443 Spectroscopic scatterometer system
03/27/2003US20030058429 Stable energy detector for extreme ultraviolet radiation detection
03/27/2003US20030058428 Controlling a photolithography process by computer, manufacturing semiconductor devices; data processing based on an algorithm for evaluating a correction value of a stepper
03/27/2003US20030058426 Sliding seal
03/27/2003US20030058425 Flexure supported wafer table
03/27/2003US20030058424 Euv reticle carrier with removable pellicle
03/27/2003US20030058423 Exposure apparatus, exposure method and process for producing device
03/27/2003US20030058422 Lithographic apparatus and device manufacturing method
03/27/2003US20030058421 Projection optical system and an exposure apparatus with the projection optical system
03/27/2003US20030058420 Image recording device
03/27/2003US20030058417 Environmental control chamber
03/27/2003US20030058222 Data input device power management including beacon state
03/27/2003US20030057835 Short arc discharge lamp
03/27/2003US20030057640 Apparatus for conveying sheet-like recording material
03/27/2003US20030057619 Method and apparatus for operating a vibration isolation system having electronic and pneumatic control systems
03/27/2003US20030057610 Positive image-forming material
03/27/2003US20030057513 Membrane IC fabrication
03/27/2003US20030057381 Apparatus and methods for mask/substrate alignment in charged-particle-beam pattern-transfer
03/27/2003US20030057346 Active vibration isolator and exposure apparatus with the active vibration isolator, device manufacturing method
03/27/2003US20030057198 Method and apparatus for performing baking treatment to semiconductor wafer
03/27/2003US20030057178 Method for making a mirror for photolithography
03/27/2003US20030057177 Three dimensional etching process
03/27/2003US20030057093 Production of microelectronic devices; application of electrophoretic resists in automated equipment that meets the standards for cleanliness and production throughput desired by the microelectronic fabrication industry.
03/27/2003US20030056722 Coating film forming system
03/27/2003US20030056665 Printing screen
03/27/2003CA2460862A1 Methods and apparatus for patterning a surface
03/26/2003EP1296540A1 Display
03/26/2003EP1296191A2 Method of optimising the imaging properties of a plurality of optical elements
03/26/2003EP1296190A1 Positive resist composition
03/26/2003EP1296189A2 Photosensitive resin composition and printed wiring board
03/26/2003EP1296188A2 Photosensitive resin composition and printed wiring board
03/26/2003EP1296187A2 Photopolymerizable lithographic printing plate
03/26/2003EP1296186A1 Radiation sensitive resin composition, rib, rib forming method and display element
03/26/2003EP1296162A1 Polygon reflector, and illumination optical system and semiconductor exposure device using the polygon reflector
03/26/2003EP1295900A2 Uses of epoxy-acrylates
03/26/2003EP1295716A2 Method for evaluating image and method for controlling quality of lithographic printing plate
03/26/2003EP1295715A1 Presensitized plate for preparing lithographic printing plate
03/26/2003EP1295635A1 Pin plate for use in array printing and method for making the pin plate
03/26/2003EP1295518A2 Process for thick film circuit patterning
03/26/2003EP1295315A2 Process for the post etch stripping of photoresist with hydrogen
03/26/2003EP1295181A2 Method for making or adding structures to an article
03/26/2003EP1295180A2 Process for producing microfluidic articles
03/26/2003EP1295179A2 Multiphoton curing to provide encapsulated optical elements
03/26/2003EP1295178A2 Imageable element and waterless printing plate
03/26/2003EP1295177A2 Strongly water-soluble photoacid generator resist compositions
03/26/2003EP1295153A1 Film coated optical lithography elements and method of making
03/26/2003EP0784527B1 X-y-theta positioning mechanism
03/26/2003CN2541872Y Photoresist stripper
03/26/2003CN1406392A Exposure mask, method for manufacturing the mask, and exposure method
03/26/2003CN1406383A Device for X-ray lithography
03/26/2003CN1406347A Method of evaluation of reticle image using aerial image simulator
03/26/2003CN1405978A Electrode pattern formation method for sound surface-wave element
03/26/2003CN1405844A Method for manufacturing active region using barrier pattern to stabilize yellow-light making process
03/26/2003CN1405843A Method for reducing photoresist roughness
03/26/2003CN1405633A Lighting device and method for producing exposure device using same and device thereof
03/26/2003CN1405632A Method for determining optical constant of reflection-prevention film and method for forming photoresist pattern
03/26/2003CN1405631A Self-sensitizing type super-branched polyimide photo-sensitive material and its preparing method
03/26/2003CN1405593A Torsion-arm type static-electric driven switch of inclined lower electrode structure and its making method
03/26/2003CN1103698C Lithographic form plate and lithographic form plate original negative
03/25/2003US6539321 Method for edge bias correction of topography-induced linewidth variation
03/25/2003US6539276 Semiconductor circuit having surface features and method of adjusting a tool with respect to this surface
03/25/2003US6539046 Wavemeter for gas discharge laser
03/25/2003US6539042 Ultra pure component purge system for gas discharge laser
03/25/2003US6538830 Method and device for improved lithographic critical dimension control
03/25/2003US6538821 Projection optical system
03/25/2003US6538753 Method and apparatus for dimension measurement of a pattern formed by lithographic exposure tools
03/25/2003US6538740 Adjusting method for position detecting apparatus
03/25/2003US6538731 System and method for characterizing macro-grating test patterns in advanced lithography and etch processes
03/25/2003US6538724 Exposure apparatus
03/25/2003US6538723 Scanning exposure in which an object and pulsed light are moved relatively, exposing a substrate by projecting a pattern on a mask onto the substrate with pulsed light from a light source, light sources therefor, and methods of manufacturing
03/25/2003US6538722 photolithography process for manufacturing semiconductor elements, such as LSIs, image pickup elements, CCDs, liquid crystal display elements or thin film magnetic heads
03/25/2003US6538721 Scanning exposure apparatus
03/25/2003US6538720 Lithographic tool with dual isolation system and method for configuring the same
03/25/2003US6538719 Exposure apparatus and exposure method, and device and method for producing the same
03/25/2003US6538716 Lithographic apparatus, device manufacturing method, and device manufactured thereby
03/25/2003US6538682 Exposure device
03/25/2003US6538348 Stage device capable of moving an object to be positioned precisely to a target position
03/25/2003US6538257 Method of generating extremely short-wave radiation, and extremely short-wave radiation source unit
03/25/2003US6538256 Electron beam lithography system using a photocathode with a pattern of apertures for creating a transmission resonance
03/25/2003US6538247 Method of detecting arrangement of beam spots
03/25/2003US6538140 Complex oxonol infrared radiation sensitive compounds
03/25/2003US6538090 Organic anti-reflective polymer and method for manufacturing thereof
03/25/2003US6538086 2-Methyl-2-(bicyclo(2.2.1)heptane) protective group; etch resistant amplified resists
03/25/2003US6537844 Manufacturing method for exposure mask, generating method for mask substrate information, mask substrate, exposure mask, manufacturing method for semiconductor device and server
03/25/2003US6537837 Pattern formation method using two alternating phase shift masks
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