Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
04/2003
04/02/2003CN1408077A Photoresist composition for deep UV radiation
04/02/2003CN1407634A Solar battery, and its manufacturing method and apparatus
04/02/2003CN1407602A Electronic emission photoetching device using selective-grow carbon nanometer tube and method thereof
04/02/2003CN1407411A Device and method for control of aqueous protective coating removing liquid
04/02/2003CN1407410A Development treating method and developing liquid coating device
04/02/2003CN1407409A Composition for removing etching resisting agent and byproducts and use thereof
04/02/2003CN1407408A Exposure device and method
04/02/2003CN1407407A Laser etching image filter
04/02/2003CN1407406A Photoetching adhesive composition
04/02/2003CN1407405A Chemical enlarging positive corrosion resist composition
04/02/2003CN1407404A Photoetching adhesive composition
04/02/2003CN1407378A Liquid treating device and method
04/02/2003CN1407374A Manufacture for photosensitive insulating film pattern and reflection electrode and its liquid crystal display device
04/02/2003CN1406990A Resin compound containing functional group derivated from quinone-cyclopentadiene affixture and light resistant agent composition
04/02/2003CN1406749A Multi-layer thermal imaging element
04/02/2003CN1406748A Litho-printing panel for infrared laser
04/02/2003CN1406675A Coated baker
04/02/2003CN1104302C 激光加工装置 The laser processing apparatus
04/01/2003USRE38054 Reliable, modular, production quality narrow-band high rep rate F2 laser
04/01/2003US6543044 Method of extracting characters and computer-readable recording medium
04/01/2003US6542282 Post metal etch clean process using soft mask
04/01/2003US6542237 Using mask; accurate pattern adjustment
04/01/2003US6542224 Silica-based light-weight EUV lithography stages
04/01/2003US6542223 Scanning type exposure uniformizing system and method
04/01/2003US6542222 Beam output control method, beam output apparatus and exposure system, and device manufacturing method using the exposure system
04/01/2003US6542221 Integrated circuit system with automated best focus determination based on change in alignment due to predictable pattern degradation
04/01/2003US6542220 Purge gas systems for use in lithographic projection apparatus
04/01/2003US6542219 Optical correction plate, and its application in a lithographic projection apparatus
04/01/2003US6542218 Photolithographic process for producing etched patterns on the surface of fine tubes, wires, or other three dimensional structures
04/01/2003US6541786 Plasma pinch high energy with debris collector
04/01/2003US6541784 Electron beam exposure system and exposing method using an electron beam
04/01/2003US6541783 Reticle having an apertured weakly scattering membrane with selective strongly scattering regions between the apertures; provides independent exposure dosage levels that can be mixed to provide a wide range of exposure levels with high contrast
04/01/2003US6541782 Electron beam photolithographic process
04/01/2003US6541776 Device for electrostatic deflection of a particle beam
04/01/2003US6541759 Interferometry system having a dynamic beam-steering assembly for measuring angle and distance and employing optical fibers for remote photoelectric detection
04/01/2003US6541750 Modification of a projection imaging system with a non-circular aperture and a method thereof
04/01/2003US6541597 Resist resin having in its structure a bridged bond containing aliphatic ring; pattern excellent in transparency against short wavelength light and dry-etching resistance can be formed by alkali development with high resolution.
04/01/2003US6541561 Comprises irradiated polyvinyl chloride or vinyl acetate-vinyl chloride copolymer for making stencils for screen prining; solvent-free; viscosity
04/01/2003US6541537 Acrylate polymeric compositions and methods
04/01/2003US6541405 Reducing in radiation transmission variations; optics, lenses; oxidation decomposition of organosilicon compound
04/01/2003US6541376 Film forming method and film forming apparatus
04/01/2003US6541361 Plasma enhanced method for increasing silicon-containing photoresist selectivity
04/01/2003US6541347 Method of providing planarity of a photoresist
04/01/2003US6541283 Method for determining magnification error portion of total misalignment error in a stepper
04/01/2003US6541188 Developer for alkaline-developable lithographic printing plates
04/01/2003US6541187 Process for producing an article with a microstructure
04/01/2003US6541184 Applying uniform layer of developer to photoresist using rotating chuck; spin coating; calibration
04/01/2003US6541183 Negative lithographic printing plates having a semisolid radiation-sensitive layer
04/01/2003US6541182 Method for forming fine exposure patterns using dual exposure
04/01/2003US6541181 Heat sensitive element on lithographic substrate
04/01/2003US6541180 Photosensitive lithographic printing plate
04/01/2003US6541179 Resist compositions and patterning process
04/01/2003US6541178 An sulfonium(-) and iodonium(+)ion-type photoacid generator containing a naphthol structure, and photosensitive polyimide resin using photoacid generator
04/01/2003US6541176 Process for making lithographic printing plate
04/01/2003US6541170 Controlling conditions accoring to the light reflectivity of the wafer's undercoat when forming the resist pattern by measuring and storing data on the rotation speed when applying the solution, exposure time, development time; fine lines
04/01/2003US6541169 Methods for charged-particle-beam microlithography including correction of deflection aberrations, and device-manufacturing methods comprising same
04/01/2003US6541168 Vacuum ultraviolet transmitting direct deposit vitrified silicon oxyfluoride lithography glass photomask blanks
04/01/2003US6541167 Optical proximity correction
04/01/2003US6541166 Method and apparatus for lithographically printing tightly nested and isolated device features using multiple mask exposures
04/01/2003US6541077 Negative non-chemical amplification resist polymer or a positive chemical amplification resist polymer
04/01/2003US6540946 Microlens for surface mount products
04/01/2003US6540898 Producing high resolution displays; grille having a set of holes applied to the screening surface that exposes a first set of areas; photoresist layer on the grille and the exposed areas of screening surface.
04/01/2003US6539986 Liquid discharging apparatus and method for discharging liquid
04/01/2003US6539856 Method of screen printing stencil production
03/2003
03/27/2003WO2003026363A1 Discharge source with gas curtain for protecting optics from particles
03/27/2003WO2003025987A1 Lens-barrel, exposure device, and method of manufacturing device
03/27/2003WO2003025981A1 Monolithic three-dimensional structures
03/27/2003WO2003025679A2 Exposure mask device and method for orienting a plurality of substrates on an exposure mask
03/27/2003WO2003025678A2 Method and device for control of the data flow on application of reticles in a semiconductor component production
03/27/2003WO2003025677A1 Etching method and composition for forming etching protective layer
03/27/2003WO2003025676A1 Pattern-forming material and method of forming pattern
03/27/2003WO2003025675A1 Pattern forming material and method of pattern formation
03/27/2003WO2003025674A1 Composition for actinic energy ray and method of forming pattern
03/27/2003WO2003025646A1 Method for apodizing a planar waveguide grating
03/27/2003WO2003025637A1 Photolithographic uv transmitting mixed fluoride crystal
03/27/2003WO2003025636A1 Photolithographic method and uv transmitting fluoride crystals with minimized spatial dispersion
03/27/2003WO2003024722A1 Pattern forming method and pattern forming device
03/27/2003WO2003024186A2 Methods and apparatus for patterning a surface
03/27/2003WO2003007078A3 Photocurable resist inks
03/27/2003WO2003007076A3 Photosensitive compositions having mixtures of alkoxy and non-alkoxy diazonium salt containing compounds
03/27/2003WO2002054458A3 Method for the manufacture of micro structures
03/27/2003WO2002004698A8 Particle guidance system
03/27/2003US20030061596 Exposure apparatus, method of controlling same, and method of manufacturing devices
03/27/2003US20030061595 Exposure method for correcting line width variation in a photomask
03/27/2003US20030061524 Capacitive sensing and data input device power management
03/27/2003US20030060921 Discrete time trajectory planner for lithography system
03/27/2003US20030060382 Solution composition for removing a remaining photoresist resin
03/27/2003US20030060055 Resist pattern, a method for fabricating a resist pattern, a method for patterning a thin film and a method for manufacturing a micro device
03/27/2003US20030059804 Detection of preferential particle in sample; provide microcarriers, incubate with labeled biopolymers, detect hybridization, evaluate code
03/27/2003US20030059726 Method of recording identifier and set of photomasks
03/27/2003US20030059725 Overcoating an image detector with photoresist; exposure; masking; patterning; development
03/27/2003US20030059722 Method of forming mask, method of forming patterned thin film, and method of fabricating micro device
03/27/2003US20030059719 Post exposure modification of critical dimensions in mask fabrication
03/27/2003US20030059716 Methods for reducing blur and variation in blur in projected images produced by charged-particle-beam microlithography
03/27/2003US20030059715 Positive resist composition
03/27/2003US20030059713 Multilayer containing photopolymers
03/27/2003US20030059710 Photosensitive patterns; semiconductor
03/27/2003US20030059709 Photoresist composition
03/27/2003US20030059708 Photocuring using photoinitiator; impact strength
03/27/2003US20030059706 Positive photoresist composition for the formation of thick films, photoresist film and method of forming bumps using the same
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