Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
04/2003
04/08/2003US6544712 Negative working resist composition
04/08/2003US6544711 Image quality and consistence sensitometric response to pressure development
04/08/2003US6544700 Charged particle beam exposure method
04/08/2003US6544699 Method to improve accuracy of model-based optical proximity correction
04/08/2003US6544698 For creating two dimensional and three dimensional structures using a maskless photolithography system that is semi-automated, directly reconfigurable, and does not require masks, templates or stencils
04/08/2003US6544695 Patterning on a photoresist layer; increased pitch-to-size ration
04/08/2003US6544692 Black defect correction method and black defect correction device for photomask
04/08/2003US6544590 Liquid coating method, apparatus and film-forming method for producing the same employing excess coating removing unit having absorbent fabric on porous structure
04/08/2003US6544370 Puff heat transfer
04/08/2003US6543617 Packaged radiation sensitive coated workpiece process for making and method of storing same
04/08/2003US6543254 Method for determining laser-induced compaction in fused silica
04/08/2003CA2311586C Amplitude mask, and apparatus and method for manufacturing long period grating filter using the same
04/08/2003CA2040521C Aqueous solutions or dispersions of oligoruethanes containing (meth)acryloyl groups, a process for their production and coated substrates prepared therefrom
04/03/2003WO2003028135A1 Fuel cell and electronic device using fuel cell
04/03/2003WO2003028074A1 Diaphragm device, projection optical system and projection exposure device, and micro-device producing method
04/03/2003WO2003028073A1 Aberration measuring device, aberration measuring method, regulation method for optical system, and exposure system provided with optical system regulated by the regulation method
04/03/2003WO2003027747A1 Catadioptric reduction lens
04/03/2003WO2003027630A2 Device and method for optically scanning a substrate disk
04/03/2003WO2003027156A1 Alkali-soluble maleimide copolymer and liquid crystal display comprising the same
04/03/2003WO2003027035A1 Fused silica having high internal transmission and low birefringence
04/03/2003WO2003001869A3 Method and apparatus for use of plasmon printing in near-field lithography
04/03/2003WO2003001521A3 Method for the production of an optical disk matrix
04/03/2003WO2002091078B1 Methods and apparatus employing an index matching medium
04/03/2003WO2002084340B1 Microlens for projection lithography and method of preparation thereof
04/03/2003WO2002069043A3 Low absorbing resists for 157 nm lithography
04/03/2003WO2002069038A3 Novel polymers and photoresist compositions comprising same
04/03/2003WO2002021216A9 Polymers and photoresist compositions comprising electronegative groups
04/03/2003US20030065126 Reacting m-cresol with propionaldehyde in the presence of acid catalyst forming polymer, then reacting with 3,4-xylenol and formaldehyde yielding phenolic novolak resin; semiconductor/integrated circuits
04/03/2003US20030065119 Comprises chromophore and antireflective coating for use in manufacturing integrated circuits by lithography
04/03/2003US20030065101 High resolution, dimensional stability; electronic devices with smaller feature sizes
04/03/2003US20030065049 Aminobenzophenones and photopolymerizable compositions including the same
04/03/2003US20030064877 For use as lens in photolithographic system
04/03/2003US20030064609 Substrate processing apparatus and substrate processing method
04/03/2003US20030064608 Polymeric antireflective coatings deposited by plasma enhanced chemical vapor deposition
04/03/2003US20030064599 Pattern forming method
04/03/2003US20030064534 Method for determining optical constant of antireflective layer, and method for forming resist pattern
04/03/2003US20030064391 Preparation of sequences on substrate; obtain substrate, deposit on plate surface, incubate with activator, remove protective groups, recover biopolymer
04/03/2003US20030064327 Exposing sections of the photosensitive resist film to generate an acid from the photoacid generator, eliminating the acid-labile group of the polymer with the acid and liberating the anchor group to change the polarity of the polymer
04/03/2003US20030064326 Resist stripper, resist stripping method, and thin film circuit device formation method
04/03/2003US20030064324 Removal of organic layers from organic electronic devices
04/03/2003US20030064323 Forming a resist film on a surface of mask by oxidizing with a compound having a silicon-nitrogen linkage in the main chain, replacing nitrogen by oxygen
04/03/2003US20030064321 Free-acid containing polymers and their use in photoresists
04/03/2003US20030064320 Active components and photosensitive resin composition containing the same
04/03/2003US20030064319 Negative photoresist compositions for the formation of thick films, photoresist films and methods of forming bumps using the same
04/03/2003US20030064318 For production of negatives without preheat or development step; durability
04/03/2003US20030064317 Spray coating a dispersion of polymethylcyanoacrylate, photothermal conversion material (infrared radiation cyanine dye, and binder for exposure of lithographic printing plate
04/03/2003US20030064316 Solvent resistant photosensitive compositions
04/03/2003US20030064315 N,N'-ditrifluoromethanesulphonyloxy-4,4'-(phenylene-1,3-dioxy) dinaphthalene-1,8:1',8'-tetracarboxylic imide increases the degree of polymerization; for passivation layer, buffer coating, or dielectric film in printed circuits
04/03/2003US20030064307 Process for forming latent image, process for detecting latent image, process and device for exposure, exposure apparatus, resist and substrate
04/03/2003US20030064305 Photosensitive resin composition and printed wiring board
04/03/2003US20030064304 Photosensitive resin composition and printed wiring board
04/03/2003US20030064303 Composition having refractive index sensitively changeable by radiation and method for forming refractive index pattern
04/03/2003US20030064300 Pattern transfer method using a mask and half tone mask
04/03/2003US20030064295 Method for making element
04/03/2003US20030064212 Printed circuit board or card having plated through-holes filled with a photocured polymer
04/03/2003US20030064168 To form a micropattern having dry etching resistance, and a substrate- protecting coat having a high dielectric strength and good adhesion to a substrate
04/03/2003US20030064161 Method for reducing carbon contamination of multilayer mirrors
04/03/2003US20030064159 Drying the coating film after forming the coating film in a state of the posture of the substrate is kept and with inhibiting the down flow from turning into a side of the surface to be coated
04/03/2003US20030063553 Manufacturing method of stamper for optical information medium, photoresist master therefor, stamper for optical information medium and optical information medium
04/03/2003US20030063394 Projection optical system, method of making projection optical system, method of making illumination optical system, and method of making exposure apparatus
04/03/2003US20030063393 Projection optical system, projection exposure apparatus, and projection exposure method
04/03/2003US20030063375 Reflection type demagnification projection optical system and exposure apparatus using the same
04/03/2003US20030063289 Switching type dual wafer stage
04/03/2003US20030063278 Method for overlay metrology of low contrast features
04/03/2003US20030063268 Projection exposure system
04/03/2003US20030063267 Interferometer system for a semiconductor exposure system
04/03/2003US20030063266 Lithographic apparatus and device manufacturing method
04/03/2003US20030062550 Semiconductor device and method for patterning
04/03/2003US20030062489 Variably shaped beam EB writing system
04/03/2003US20030062334 Method for forming a micro-pattern on a substrate by using capillary force
04/03/2003US20030062145 Method and apparatus for production of a cast component
04/03/2003US20030062125 Cationic-polymerizable compound, a photocationic initiator and aromatic ether compound or an aliphatic thioether; liquid crystal or electroluminescent display having excellent adhesive strength and moisture permeation resistance
04/03/2003US20030061958 Low-cost lithography
04/03/2003US20030061957 Direct drawing type lithographic printing plate precursor and production method thereof
04/02/2003EP1298965A2 Radiation-generating devices utilizing multiple plasma-discharge sources and microlithography apparatus and methods utilizing the same
04/02/2003EP1298495A1 Method of developing photosensitive planographic printing plate
04/02/2003EP1298494A2 High numerical aperture projection system for microlithography
04/02/2003EP1298493A2 Coating compositions for use with an overcoated photoresist
04/02/2003EP1298492A2 Coating compositions for use with an overcoated photoresist
04/02/2003EP1298491A1 Resist composition
04/02/2003EP1298490A2 Photopolymerizable composition and recording material
04/02/2003EP1298155A1 Photo-setting and thermosetting resin composition, process for preparing plugged-through-hole printed wiring board, and plugged-through-hole printed wiring board
04/02/2003EP1297968A2 Dampening water composition for lithographic printing plate and lithographic printing process
04/02/2003EP1297594A1 Gas discharge laser long life electrodes
04/02/2003EP1297566A2 Substrate cleaning apparatus and method
04/02/2003EP1297563A1 Bottom anti-reflective coating using rapid thermal anneal with oxidizing gas
04/02/2003EP1297387A2 Electric microcontact printing method and apparatus
04/02/2003EP1297386A1 Negative-acting chemically amplified photoresist composition
04/02/2003EP1297385A2 Material and method for making an electroconductive pattern
04/02/2003EP1297384A1 Device and method for cleaning articles used in the production of semiconductor components
04/02/2003EP1297383A1 A method for individualised marking of circuit boards
04/02/2003EP1297381A1 Imaging materials comprising electrically conductive polymer particle layers
04/02/2003EP1297049A1 Accelerators for cationic polymerization catalyzed by iron-based catalysts
04/02/2003EP1297022A1 Novel photoinitiators and applications therefor
04/02/2003EP1297021A2 Multiphoton photosensitization system
04/02/2003EP1296913A2 Photostructured paste
04/02/2003EP1296899A1 Fused silica with constant induced absorption
04/02/2003EP1222842B1 Production of a dense mist of micrometric droplets in particular for extreme uv lithography
04/02/2003EP0996544B1 Pattern formation
04/02/2003CN1408078A Method for forming resist pattern in reverse-tapered shape
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