Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
04/2003
04/15/2003US6548219 Transparent to deep ultraviolet (DUV) radiation
04/15/2003US6548215 Polymer particles in photosensitive layer; stability
04/15/2003US6548214 Method of lithography utilizing orthogonal experiment to improve profile
04/15/2003US6548213 Controlling transmission light
04/15/2003US6548124 Nanometric scale coherently controlled molecular deposition
04/15/2003US6548122 Depositing metal precursor on substrate, adding energy to reduce metal precursor and precipitate metal on substrate as a continuous metal layer
04/15/2003US6548115 Modular coating apparatus adapted to couple to host system, such as a cluster or in-line type coating system, as well as to operate in stand-alone fashion; uses rotatable chuck
04/15/2003US6548110 Process liquid dispense method and apparatus
04/15/2003US6547975 Magnetic pole fabrication process and device
04/15/2003US6547461 Photosensitive material automatic-processing apparatus
04/15/2003US6547458 Optical monitoring integrated circuits
04/15/2003US6546939 Removal residues from copper or aluminum surfaces; polishing with aqueous acidity solution containing buffers
04/15/2003US6546868 Printing form and method of modifying the wetting characteristics of the printing form
04/15/2003CA2216296C Imaging method for manufacture of microdevices
04/10/2003WO2003030597A2 Machine and installation for tracing on a support
04/10/2003WO2003030252A2 Process for producing interconnects
04/10/2003WO2003030238A1 Processing method
04/10/2003WO2003030237A1 Etching method
04/10/2003WO2003030229A1 Aligner and method for fabricating device
04/10/2003WO2003030228A2 Method and apparatus for mitigating cross-contamination between liquid dispensing jets in close proximity to a surface
04/10/2003WO2003029901A1 Chemical-amplification-type positive radiation-sensitive resin composition
04/10/2003WO2003029900A1 Negative-acting aqueous photoresist composition
04/10/2003WO2003029899A1 Positive photosensitive polyimide resin composition
04/10/2003WO2003029898A1 Photosensitive resin composition
04/10/2003WO2003029873A2 Method and device for reducing speckle in an optical system
04/10/2003WO2003028970A1 Method of producing resin molded product
04/10/2003US20030069134 Surface active homopolymer of hydrofluoroalkyl (alk)acrylates that may contain other groups such as sulfonamides
04/10/2003US20030068892 Metal shadow-mask in IC process flow
04/10/2003US20030068837 Apparatus and method for deposition of an electrophoretic emulsion
04/10/2003US20030068833 Error reduction in semiconductor processes
04/10/2003US20030068585 Chemical consolidation of photoresists in the UV range
04/10/2003US20030068584 Surface smoothing of stereolithographically formed 3-D objects
04/10/2003US20030068579 Dissolving a gaseous molecule having oxidizing properties or reducing properties in an aqueous alkaline solution.
04/10/2003US20030068575 Lithographic printing plate precursor
04/10/2003US20030068574 Copolymer of hexafluoropropylene, an unsaturated carboxylic acid and/or anhydride and another unsaturated compound; acid generator; curing agent; and a fluorine-containing organic compound
04/10/2003US20030068573 Chemical amplification type positive resist composition
04/10/2003US20030068567 Photosensitive resin composition and printed wiring board
04/10/2003US20030068566 Full phase shifting mask in damascene process
04/10/2003US20030068565 Mask for use in measuring flare, method of manufacturing the mask, method of identifying flare-affected region on wafer, and method of designing new mask to correct for flare
04/10/2003US20030068430 Nozzle arm movement for resist development
04/10/2003US20030068012 Arrangement for generating extreme ultraviolet (EUV) radiation based on a gas discharge
04/10/2003US20030067734 Methods for electrostatically chucking an object to an electrostatic chuck that reduce uncorrectable placement error of the object
04/10/2003US20030067679 Preferred crystal orientation optical elements from cubic materials
04/10/2003US20030067611 Point-diffraction interferometer
04/10/2003US20030067604 Scan exposure apparatus and method, and device manufacturing method
04/10/2003US20030067592 Reticle stage with reaction force cancellation
04/10/2003US20030067591 Illumination optical system, exposure apparatus, and microdevice manufacturing method
04/10/2003US20030066975 Photocatalytic layer; decomposing impurities by exposure toradiation
04/10/2003US20030066961 Examining system for the particle-optical imaging of an object, deflector for charged particles as well as method for the operation of the same
04/10/2003DE20220125U1 Numerically controlled (NC) exposure device for light-sensitive material e.g. for circuit board layout film, uses exposure head moving in direct contact with light-sensitive material
04/09/2003EP1300932A2 Linear motor, stage apparatus, and exposure apparatus
04/09/2003EP1300857A2 Apparatus and methods for surficial milling of selected regions on surfaces of multilayer-film reflective mirrors as used in X-ray optical systems
04/09/2003EP1300727A2 Positive photosensitive composition
04/09/2003EP1300434A2 Hyperbranched polymers with latent functionality and methods of making same
04/09/2003EP1299775A1 Method of reducing metal ion content of film-forming resins using a liquid/liquid centrifuge
04/09/2003EP1299774A1 Perfluoroalkylsulfonic acid compounds for photoresists
04/09/2003EP1299773A1 Silicon-containing acetal protected polymers and photoresists compositions thereof
04/09/2003EP1299772A1 Apparatus and method for forming photoresist pattern with target critical dimension
04/09/2003EP1299770A2 Resin composition and three-dimensional object
04/09/2003EP1299448A1 Accelerators useful for energy polymerizable compositions
04/09/2003EP1299238A1 Coating composition and method for preparing radiation sensitive plate useful in lithographic printing and the like
04/09/2003EP1299237A1 Printing plates comprising modified pigment products
04/09/2003EP1159133B1 Positive-working photosensitive lithographic printing plate and method for producing the same
04/09/2003EP1095346A4 Two-dimensional to three-dimensional vlsi design
04/09/2003EP1051666B1 Solution of tetramethyl ammonium hydroxide in water, process for preparing the solution and use thereof
04/09/2003CN1409832A Device and method in connection with production of structures
04/09/2003CN1409377A Circle forming method
04/09/2003CN1409376A Semiconductor device and its producing method
04/09/2003CN1409175A Lighting optical system, exposure device and method for producing micro element
04/09/2003CN1409174A Lithographic printing forebody
04/09/2003CN1409173A Photosensitive resin composition and printing circuit board
04/09/2003CN1409172A Photosensitive resin composition and printing circuit board
04/09/2003CN1409171A Photoetching programming system and its use
04/09/2003CN1408765A Resin composition for insulation and laminated body using said composition
04/09/2003CN1408764A Light solidified and heat solidified resin composition and method for producing printed circuit board
04/09/2003CN1105129C Fractionation of phenol formaldehyde condensate and photoresist compositions produced therefrom
04/09/2003CN1105030C Dry lithographic printing plate front element and method for forming lithographic printing plate
04/09/2003CN1105015C Method for producing screen printing stencil
04/08/2003US6546543 Method of displaying, inspecting and modifying pattern for exposure
04/08/2003US6546125 Photolithography monitoring using a golden image
04/08/2003US6545829 Method and device for improved lithographic critical dimension control
04/08/2003US6545808 Phase mask with spatially variable diffraction efficiency
04/08/2003US6545748 Apparatus for the method of manufacturing a stent
04/08/2003US6545746 Projection exposure apparatus
04/08/2003US6545745 Extreme-UV lithography vacuum chamber zone seal
04/08/2003US6545744 Two-sided substrate imaging using single-approach projection optics
04/08/2003US6545377 Coil with cooling means
04/08/2003US6545369 Overlay error reduction by minimization of unpatterned wafer area
04/08/2003US6545284 Face position detection method and apparatus, and exposure method and exposure apparatus, a production method for an exposure apparatus and a production method for a semiconductor device
04/08/2003US6545282 Apparatus and methods for reducing Coulombic blur in charged-particle-beam microlithography
04/08/2003US6545274 Methods and devices for determining times for maintenance activity performed on a charged-particle-beam microlithography apparatus, and microelectronic-device-manufacturing methods comprising same
04/08/2003US6545272 Apparatus and methods for monitoring contamination of an optical component in an optical system
04/08/2003US6544903 Resist pattern forming method and semiconductor device manufacturing method
04/08/2003US6544894 Method of producing chromium mask
04/08/2003US6544859 Semiconductor processing methods and structures for determining alignment during semiconductor wafer processing
04/08/2003US6544739 Method for marking samples
04/08/2003US6544721 Multiple exposure method
04/08/2003US6544720 Containing phthalocyanine compound
04/08/2003US6544717 Undercoating composition for photolithographic resist
04/08/2003US6544715 Positive photoresist composition for far ultraviolet ray exposure