| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 04/17/2003 | US20030073762 For addition polymers; mixture containing free radicals |
| 04/17/2003 | US20030073754 Photopolymerization |
| 04/17/2003 | US20030073322 Ashing apparatus, ashing methods, and methods for manufacturing semiconductor devices |
| 04/17/2003 | US20030073045 Exposure apparatus and method |
| 04/17/2003 | US20030073043 Amplification of resist structures of fluorinated resist polymers by structural growth of the structures by targeted chemical bonding of fluorinated oligomers |
| 04/17/2003 | US20030073042 Process and materials for formation of patterned films of functional materials |
| 04/17/2003 | US20030073041 Partial photoresist etching |
| 04/17/2003 | US20030073040 Pattern forming method and bilayer film |
| 04/17/2003 | US20030073039 Method of forming a patterned photoresist with a non-distorted profile |
| 04/17/2003 | US20030073038 Fabrication method of semiconductor integrated circuit device and mask |
| 04/17/2003 | US20030073037 Negative resist process with simultaneous development and aromatization of resist structures |
| 04/17/2003 | US20030073035 Forming substrate blanket resist layer on substrate; exposing, while employing a charged particle beam method susceptible to a proximity effect, the blanket resist layer to form a charged particle beam exposed blanket resist layers |
| 04/17/2003 | US20030073034 Capable of forming a high-contrast image without reducing the sensitivity, in which the image-forming layer is improved in the uniformity, and the solubility and dispersibility in a developer |
| 04/17/2003 | US20030073033 Capable of directly processed from the digital signals of computers; image quality |
| 04/17/2003 | US20030073032 Can be directly recorded based on digital data from computers and the like, excellent in storage stability, shows no reduction in sensitivity with the lapse of time, and has excellent face flatness |
| 04/17/2003 | US20030073030 Polymers containing oxygen and sulfur alicyclic units and photoresist compositions comprising same |
| 04/17/2003 | US20030073029 Positive-working resist composition |
| 04/17/2003 | US20030073028 Isoflavonyl (meth)acrylate monomer; semiconductors, photolithography |
| 04/17/2003 | US20030073027 Chemical amplification resist compositions and process for the formation of resist patterns |
| 04/17/2003 | US20030073025 Used in connection with organic dyes having excellent image fastness, ink, color filters, holograms, proofs, sealants, adhesives, planography, resin letterpress, photoresists and the like |
| 04/17/2003 | US20030073013 Generating diffraction pattern corresponding to lithographic pattern; determining which of spatial frequency components need to be captured by lens; illuminating high transmission attenuated phase-shift mask |
| 04/17/2003 | US20030073012 Additive composition for both rinse water recycling in water recycling systems and simultaneous surface treatment of lithographic printing plates |
| 04/17/2003 | US20030073011 Imaged members and method of preparation thereof |
| 04/17/2003 | US20030073009 Photomask for focus monitoring, method of focus monitoring, unit for focus monitoring and manufacturing method for a unit |
| 04/17/2003 | US20030073008 Method for certifying a newly-made photomask |
| 04/17/2003 | US20030072886 Forming a liquid film on the substrate by dropping a liquid on a substrate from a dropping unit while rotating the substrate, moving the dropping unit in the radial direction from the inner periphery, adjusting the feed speed of the liquid |
| 04/17/2003 | US20030072575 Applying thin film of developer solution to imaged coating and allowing time for dissolution to take place as plate is conveyed through developer across flat horizontal platen; lithographic printing plates |
| 04/17/2003 | US20030072046 Holographic illuminator for synchrotron-based projection lithography systems |
| 04/17/2003 | US20030072017 Method of producing multicolor pixel sheet and color filter using the same |
| 04/17/2003 | US20030071997 Method for determining semiconductor overlay on groundrule devices |
| 04/17/2003 | US20030071986 Method for optimizing the image properties of at least two optical elements as well as methods for optimizing the image properties of at least three optical elements |
| 04/17/2003 | US20030071983 Method for improving resolution limits of a stepper |
| 04/17/2003 | US20030071982 Exposure apparatus |
| 04/17/2003 | US20030071981 Devices and methods for compensating for tilting of a leveling table in a microlithography apparatus |
| 04/17/2003 | US20030071980 Apparatus control system, apparatus control method, semiconductor exposure apparatus, semiconductor exposure apparatus control method and semiconductor device manufacturing method |
| 04/17/2003 | US20030071979 Lithographic apparatus and device manufacturing method |
| 04/17/2003 | US20030071571 Ultraviolet light source driven by capillary discharge plasma and method for surface treatment using the same |
| 04/17/2003 | US20030071279 Semiconductor device including a plurality of kinds of MOS transistors and method of manufacturing the same |
| 04/17/2003 | US20030071236 Method of deforming a pattern and semiconductor device formed by utilizing deformed pattern |
| 04/17/2003 | US20030071231 Electron beam exposing method and exposure apparatus |
| 04/17/2003 | US20030071230 Electron beam apparatus and electron beam adjusting method |
| 04/17/2003 | US20030071204 Homogenization of a spatially coherent radiation beam and printing and inspection, respectively, of a pattern on a workpiece |
| 04/17/2003 | US20030071018 Method for correcting characteristics of attenuated phase-shift mask |
| 04/17/2003 | US20030071016 Patterned structure reproduction using nonsticking mold |
| 04/17/2003 | US20030071010 Inhibiting adsorption of sodium to integrated circuit surfaces during photoresist removal or post-metal etch cleanup with a solvent mixture of 1,2-diaminocyclohexanetetra carboxylic acid, a nucleophilic amine, and a weak acid |
| 04/17/2003 | US20030070613 Excluding an antioxidant and/ or aging retardant the surface of rubber rollers placed before and after the coating site |
| 04/17/2003 | CA2462347A1 Patterned structure reproduction using nonsticking mold |
| 04/16/2003 | EP1302813A1 Resist composition |
| 04/16/2003 | EP1302496A1 Insulating resin composition, adhesive resin composition and adhesive sheeting |
| 04/16/2003 | EP1302313A2 Lithographic printing plate precursor |
| 04/16/2003 | EP1301944A2 Nanoscale patterning for the formation of extensive wires |
| 04/16/2003 | EP1301830A2 Method for characterizing optical systems using holographic reticles |
| 04/16/2003 | EP1301829A1 Radiation sensitive compositions containing image quality and profile enhancement additives |
| 04/16/2003 | EP1301818A2 Apparatus, system, and method for active compensation of aberrations in an optical system |
| 04/16/2003 | EP1301569A1 Absorbing compounds for spin-on glass anti-reflective coatings for photolithography |
| 04/16/2003 | EP1301302A1 Paste filled with metal powder and metal products obtained with same |
| 04/16/2003 | EP1268189A4 Flame retardant optical films |
| 04/16/2003 | EP1212660B1 Device and method for wavelength dependent light outcoupling |
| 04/16/2003 | EP0957400B1 Photosensitive resin composition, method for producing pattern therefrom, electronic devices produced by using the same, and method for production thereof |
| 04/16/2003 | EP0925529B1 Alkysulfonyloximes for high-resolution i-line photoresists of high sensitivity |
| 04/16/2003 | CN1411032A Auxiliary designing method of contact hole photoetching |
| 04/16/2003 | CN1411025A Charged beam apparatus, pattern testing method and pattern display method |
| 04/16/2003 | CN1410833A Light cover composite and making method of contact hole with same |
| 04/16/2003 | CN1410832A Double layer microimage method without residue |
| 04/16/2003 | CN1106029C Process of exactly patterning layer to target configuration by using photo-resist mask formed with dummy pattern |
| 04/16/2003 | CN1105945C Apertured nonplanar electrodes and forming methods |
| 04/16/2003 | CN1105944C Process for obtaining lift-off imaging profile |
| 04/16/2003 | CN1105757C Composition for anti-reflection coating |
| 04/15/2003 | US6550051 Lithographic data verification method and photo mask manufacturing method |
| 04/15/2003 | US6549608 Semiconductor manufacturing apparatus and semiconductor device manufacturing method |
| 04/15/2003 | US6549555 Gas performance control system for gas discharge lasers |
| 04/15/2003 | US6549551 Injection seeded laser with precise timing control |
| 04/15/2003 | US6549347 Catadioptric lens barrel structure |
| 04/15/2003 | US6549322 Method and apparatus for enhancing image contrast using intensity filtration |
| 04/15/2003 | US6549277 Illuminance meter, illuminance measuring method and exposure apparatus |
| 04/15/2003 | US6549272 Method for improved resolution of patterning using binary masks with pupil filters |
| 04/15/2003 | US6549271 Exposure apparatus and method |
| 04/15/2003 | US6549270 Exposure apparatus, exposure method and method for manufacturing devices |
| 04/15/2003 | US6549269 Exposure apparatus and an exposure method |
| 04/15/2003 | US6549268 Exposure method and apparatus |
| 04/15/2003 | US6549267 Pulse-width extending optical systems, projection-exposure apparatus comprising same, and manufacturing methods using same |
| 04/15/2003 | US6549266 Projection exposure method and apparatus |
| 04/15/2003 | US6549264 Extreme-UV lithography vacuum chamber zone seal |
| 04/15/2003 | US6549023 Apparatus for measuring the focus of a light exposure system used for fabricating a semiconductor device |
| 04/15/2003 | US6548847 Semiconductor integrated circuit device having a first wiring strip exposed through a connecting hole, a transition-metal film in the connecting hole and an aluminum wiring strip thereover, and a transition-metal nitride film between the aluminum wiring strip and the transition-metal film |
| 04/15/2003 | US6548820 Optical synthetic aperture array |
| 04/15/2003 | US6548613 Polymerization of acrylic and vinyl monomers to produce a polymer that can be used in a submicrolithographic process; semiconductors |
| 04/15/2003 | US6548602 Polymeric film compositions having controlled viscosity response to temperature and shear |
| 04/15/2003 | US6548423 Multilayer anti-reflective coating process for integrated circuit fabrication |
| 04/15/2003 | US6548416 Plasma ashing process |
| 04/15/2003 | US6548384 Method for performing lithographic process to a multi-layered photoresist layer |
| 04/15/2003 | US6548312 Manufacturing method of semiconductor integrated circuit devices and mask manufacturing methods |
| 04/15/2003 | US6548229 Positive-working chemical-amplification photoresist composition and method for forming a resist pattern using the same |
| 04/15/2003 | US6548228 Method of and apparatus for developing exposed photoresist to prevent impurity from being attached to wafer surface |
| 04/15/2003 | US6548227 Forming a protective layer on aluminum layer, thereby exposing protective layer to solution while reducing surface area of aluminum layer exposed to solution, to inhibit diffusion of solution through aluminum layer into tin oxide layer |
| 04/15/2003 | US6548226 Narrow width pattern; variations in light intensity |
| 04/15/2003 | US6548223 Methods of forming patterns across photoresist and methods of forming radiation-patterning tools |
| 04/15/2003 | US6548222 Cationic polymerizable monomer, a cationic initiator, and an infrared absorber; hardens upon exposure to infrared radiation and soluble or dispersable in ink and/or fountain solution |
| 04/15/2003 | US6548221 Comprising 2-alkyl-2-adamantyl (meth)acrylate monomer; for production of semiconductors via lithography |
| 04/15/2003 | US6548220 Containing acid generator |