Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
04/2003
04/23/2003EP1304594A2 Projection exposure device for microlithography at 200 nm
04/23/2003EP1304499A1 Vibration isolating device using magnetic levitating device
04/23/2003EP1304340A1 Resins for resists and chemically amplifiable resist compositions
04/23/2003EP1304221A1 Imaging members containing carbon black and methods of imaging and printing
04/23/2003EP1304220A1 Heat-sensitive lithographic printing plate precursor
04/23/2003EP1303894A1 Extreme repetition rate gas discharge laser with improved blower motor
04/23/2003EP1303892A1 Injection seeded f 2? lithography laser
04/23/2003EP1303875A2 Method and apparatus for performing final critical dimension control
04/23/2003EP1303794A2 Method for an improved developing process in wafer photolithography
04/23/2003EP1303793A2 Method and system of automatic fluid dispensing for imprint lithography processes
04/23/2003EP1303792A2 High-resolution overlay alignement methods and systems for imprint lithography
04/23/2003EP1303791A2 Multicolor imaging using multiphoton photochemical processes
04/23/2003EP1303789A1 T-butyl cinnamate polymers and their use in photoresist compositions
04/23/2003EP1303736A2 Systems and methods for quantifying nonlinearities in interferometry systems
04/23/2003EP1303729A2 Reticle storage and retrieval system
04/23/2003EP1303399A1 Thermal digital lithographic printing plate
04/23/2003EP1171493B1 Photoactive polymers
04/23/2003EP0992092B1 Very narrow band laser with unstable resonance cavity
04/23/2003EP0938526B1 Thermosettable pressure sensitive adhesive
04/23/2003CN1413356A Semiconductor integrated circuit device, and method for producing the same, and method of producing masks
04/23/2003CN1413317A Thinner for rinsing photoresist and method of treating photoresist layer
04/23/2003CN1413225A Resin composition curable with actinic energy ray
04/23/2003CN1413126A Method and device for mask-free production of biopolymers
04/23/2003CN1412848A Semiconductor device and its mfg. method
04/23/2003CN1412819A Application of metal cover in IC preparation process
04/23/2003CN1412818A Application of ceramic cover in IC preparation process
04/23/2003CN1412623A Base plate exposure device and method
04/23/2003CN1412622A Equipment management system and method, semiconductor exposure apparatus and management method, method for mfg. semiconductor
04/23/2003CN1412621A Optical recorder and recording method thereof
04/23/2003CN1412620A Optical mask for focus monitor, monitoring method and device, and its manufacturing method
04/23/2003CN1412619A Chemical enlarging positive photoetching glue composition
04/23/2003CN1106788C 电路基片 Circuit substrate
04/23/2003CN1106417C Polymerizable composition based on epoxides
04/23/2003CN1106275C Laser imageable tuned optical cavity thin film and printing plate incorporating same
04/22/2003USRE38085 Exposure method and projection exposure apparatus
04/22/2003US6553562 Method and apparatus for generating masks utilized in conjunction with dipole illumination techniques
04/22/2003US6553558 Integrated circuit layout and verification method
04/22/2003US6553137 Method of increasing overlay accuracy in an exposure step and overlay displacement measuring device for determining optimum measurement focus plane by variation in magnitudes of displacement of two overlay inspection marks
04/22/2003US6553049 ArF laser with low pulse energy and high rep rate
04/22/2003US6552862 Mounting device for an optical element
04/22/2003US6552846 Catoptric optical element, illumination optical system equipped therewith, projection exposure apparatus and method for manufacturing semiconductor device
04/22/2003US6552798 Position detecting method and system for use in exposure apparatus
04/22/2003US6552790 Accuracy
04/22/2003US6552779 Flying image of a maskless exposure system
04/22/2003US6552777 Image exposing method and image exposing apparatus
04/22/2003US6552776 Photolithographic system including light filter that compensates for lens error
04/22/2003US6552775 Optical projecting system for projecting and synchronously scanning mask pattern; enhancing fineness
04/22/2003US6552774 Exposure apparatus
04/22/2003US6552773 Stage system with driving mechanism, and exposure apparatus having the same
04/22/2003US6552352 Aligner
04/22/2003US6552350 System and method for providing a lithographic light source for a semiconductor manufacturing process
04/22/2003US6552143 Polymeric compound and resin composition for photoresist
04/22/2003US6551973 Stable metal-safe stripper for removing cured negative-tone novolak and acrylic photoresists and post-etch residue
04/22/2003US6551939 Plasma surface treatment method and resulting device
04/22/2003US6551938 N2/H2 chemistry for dry development in top surface imaging technology
04/22/2003US6551784 Method of comparing nucleic acid sequences
04/22/2003US6551765 Coating apparatus, discharge device, and coating method
04/22/2003US6551764 Exposing a resist layer of a polymer material that has at least one saturated alicycle substitited with fluorine atoms to vacuum ultraviolet rays for patterning into a predetermined shape
04/22/2003US6551758 For use in microfabrication of integrated circuits
04/22/2003US6551757 Negative-working thermal imaging member and methods of imaging and printing
04/22/2003US6551756 Solvent-developable printing formulations with improved processing characteristics
04/22/2003US6551755 Positive photoresist composition
04/22/2003US6551751 Apparatus for controlling the amount of light energy delivered to a layer of photoresist on a semiconductor device
04/22/2003US6551749 Developer and method for forming resist pattern and photomask produced by use thereof
04/22/2003US6551696 Interleaf sheet for planographic printing plates, abutting member for planographic printing plates, and packaging structure for planographic printing plates
04/22/2003US6551448 Heat processing apparatus of substrate
04/22/2003US6551409 Holding the substrate containing organic contaminants in a tank, filling the tank with water vapors and ozone gas mixture, contacting the side of the substrate with contaminants with above gas mixture to remove the organic
04/22/2003US6551400 Coating apparatus
04/22/2003US6551045 Wafer stage chamber
04/22/2003US6550990 Holder for keeping the substrate horizontal, and a chemical solution discharge/suction mechanism that simultaneously supplies fresh solution to the mechanism as it suctions the chemical solution; developing exposed photoresist coatings
04/22/2003US6550989 Apparatus and methods for development of resist patterns
04/22/2003US6550988 Substrate processing apparatus
04/17/2003WO2003032381A2 Method for measuring a characteristic dimension of at least one structure on a disk-shaped object in a measuring appliance
04/17/2003WO2003032369A2 Correction of overlay offset between inspection layers
04/17/2003WO2003032351A2 Method and device for aligning a charged particle beam column
04/17/2003WO2003032329A1 Optical element and method for its manufacture as well as lightography apparatus and method for manufacturing a semiconductor device
04/17/2003WO2003032092A1 Planarizing recess etch
04/17/2003WO2003032091A1 Method for forming image through reaction development
04/17/2003WO2003032090A1 Photosensitive resin composition
04/17/2003WO2003032089A1 Photosensitive resin composition and printed circuit board
04/17/2003WO2003032088A1 Aqueous developable photoimageable thick film compositions for making photoimageable black electrodes
04/17/2003WO2003032087A2 Aqueous developable photoimageable thick film compositions
04/17/2003WO2003032086A2 Carl for bioelectronics: substrate linkage using a conductive layer
04/17/2003WO2003032085A2 Determination of center of focus by cross-section analysis
04/17/2003WO2003032082A1 Method and apparatus for mechanically masking a workpiece
04/17/2003WO2003032081A1 Method and apparatus for optically defining an exposure exclusion region on a photosensitive workpiece
04/17/2003WO2003031487A1 Novel fluoropolymer, resist compositions containing the same, and novel fluoromonomers
04/17/2003WO2003031136A2 Methods for patterning using liquid embossing
04/17/2003WO2003031096A2 Patterned structure reproduction using nonsticking mold
04/17/2003WO2003012548A3 System for measuring an optical system, especially an objective
04/17/2003WO2002095542A3 Workpiece sorter operating with modular bare workpiece stockers and/or closed container stockers
04/17/2003WO2002073318A3 Method and device for vibration control
04/17/2003WO2002067054A3 High-resolution photoresist structuring of multi-layer structures deposited onto substrates
04/17/2003WO2002037183A3 Inverse resist coating process
04/17/2003WO2001069973A3 Disposable modular hearing aid
04/17/2003US20030074639 Method for automatically correcting overlay alignment of a semiconductor wafer
04/17/2003US20030074587 Capacitive sensing and data input device power management
04/17/2003US20030074363 Method and system for providing a polymorphism database
04/17/2003US20030074097 Lithography; stacked containers
04/17/2003US20030073795 Transparent to ultraviolet radiation; pattern clarity
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